NSM Archive - Physical Properties of Semiconductors http://www.ioffe.

ru/SVA/NSM/Semicond/

Si - Silicon Ge - Germanium
GaP - Gallium Phosphide GaAs - Gallium Arsenide
InAs - Indium Arsenide C - Diamond
GaSb - Gallium Antimonide InSb - Indium Antimonide
InP - Indium Phosphide GaAs1-xSbx - Gallium Arsenide Antimonide
AlxGa1-xAs - Aluminium Gallium Arsenide
AlN - Aluminium Nitride InN - Indium Nitride
BN - Boron Nitride GaN - Gallium Nitride

We are going to add new data for:

GaxIn1-xAsySb1-y - Gallium Indium Arsenide GaxIn1-xP - Gallium Indium Phosphide

Antimonide
GaxIn1-xAs - Gallium Indium Arsenide GaxIn1-xSb - Gallium Indium Antimonide
InAs1-xSbx - Indium Arsenide Antimonide GaxIn1-xAsyP1-y - Gallium Indium Arsenide
Phosphide
Si1-xGex - Silicon Germanium SiC - Silicon Carbide

This section is intended to systematize parameters of semiconductor compounds and heterostructures based on
them. Such a WWW-archive has a number of advantages: in particular, it enables physicists, both theoreticians
and experimentalists, to rapidly retrieve the semiconducting material parameters they are interested in. In
addition, physical parameters - optical, electrical, mechanical, etc. - will be presented in the framework of the
electronic archive for both the known and new semiconducting compounds. As the starting point in creating the
database served the voluminous reference book "Handbook Series on Semiconductor Parameters" vol. 1,2 edited
by M. Levinstein, S. Rumyantsev and M. Shur, World Scientific, London, 1996, 1999. We express sincere
gratitude to M.E. Levinstein for help and attention to this work. A great number of reference books and original
papers cited at the end of this section have been used in compiling the information database.

We would like to express our warmest gratitude to all colleages presented their original data and literature
references to complete these archive. If you find these archive pages helpful, and use the data retrieved through
the server for your reseach, we would appreciate acknowledging it in your papers.

We would be indebted very much for any of your further suggestions and comments.

Authors

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Basic Parameters at 300 K

Band structure and carrier concentration
Basic Parameters
Band Structure
Intrinsic carrier concentration
Effective Density of States in the Conduction and Valence Band
Temperature Dependences
Dependence on Hydrostatic Pressure
Band Discontinuities at Heterointerfaces
Energy gap narrowing at high doping levels
Effective Masses and Density of States
Donors and Acceptors
Electrical Properties
Basic Parameters of Electrical Properties
Mobility and Hall Effect
Two-Dimensional Electron and Hole Gas Mobility in Heterostructures
Transport Properties in High Electric Fields
Impact Ionization
Recombination Parameters
Optical properties
Thermal properties
Basic parameters
Thermal conductivity
Lattice properties
Mechanical properties
Basic Parameters
Elastic Constants
Micro Hardness
Acoustic Wave Speeds
Phonon Frequencies
Magnetic properties
References

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Basic Parameters at 300 K

Ga0.47In0.53As GaxIn1-xAs Remarks Referens

Crystal structure Zinc Blende Zinc Blende 300 K
Group of symmetry Td2-F43m Td2-F43m 300 K
Number of atoms in 1 3.98•10 22 (3.59-0.83x) • 1 0 22 300 K
3
cm
Bulk modulus 6.62•10 11 dyn/cm2 (5.81+1.72x) • 1 0 11 dyn/cm2 300 K Goldberg Yu.A. &
N.M. Schmidt (1999)
Debye temperature 330 K (280+110x) K 300 K
Density 5.50 g•cm -3 (5.68-0.37x) g•cm -3 300 K
Melting point, Tm ~= 1100° C
Specific heat 0.3 J g-1°C -1 300 K
Thermal conductivity 0.05 W cm-1 °C -1 see Temerature dependences
Thermal expansion 5.66x10-6 °C -1 see Temerature dependences
coefficient, linear
Dielectric constant 13.9 15.1-2.87x+0.67x2 300 K
(static)
Dielectric constant (high 11.6 12.3-1.4x 300 K
frequency)
Infrared refractive index 3.43 cm2 V-1s-1 (3.51-0.16x ) V-1s-1 300 K
n
Radiative recombination 0.96 x 10-10 cm2/s see Impact Ionization 300 K
coefficient
Energy gaps, Eg 0.74 eV (0.36+0.63x+0.43x2) eV 300 K Goetz et al.(1983)
2K
(0.4105+0.6337x+0.475x2)
eV
Effective electron mass 0.041 mo (at n= (0.023+0.037x+0.003x2) mo 300 K Pearsall (1982)
me 17 cm -3)
2•10
Effective hole masses mh 0.45 mo (0.41+0.1x) mo 300 K Goldberg Yu.A. &
N.M. Schmidt (1999)
Effective hole masses 0.052 mo (0.026+0.056x) mo 300 K
mlp
Effective hole masses ~= 0.15 mo 300 K
(split-off band) mso
Electron affinity 4.5 eV (4.9-0.83x) eV 300 K
Lattice constant 5.8687 A (6.0583-0.405x) A 300 K
Piezoelectric constant e14= -(0.045+0.115x) C/m2 300 K
Optical phonon energy 34 meV see Raman-active phonon 300 K
modes

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Band structure and carrier concentration

Basic Parameters
Band structure
Intrinsic carrier concentration
Lasing wavelength
Effective Density of States in the Conduction and Valence Band
Temperature Dependences
Dependences on Hydrostatic Pressure
Band Discontinuities at Heterointerfaces
Energy gap narrowing at high doping levels
Effective Masses and Density of States
Donors and Acceptors

Basic Parameters for GaxIn1-xAsyP1-y

Zinc Blende crystal structure

Ga0.47In0.53As GaxIn1-xAs Remarks Referens

Energy gaps, Eg 0.74 eV (0.36+0.63x+0.43x2) eV 300 K Goetz et
al.(1983)
Energy gaps, Eg (0.4105+0.6337x+0.475x2) 2K Goetz et
eV al.(1983)
Electron affinity 4.5 eV (4.9-0.83x) eV 300 K
Conduction band
Energy separation between X valley 1.33 eV (1.37-0.63x+1.16x2) eV 300 K Goetz et
and al.(1983)
top of the valence band EX
Energy separation between L valley 1.2 eV (1.08-0.02x+0.65x2) eV 300 K Goetz et
and al.(1983)
top of the valence band EL
Effective conduction band density of -3 see Temerature dependences
2.1•10 17 cm
states
Valence band
Energy separation of spin-orbital *** ***
splitting Eso
Effective valence band density of -3 see Temerature dependences
7.7•10 18 cm
states
Intrinsic carrier concentration -3 see Temerature dependences
6.3•10 11 cm

Band structure for GaxIn1-xAs

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GaxIn1-xAs (zinc blende, cubic). Band structure

Important minima of the conduction band and maxima of the valence band..

For details see Goldberg Yu.A. & N.M. Schmidt (1999) .

GaxIn1-xAs. Energy gap Eg Energy separations between •- ,X-, and L -conduction

band minima and top of the valence band vs. composition parameter x.

Porod and Ferry (1983)

Interfacial elastic strain induced by lattice parameter mismatch between epilayer and substrate results in significant
band-gap shifts:

GaxIn1-xAs. Energy band gap Eg of unstrained (solid line) and strained (dashed
line and experimental points) vs. composition parameter x.
Solid line is calculated according to Eg= (0.4105+0.6337x+0.475x2) eV.
Experimental points are obtained at 4K.
Kuo et al.(1985)

Brillouin zone of the face centered cubic lattice, the Bravais lattice of the diamond and
zincblende structures.

Brillouin zone of the

hexagonal lattice.

Temperature Dependences

Eg (x,T)= 0.42 + 0.625x -[5.8/(T+300)-4.19 GaxIn1-xAs Paul et al.(1991)

-4 2
/(T+271)]•10 T x- (eV)
- 4.19•10-4T2/(T+271) +0.475x2 (eV)
Eg (x,T)= Eg (0) + (6x2- 8.6x +5.2)•10 -4 T2/(337x2- 455x GaxIn1-xAs on Ga Karachevtseva et
+196) As al.(1994)
Eg (x,T)= 0.42 + 0.625x -[5.8/(T+300)-4.19 GaxIn1-xAs
-4 2
/(T+271)]•10 T x- (eV)
- 4.19•10-4T2/(T+271) +0.475x2 (eV)
where T is temperature in degrees K

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Ga0.47In0.53As. Energy gap Eg of vs. temperature

Points are experimental data.
Solid line is theoretical calculation.
Eg(0)=821.5 ± 0.2 meV.
Zielinski et al.(1986)

Ga0.87In0.13As. Energy gap Eg of vs. temperature

Points are experimental data.
Solid line -- 1.321 - 4.1•10-4 T2/(T+139)
Karachevtseva et al.(1994)

Lasing wavelength •0

Intrinsic carrier concentration:

ni = (Nc• N v)1/2exp(-Eg/(2kBT)) ~= 4.82 x 1015 • [(0.41-0.09x)3/2 +(0.027+0.047x)3/2]1/2 x

x(0.025+0.043x)3/4[ T3/2 exp(-•/2)(1+3.75/• +3.28/• 2 -2.46/• 3)1/2 ] (cm-3) ,
where •=E(x,T)/2kT
Paul et al.(1991).

GaxIn1-xAs. Intrinsic carrier concentration vs. temperature for GaxIn1-xAs.

T = 100K; 200K; 300K; 400K; 500K;
Paul et al.(1991)

ni = 6.3x1011 cm-3 for Ga0.47In0.53As at 300K

Effective density of states in the conduction band: Nc

Nc ~= 4.82 x 1015 • ( m• /m0)3/2T3/2 (cm-3) ~= 4.82 x 1015 • (0.023+0.037x+0.003x2)3/2 T3/2 (cm-3) :

Effective density of states in the valence band: Nv

Nv ~= 4.82 x 1015 • ( mh/m0)3/2 T3/2 (cm-3)= 4.82 x 1015 • (0.41-0.1x)3/2 T3/2 (cm-3) :

Dependence on Hydrostatic Pressure

Eg (0.47,P)~= (0.796+10.9x 10-3 • P -30x10-6 • P2) 80K, Ga0.47In0.53As x=0.47 Lambkin and Dunstan
eV (1988)
Eg (0.47,P)~= (0.733+11.0x 10-3 • P -27x10-6 • P2) 300K, x=0.47
eV Ga0.47In0.53As

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Eg (0.0, P)~= (Eg (0)+4.8x 10-3 • P) eV 300K, InAs x=0.

Eg (1.0, P)~= (Eg (0)+12.6x 10-3 • P -37.7x10-6 300K, GaAs x=1.
2
• P ) eV
where P is pressure in kbar.

Energy gap narrowing at high doping levels

Ga0.47In0.53As. Energy gap narrowing Eg vs. donor (solid line) and acceptor
(dashed line) doping density
solid line -- donor doping density;
dashed line -- acceptor doping density
Jain et al. (1990)

• Eg ~= (A • N1/3 10-9 +B • N1/4 10-7 +C • N1/2 10-12) meV 300K, Ga0.47In0.53As x=0.47
where
n : A=15.5; B=1.95; C=159 300K, Ga0.47In0.53As x=0.47
p : A= 9.2; B=3.57; C=3.65 300K, Ga0.47In0.53As x=0.47
N -- carrier concentration in cm-3

Band Discontinuities at Heterointerfaces

Band discontinuities at GaxIn1-xAs/AlyGa1-yAs heterointerface Shur (1990).

Referens
Conduction band • Ev = ( • Eg - • Ev) eV Shur (1990)
discontinuity
Valence band • Ec = (0.44 •Egg) eV Shur (1990)
discontinuity
where •Egg (eV) = [1.247y + 1.5(1-x) - 0.4(1-x)2] (eV) is the difference
between •-valleys in GaxIn1-xAs and AlyGA1-yAs .

Energy gap Eg • Eg = • Egg for y<0.45

discontinuity :
Energy gap Eg • Eg = 0.476 +0.125y + 0.143y2 for y>0.45
discontinuity :
+1.5(1-x) - 0.4(1-x)2

Band discontinuities • Ev ~= 0.38 eV at Ga0.47In0.53As/InP Adachi (1992);

• Ec ~= 0.22 eV heterointerface Hybertsen
(1991)
Band discontinuities • Ev ~= 0.2 eV at Adachi (1992);
• Ec ~= 0.52 eV Ga0.47In0.53As/Al0.48In0.52As Hybertsen
heterointerface (1991)

• Ec / • Eg = [0.653 + 0.1(1-x)] eV at GaxIn1-xAs/AlxIn1-xAs Wolak et

heterointerface al.(1991)

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Effective Masses and Density of States:

Electrons

For wurtzite crystal structure the surfaces of equal energy in • valley should be ellipsoids, but effective masses in z
direction and perpendicular directions are estimated to be approximately the same:

Effective Electron Remarks Referens

Masses
Effective electron mass 0.023 -0.037x +0.003x2 GaxIn1-xAs; 300K; for • - Goldberg Yu.A. & N.M.
me= m• mo valley Schmidt (1999)
Effective electron mass m• = 0.041 mo at n= Ga0.47In0.53As; x=0.47 Pearsall (1982)
me -3
2x•10 17 cm
m• = 0.074 mo at n=
-3
6x•10 18 cm
mL = 0.29 mo ; ( L - valley Ga0.47In0.53As; x=0.47 Pearsall (1982)
)
mX = 0.68 mo ; ( X -
valley )

GaxIn1-xAs. Electron effective mass vs. concentration x for GaxIn1-xAs;

300K
Adachi (1992)

Holes

Effective Masses for Zinc Remarks Referens

Blende GaN

Effective hole masses (heavy) mh mh ~= (0.41 -0.1x) mo GaxIn1-xAs; Goldberg Yu.A. & N.M. Schmidt
300K; (1999)
Effective hole masses (light) mlp mlp ~= (0.026 -0.056x ) GaxIn1-xAs;
mo 300K;
Effective hole masses (split-off mso ~= 0.15 mo GaxIn1-xAs;
band) ms 300K;

Donors and Acceptors

Ionization energies of Shallow Remarks

Donors
Sn, Ge, Si, C ~ 5 meV Ga0.47In0.53As; Goldberg Yu.A. & N.M. Schmidt
x=0.47 (1999)
Sn, Ge, Si, S, Se, Te > 1 meV InAs; x=0
Sn, Ge, Si, S, Se, Te ~ 6 meV GaAs; x=1

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Ionization energies of Shallow

Acceptor
Mg ~ 25 meV Ga0.47In0.53As; Goldberg Yu.A. & N.M. Schmidt
x=0.47 (1999)
Zn ~ 20 meV Ga0.47In0.53As;
x=0.47
Cd ~ 30 meV Ga0.47In0.53As;
x=0.47
Mn ~ 50 meV Ga0.47In0.53As;
x=0.47
Fe ~ 150 meV Ga0.47In0.53As;
x=0.47
(above valence band), 280, 370, and 440 below conduction band
Mg ~ 25 meV GaxIn1-xAs; 0<x<1
Be ~ 25 meV GaxIn1-xAs; 0<x<1
Cd ~ 8-20 GaxIn1-xAs; 0<x<1
meV

(above valence band), 280, 370, and 440 below conduction band
Sn-10; Ge-14; Si-20; Cd-15; Zn-10 meV InAs; x=0
C - 20, Si - three acceptor levels ~ 30, 100, and GaAs; x=1
220,
Ge - 30, Zn - 25, Sn - 20.

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Electrical properties
Basic Parameters
Mobility and Hall Effect
Two-dimensional electron and hole gas mobility in heterostructures
Transport Properties in High Electric Fields
Impact Ionization
Recombination Parameters

Basic Parameters

Ga0.47In0.53As GaxIn1-xAs Remarks Referens

Breakdown field • 2 • 1 0 5 V/cm •(2÷4)•10 5 V/cm 300 K Goldberg Yu.A. &
N.M. Schmidt (1999)
Mobility electrons <12•10 3 cm2 (40-80.7x+49.2x2) • 1 0 3 cm2 300 K
V-1s-1 V-1s-1
Mobility holes <300 cm2 V-1s-1 ~300÷400 cm2 V-1s-1 300 K
Diffusion coefficient <300 cm2/s (10-20.2x+12.3x2) • 1 0 2 300 K
electrons
cm2/s
Diffusion coefficient <7.5 cm2/s ~7÷12 cm2/s 300 K
holes
Electron thermal 5.5•10 5 m/s (7.7-5.9x+2.6x2) • 1 0 5 m/s 300 K
velocity
Hole thermal velocity 2 • 1 0 5m/s (1.8÷2)•10 5m/s 300 K
Surface recombination <106 cm/s 300 K
velocity
Radiative recombination 0.96•10 -10 cm3/s 300 K
coefficient
Auger coefficient 7 • 1 0 -29 cm6/s 300 K

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Optical properties

Ga0.47In0.53As GaxIn1-xAs Remarks Referens

Dielectric constant (static) 13.9 15.1-2.87x+0.67x2 300 K
Dielectric constant (high 11.6 12.3-1.4x 300 K
frequency)
Infrared refractive index n 3.43 cm2 V-1s-1 (3.51-0.16x ) V-1s-1 300 K Goldberg Yu.A. &
N.M. Schmidt (1999)
Radiative recombination 0.96 x 10-10 cm2/s see Impact Ionization 300 K
coefficient
Optical phonon energy 34 meV see Raman-active phonon 300 K
modes

Refractive index n versus alloy composition x at different photon

energies
1 1.2 eV
2 0.9 eV
3 0.6 eV.
Takagi (1978)

Refractive index n versus photon energy for x=0.47. 300 K.

Adachi (1992)

Normal incidence reflectivityversus photon energy for x=0.47. 300 K.

Adachi (1992)

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The absorption coefficient versus photon energy at different

temperatures for x=0.47.
Electron concentration no=8•10 14 cm-3.
Curves are shifted vertically for clarity.
Zielinski et al. (1986)

The absorption coefficient versus photon energy for x=0.47, 300 K.

Adachi (1992)

Free carrier absorption coefficient versus wavelength.

a - T=300 K, b - T=92 K.
1 x=0.08, Nd=1.4•10 17 cm-3
2 x=0.1 Nd=5.4•10 17 cm-3.
Aliev et al. (1987)

A ground state Rydberg energy Rx1=2.5 meV (for x=0.47).

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Thermal properties
Basic parameters
Thermal conductivity
Lattice properties

Basic parameters

Ga0.47In0.53As GaxIn1-xAs Remarks Referens

Bulk modulus 6.62•10 11 (5.81+1.72x) • 1 0 11 300 K Goldberg Yu.A. &
N.M. Schmidt (1999)
dyn/cm2 dyn/cm2
Debye temperature 330 K (280+110x) K
Density 5.50 g/cm3 5.68-0.37x g/cm3 300 K Goldberg Yu.A. &
N.M. Schmidt (1999)
Melting point, Tm ~= 1100° C
Specific heat 0.3 J g-1°C -1
Thermal conductivity 0.05 W cm-1 °C -1 see Temerature
dependences
Thermal expansion 5.66x10-6 °C -1 see Temerature
coefficient, linear dependences
Lattice constant 5.8687 A (6.0583-0.405x) A

Thermal conductivity

Thermal conductivity 0.05 W cm-1 °C -1

GaxIn1-xAs. Thermal resistivity vs. composition parameter x

300K
Solid lines shows the experimental data.
Dashed lines are the results theoretical calculation.
Adachi (1983)

GaxIn1-xAs. Specific heat at constant pressure vs. temperature for

different concentrations x.
1 - x=0.0;
2 - x=0.2;
3 - x=0.4;
4 - x=0.6;
5 - x=0.8.
6 - x=1.0.
Sirota et al. (1982)

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GaxIn1-xAs. Debye temperature vs. temperature for different

concentrations x.
1 - x=0.0;
2 - x=0.2;
3 - x=0.4;
4 - x=0.6;
5 - x=0.8.
6 - x=1.0.
Sirota et al. (1982)

Lattice properties

Lattice parameters

Remarks Referens
Lattice constant, a (6.0583-0.405x) A GaxIn1-xAs; 300K Adachi (1982)
5.8687 A Ga0.47In0.53As; 300K, x=0.47

Linear thermal expansion coefficient

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Mechanical properties, elastic constants, lattice vibrations

Basic Parameter
Elastic constants
Micro Hardness
Acoustic Wave Speeds
Phonon frequencies

Basic Parameter

Ga0.47In0.53As GaxIn1-xAs Remarks Referens

Bulk modulus 6.62•10 11 (5.81+1.72x) • 1 0 11 300 K Goldberg Yu.A. &
N.M. Schmidt (1999)
dyn/cm2 dyn/cm2
Debye temperature 330 K (280+110x) K
Density 5.50 g/cm3 5.68-0.37x g/cm3 300 K Goldberg Yu.A. &
N.M. Schmidt (1999)
Melting point, Tm ~= 1100° C
Specific heat 0.3 J g-1°C -1
Thermal conductivity 0.05 W cm-1 °C -1 see Temerature
dependences
Thermal expansion -6 -1 see Temerature
5.66x10 °C
coefficient, linear dependences
Hardness on the Mohs ***
scale
Surface microhardness see Micro Hardness
(using Knoop's pyramid
test)
Piezoelectric constant e14= -(0.045+0.115x)
C/m2
Cleavage plane {110} {110}
Lattice constant 5.8687 A (6.0583-0.405x) A

Elastic constants at 300K

C11 = (8.34 + 3.56x)•1011 dyn/cm2

C12 = (4.54 + 0.8x)•1011 dyn/cm2
C44 = (3.95 + 2.01)•1011 dyn/cm2

Cleavage plane {110}

-1
Bulk modulus (compressibility )
Bs=(C11+2C12)/3 Bs = (5.81+1.72x) • 1 0 11 dyn/cm2
Anisotropy factor

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C'=(C11-C12)/2 A = (0.48+0.07x)
Shear modulus
C'=(C11-C12)/2 C' = (1.9+1.38x) • 1 0 11 dyn/cm2
[100] Young's modulus
Yo=(C11+2C12)• (C11-C12)/(C11+C12) Yo= (5.14+3.39x) • 1 0 11 dyn/cm2
[100] Poisson ratio
• o=C12/(C11+C12) • o = (0.35-0.04x)

Micro Hardness

Micro hardness (Hv) and energy gap values Eg vs composition of

three alloy systems:
In1-xGaxAs (1, 2),
In1-xGaxAs0.9Sb0.1 (3, 4) and
InAs1-x-0.1Sb0.1Py (5, 6).
Measured using (111) oriented epilayers at 50 g weight (stress) on
Vikkers pyramid
B.A.Matveev et al. Izv.Akad.Nauk SSSR, Neorg.Mater, 26 (1990), 639
Contact authors: B.A.Matveev

Knoop microhardness anisotropy on the {100} plane for Ga0.47In0.53As.

Adachi (1992)

Acoustic Wave Speeds

Wave propagation Wave character Expression for wave speed Wave speed
Direction (in units of 105 cm/s)
[100] VL (longitudinal) (C11/• )1/2 3.83+0.90x
VT (transverse) (C44/• )1/2 2.64+0.71x
[100] Vl [(C11+Cl2+2C44)/2• ]1/2 4.28+0.96x
Vt|| Vt||=VT=(C44/• ;)1/2 2.64+0.71x
Vt [(C11-C12)/2• ]1/2 1.83+0.65x
[111] Vl' [(C11+2C12+4C44)/3• ]1/2 4.41+0.99x
Vt' [(C11-C12+C44)/3• ]1/2 2.13+0.67x

Phonon frequencies

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Raman-active phonon modes in GaxIn1-xAs.

The symbols show experimental results.
1 - LO phonon behavior,
2 - TO phonon behavior,
3,4 - mixed mode behavior.
Pearsall et al. (1983)

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Piezoelectric, Thermoelectic and Magnetic Properties

Piezoelectric constant

Remarks Referens
Piezoelectric constant e14= -(0.045+0.115x) C/m2 300 K Goldberg Yu.A. & N.M. Schmidt (1999)

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Reference for Gallium Indium Arsenide (GaInAs) http://www.ioffe.ru/SVA/NSM/Semicond/GaInAs/reference.html

References:
Goldberg Yu.A. and N.M. Schmidt Handbook Series on Semiconductor Parameters, vol.2, M. Levinshtein,
S. Rumyantsev and M. Shur, ed., World Scientific, London, 1999, pp. 62-88.

S. Adachi, J.Appl. Phys., 54, no.4, pp.1844-1848 (1983).

S.Adachi, J. Appl. Phys., 66, no.12, pp.6030-6040(1989).
S.Adachi, Physical Properties of III-Y Semiconductor compounds. John Wiley and Sons.1992.
M.I.Aliev, Kh.A.Khalilov, G.B.Ibragimov, Phys. Stat. Sol.(b), 140, no.1, pp.K83-K86(1987).
P.Ambree, B.Gruska, K.Wandel, Semicond. Sci. and Technol., 7, pp. 858-860(1992).
N.Arnold, R.Schmitt, K.Heime, J.Phys. D, 17, no.3, pp.443-474(1984).
V.Balynas, A.Krotkus, A.Stalnionis, A.T.Gorelionok, N.M.Shmidt, J.A.Tellefsen, Appl. Phys.A, 51, no.4,
pp.357-360(1990).
P.K.Bhattacharya, U.Das, F.Y.Juang, Y.Nashimoto, S.Dhar, Sol. St. Electr., 29, no.2, pp.261-267(1986).
P.Bourel, J.L.Thobel, K.Bellahsni, M.Pernisek, R.Fanquembergue. Journal de Physique. III, 1, no.4,
pp.511- 520(1991).
D.Chattopadhyay, S.K.Sutradhar, B.R.Nag, J. Phys. C, 14, no.6, pp.891-908(1981).
A.Chin, T.Y. Chang, J.Vac.Sci.Technol., B8, no.2, pp.364-366(1990).
I.J. Fritz, T.J. Drummond, G.C.Osbourn, J.E.Schirber, E.D.Jones, Appl. Phys. Lett., 48, no.24,
pp.1678-1680(1986).
G.Gaonach, J.Favre, E.Barbier, D.Adam, M.Champagne, C.Terrier, D.Pons, Inst.Phys. Conf.Ser. N112,
Gallium Arsenide and Related Compounds 1990. Inst. of Phys., Bristol, Philadelphia and New York, pp.
441-446.
K-H. Goetz, D. Bimberg, H. Jurgensen, J. Selders, A.V.Solomonov, G.F.Glinskii, M. Razeghi, J. Appl.
Phys., 54, no.8, pp.4543-4552(1983).
M.A.Haase, V.M. Robbins, N.Tabatabaie, G.E. Stillman, J.Appl. Phys., 57, no.6, pp.2295-2298(1985).
C.H. Henry, R.A. Logan, F.R. Merritt, C.G. Bethea, Electronics Letters, 20, no.9, pp.358-359(1984).
M.S. Hybertsen, Appl. Phys. Lett., 58, no.16, pp.1759-1761(1991).
S.C.Jain, J.M.Mc.Gregor, D.J.Roulston, J. Appl. Phys., 68, no.7, pp.3747-3749(1990).
M.V. Karatchevtseva, A.S. Ignatiev, V.G.Mokerov, G.S.Nemtsov, V.A.Strakhov, N.G.Yaremenko,
Semiconductors, 28, no.7, pp.691-694 (1994).
C.P.Kuo, S.K.Vong, R.M.Cohen, G.B. Stringfellow, J. Appl. Phys., 57, no.12, pp.5428-5432 (1985).
J.D.Lambkin, D.J.Dunstan, Sol. St. Comm., 67, no.8, pp.827-830(1988).
T. Matsuoka, E. Kobayashi, K.Taniguchi, C.Hamaguchi, S.Sasa., Jap. J. Appl. Phys., 29, no.10,
pp.2017-2025(1990).
J.Novak, M.Kuliffayova, M.Morvic, P.Kordos, J.Cryst.Growth, 96, no.3, pp.645-648(1989).
J.D.Oliver, Jr., L.F.Eastman, P.D.Kirchner, W.J.Schaff, J.Cryst.Growth., 54, no.1, pp.64-68 (1981).
F.Osaka, T.Mikawa, T.Kaneda, IEEE J. Quant. El., QE-21, no.9, pp.1326-1338(1985).
J.Pamulapati, R.Lai, G.I.Ng, Y.C.Chen, P.R.Berger, P.K.Bhattacharya, J.Singh, D.Pavlidis, J. Appl. Phys.,
68, no.1, pp.347-350(1990).
S.Paul, J.B.Roy, P.K.Basu, J. Appl. Phys., 69, no.2, pp.827-829 (1991).
T.P.Pearsall, J.P.Hirtz, J.Cryst. Growth, 54, no.1, pp.127-131(1981).
T.P.Pearsall, GaInAsP Alloy Semiconductors. John Wiley and Sons. 1982.
T.P. Pearsall, R.Carles, J.C.Portal, Appl. Phys. Lett., 42, no.5, pp.436-438(1983).
W. Porod, D.K. Ferry, Phys. Rev., B27, no.4, pp.2587-2589(1983).
N.N.Sirota, V.V.Novikov, A.M.Antiukhov, Doklady Akademii Nauk SSSR, 263, no.1, pp.96-100(1982).
H-M.Shieh, C-L.Wu, W-Ch.Hsu, Y-H.Wu, M-J.Kao, Jap. J. Appl. Phys., 33, no.4a, pp.1778-1780(1994).
M.Shur, Physics of Semiconductor Devices, Prentice Hall, 1990.
T.Takagi, Jap. J. Appl. Phys., 17, no.10, pp.1813-1817(1978).
J.L.Thobel, L.Baudry, A.Cappy, P.Bourel, R.Fauquembergue, Appl. Phys. Lett., 56, no.4, pp.346-348(1990).
E.Wolak, J.C.Harmand, T.Matsuno, K.Inoue, T.Narusawa, Appl. Phys. Lett., 59, no.1, pp.111-113(1991).
E.Zielinski, H.Schweizer, K.Streubel, H.Eisele, G.Weimann, J. Appl. Phys., 59, no.6, pp.2196-2204(1986).

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Physical properties of Indium Phosphide (InP) http://www.ioffe.ru/SVA/NSM/Semicond/InP/index.html

Basic Parameters at 300 K

Band structure and carrier concentration
Basic Parameters of Band Structure and carrier concentration
Temperature Dependences
Energy Gap Narrowing at High Doping Levels
Effective Masses and Density of States
Donors and Acceptors
Electrical Properties
Basic Parameters of Electrical Properties
Mobility and Hall Effect
Transport Properties in High Electric Fields
Impact Ionization
Recombination Parameters
Optical properties
Thermal properties
Mechanical properties, elastic constants, lattice vibrations
Basic Parameters
Elastic Constants
Acoustic Wave Speeds
Phonon Frequencies
References

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Basic Parameters of Indium Phosphide (InP) http://www.ioffe.ru/SVA/NSM/Semicond/InP/basic.html

Basic Parameters at 300 K

Crystal structure Zinc Blende

Group of symmetry Td2-F43m
Number of atoms in 1 cm3 3.96•10 22
Debye temperature 425 K
Density 4.81 g/cm3
Dielectric constant (static) 12.5
Dielectric constant (high frequency) 9.61
Effective electron mass 0.08mo
Effective hole masses mh 0.6mo
Effective hole masses mlp 0.089mo
Electron affinity 4.38 eV
Lattice constant 5.8687 A
Optical phonon energy 0.043 eV

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Band structure and carrier concentration

Basic Parameters
Temperature Dependences
Dependences on Hydrostatic Pressure
Energy Gap Narrowing at High Doping Levels
Effective Masses
Donors and Acceptors

Basic Parameters

Energy gap 1.344 eV

Energy separation (E• L ) between • and L valleys 0.59 eV
Energy separation (E• X ) between • and X valleys 0.85 eV
Energy spin-orbital splitting 0.11 eV
Intrinsic carrier concentration 1.3•10 7 cm-3
Intrinsic resistivity 8.6•10 7• • c m
Effective conduction band density of states 5.7•10 17 cm-3
Effective valence band density of states 1.1•10 19 cm-3

Band structure and carrier concentration of InP.

Important minima of the conduction band and maxima of the valence
band. 300 K.
Eg = 1.34eV;
EL = 1.93 eV;
EX = 2.19 eV;
Eso = 0.11 eV

Temperature Dependences

Temperature Dependences Temperature dependence of the energy gap

Eg = 1.421 - 4.9•10-4• T 2/(T+327) (eV),

where T is temperature in degrees K (0 < T < 800).

Temperature dependence of the energy separation between • and X valleys

E• X = 0.96 - 3.7•10-4•T (eV),

where T is temperature in degrees K (0 < T < 300).

Effective density of states in the conduction band

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Nc• 1 . 1 • 1 0 14• T 3/2 (cm-3).

Effective density of states in the valence band

Nv• 2 . 2 • 1 0 15• T 3/2 (cm-3).

The temperature dependence of the intrinsic carrier concentration.

Fermi level versus temperature for different concentrations of

shallow donors and acceptors.

Dependences on Hydrostatic Pressure

Eg = Eg(0) + 8.4•10 -3P - 1.8•10 -5P2 (eV)

EL = EL(0) + 4.6•10 -3P (eV),
EX = EX(0) + 2•10 -3P (eV),
where P is pressure in kbar.

Energy Gap Narrowing at High Doping Levels

Energy gap narrowing versus donor (curve 1 and experimental

points) and acceptor (curve 2) doping density, T = 300 K.
Curve 1 and experimental points (Bugajski and Lewandowski [1985]);
Curve 2 (Jain et al. [1990]).

For n-type InP:

• E g• 2 2 . 5 • 1 0 -9• N d1/3 (eV)

(Bugajski and Lewandowski [1985])

For p-type InP

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• E g• 1 0 . 3 • 1 0 -9• N a1/3 + 4.43•10 -7• N a1/4 + 3.38•10 -12• N a1/2 (eV)

(Jain et al. [1990]).

Effective Masses

Electrons:
For •-valley m• = 0.08mo
The are 4 equivalent L-valleys in the conduction band:
in one L-valley mL = 0.25mo
for all L-valley mLd = 0.63mo
The are 3 equivalent X-valleys in the conduction band:
in one X-valley mX = 0.32mo
for all X-valley mXd = 0.66mo
Holes:
Heavy mh = 0.6mo
Light mlp = 0.089mo
Split-off band mso = 0.17mo
Effective mass of density of states mv = 0.6mo

Donors and Acceptors

Ionization energies of shallow donors (eV) ~0.0057:

S, Si, Sn, Ge

Ionization energies of shallow acceptors (eV):

C Hg Zn Cd Si Cu Be Mg Ge Mn
0.04 0.098 0.035 0.057 0.03 0.06 0.03(MBE) 0.03(MBE) 0.021 0.27

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Electrical properties
Basic Parameters
Mobility and Hall Effect
Transport Properties in High Electric Fields
Impact Ionization
Recombination Parameters

Basic Parameters

Breakdown field • 5 • 1 0 5 V cm-1

Mobility electrons •5400 cm 2V-1s-1
Mobility holes •200 cm 2 V-1s-1
Diffusion coefficient electrons •130 cm 2 s-1
Diffusion coefficient holes •5 cm 2 s-1
Electron thermal velocity 3.9•10 5 m s-1
Hole thermal velocity 1.7•10 5 m s-1

Electron Hall mobility versus temperature for different doping

levels.
Bottom curve - no=Nd-Na=8•10 17 cm-3;
Middle curve - no=2•10 15 cm-3;
Top curve - no=3•10 13 cm-3.
(Razeghi et al. [1988]) and (Walukiewicz et al [1980]).

Electron Hall mobility versus temperature (high temperatures):

Bottom curve - no=Nd-Na~3•10 17 cm-3;
Middle curve - no~1.5•10 16 cm-3;
Top curve - no~3•10 15 cm-3.
(Galavanov and Siukaev[1970]).

For weakly doped n-InP at temperatures close to 300 K electron drift mobility:

µ n = (4.2÷5.4)•103•(300/T) (cm 2V-1 s-1)

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Hall mobility versus electron concentration for different

compensation ratios.
• = N a/Nd, 77 K.
Dashed curves are theoretical calculations: 1. • = 0; 2. • = 0.2; 3. • =
0.4; 4. • = 0.6; 5. • = 0.8;
(Walukiewicz et al. [1980]).
Solid line is mean observed values (Anderson et al. [1985]).

Hall mobility versus electron concentration for different

compensation ratios
• = N a/Nd, 300 K.
Dashed curves are theoretical calculations: 1. • = 0; 2. • = 0.2; 3. • =
0.4; 4. • = 0.6; 5. • = 0.8;
(Walukiewicz et al. [1980]).
Solid line is mean observed values (Anderson et al. [1985]).

Approximate formula for electron Hall mobility

µ=µ OH/[1+(Nd/107)1/2],
where µOH=5000 cm2V-1 s-1,
Nd- in cm-3 (Hilsum [1974])

At 300 K, the electron Hall factor rn• 1 in n-InP.

for Nd > 1015 cm-3.

Hole Hall mobility versus temperature for different doping (Zn)

levels.
Hole concentration at 300 K: 1. 1.75•10 18 cm-3; 2. 3.6•10 17 cm-3; 3.
4.4•10 16 cm-3.
• = N a/Nd~0.1.
(Kohanyuk et al. [1988]).

For weakly doped p-InP at temperature close to 300 K the Hall mobility

µ pH~150•(300/T) 2.2 (cm2V-1 s-1).

Hole Hall mobility versus hole density, 300 K (Wiley [1975]).

The approximate formula for hole Hall mobility:
µ p=µ po/[1 + (Na/2•10 17)1/2], where µpo~150 cm2V-1 s-1, Na- in cm-3

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At 300 K, the hole factor in pure p-InP: rp~1

Transport Properties in High Electric Fields

Field dependences of the electron drift velocity in InP, 300 K.

Solid curve are theoretical calculation.
Dashed and dotted curve are measured data.
(Maloney and Frey [1977]) and (Gonzalez Sanchez et al. [1992]).

The field dependences of the electron drift velocity for high electric
fields.
T(K): 1. 95; 2. 300; 3. 400.
(Windhorn et al. [1983]).

Field dependences of the electron drift velocity at different

temperatures.
Curve 1 -77 K (Gonzalez Sanchez et al. [1992]).
Curve 2 - 300 K, Curve 3 - 500 K (Fawcett and Hill [1975]).

Electron temperature versus electric field for 77 K and 300 K.

(Maloney and Frey [1977])

Fraction of electrons in L and X valleys nL/no and nX/no as a

function of electric field, 300 K.
(Borodovskii and Osadchii [1987]).

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Frequency dependence of the efficiency • at first (solid line) and at

the second (dashed line) harmonic in LSA mode.
Monte Carlo simulation.
F = Fo + F1•sin(2••ft) + F 2•[sin(4••ft)+3•/2],
Fo=F1=35 kV cm-1,
F2=10.5 kV cm-1
(Borodovskii and Osadchii [1987]).

Longitudinal (D || F) and transverse (D ˆ F) electron diffusion

coefficients at 300 K.
Ensemble Monte Carlo simulation.
(Aishima and Fukushima [1983]).

Longitudinal (D || F) and transverse (D ˆ F) electron diffusion

coefficients at 77K.
Ensemble Monte Carlo simulation.
(Aishima and Fukushima [1983]).

Impact Ionization

The dependence of ionization rates for electrons •i and holes •i

versus 1/F, 300 K.
(Cook et al. [1982]).

Breakdown voltage and breakdown field versus doping density for

an abrupt p-n junction, 300 K
(Kyuregyan and Yurkov [1989]).

Recombination Parameters

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Pure n-type material (no ~ 10-14cm-3)

The longest lifetime of holes • p ~ 3•10 -6 s

Diffusion length Lp = (Dp• • p)1/2 Lp ~ 40 µm.

Pure p-type material(po ~ 1015cm-3)

(a)Low injection level
The longest lifetime of electrons • n ~ 2•10 -9 s

Diffusion length Ln = (Dn• • n)1/2 Ln ~ 8 µm

(b) High injection level (filled traps)

The longest lifetime of electrons • ~ 10 -8 s

Diffusion length Ln Ln ~ 25 µm

Surface recombination velocity versus the heat of reaction per atom

of each metal phosphide •HR
(Rosenwaks et al. [1990]).

If the surface Fermi level EFS is pinned close to midgap (EFS~Eg/2) the surface recombination velocity increases
from ~5•10 -3cm/s for doping level no~3•10 15 cm-3 to ~106 cm/s for doping level no ~ 3•10 18cm-3 (Bothra et
al. [1991]).

Radiative recombination coefficient (300 K) 1.2•10 -10 cm3/s

Auger coefficient (300 K) ~9•10 -31 cm6/s

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Optical properties

Infrared refractive index 3.1

Radiative recombination coefficient 1.2•10 -10 cm3/s

Infrared refractive index

n = k1/2 = 3.075•(1+2.7•10 -5T)

Long-wave TO phonon energy at 300 K h•TO = 38.1 meV

Long-wave LO phonon energy at 300 K h•LO = 42.6 meV

Refractive index n versus photon energy.

Solid curve is theoretical calculation.
Points represent experimental data, 300 K
(Adachi [1989]).

Normal incidence reflectivity versus photon energy, 300 K

(Aspnes and Studna [1983]).

Intrinsic absorption coefficient near the intrinsic absorption edge for

different temperatures.
n-InP. no=5•10 15 cm-3
(Turner et al. [1964]).

A ground state Rydberg energy RX1 = 5.0 meV.

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Intrinsic absorption edge at 296 K at different doping levels

1. p-type sample, po = 1.1•10 18 cm-3
3. n-type sample, no = 1.9•10 18 cm-3
2. n-type sample, no = 7.4•10 16 cm-3
4. n-type sample, no = 7•10 18 cm-3
(Burkhard et al. 1982]).

Intrinsic absorption edge at 77 K for n-InP at different doping levels

1. no = 1019 cm-3;
2. no = 5•10 18 cm-3;
3. no = 2•10 18 cm-3;
4. no = 9.6•10 16 cm-3
(Bugajski and Lewandowski [1985]).

The absorption coefficient versus photon energy, 300 K

(Aspnes and Studna [1983]).

Free carrier absorption versus photon energy ai different doping

levels, 300 K.
Electron concentration no (cm-3): 1. 4•10 16; 2. 2•10 17; 3. 4•10 17
(Newman [1958]).

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Thermal properties

Bulk modulus 7.1•10 11 dyn cm-2

Melting point 1060 °C
Specific heat 0.31 J g-1 °C-1
Thermal conductivity 0.68 W cm-1 °C-1
Thermal diffusivity 0.372 cm2 s-1
Thermal expansion, linear 4.60•10 -6 °C-1
Melting point Tm = 1333 K
For 0 < P < 40 kbar
Tm = 1333 - 2.0•P (P in kbar)
(Glasov et al. [1977]).

Temperature dependence of thermal conductivity.

n-type samples, no=2•10 16 cm-3
(Aliev et al [1965]).

Temperature dependence of specific heat at constant pressure

(Piesbergen [1963]).

For 298< T < 910 K

Cp = 0.28 + 10-4•T (J g -1 K-1)
(Barin et al. [1977]).

Temperature dependence of linear expansion coefficient •.

1. (Soma et al. [1982]),
2. (Glazov et al. [1977]).

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Temperature dependence of saturation vapor pressure.

(Panish and Arthur[1970]).

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Mechanical properties, elastic constants, lattice vibrations

Basic Parameter
Elastic constants
Acoustic Wave Speeds
Phonon frequencies

Basic Parameter

Bulk modulus 7.1•10 11 dyn cm-2

Density 4.81 g cm-3
Surface microhardness (using Knoop's pyramid test) ~460 kg mm-2
Cleavage plane {100}
Piezoelectric constant e14= -3.5•10 -2 C m-2

Elastic constants at 300 K

C11 = 10.11•10 11 dyn/cm2

C12 = 5.61•10 11 dyn/cm2
C44 = 4.56•10 11 dyn/cm2
(Nichols et al. [1980]).

Bulk modulus (compressibility-1) Bs= 7.11•10 11 dyn/cm2

Shear modulus C'= 2.25•10 11 dyn/cm2
[100] Young's modulus Yo= 6.11•10 11 dyn/cm2
[100] Poisson ratio • o = 0.36

Acoustic Wave Speeds

Wave propagation Direction Wave character Expression for wave speed Wave speed (in units of 105 cm/s)
[100] VL (C11/ • ) 1/2 4.58
VT (C44/ • ) 1/2 3.08
[100] Vl [(C11+Cl2+2C44)/2•] 1/2 5.08
Vt|| Vt||=VT=(C44/ • ) 1/2 3.08
V tˆ [(C11-C12)/2•] 1/2 2.16
[111] V l' [(C11+2C12+4C44)/3•] 1/2 5.23
V t' [(C11-C12+C44)/3•] 1/2 2.51

Phonon frequencies (in units of 1012 Hz)

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• TO( • ) 9.2 • LO(X) 9.95

• LO( • ) 10.3 • TA(L) 1.65
• TA(X) 2.05 • LA(L) 5.0
• LA(X ) 5.8 • TO(L) 9.5
• TO(X) 9.7 • LO(L) 10.2
(Suto and Nashizawa [1990]).

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