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Lecture11 MOS Cap Delay 6up

The document discusses MOS capacitances and delay. It explains that there are several MOS capacitances including the gate-source capacitance, gate-drain capacitance, and gate-bulk capacitance. The gate capacitance is approximately equal to the width times length times the oxide capacitance when the transistor is in the linear region. When the transistor is cut off or saturated, the different capacitances change value based on the operating conditions and voltages applied.

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Naveen Kuram
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0% found this document useful (0 votes)
89 views

Lecture11 MOS Cap Delay 6up

The document discusses MOS capacitances and delay. It explains that there are several MOS capacitances including the gate-source capacitance, gate-drain capacitance, and gate-bulk capacitance. The gate capacitance is approximately equal to the width times length times the oxide capacitance when the transistor is in the linear region. When the transistor is cut off or saturated, the different capacitances change value based on the operating conditions and voltages applied.

Uploaded by

Naveen Kuram
Copyright
© © All Rights Reserved
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as PDF, TXT or read online on Scribd
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EE141-Fall 2010

Digital Integrated
Circuits

MOS Capacitance
Lecture 11
MOS Capacitance
and Delay

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Announcements MOS Capacitances


G
‰ No lab Fri., Mon.
ƒ Labs restart next week CGS CGD
= CGCS + CGSO = CGCD + CGDO
‰ Midterm #1 Thurs. Oct. 7th, 6:30-8:00pm S D
ƒ Exam is open notes, book, calculators, etc.
CSB CGB CDB
= Cdiff = Cdiff
= CGCB
B

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Class Material Gate Capacitance


‰ Last lecture
ƒ Using the MOS model: Inverter VTC
‰ Today’s lecture
ƒ MOS Capacitance
ƒ Using the MOS Model: Delay
‰ Reading (3.3.2, 5.4.2) ‰ Capacitance (per area) from gate across
the oxide is W·L·Cox, where Cox=εox/tox

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Gate Capacitance Transistor in Linear Region
G

S W D
L

C OL CG C OL
xj
C JC
C jSB C jDB

‰ Distribution between terminals is complex LD

ƒ Capacitance is really distributed ƒ Channel is formed and acts as the other terminal
– CGCB drops to zero (shielded by channel)
– Useful models lump it to the terminals
ƒ Several operating regions: ƒ Model by splitting oxide cap equally between
source and drain
– Way off, off, transistor linear, transistor saturated
– Changing either voltage changes the channel charge
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Transistor In Cutoff Transistor in Saturation Region


G G

S W D S W D
L L

C OL C GB C OL C OL CG C OL
xj xj
C JC
C jSB C jDB C jSB C jDB

LD
ƒ When the transistor is off, no carriers in channel ƒ Changing source voltage doesn’t change VGC
to form the other side of the capacitor.
uniformly
– Substrate acts as the other capacitor terminal
– E.g. VGC at pinch off point still VTH
– Capacitance becomes series combination of gate
oxide and depletion capacitance
ƒ Bottom line: CGCS ≈ 2/3·W·L·Cox
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Transistor In Cutoff (cont’


(cont’d) Transistor in Saturation Region (cont’
(cont’d)
G G

S W D S W D
L L

C OL C GB C OL C OL CG C OL
xj xj
C JC
C jSB C jDB C jSB C jDB

LD
ƒ When |VGS| < |VT|, total CGCB much smaller than
ƒ Drain voltage no longer affects channel charge
W·L·Cox
– Set by source and VDS_sat
– Usually just approximate with CGCB = 0 in this region.

ƒ (If VGS is “very” negative (for NMOS), depletion ƒ If change in charge is 0, CGCD = 0
region shrinks and CGCB goes back to ~W·L·Cox)
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Gate Capacitance Diffusion Capacitance
NA+
ƒ Bottom
Side wall
– Area cap
W Source
– Cbottom = Cj·LS·W ND
Bottom

ƒ Sidewalls xj Side wall


– Perimeter cap Channel
LS Substrate
– Csw = Cjsw·(2LS+W) NA
Cgate vs. VGS Cgate vs. operating region
(with VDS = 0) ƒ GateEdge
– Cge = Cjgate·W
– Usually automatically included in the SPICE model
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Gate Overlap Capacitance Junction Capacitance (2)


Polysilicon gate 1.0

ƒ Junction caps 0.9

are nonlinear

Capacitance [arbitrary units]


Gate oxide 0.8
tox – CJ is a
Source Drain
function of
0.7

W n+ L n+
n+ xd xd n+ junction bias 0.6

N+ junction area
Cross section 0.5 N+ junction perimeter

Gate-bulk P+ junction area

ƒ SPICE model
P+ junction perimeter
Ld
overlap 0.4

CO = Cox ⋅ xd
0.0 0.2 0.4 0.6 0.8 1.0 1.2 1.4 1.6 1.8

Top view equations: Node voltage (V)

– Area CJ = area × CJ0 / (1+ |VDB|/φΒ )mj


– Perimeter CJ = perim × CJSW / (1 + |VDB|/φΒ)mjsw
Off/Lin/Sat Æ CGSO = CGDO = CO·W – Gate edge CJ = W × CJgate / (1 + |VDB|/φΒ)mjswg

ƒ How do we deal with nonlinear capacitance?


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Gate Fringe Capacitance Linearizing the Junction Capacitance


Fringing fields
Replace non-linear capacitance by
large-signal equivalent linear capacitance
which displaces equal charge over voltage swing of interest
n+ n+

Cross section

ƒ COV not just from metallurgic overlap – get fringing


fields too

ƒ Typical value: ~0.2fF·W(in µm)/edge


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Capacitance Model Summary Model Calibration - Capacitance
‰ Gate-Channel Capacitance
ƒ CGC ≈ 0 (|VGS| < |VT|) ƒ Can calculate Cg, Cd based on tech. parameters
ƒ CGC = Cox·W·Leff (Linear) – But these models are simplified too
– 50% G to S, 50% G to D
ƒ CGC = (2/3)·Cox·W·Leff (Saturation) ƒ Another approach:
– 100% G to S – Tune (e.g., in spice) the linear capacitance until it
makes the simplified circuit match the real circuit
‰ Gate Overlap Capacitance – Matching could be for delay, power, etc.
ƒ CGSO = CGDO = CO·W (Always)

Cload
‰ Junction/Diffusion Capacitance Delay1 Match Delay2

ƒ Cdiff = Cj·LS·W + Cjsw·(2LS + W) + CjgW (Always)


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Capacitances in 0.25 µm CMOS


Process Model Calibration for Delay
A
Cload
Delay1 Match Delay2

ƒ For gate capacitance:


– Make inverter fanout 4
– Adjust Cload until Delay1 = Delay2
ƒ For diffusion capacitance
– Replace inverter “A” with a diffusion capacitance load

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Simplified Model Delay Calibration


ƒ Capacitance models important for analysis 1 4 16 64
and intuition
– But often need something simpler to work with
ƒ Simple switch model: Delay
– Lump together as effective linear capacitance to "Edge Shaper" Load ???
(ac) ground
– In most processes: CG = CD = 1.5 – 2fF·W(µm) ƒ Why did we need that last inverter stage?

Vin Vout Vin Vout


CL

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The Miller Effect
MOS Transistor as a Switch
ƒ As Vin increases, Vout drops
– Once get into the transition region, gain
Cgd1 ‰ Saw that real transistors aren’t exactly
∆V Vout
from Vin to Vout > 1 resistors
Vin ∆V
ƒ Look more like current sources in saturation
ƒ So, Cgd experiences voltage swing
larger than Vin M1

– Which means you need to provide more


charge ‰ Two questions:
– Makes Cgd look larger than it really is
ƒ Which region of IV curve determines delay?
ƒ Known as the “Miller Effect” in the ƒ How can that match up with the RC model?
analog world

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Transistor Driving a Capacitor


• With a step input:
VDD Æ VDD/2 ID VGS = VDD

CMOS
Switching Delay VDS
VVSAT VDD /2 VDD

• Transistor is in (velocity) saturation during entire transition


from VDD to VDD/2
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MOS Transistor as a Switch Switching Delay


• Discharging a capacitor • In saturation, transistor basically acts like a current source:
VOUT
i D = i D (v DS ) VOUT
VDD
C
dVDS IDSAT C
iD = C VDD/2
dt
• We modeled this with: t
R
tp

C tp = ln (2) RC VOUT = VDD - (IDSAT/C)t tp = C(VDD/2)/IDSAT

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Switching Delay (with Output Conductance) The Book’s Method
• Including output conductance:
VOUT

IDSAT 1/(λIDSAT) C

VOUT = (VDD + λ −1 ) e
-t ( C λI DSAT )
- λ −1

C (VDD 2 )
• For “small” λ: tp ≈
(1 + λVDD ) I DSAT
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RC Model The Transistor as a Switch


• Transistor current not linear on VOUT – how is the RC 7
x 10
5

model going to work?


6

• Look at waveforms: 2.5


5
2.3

• Voltage looks like a


(Ohm)

2.1 4

ramp for RC too 1.9


eq

3
NMOS
R
OUT

1.7
V

1.5 2

1.3 1
RC
1.1
0
0.9 0.5 1 1.5 2 2.5
V (V)
DD
0 0.2 0.4 0.6 0.8 1
t/τ
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Finding Req The Transistor as a Switch


• Match the delay of the RC model with the actual delay:
tp = t p , RC
C (VDD 2 ) (VDD 2 )
= ln ( 2 ) Req C Req =
(1 + λVDD ) I DSAT ln ( 2 )(1 + λVDD ) I DSAT

1 VDD
• Often just: Req ≈
2 ⋅ ln ( 2 ) I DSAT

• Note that the book uses a different method and gets


0.75·VDD/IDSAT instead of ~0.72·VDD/IDSAT.
• Why did we do it this way vs. the book’s method?

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