Scribd
Upload
18 views

Question 2

The document contains code that calculates the wavelength (W) needed to resolve a feature size of 500nm for different numerical apertures (NA). It plots W vs the variable i for two NAs: 0.26 and 0.41. The discussion notes that a higher NA allows a larger feature size to be resolved but reduces the depth of focus quadratically. For a 500nm feature, a wavelength of 173nm is needed with NA=0.26, giving a depth of focus of 2559.2nm, while NA=0.41 requires 273nm wavelength and reduces the depth of focus to 1624.0nm. Therefore, there is a tradeoff between resolution and depth of focus that a designer must consider

Uploaded by

bauncy
Copyright
© Attribution Non-Commercial (BY-NC)
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as DOCX, PDF, TXT or read online on Scribd
18 views

Question 2

The document contains code that calculates the wavelength (W) needed to resolve a feature size of 500nm for different numerical apertures (NA). It plots W vs the variable i for two NAs: 0.26 and 0.41. The discussion notes that a higher NA allows a larger feature size to be resolved but reduces the depth of focus quadratically. For a 500nm feature, a wavelength of 173nm is needed with NA=0.26, giving a depth of focus of 2559.2nm, while NA=0.41 requires 273nm wavelength and reduces the depth of focus to 1624.0nm. Therefore, there is a tradeoff between resolution and depth of focus that a designer must consider

Uploaded by

bauncy
Copyright
© Attribution Non-Commercial (BY-NC)
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as DOCX, PDF, TXT or read online on Scribd
You are on page 1/ 2

Question 2:

Code:

NA1=0.26;
K=0.75;
NA2=0.41;
z=0;
for i= 100:1:500
z=z+1;
W1(z)=i*K/(NA1);
W2(z)=i*K/(NA2);
W3(z)=i/(NA1^2);
W4(z)=i/(NA2^2);
X(z)=i;
if fix(W1(z) - 500)==0
i
W3(z)
end
if fix(W2(z) - 500)==0
i
W4(z)
end
end
plot(X,W1,'--','linewidth',2);
hold on;
plot(X,W2,'-.','linewidth',2,'color','black');
hold on;
plot(X,W3,':','linewidth',2,'color','red');
hold on;
plot(X,W4,'linewidth',2,'color','green');
Discussion:

From the graph we can deduce that, if we want to use a higher wavelength for manufacturing
desired feature size, then we have to use a larger value of numerical aperture (NA). And at
higher value of NA, at a given wavelength, it is observed that the depth of focus is reduced
considerably. Increasing the NA increases resolution linearly, but decreases the depth of focus
quadratically.

Or, we can say that for any source of given wavelength, the smallest feature size will be smaller
if we use we use a larger numerical aperture (NA). And at that wavelength the Depth of Focus
will be smaller if NA value is larger.

Since we need smaller feature size and larger depth of focus, there’ll always be a tradeoff
between them.

For a feature size of feature size to be 500nm we need a source of wavelength around 173nm,
if NA is 0.26, or we need a source of wavelength around 273nm, if NA is 0.41. It is observed that
at wavelength equal to 173nm and NA equal to 0.26, the depth of focus is 2559.2nm. While at
wavelength equal to 273nm and NA equal to 0.41, the depth of focus is 1624.0nm.

Hence we can say that if a designer has to manufacture 0.5um feature sizes, he/she has to
adjust wavelength and NA so that an acceptable depth of focus is maintained.

You might also like