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Surface Engineering of Nanomaterials: Lecture 11: Deposition and Surface Modification Methods

This document discusses surface engineering of nanomaterials through various deposition and modification methods. It begins by classifying deposition technologies into physical (evaporative) or chemical (gas or liquid-phase) processes. Several deposition methods are described within each classification, including sputtering, chemical vapor deposition, and electroplating. Unique features of deposited materials are outlined, such as versatility of materials, ability to vary defect concentration, and fabrication of thin shapes. Key issues and current applications of these deposition techniques are also summarized.

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91 views

Surface Engineering of Nanomaterials: Lecture 11: Deposition and Surface Modification Methods

This document discusses surface engineering of nanomaterials through various deposition and modification methods. It begins by classifying deposition technologies into physical (evaporative) or chemical (gas or liquid-phase) processes. Several deposition methods are described within each classification, including sputtering, chemical vapor deposition, and electroplating. Unique features of deposited materials are outlined, such as versatility of materials, ability to vary defect concentration, and fabrication of thin shapes. Key issues and current applications of these deposition techniques are also summarized.

Uploaded by

hrana287
Copyright
© © All Rights Reserved
Available Formats
Download as PDF, TXT or read online on Scribd
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SURFACE ENGINEERING OF NANOMATERIALS

Lecture 11: Deposition and Surface Modification Methods

Dr. Kaushik Pal


Associate Professor
Dept. of Mech. & Indl. Engg.
Joint faculty: Centre of Nanotechnology
Objectives & Importance:
 Includes:
• Primarily advanced and emerging deposition technologies.
• Formation of films/coatings within 10 μm thickness.

 The electrical, optical, mechanical, and tribological properties as well as the


structure and microstructure of thin film materials can vary over wide ranges, and
are highly dependent on the deposition process used.

 Requirement:
• One must be familiar with thin film deposition technology and materials.

 Distinct advantage:
• Because they are non-equilibrium in nature, is that they are able to synthesize compositions
not possible with bulk processes.

ADVANCED COMPOSITE LAB 2


Classification of Deposition Technologies:

 Basically, thin-film deposition is categorized into


• purely physical, i.e., evaporative methods, or
• purely chemical, i.e., gas- and liquid-phase chemical processes.

 A classification scheme is presented here, where we have grouped thin-film


deposition technologies according to
• Evaporative process
• Glow-discharge process
• Gas-phase chemical process
• Liquid-phase chemical process

ADVANCED COMPOSITE LAB 3


Evaporative Methods

Conventional Electron-beam Molecular-beam


Reactive Evaporation
Vacuum Evaporation Evaporation Epitaxy (MBE)

ADVANCED COMPOSITE LAB 4


Glow-discharge Processes:
Plasma process
Sputtering

 Plasma enhanced CVD


 Diode sputtering  Plasma oxidation
 Reactive sputtering  Plasma anodization
 Bias sputtering (Ion plating)  Plasma polymerization
 Magnetron sputtering  Plasma nitridation
 Ion beam deposition  Plasma reduction
 Ion beam sputter deposition  Microwave ECR plasma CVD
 Reactive ion plating  Cathodic arc deposition

ADVANCED COMPOSITE LAB 5


Gas-phase Chemical Processes:
• Atmospheric –pressure CVD
(APCVD)
• Low-pressure CVD (LPCVD)
Chemical Vapor • Metal-organic CVD (MOCVD)
Deposition • Photo-enhanced CVD (PHCVD)
(CVD) • Laser-induced CVD (LCVD) Thermal Forming Processes
• Electron-enhanced CVD
• CVD epitaxy
Thermal oxidation

Thermal nitridation

Thermal polymerization

Ion implantation
(discussed in lecture-09)

ADVANCED COMPOSITE LAB 6


Liquid-phase Chemical Techniques:
Electro Process
Chemical Chemical
Electroless Electrolytic Electrophoretic
Electroplating Reduction Displacement
plating anodization deposition
plating plating

Spray pyrolysis

Spray-on techniques
Mechanical Techniques
Spin-on techniques

Liquid phase epitaxy

ADVANCED COMPOSITE LAB 7


Advanced Deposition Technologies:

High-power
Vacuum pulsed Glancing
Atomic layer Filtered
polymer magnetron angle
deposition cathodic arc
deposition sputtering deposition
(ALD) deposition
(VPD) (HPPMS or (GLAD)
HIPIMS)

 VPD and ALD have recently emerged as processes that can achieve molecular doping,
polymer thin films and nanocomposites.
 Processes such as GLAD can achieve unique microstructures not possible with
conventional substrate–source configurations and deposition processes.
 Films deposited by HPPMS have high density and excellent adhesion to the substrate,
which makes them desirable for tribological, corrosion-resistant coatings, barrier
coatings, and electronic applications.

ADVANCED COMPOSITE LAB 8


Unique Features of Deposited Materials:
Several features of materials can only be produced by vacuum deposition technologies,
including:

 Extreme versatility of range and variety of deposited materials.


 Applied coatings with properties independent of thermodynamic compositional
constraints.
 Ability to vary defect concentration over wide ranges, thus resulting in a range of
properties comparable to or far removed from conventional bulk materials.
 High quench rate available to deposit amorphous materials.
 Controllable production of microstructures different from conventionally processed
materials, e.g., A wide range of microstructures: ultrafine (superlattice, nanostructures) to
single crystal films.
 Fabrication of thin free-standing shapes and foils, even from brittle materials.
 Ecological benefits with certain techniques.

ADVANCED COMPOSITE LAB 9


Key Issues to Understand:
 Relationships between plasma density, pulse length, coating density, and microstructure
for high-power pulsed plasma deposition.
 Role of plasmas in large area deposition.
 Microstructure and properties in the thickness range 10-10,000 nm, particularly for low-
dimensional structures, nanocomposites, tribological coatings, corrosion-resistant
materials, reflective surfaces, and thermoelectrics.
 Ion energy and ion flux on properties of deposited material.
 Effect of energy of the depositing species on interfacial interaction, nucleation, and
growth of the deposit.
 Effect of substrate surface condition and morphology on adhesion and mechanical
properties of the deposit.
 Influence of process parameters on residual stress.
 Sculpted thin films and highly porous films.

ADVANCED COMPOSITE LAB 10


Current Applications:
Although there is significant overlap, current coating applications may be classified into
the following generic areas:
 Optically functional:
Laser optics, Architectural glazing, Residential mirrors, Automotive rear-view mirrors and
headlamps, Reflective and antireflection coatings, Optically absorbing materials, Low-e
coatings, Solar selective coatings, Free-standing reflectors, Transparent conductive films.

Solar
selective
coatings

Laser
optics

ADVANCED COMPOSITE LAB 11


 Energy related:
Thin film battery, Thin film fuel cell, Thin film solar cell, Thermoelectric thin films,
Superlattice, Electrochromic coatings, Solar absorbers, Barrier coatings (oxygen and water
permeation barriers), Transparent solar cells, Organic solar cells, Photocatalytic coatings.

Thin film battery Thermoelectric thin films

ADVANCED COMPOSITE LAB 12


 Electrically functional:
Electrical conductors, Electrical contacts, Semiconductor films, Active solid state
devices, Electrical insulators, Photovoltaics, Transparent electrical contacts.

Photovoltaics Transparent electrical contacts


ADVANCED COMPOSITE LAB 13
 Mechanically functional:
Tribological coatings, Lubrication films, Nanocomposites, Diffusion barriers, Hard coatings
for dies and Cutting tools, Wear and Corrosion-resistant coatings, Biomedical coatings.

Lubrication films Corrosion-resistant coatings

ADVANCED COMPOSITE LAB 14


 Chemically functional:
Corrosion-resistant coatings, Catalytic coatings, Biomedical coatings, Photocatalytic
coatings, Thin film electrolytes, Organic materials.

Biomedical coatings Catalytic coatings

ADVANCED COMPOSITE LAB 15


Selection Criteria for Selection of Particular Deposition Process:
 Material to be deposited
 Limitations imposed by the substrate, e.g., Material, size, temperature stability
 Specific applications
 Deposition rate
 Adhesion of film to substrate
 Throwing power
 Purity of source material
 Availability of required apparatus
 Cost
 Safety considerations, e.g., Toxicity
 Process stability
 Manufacturing considerations, e.g., Batch size, throughput, process controls
 Abundance of source materials

ADVANCED COMPOSITE LAB 16


Thin-Film Photovoltaics Markets by Application ($ Millions):
Since mid-1990s, the market for several types of thin film products has exploded,
including photovoltaics, energy conversion, energy efficiency, biomedical,
pharmaceutical, and flat panel displays.

ADVANCED COMPOSITE LAB 17


Summary:
 There exist a wide variety of deposition techniques.

 No unique method for classification of thin film deposition techniques.


Depending on the viewpoint, the same process may fall into one or more
classes.

 Each technique has its own advantages and disadvantages.

 Selection criteria for particular technique is mainly dependent on specific


required applications and availability of resources.

 Hybrid techniques are becoming more widely used and available, i.e. Using
more than one technique, simultaneously or consecutively, to deposit a given
thin film material for microelectronics, bio-medical implants, etc.

ADVANCED COMPOSITE LAB 18


ADVANCED COMPOSITE LAB 19

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