Theoretical and Experimental Determination of Cell Constants of Planar-Interdigitated Electrolyte Conductivity Sensors
Theoretical and Experimental Determination of Cell Constants of Planar-Interdigitated Electrolyte Conductivity Sensors
Abstract
In this paper, an analytical expression is presented for the cell constant of planar-interdigitated electrodes used as electrolyte
conductivity sensors. The result of this expression is compared with results of measurement carried out with several differently
shaped planar probes provided with a thin Ta,O, insulating film, showing good agreement. More than 10 different devices
have been fabricated with predicted cell constants ranging from 0.14 to 4.44 cm-‘. The measured cell constants are typically
N-20% smaller, possibly due to fringing effects.
trolytes, the electric-field lines between the electrodes By combining Eqs. (1) and (3) with R=R,,, the
are assumed to travel mainly through the electrolyte. parameter of interest, the cell constant K, can be
expressed in terms of the capacitance:
C=~+4/d andR=d/aA(=pd/A)
thus
RC = e&a
(a) 1
with d and A the separation and the area of the plates, Fig. 2. (a) Representation of the two-finger structure in the (x, y)
respectively. plane and (b) after conformal mapping in the (u, v) plane.
254 W. Olthuk et al. I Senrors and Achuturs B 24-25 (1995) 252-256
After some tediousintegral calculations, thiscapacitance electrode structure as shown in Fig. l(a). Then, 50 nm
can be expressed as Ta was applied on the Pt and SiO, structure by electron-
gun evaporation with a deposition rate of 5 8, SK’.
c = EOE,K[(l-kyl This Ta film was oxidized at 500 “C for 3 h in O2
I
2 (6)
K(k) ambient, resulting in a Ta,O, layer = 120 nm thick. A
when K(k) is the complete elliptic integral of the first cross-sectional view is shown in Fig. l(b). Openings to
kind: the Pt electrode were accomplished by reactive ion
etching of the Ta,O, layer after proper masking. The
finger spacing and finger width of the prepared series
of differently shaped interdigitated electrodes were not
of a critically small size (from 10-100 Fm), so that the
Eqn. (6) becomes useful when the variable of function actual realized dimensions were within 5% of the original
Ii, the so-called modulus k, is related to real-world designs of the masks for photolithography.
shapes and dimensions. For the configuration described After dicing, the 3 mmx4 mm chips were glued on
here, for two fingers, k can be approximated by [3] a 8 mmX100 mm printed circuit board (PCB) carrier
and the Pt electrodes were connected to the copper
k= k strips on the PCB with bonding wires. The copper
(8)
strips, the bonding wires and the edges of the chip
where s and w represent the relevant dimensions of were covered with epoxy for insulation and protection.
the sensor, as depicted in Fig. 1.
For more than two fingers, the periodicity of the 3.2. Measurement set-up
structure requires another definition of the modulus k
[41: Although we focus in this paper on the resistive
contribution from the electrolyte, R,, the other elements
of the sensor that also somehow determine the signal
transfer have to be taken into account when performing
The total capacitance is the sum of the total number actual measurements. These components are indicated
of gaps between the fingers, which for a total of N in Fig. 3(a). Typical values of these components are
electrode fingers is simply N- 1, and is for a finger- given in the Figure caption. Depending on the measuring
length L given by frequency used and the range of Rb, these components
c= (N- l)LC, can either be neglected or taken into account due to
(10)
their constant nature.
For N=2, Eqs. (6), (7) and (8) should be used, and
for N>2, Eqs. (6) (7) and (9) should be used.
3. Experimental
I
A 75 nm thick Pt film was sputtered with a d.c. (b)
sputter gun on top of a Si wafer with 1.3 pm SiO,.
Fig. 3. (a) Cross-sectional view of the sensor showing parasitic
In between the SiO, and the Pt film, a film of 20 nm components; TalOs capacitance C, = 1 nF, Si02 capacitance C,= 10
Ti was applied for adhesion. The Pt was patterned pF (typical values). (b) The measurement set-up, indicating the
using ion-beam etching, resulting in the interdigitated bootstrapping.
W. 0Nhui.v et al. I Sensors and Actiators B 24-25 (lW5) 252-256 255
For the measurements performed in this paper, we (11) and the experimentally determined cell constant
used a constant-current source and a voltage follower are summarized in Table 1.
as shown in Fig. 3(b). We took into account the output As can be concluded from Table 1, the experimentally
and input capacitance of the current source and voltage found values for the cell constant correspond reasonably
follower, respectively. The follower was not only used well with the theoretically determined values from Eqs.
to give a low-impedance output signal, but also to (10) and (11). However, the experimentally foundvalues
provide for active shielding (or bootstrapping) of the are systematically smaller than the theoretically cal-
signal path to the non-inverting input of the follower, culated cell constants. Our explanation for this sys-
thereby decreasing the effect of parasitic capacitances. tematic discrepancy is the presence of fringing effects
at the Ta,O,-solution interface, causing the electric-
3.3. Protocol field lines to diverge instead of starting perfectly per-
pendicular to this interface. This causes the apparent
In order to determine the values of the capacitances electrode width, w, derived from the observed data, to
shown in Fig. 3(a, b), the output potential was measured be slightly larger than stated in Table 1, which would
at a constant electrolyte concentration for frequencies result in a smaller calculated cell constant, according
ranging from 20 to 500 kHz. Subsequently, the mea- to Fig. 4.
surements were repeated for a different electrolyte The measured output potential, V,.,, as a function
concentration. Using the now known values for the of the specific resistivity p, using the set-up as shown
capacitances, the value of Rb can be calculated and in Fig. 3(b), is given in Fig. 5 for two very different
from the tabled values of p at the known concentration, sensor shapes (sensor nos. 2 and 10 of Table 1). The
the cell constant could be calculated with Eq. (1). All range of specific resistivity corresponds to [KC11from
measurements were carried out in KC1 at room tem- 0.5 to 100 mM. These two typical experimental curves
perature. show a linear behaviour, as expected from the constant-
current mode of operation [l]. Note that the slopes
0 40 80 120 160
0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 Specific resistlvity [Ohm*m]
WWS) Fig. 5. Output voltage Vo.,
of the constant-current mode of operation
Fig. 4. Normalized cell constant as a function of the normalized 0=7 P&m,, at 200 kHz) as a function of the specific resistivity for
electrode geometry; results of simulations. two sensors, nos. 2 and 10 of Table 1.
256 K 0Ithui.v et al. I Semors and Achwfors B 24-25 (1995) 252-256