Scribd
Upload
43 views20 pages

Cif L26

The format of 'gds II' is 'binary' while 'cif' is an 'ASCII' file, so it can be read. Other formats: OASIS Open Artwork System Interchange Standard The OASIS is a trademark of the Semiconductor Equipment and Materials Institute (semi)

Uploaded by

Nirneya Gupta
Copyright
© Attribution Non-Commercial (BY-NC)
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as PDF, TXT or read online on Scribd
43 views20 pages

Cif L26

The format of 'gds II' is 'binary' while 'cif' is an 'ASCII' file, so it can be read. Other formats: OASIS Open Artwork System Interchange Standard The OASIS is a trademark of the Semiconductor Equipment and Materials Institute (semi)

Uploaded by

Nirneya Gupta
Copyright
© Attribution Non-Commercial (BY-NC)
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as PDF, TXT or read online on Scribd
You are on page 1/ 20

Layout Formats : The GDS II (Gerber Data Stream information interchange) was popular with industry.

Academic group came out with CIF (Caltech intermediate format). o ). The format of GDS II is binary while CIF is an ASCII file, so it can be read.

Other formats: OASIS Open Artwork System Interchange Standard The OASIS is a trademark of the Semiconductor Equipment and Materials Institute (SEMI). DXF Drawing Exchange format

Benefits of using CIF : Standard machine-readable representation. Other h forms f can be b constructed d for f specific ifi o/p / devices d i such h as: Plotters, , Video displays Pattern-generation machines. Graphical-layout-language, Graphical layout language supports Boxes, Polygon, Circle Ci l Human readable/simple. Unambiguous, g , machine readable syntax y & semantics, , Also supports comments. Captures layer information. file ASCII text file. Exchanges design.

Boxes:
Box length -20,20; OR B25 60 80 40 -20 20; 25 width 60 center 80,40 Direction

Polygons:
Polygon OR P 0 A 0,0 B 10,20 C -30,40;

10

20

-30

40;

The edge connecting the last vertex with the first is implied.

Flashes:
Round Flash OR R 200 -500 800 ; Diam 200 center 500 ,800 ;

Wires:
Wire OR W 10 0 0 10 20 -30 40 ; width 10 A 0,0 B 10,20 c -30,40 30,40 ;

Layer Specification:
L Layer OR LND ; Technology) gy) Diffusion; Poly-silicon; Contact cut; Metal; Depletion mode implant; Buried i contact; Over-glass opening; ND nmos Diff i Diffusion ;

(layer ( y ND NP NC NM NI NB NG

nmos nmos nmos nmos nmos nmos nmos

Symbols: A symbols y is defined by y p proceeding g the symbol y geometry g y with the DS command and following it with the DF command. Symbol definition may not nest, i.e. after a DS command is specified, the terminating DF must come before the next DS .

Definition e t o sta start t # 5 57 ..; Definition finish ; OR DS 57 100 .....; DF; 1;

A/B / =

100/1; 00/ ;

e.g. (scaling 2000 CIF DS 1 100 1; unit = 1 micron );

L ND; B 25 60 80 40 ( 25* 100/1 =2500 2500 P ----; L P B L W B NP; 0 0 ---NM; 50 ----

-20 20; CIF units i

1 1.25 25

micron); i )

10

20

-30

40;

10

20

-30

40;

DF;

Calling symbols :
DS 2 LNM; R 6 C 1 (call 100 1;

0; T 45 13; symbol &

20

transform);

LNM; (This layer setting is not necessary. Layer settings are preserved across symbol calls and definitions.); R 3 0 0; DF;

Syntax :
Call -1 ,1 OR C 57 symbol # 57 mirrored i in x i then translated to 10 , 20 ; rotated to

MX

-1

10

20 ;

The primitive transformations are : MX :Mirror in x MY : Mirror Mi i y in T point or T x, y R point or R x, y

The primitive transformations are : MX :Mirror in x MY : Mirror in y T point or T x, y: Translate the current cu e sy symbol bo o origin g to o this s po point e.g. T 2 0

R point or R x, y: Rotate symbols symbol s x x-axis axis to this direction. direction e.g. R 1 1

Transformations:

T = T1 .T2 .T3

Find primitive transformation matrix R(1,1) ?

Deleting Symbol Definition:


Delete 10; OR DD 10; 10 Definitions greater than or equal to

Symbol with indices greater than or equal to the argument to DD can be forgotten . This will allow simultaneous processing of several CIF files appended in single CIF file . Euro Practice IC service : Low cost ASIC prototyping .

(Definitionoflibrarysymbols0to99); DS01001; . . DF; DS11001; . . DF; (project1); (firstprojectsymboldefinitions); DS1001001; C57T4513; . DF; DS1091001; (firstprojectmainsymbol.Hierarchical masklayoutdata); . DF; DD100; (preserveonlysymbols1to99);

(project2); (secondprojectssymboldefinitions); DS1001001; . . DF; DS1131001; (secondprojectsmainsymbol); C1T345; DF; E (Endoffile)

Open Artwork System Interchange Standard (OASIS): OASIS is a specification for hierarchical integrated circuit mask layout data format for interchange between EDA software, IC mask writing tools and mask inspection tools. tools Like GDSII, OASIS is a hardware- and software-independent bi binary data d format. f g improvements p over GDSII: It delivers the following An average of 10-50 times smaller file sizes Support of 64-bit arithmetic Unlimited design layers Richer data format for exchange of information between design and manufacturing stages.

You might also like