The PN Junction:: Formation of The Depletion Region
The PN Junction:: Formation of The Depletion Region
The PN Junction:
P-Type material consists of silicon and a trivalent impurity. The number of
protons and electrons are equal and there is no net charge.
N-Type material consists of silicon and a pentavalent impurity. The number of
protons and electrons are equal and there is no net charge.
A PN junction forms when a piece of intrinsic silicon is doped half N-type and half
P-Type.
However, in less than a nanosecond, some of the free electrons will diffuse into the p-type, and
an equal number of holes will diffuse into the n-type. As the electrons and holes diffuse across
the junction they recombine and “'eliminate” each other. The end result is a lack of mobile
charge carriers in the immediate vicinity of the junction
Filling a hole makes a negative ion and leaves behind a positive ion on
the N side.
These two layers of positive and negative charges form the depletion
region, as the region near the junction is depleted of charge carriers.
As electrons diffuse across the junction a point is reached where the
negative charge repels any further diffusion of electrons.
The depletion region now acts as a barrier.
Barrier Potential:
The electric field formed in the depletion region acts as a barrier.
External energy must be applied to get the electrons to move across the
barrier of the electric field.