Machine Learning in Computational Lithography: Yu Cao
Machine Learning in Computational Lithography: Yu Cao
Yu Cao
ASML-Brion
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This is really a no-brainer …
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Slide 2
ASML introduces AI to its product portfolio: This is really a no-brainer. That said, the
problem that most equipment companies have is finding good applications for it, as they find all
they have is little data to feed the NN (more on that below). Anyway, this will be a good test for
DLNNs as to whether engineers will accept results without knowing what’s in the ‘blackbox,’
which is a classic barrier to this technology. I believe they will because comparing results to
input consistency are pretty easy to test out in this case. Especially since ASML led the way into
computational lithography, albeit with plenty of customer pull.
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We have been doing machine learning for a long time …
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1: E. Abbe, H. H. Hopkins Aerial image Resist model design Resist kernels Resist contour
Machine Learning
95% cat
5% dog
Input Feature extraction Classification Output
95% cat
5% dog
Input Deep Learning
Feature extraction + Classification Output
Based on: Jagreet Kaur Gill, “Log Analytics With Deep Learning And Machine Learning” April 28, 2017 Public
Massive metrology data & deep learning models further
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Model Accuracy
0.3
Deep Learning Model
Traditional Model
0.2
~16,000 verification gauges
Regular hole patterns
0.1
0
0 600 800 1000 2000 8000 16000
Source: Jeff Dean, Google, “Trends and developments in deep learning”, Jan’17 Calibration gauge number
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High speed e-beam metrology and large field of view
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Slide 7
Excellent precision across large field of view
#1 #2 #3
Metrology Throughput
Current 8 pA 250 pA
(1um x 1um) Scan Rate 16 MHz 100 MHz
Field of view 1 um 12 um
12
#7 #8 #9 1
Error
with deep learning 0
1.0
0.7
0.6
ASML Deep 0.4
0.5 0.7
1.2 1.3
Data-driven training based on fitting 1.1 1.1
1.0
0.8
spec and wafer measurements 0.7
0.4
Accuracy
EP SET1 EP SET2 1D 2D
2.0
1.0
0.0
28nm 22nm 14nm 10nm 7nm 5nm Public
Deep learning inverse model speeds up full-chip OPC
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Improving training pattern coverage
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Full-chip Layout Pattern Library Machine-learning-based pattern selection Training Pattern Set
Pattern Representative
… Feature Clustering Selection
Pattern Generation
Collector
…
…
Normalized RMS between prediction
and ground-truth (inverse solution) Critical PV-band (>15% CD error ) Comparison
Full-chip application of machine learning SRAFs on DRAM case using auto pattern selection K. Chen et al., SPIE 2019, 10961-37 Public
Deep learning SRAF improves full-chip DoF by 24%
for DRAM contact hole layer, validated on wafer Slide 13
Newron SRAF places more accurate assist Newron SRAF wafer validation
features to remove the process window limiter shows 24% DoF improvement
Off-nominal
OPC Mask
(-40nm defocus)
9
Full-chip application of machine learning SRAFs on DRAM case using auto pattern selection K. Chen et al., SPIE 2019, 10961-37 Public
Leverage confluence of new technologies to meet OPC
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14 10 nm
Skylake Cascade Lake Cooper Lake Ice Lake
Spring Crest
Etch
Dep
CMP
Dep
CMP
Lithography Step N
Context Data Corrections
Overlay Variations
Wafer to Wafer Variation
ASML Machine
Learning Model
• Leveling &
Alignment all wafers
• Overlay or alignment
sampling from same
wafer (blue points)
Machine Learning
Prediction
Algorithms Data
Physical Models, Scatterometry, SEM,
Optimization, & other fab
Machine Learning equipment
Immersive experience
Applications
Moore’s Law
Performance Connectivity
Data Value
Algorithms Cost Data Real-time
Deep Learning
Volume
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