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VLSI System Design ECE3002 Winter 2018-19

The document discusses the evaluation criteria and reference books for the ECE3002 VLSI System Design course taught by Jayakrishnan P at SENSE. It provides an overview of recent processors and VLSI technology trends, including transistor counts and manufacturing processes. Finally, it covers fundamental VLSI design concepts such as abstraction levels, MOS transistor operation, and the modes of operation for nMOS and pMOS transistors.
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© © All Rights Reserved
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Download as PDF, TXT or read online on Scribd
0% found this document useful (0 votes)
81 views

VLSI System Design ECE3002 Winter 2018-19

The document discusses the evaluation criteria and reference books for the ECE3002 VLSI System Design course taught by Jayakrishnan P at SENSE. It provides an overview of recent processors and VLSI technology trends, including transistor counts and manufacturing processes. Finally, it covers fundamental VLSI design concepts such as abstraction levels, MOS transistor operation, and the modes of operation for nMOS and pMOS transistors.
Copyright
© © All Rights Reserved
Available Formats
Download as PDF, TXT or read online on Scribd
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VLSI System Design

ECE3002
Winter 2018-19
Jayakrishnan P
Assistant Professor (senior)
Dept. of Micro and Nano Electronics
SENSE
Evaluation
• CAT 1 - 15
• CAT 2 - 15
• Quiz 1 - 10 (6th Feb. 2019)
• Quiz 2 - 10 ( 13th Mar. 2019)
• DA1 - 10 (Due Date: 29th Mar. 2019)
Reference Books
• Neil H.Weste, Harris, A. Banerjee, “CMOS VLSI Design, A circuits and
System Perspective”, Fourth Edition, Pearson Education, 2014.
• Jan M. Rabaey, Anantha Chadrakasan, BorivojeNikolic, “Digital
Integrated Circuits: A Design Perspective”, Third Edition, Prentice Hall
India, 2014.
Very Large Scale Integration (VLSI)
Recent Processors and Technology
Transistor Date of
Processor Designer Process Area
count introduction
Apple A12 Bionic (hexa-core
6,900,000,000 2018 Apple 7 nm 83.27 mm2
ARM64 "mobile SoC")
HiSilicon Kirin 980 (octa-core
6,900,000,000 2018 Huawei 7 nm 74.13 mm2
ARM64 "mobile SoC")
Centriq 2400 18,000,000,000 2017 Qualcomm 10 nm 398 mm2
22-core Xeon Broadwell-E5 7,200,000,000 2016 Intel 14 nm 456 mm²
GC2 IPU 23,600,000,000 2018 Graphcore 16 nm 825 mm2
Silicon Die

Single die

Wafer

Going up to 12” (30cm)

From http://www.amd.com
6
Design Abstraction Levels
SYSTEM

MODULE
+

GATE

CIRCUIT

DEVICE
G
S D
n+ n+

7
nMOS Transistor
• Four terminals: gate, source, drain, body
• Gate – oxide – body stack looks like a capacitor
• Gate and body are conductors
• SiO2 (oxide) is a very good insulator
• Called metal – oxide – semiconductor (MOS) capacitor
• Even though gate is
Source Gate Drain
no longer made of metal Polysilicon
SiO2

n+ n+

p bulk Si
nMOS Operation
• Body is commonly tied to ground (0 V)
• When the gate is at a low voltage:
• P-type body is at low voltage
• Source-body and drain-body diodes are OFF
• No current flows, transistor is OFF
Source Gate Drain
Polysilicon
SiO2

0
n+ n+
S D
p bulk Si

Slide 9
pMOS Transistor
• Similar, but doping and voltages reversed
• Body tied to high voltage (VDD)
• Gate low: transistor ON
• Gate high: transistor OFF
• Bubble indicates inverted behavior

Source Gate Drain


Polysilicon
SiO2

p+ p+

n bulk Si

Slide 10
Symbols
• An ON transistor passes a finite amount of current
• Depends on terminal voltages
• Transistor gate, source, drain all have capacitance
• Capacitance and current determine speed
Transistors as Switches
• We can view MOS transistors as electrically controlled switches
• Voltage at gate controls path from source to drain
g=0 g=1

d d d
nMOS g OFF
ON
s s s

d d d

pMOS g OFF
ON
s s s

Slide 12
MOS Capacitor Vg < 0
polysilicon gate
silicon dioxide insulator
+
- p-type body

• Gate and body form MOS capacitor


(a)
• Operating modes
• Accumulation 0 < Vg < Vt

• Depletion
depletion region
+
-

• Inversion
(b)

Vg > Vt
inversion region
+
- depletion region

(c)

13
Terminal Voltages
• Mode of operation depends on Vg, Vd, Vs
• Vgs = Vg – Vs
• Vgd = Vg – Vd Vg

• Vds = Vd – Vs = Vgs - Vgd +


Vgs
+
Vgd
• Source and drain are symmetric diffusion terminals - -
• By convention, source is terminal at lower voltage Vs
- +
Vd
Vds
• Hence Vds  0
• nMOS body is grounded. First assume source is 0 too.
• Three regions of operation
• Cutoff
• Linear
• Saturation (Pinchoff)
nMOS Cutoff
• No channel
• Ids ≈ 0
Vgs = 0 Vgd
+ g +
- -
s d

n+ n+

p-type body
b
nMOS Linear
• Channel forms
• Current flows from d to s Vgs > Vt
+ g +
Vgd = Vgs

- -
• e- from s to d s d
Vds = 0
• Ids increases with Vds
n+ n+

p-type body

• Similar to linear resistor b

Vgs > Vt
Vgs > Vgd > Vt
+ g +
- - Ids
s d
n+ n+
0 < Vds < Vgs-Vt
p-type body
b
nMOS Saturation/ Pinchoff
• Channel pinches off
• Ids independent of Vds
• We say current saturates
• Similar to current source
Vgs > Vt
g Vgd < Vt
+ +
- -
s d Ids

n+ n+
Vds > Vgs-Vt
p-type body
b
Summary
• Design abstraction levels
• MOS transistors
• nMOS & pMOS
• MOS as switch
• MOS mode of operations
I-V Characteristics

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