Lect 02 MOS1
Lect 02 MOS1
MOS Transistor
Drain
Kuroda, IEDM panel
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With a positive gate bias, electrons are pulled toward the positive gate electrode Given a large enough bias, the electrons start to invert the surface (p n type), a conductive channel forms Threshold voltage Vt
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Current flows from drain to source with a positive drain voltage What is current in terms of Vgs, Vds, Vbs?
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MOS Current
Ids = 0 : cut-off Vgs< Vt Ids = eCoxW/L ((Vgs-Vt) Vds-0.5Vds2) : triode (linear) mode 0 < Vds < Vgs- Vt 2 Ids = eCoxW/(2L) (Vgs-Vt) 0 < Vgs- Vt < Vds : saturation mode
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Pinch-off depletion layer width increases as the drain voltage increases Extreme case of this is punch-through
L = Lo Vds
I ds = I dsat
The square-law model doesnt match well with simulations Only fits for low Vgs, low Vds (low E-field) conditions
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Not as bad as the NMOS device Still large discrepancies at high E-field conditions
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Velocity Saturation
Saturation current does not increase quadratically The simulated curves looks like a straight line Main reason for discrepancy: velocity saturation
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E-fields have gone up as dimensions scale Unfortunately, carrier velocity in silicon is limited Electron velocity saturates at a lower E-field than holes Mobility (e=v/E) degrades at higher E-fields Simple piecewise linear model can be used
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Velocity Saturation
v =
Velocity Saturation
Plug it into the original current equation
e E
n 1 n
for E < Ec
Ec =
2vsat
Modeled through a variable mobility n=1 for PMOS, n=2 for NMOS To get an analytical expression, lets assume n=1
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Vdsat =
(Vgs Vt ) Ec L (Vgs Vt ) + Ec L
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linear
1.0V
vel. saturation
0.8V
0.6V
saturation
0.2
0.4V 1.2
Vdsat0.4
0.8
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W eCox (Vgs Vt ) 2L
Model presented is compact and suitable for hand analysis. Still have to keep in mind the main approximation: that VDSat is constant. But the model still works fairly well.
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Parameter is between 1 and 2 =1-1.2 for short channel devices Parameters and Vt are fitted to measured data for minimum square error fitted Vt can be different from physical Vt
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