J.F.Scott - Physics of Thin-Film Ferroelectric Oxides
J.F.Scott - Physics of Thin-Film Ferroelectric Oxides
K. M. Rabe†
Department of Physics and Astronomy, Rutgers University, Piscataway, New Jersey 00854-
8019, USA
J. F. Scott‡
Department of Earth Sciences, University of Cambridge, Cambridge CB2 3EQ, United
Kingdom
共Published 17 October 2005兲
This review covers important advances in recent years in the physics of thin-film ferroelectric oxides,
the strongest emphasis being on those aspects particular to ferroelectrics in thin-film form. The
authors introduce the current state of development in the application of ferroelectric thin films for
electronic devices and discuss the physics relevant for the performance and failure of these devices.
Following this the review covers the enormous progress that has been made in the first-principles
computational approach to understanding ferroelectrics. The authors then discuss in detail the
important role that strain plays in determining the properties of epitaxial thin ferroelectric films.
Finally, this review ends with a look at the emerging possibilities for nanoscale ferroelectrics, with
particular emphasis on ferroelectrics in nonconventional nanoscale geometries.
FIG. 1. 共a兲 1T-1C memory design. When a voltage is applied to both the word and bit line, the memory cell is addressed. Also
shown is the voltage applied to the capacitor and the current output, depending on whether a one or a zero is stored. The current
for the zero state is pure leakage current and by comparison to a reference capacitor can be removed. 共b兲 A 2T-2C memory cell
in which the reference capacitor is part of the memory cell.
pensive and that it is difficult to be able to guarantee An example of a real commercially available memory
that a device will still operate ten years into the future. is the Samsung lead zirconate titanate-based 4 Mbit
Because competing nonvolatile memory technologies 1T-1C ferroelectric memory 共Jung et al., 2004兲. The scan-
exist, ferroelectric memories can succeed only if these ning electron microscopy cross section 共Fig. 2兲 of the
issues are resolved. device gives some indication of the complexity of design
A ferroelectric capacitor, while capable of storing in- involved in a real ferroelectric memory.
formation, is not sufficient for making a nonvolatile Lead zirconate titanate 共PZT兲 has long been the lead-
computer memory. A pass-gate transistor is required so ing material considered for ferroelectric memories,
that a voltage above the coercive voltage is only applied though strontium bismuth tantalate 共SBT兲, a layered
to the capacitor when a voltage is applied to both the perovskite, is also a popular choice due to its superior
word and bit line; this is how one cell is selected from an fatigue resistance and the fact that it is lead-free 共Fig. 3兲.
array of memories. The current measured through a However, it requires higher-temperature processing,
small load resistor in series with the capacitor is com- which creates significant integration problems. Recently
pared to that from a reference cell that is poled in a
progress has been made in optimizing precursors. Until
definite direction. If the capacitor being read is in a dif-
recently the precursors for Sr, Bi, and Ta/ Nb did not
ferent state, the difference in current will be quite large
function optimally in the same temperature range, but
where the displacement current associated with switch-
last year Inorgtech developed Bi共mmp兲3—a 2-methoxy-
ing accounts for the difference. If the capacitor does not
2-propanol propoxide that improves reaction and lowers
switch because it is already in the reference state, the
difference in current between the capacitor being read the processing temperature for SBT, its traditional main
and the reference capacitor is zero. disadvantage compared to PZT. This material also satu-
Most memories use either a 1 transistor–1 capacitor rates the bismuth coordination number at 6. Recently
共1T-1C兲 design or a 2 transistor–2 capacitor 共2T-2C兲 de- several other layered perovskites, for example, bismuth
sign 共Fig. 1兲. The important difference is that the 1T-1C titanate, have also been considered.
design uses a single reference cell for the entire memory
for measuring the state of each bit, whereas in the 2T-2C
there is a reference cell per bit. A 1T-1C design is much
more space effective than a 2T-2C design, but has some
significant problems, most significantly that the refer-
ence capacitor will fatigue much faster than the other
capacitors, and so failure of the device occurs more
quickly. In the 2T-2C design the reference capacitor in
each cell fatigues at the same rate as its corresponding
storage capacitor, leading to better device life. A prob-
lem with these designs is that the read operation is de-
structive, so every time a bit is read it needs to be writ-
ten again. A ferroelectric field-effect transistor, in which
a ferroelectric is used in place of the metal gate on a
field-effect transistor, would both decrease the size of
the memory cell and provide a nondestructive readout;
however, no commercial product has yet been devel-
oped. Current efforts seem to run into serious problems FIG. 2. Cross-sectional SEM image of the Samsung 4 Mbit
with data retention. 1T-1C 3 metal FRAM.
As well as their applications as ferroelectric random Flash to operate as the silicon logic levels decrease from
access memories 共FRAMs兲, ferroelectric materials have 5 at present to 3.3, 1.1, and 0.5 V in the near future. The
potential use in dynamic random access memories main problem for ferroelectrics is the destructive read
共DRAMs兲 because of their high dielectric constant in operation, which means that each read operation must
the vicinity of the ferroelectric phase transition, a topic be accompanied by a write operation leading to faster
which has been reviewed by Kingon, Maria, and Streif- degradation of the device. The operation principle of
fer 共2000兲. Barium strontium titanate 共BST兲 is one of the MRAMs is that the tunneling current through a thin
leading materials in this respect since by varying the layer sandwiched between two ferromagnetic layers is
composition a transition temperature just below room different depending on whether the ferromagnetic layers
temperature can be achieved, leading to a high dielectric have their magnetization parallel or antiparallel to each
constant over the operating temperature range. other. The information stored in MRAMs can thus be
read nondestructively, but their write operation requires
high power which could be extremely undesirable in
B. Future prospects for nonvolatile ferroelectric memories
high-density applications. We present a summary of the
There are two basic kinds of ferroelectric random ac- current state of development in terms of design rule and
cess memories in production today: 共1兲 the free-standing speed of the two technologies in Table I.
RAMs and 共2兲 fully embedded devices 关usually a CPU, Partly in recognition of the fact that there are distinct
which may be a complementary metal-oxide semicon- advantages for both ferroelectrics and ferromagnets,
ductor electrically erasable programmable read-only there has been a recent flurry of activity in the field of
memory 共CMOS EEPROM兲, the current generation multiferroics, i.e., materials that display both ferroelec-
widely used nonvolatile memory technology, plus a tric and magnetic ordering, the hope being that one
FRAM and an 8-bit microprocessor兴. The former have could develop a material with a strong enough coupling
reached 4 Mbit at both Samsung 共using PZT兲 and Mat- between the two kinds of ordering to create a device
sushita 共using SBT兲. The Samsung device is not yet, as that can be written electrically and read magnetically. In
far as the authors know, in commercial production for general multiferroic materials are somewhat rare, and
real products, but the NEC FRAM is going into full- certainly the conventional ferroelectrics such as PbTiO3
scale production this year in Toyama 共near Kanazawa兲. and BaTiO3 will not display any magnetic behavior as
Fujitsu clearly leads in the actual commercial use of its the Ti-O hybridization required to stabilize the ferro-
embedded FRAMs. The Fujitsu-embedded FRAM is electricity in these compounds will be inhibited by the
that used in the SONY Playstation 2. It consists of 64
partially filled d orbitals that would be required for mag-
Mbit of EEPROM plus 8 kbit of RAM, 128-kbit ROM,
netism 共Hill, 2000兲. However, there are other mecha-
and a 32-kbit FRAM plus security circuit. The device is
nisms for ferroelectricity and in materials where ferro-
manufactured with a 0.5-m CMOS process. The ca-
electricity and magnetism coexist there can be coupling
pacitor is 1.6⫻ 1.9 m2 and the cell size is either
27.3 m2 for the 2T-2C design or 12.5 m2 for the 1T- between the two. For example, in BaMnF4 the ferroelec-
1C. tricity is actually responsible for changing the antiferro-
The leading competing technologies in the long term magnetic ordering to a weak canted ferromagnetism
for nonvolatile computer memories are FRAM and 共Fox et al., 1980兲. In addition, the large magnetoelectric
magnetic random access memories 共MRAM兲. These are coupling in these materials causes large dielectric
supposed to replace EEPROMs 共electrically erasable anomalies at the Néel temperature and at the in-plane
programable read-only memories兲 and “Flash” memo- spin-ordering temperature 共Scott, 1977, 1979兲. More re-
ries in devices such as digital cameras. Flash, though cent theoretical and experimental efforts have focused
proving highly commercially successful at the moment, on BiMnO3, BiFeO3 共Seshadri and Hill, 2001; Moreira
is not a long-term technology, suffering from poor long- de Santos et al., 2002; Wang et al., 2003兲 and YMnO3
term endurance and scalability. It will be difficult for 共Fiebig et al., 2002; Van Aken et al., 2004兲.
TABLE II. A number of the most promising gate materials under recent study, together with the
buffer layers employed in each case. Studies of the I共V兲 characteristics of such ferroelectric FETs
have been given by Macleod and Ho 共2001兲 and a disturb-free programming scheme described by
Ullman et al. 共2001兲.
and Silverman 共1972兲, it has been neglected in the more nearly interchangeable兲 deposited by some form of epi-
recent context of ferroelectric FETs. In our opinion, this taxial growth. This is the technique employed at Mo-
depolarization instability for thin ferroelectric gates on torola, but the view elsewhere is that it is too expensive
FETs is a significant source of the observed retention to become industry process worthy. The second ap-
failure in the devices but has not yet been explicitly proach is to use a material of moderate k 共of order 20兲,
modeled. If we are correct, the retention problem in
with HfO2 favored but ZrO2 also a choice. Hafnium ox-
ferroelectric FETs could be minimized by making the
ferroelectric gates thicker and the Si contacts more con- ide is satisfactory in most respects but has the surprising
ducting 共e.g., p+ rather than p兲. See Scott 共2005兲 for a disadvantage that it often degrades the n-channel mobil-
full discussion of all-perovskite FETs. ity catastrophically 共by as much as 10 000 times兲. Re-
Table II lists a number of the most promising gate cently ST Microelectronics decided to use SrTiO3 but
materials under recent study, together with the buffer with metal-organic chemical-vapor deposition from Aix-
layers employed in each case. Studies of the I共V兲 char- tron, thus combining high dielectric constant and
acteristics of such ferroelectric FETs have been given by cheaper processing.
Macleod and Ho 共2001兲 and a disturb-free programming The specific high-k integration problems are the fol-
scheme described by Ullman et al. 共2001兲. lowing four: 共1兲 depletion effects in the polysilicon gate,
Beyond its use in modulating the current in a semi- 共2兲 interface states, 共3兲 strain effects, and 共4兲 etching dif-
conductor channel the ferroelectric field effect can also
ficulties 共HfO2 is hard to wet etch兲. The use of a poly-Si
be used to modify the properties of more exotic corre-
lated oxide systems 共Ahn, Triscone, and Mannhart, gate instead of a metal gate produces grain-boundary
2003兲. stress in the poly, with resultant poor conductivity. This
mobility degradation is only partly understood. The gen-
eral view is that a stable amorphous HfO2 would be a
D. Replacement of gate oxides in DRAMs
good strain-free solution. Note that HfO2 normally crys-
At present there are three basic approaches to solving tallizes into two or three phases, one of which is mono-
the problem of SiO2-gate oxide replacement for clinic 共Morrison et al., 2003兲. Hurley in Cork has been
DRAMs. The first is to use a high-dielectric 共“high-k”兲 experimenting with a liquid injection system that re-
material such as SrTiO3 共k = 300 is the dielectric con- sembles Isobe’s earlier SONY device for deposition of
stant; ⑀ = k − 1 is the permittivity; for k Ⰷ 1 the terms are viscous precursors with flash evaporation at the target.
C共t,t⬘兲 = CD 冋冕t⬘
t
V共t⬙兲dt⬙ 册 D
, 共1兲
The backswitching studies of Ganpule et al. 共2001兲 fatigue process due to their ordering 共Park and Chadi,
show two very interesting effects 共Fig. 7兲. The first is the 1998; Scott and Dawber, 2000兲.
finding that reverse domains nucleate preferentially at An unsolved puzzle is the direct observation via
antiphase boundaries. This was studied in more detail atomic force microscopy of domain walls penetrating
subsequently by Roelofs et al. 共2002兲 who invoked a grain boundaries 共Gruverman et al., 1997兲. This is con-
depolarization-field-mediated mechanism to explain the trary to some expectations and always occurs at non-
result. Another explanation might be that the strain is normal incidence, i.e., at a small angle to the grain
relaxed at these antiphase boundaries resulting in favor- boundary.
able conditions for nucleation. Second, the influence of One of the interesting things to come out of the work
curvature on the domain-wall relaxation is accounted for in lead germanate 共where ferroelectric domains are op-
within the Kolomogorov-Avrami framework. The veloc- tically distinct due to electrogyration兲 by Shur et al.
ity of the domains is dependent on curvature, and, as the 共1990兲 is that at high applied electric fields 共15 kV cm−1兲
relaxation proceeds, the velocity decreases and the do- tiny domains are nucleated in front of the moving do-
main walls become increasingly faceted. In Fig. 7 the main wall 共Fig. 9兲. A very similar effect is seen in ferro-
white polarization state is stable, whereas the black is magnets as observed by Randoshkin 共1995兲 in a single-
not. The sample is poled into the black polarization state crystal iron-garnet film.
and then allowed to relax back. However, in ferromagnets the effect is modeled by a
A different kind of study was undertaken by Tybell et spin-wave mechanism 共Khodenkov, 1975兲. This mecha-
al. 共2002兲, in which they applied a voltage pulse to switch nism is based on the gyrotropic model of domain-wall
a region of the ferroelectric using an atomic force mi- motion in uniaxial materials 共Walker, 1963兲. When a
croscopy tip and watched how the reversed domain grew strong magnetic driving field 共exceeding the Walker
as a function of pulse width and amplitude. They were threshold兲 acts upon a domain wall, the magnetization
able to show that the process was well described by a vectors in the domain wall begin to precess with a fre-
creep mechanism thought to arise due to random pin- quency ␥H, where ␥ is the effective gyromagnetic ratio.
ning of domain walls in a disordered system 共Fig. 8兲. By relating the precession frequency in the domain wall
Though the exact origin of the disorder was not clear, it with the spin-wave frequency in the domain, good pre-
suggests that it is connected to oxygen vacancies, which dictions can be made for the threshold fields at which
also play a role in pinning the domain walls during a the effect occurs. We note that the domains nucleated in
FIG. 9. Nucleation of nanodomains in front of domain wall in FIG. 10. 共a兲 The original Sawyer-Tower circuit, 共b兲 hysteresis
lead germanate at high electric field. Black and white represent in Rochelle salt measured using this circuit by Sawyer and
the two directions of polarization. From Gruverman, 1990. Tower at various temperatures. From Sawyer and Tower, 1930.
front of the wall may be considered as vortexlike Skyr- carried out using commercial apparatus from one of two
mions. The similarity between these effects is thus quite companies, Radiant Technologies and AixAcct. Both
surprising and suggests that perhaps there is more in companies’ testers can carry out a number of tests and
common between ferroelectric domain-wall motion and measurements, and both machines use charge or current
ferromagnet domain-wall motion than is usually consid- integration techniques for measuring hysteresis. Both
ered. However, whereas Democritov and Kreines 共1988兲 machines also offer automated measurement of charac-
have shown that magnetic domain walls can be driven teristics such as fatigue and retention.
supersonically 共resulting in a phase-matched Cherenkov- In measuring P共E兲 hysteresis loops several kinds of
like bow wave of acoustic phonon emission兲, there is no artifacts can arise. Some of these are entirely instrumen-
direct evidence of supersonic ferroelectric domains. Pro- tal, and some arise from the effects of conductive 共leaky兲
cesses such as the nanodomain nucleation described specimens.
above seem to occur instead when the phase velocity of
Hysteresis circuits do not measure polarization P di-
the domain-wall motion approaches the speed of sound.
rectly. Rather, they measure switched charge Q. For an
Of course the macroscopic electrical response to switch-
ideal ferroelectric insulator
ing can arrive at a time t ⬍ v / d, where v is the sound
velocity and d the film thickness, simply from domain
nucleation within the interior of the film between cath- Q = 2PrA, 共4兲
ode and anode.
where Pr is the remanent polarization and A is the elec-
trode area for a parallel-plate capacitor. For a somewhat
B. Electrical characterization
conductive sample
1. Standard measurement techniques
Several kinds of electrical measurements are made on Q = 2PrA + Eat, 共5兲
ferroelectric capacitors. We briefly introduce them here
before proceeding to the following sections where we where is the electrical conductivity, Ea is the applied
discuss in detail the experimental results obtained by field, and t the measuring time. Thus Q in a pulsed mea-
using these techniques. suring system depends on the pulse width.
The four basic types of apparent hysteresis curves that
a. Hysteresis are artifacts are shown in Fig. 11.
One of the key measurements is naturally the mea-
surement of the ferroelectric hysteresis loop. There are
two measurement schemes commonly used. Tradition-
ally a capacitance bridge as first described by Sawyer
and Tower 共1930兲 was used 共Fig. 10兲. Although this is no
longer the standard way of measuring hysteresis, the cir-
cuit is still useful 共and very simple and cheap兲 and we
have made several units which are now in use in the
teaching labs in Cambridge for a demonstration in which
students are able to make and test their own ferroelec-
tric KNO3 capacitor 共Dawber, Farnan, and Scott, 2003兲.
This method is not very suitable in practice for many
reasons, for example, the need to compensate for dielec- FIG. 11. Common hysteresis artifacts: 共a兲 dead short, 共b兲 linear
tric loss and the fact that the film is being continuously lossy dielectric, 共c兲 saturated amplifier, and 共d兲 nonlinear lossy
cycled. Most testing of ferroelectric capacitors is now dielectric.
FIG. 12. Current-voltage and capacitance-voltage relationship of Pt-Si-Pt punch-through diode. The characteristics are very
similar to those obtained in metal-ferroelectric-metal systems. Reprinted from Sze et al., 1971, with permission from Elsevier.
共Brennan, 1992; Mihara et al., 1992; Sayer et al., 1992; contributions will vary greatly from sample to sample, or
Scott et al., 1992; Hwang, 1998; Hwang et al., 1998兲. even in the same sample under different experimental
In contrast to the approach of explaining these char- conditions.
acteristics using semiconductor models, Basceri et al.
共1997兲 account for their results on the basis of a Landau-
Ginzburg-style expansion of the polarization 共Fig. 13兲. b. Domain-wall contributions
The change in field due to its nonlinearity has also been Below the coercive field there are also contributions
calculated by both Outzourhit et al. 共1995兲 and Dietz et to the permittivity from domain walls, as first pointed
al. 共1997兲. The real problem is that both pictures are out by Fouskova 共1965; Fouskova and Janousek, 1965兲.
feasible. One should not neglect the fact that the mate- In PZT the contributions of domain-wall pinning to the
rials have semiconductor aspects; but at the same time it dielectric permittivity have been studied in detail by
is not unreasonable to expect that the known nonlinear- Damjanovic and Taylor 共Damjanovic, 1997; Taylor and
ity of the dielectric response in these materials should be Damjanovic, 1997, 1998兲, who showed that the subcoer-
expressed in the capacitance-voltage characteristic. cive field contributions of the permittivity were de-
Probably the best approach is to avoid making any con- scribed by a Raleigh law with both reversible and irre-
clusions on the basis of these kinds of measurements versible components, the irreversible component being
alone, as it is quite possible that the relative sizes of the due to domain-wall pinning.
=
S 2C
2
冋
− S3/2 C共m − 兲 + 共1 − S兲共Eg − 0兲
C
S
considering it as the dielectric response of the ions
stripped of their electrons. This may seem quite reason-
册
able but is not, however, appropriate. In general we
1/2
C C 2S think of metals not being able to sustain fields, and in
− 共Eg − Ef + kT兲 + . 共10兲 the bulk they certainly cannot, but the problem of the
S 4
penetration of electric fields into metals is actually well
In the above S = 1 / 共1 + q2␦effDs兲, C = 2qsND␦eff
2
. When known in a different context, that of the microwave skin
s ⬇ 100 and ND ⬍ 10 cm , C is of the order of 0.01 eV
18 −3
depth. It is very instructive to go through the derivation
and it is reasonable to discard the term as Cowley and as an ac current problem and then find the dc limit
Sze 共1965兲 did. Neglecting this term, as has been pointed which will typically apply for our cases of interest.
We describe the metal in this problem using the 1 / C共d兲 versus thickness d extrapolates to finite values at
Drude free-electron theory: d = 0, demonstrating an interfacial capacitance. However,
whereas the value for the sol-gel films is consistent with
0
= . 共11兲 the Thomas-Fermi screening approach 共0.05 nm兲, the
1 + i value of interfacial thickness 共0.005 nm兲 for the
There are three key equations to describe the charge chemical-vapor deposition films is only 10% of the inter-
distribution in the metal: Poisson’s equation for free facial capacitance that would arise from the known
charges, Fermi-Thomas screening length of 0.05 nm in the Pt
electrodes 共Dawber, Chandra, et al., 2003兲. That is, if this
1 E共z兲 result were interpreted in terms of a “dead layer,” the
共z兲 = ; 共12兲
4 z dead layer would have negative width. This result may
arise from a compensating “double layer” of space
the continuity equation, charge inside the semiconducting PZT dielectric; the
j共z兲 Armstrong-Horrocks 共1997兲 semiconductor formalism
− i共z兲 = ; 共13兲 form of the earlier Helmholtz and Gouy-Chapman
z
polar-liquid models of the double layer can be used.
and the Einstein transport equation, Such a double layer is unnecessary in PVDF because
that material is highly insulating 共Moreira, 2002兲. This
explains quantitatively the difference 共8 times兲 of inter-
j = E − D . 共14兲
z facial capacitance in sol-gel PZT films compared with
chemical-vapor deposition PZT films of the same thick-
These are combined to give
ness. The magnitude of the electrokinetic potential 共or
2 4
z 2 =
D
1+ 冉
i
4
共z兲. 冊 共15兲
zeta potential兲 = d⬘ / ⑀⑀0 that develops from the Helm-
holtz layer can be estimated without adjustable param-
eters from the oxygen-vacancy gradient data of Dey for
This tells us that if at a boundary of the metal there a typical oxide perovskite, SrTiO3; using Dey’s surface
exists a charge, it must decay with the metal exponen- charge density of 2.8⫻ 1018 e / m2, a Gouy screening
tially with characteristic screening length : length in the dielectric d⬘ = 20 nm, and a dielectric con-
= 冋 冉4
D
1+
i
4
冊册 −1/2
. 共16兲
stant of ⑀ = 1300 yields = 0.78 eV. Since this is compa-
rable to the Schottky barrier height, it implies that much
of the screening is provided internally by mobile oxygen
In the dc limit 共which applies for most frequencies of vacancies. 关Here 共 , 兲 is a function of time and mo-
our interest兲 this length is the Thomas-Fermi screening bility for a bimodal 共ac兲 switching process.兴
length,
0 = 冉 冊
40
D
−1/2
. 共17兲
4. Conduction mechanisms
In general, conduction is undesirable in memory de-
vices based on capacitors, and so the understanding and
So it becomes clear that the screening charge in the minimization of conduction has been a very active area
metal may be modeled by substituting a sheet of charge of research over the years. Many mechanisms have been
displaced from the interface by the Thomas-Fermi proposed for the conduction in ferroelectric thin films.
screening length, but that in calculating the dielectric
thickness of this region the effective dielectric constant
a. Schottky injection
that must be used is 1, consistent with the derivation of
the screening length. Had we used a form of the Poisson Perhaps the most commonly observed currents in fer-
equation that had a nonunity dielectric constant, i.e., roelectrics are due to thermionic injection of electrons
from the metal into the ferroelectric. The current-
⑀ E共z兲 voltage characteristic is determined by the image force
共z兲 = , 共18兲
4 z lowering of the barrier height when a potential is ap-
plied. A few points should be made about Schottky in-
then our screening length would be jection in ferroelectric thin films. The first is about the
0 = 冉 冊
40
⑀D
−1/2
, 共19兲
dielectric constant appropriate for use. In ferroelectrics
the size of the calculated barrier-height lowering de-
pends greatly on which dielectric constant, the static or
which is not the Thomas-Fermi screening length. Thus the electronic, is used. The correct dielectric constant is
the use of a nonunity dielectric constant for the metal is the electronic one 共⬃5.5兲, as discussed by Scott 共1999兲
not compatible with the use of the Thomas-Fermi and used by Dietz and Waser 共1997兲, and by Zafar et al.
screening length. 共1998兲. Dietz and Waser 共1997兲 used the more general
Measurements on both sol-gel and chemical-vapor injection law of Murphy and Good 共1956兲 to describe
deposition lead zirconate titanate 共PZT兲 films down to charge injection in SrTiO3 films. They found that for
⬃60 nm thickness show that reciprocal capacitance lower fields the Schottky expression was valid, but at
not the case in SBT. In his experiment an atomic force Even in films for which there is considerable Poole-
microscopy tip is rastered across the surface of a poly- Frenkel limitation of current 共a bulk effect兲, the
crystalline ferroelectric film. The imaged pattern records Schottky barriers at the electrode interfaces will still
the leakage current at each point: white areas are high- dominate breakdown behavior.
current spots; dark areas, low current. If the leakage In general, electrical breakdown in ferroelectric ox-
were predominantly along grain boundaries, we should ides is a hybrid mechanism 共like spark discharge in air兲
see dark polyhedral grains surrounded by white grain in which the initial phase is electrical but the final stage
boundaries, which become brighter with increasing ap- is simple thermal runaway. This makes the dependence
plied voltage. In fact, the opposite situation occurs. This upon temperature complicated.
indicates that the grains have relatively low resistivity, There are at least three different contributions to the
with high-resistivity grain boundaries. The second sur- temperature dependence. The first is the thermal prob-
prise is that the grain conduction comes in a discrete ability of finding a hopping path through the material.
step; an individual grain suddenly “turns on” 共like a light Following Gerson and Marshall 共1959兲 and assuming a
switch兲. Smaller grains generally conduct at lower volt- random isotropic distribution of traps, Scott 共1995兲
ages 关in accord with Maier’s theory of space-charge ef- showed that
fects being larger in small grains with higher surface-
volume ratios 共Lubomirsky et al., 2002兲兴. k BT
EB = G − log A, 共22兲
B
which gives both the dependence on temperature T and
C. Device failure electrode area A in agreement with all experiments on
1. Electrical breakdown PZT, BST, and SBT.
In agreement with this model the further assumption
The process of electrical shorting in ferroelectric PZT of exponential conduction 共nonohmic兲 estimated to oc-
was first shown by Plumlee 共1967兲 to arise from den- cur for applied field E ⬎ 30 MV/ m 共Scott, 2000a兲,
冉 冊
dritelike conduction pathways through the material, ini-
tiated at the anodes and/or cathodes. These were mani- −b
共T兲 = 0exp 共23兲
fest as visibly dark filamentary paths in an otherwise k BT
light material when viewed through an optical micro-
in these materials yields the correct dependence of
scope. They have been thought to arise as “virtual cath-
breakdown time tB upon field
odes” via the growth of ordered chains of oxygen-
deficient material. This mechanism was modeled in log tB = c1 − c2EB 共24兲
detail by Duiker et al. 共Duiker, 1990; Duiker and Beale,
1990; Duiker et al., 1990兲. as well as the experimentally observed dependence of
To establish microscopic mechanisms for breakdown EB on rise time tc of the applied pulse:
in ferroelectric oxide films one must show that the de- EB = c3t−1/2 . 共25兲
c
pendences of breakdown field EB upon film thickness d,
ramp rate, temperature, doping, and electrodes are sat- Using the same assumption of exponential conduc-
isfied. The dependence for PZT upon film thickness is tion, which is valid for
most compatible with a low power-law dependence or is aeE Ⰶ kBT, 共26兲
possibly logarithmic 共Scott et al., 2003兲. The physical
models compatible with this include avalanche 共logarith- where a is the lattice nearest-neighbor oxygen-site hop-
mic兲, collision ionization from electrons injected via field ping distance 共approximately a lattice constant兲 and e,
emission from the cathode 共Forlani and Minnaja, 1964兲, the electron charge, Scott 共2000a兲 showed that the gen-
which gives eral breakdown field expression
dT
EB = Ad−w , 共20兲 CV − ⵜ共K · ⵜT兲 = EB
2
共27兲
dt
with 1 / 4 ⬍ w ⬍ 1 / 2, or the linked defect model of Gerson in the impulse approximation 共in which the second term
and Marshall 共1959兲, where w = 0.3. The dependence on in the above equation is neglected兲 yields
冋 册 冉 冊
electrode material arises from the electrode work func- 1/2
tion and the ferroelectric electron affinity through the 3CVK b
EB共T兲 = T exp , 共28兲
resultant Schottky barrier height. Following Von Hippel 0btc 2kBT
共1935兲 we have 关Scott 共2000a兲, p. 62兴 which suffices to estimate the numerical value of break-
down field for most ferroelectric perovskite oxide films;
eEB = h共⌽M − ⌽FE兲, 共21兲 values approximating 800 MV/ m are predicted and
measured.
where ⌽M and ⌽FE are the work functions of the metal A controversy has arisen regarding the temperature
and of the semiconducting ferroelectric, is electron dependence of EB共T兲 and the possibility of avalanche
mean free path, and h is a constant of order unity. 共Stolichnov et al., 2001兲. In low carrier-concentration
冉 冊
vacancies play some key part in the fatigue process. Au-
EB ger data of Scott et al. 共1991兲 show areas of low oxygen
= 0tanh . 共29兲
kT concentration in a region near the metal electrodes, im-
However, this effect is extremely small even for low plying a region of greater oxygen-vacancy data. Scott et
carrier concentrations 共10% change in EB between 300 al. also reproduced Auger data from Troeger 共1991兲 for
and 500 K for n = 1016 cm−3兲 and negligible for higher a film that had been fatigued by 1010 cycles showing an
concentrations. The change in EB in BST between 600 increase in the width of the region with depleted oxygen
and 200 K is ⬎500% and arises from Eq. 共22兲, not Eq. near the platinum electrode 共Fig. 19兲. There is, however,
共29兲. Even if the ferroelectrics were single crystals, with no corresponding change at the gold electrode. Gold
1020 cm−3 oxygen vacancies near the surface, any T de- does not form oxides. This might be an explanation of
pendence from Eq. 共29兲 would be unmeasurably small; the different behavior at the two electrodes. Although
and for the actual fine-grained ceramics 共40 nm grain some researchers believe that platinum also does not
diameters兲, the mean free path is ⬃1 nm and limited by form oxides, the adsorption of oxygen onto Pt surfaces is
grain boundaries 共T independent兲. Thus the conclusion actually a large area of research because of the impor-
of Stolichnov et al. 共2001兲 regarding avalanche is quali- tant role platinum plays as a catalyst in fuel-cell elec-
tatively and quantitatively wrong in ferroelectric oxides. trodes. Oxygen is not normally adsorbed onto gold sur-
faces but can be if there is significant surface roughness
共Mills et al., 2003兲.
2. Fatigue
It has also been found experimentally that films fa-
Polarization fatigue, which is the process whereby the tigue differently in atmospheres containing different
switchable ferroelectric polarization is reduced by re- oxygen partial pressures 共Brazier et al., 1999兲. Pan et al.
FIG. 19. 共a兲 Auger depth profile of PZT thin-film capacitor. 共b兲 Effect of fatigue on oxygen concentration near the electrode.
Reprinted with permission from Scott et al., 1991. © 1991, AIP.
tive, a reversible effect that occurs when low to moder- strain兲. The form of the latter strongly resembles that of
ate fields are used for switching and an irreversible ef- a Landau-Devonshire theory, providing a connection be-
fect which occurs under very high fields. tween first-principles approaches and the extensive lit-
erature on phenomenological models for the behavior of
3. Retention failure
thin-film ferroelectrics. The advantages and disadvan-
tages of using first-principles results rather than experi-
Clearly a nonvolatile memory that fails to retain the mental data to construct models will be considered. In
information stored in it will not be a successful device. addition to allowing the study of systems far more com-
Furthermore, producers of memories need to be able to plex than those that can be considered by first principles
guarantee retention times over much longer periods of alone, this modeling approach yields physical insight
time than they can possibly test. A better understanding into the essential differences between bulk and thin-film
of retention failure is thus required so that models can behavior, which will be discussed at greater length in
be used that allow accelerated retention tests to be car- Sec. IV.B.5. Finally, it will be seen that, despite practical
ried out. The work of Kim et al. 共2001兲 is a step in this limitations, the complexity of the systems for which ac-
direction. curate calculations can be undertaken has steadily in-
It seems that imprint and retention failure are closely creased in recent years, to the point where films of sev-
linked phenomena; i.e., if a potential builds up over a eral lattice constants in thickness can be considered.
period of time, it can destabilize the ferroelectric polar- While this is still far thinner than the films of current
ization state and thus cause loss of information. Further technological interest, concommitent improvements in
comparison of retention-time data and fatigue data sug- thin-film synthesis and characterizaton have made it pos-
gests a link between the two effects. Direct current deg- sible to achieve a high degree of atomic perfection in
radation of resistance in BST seems also to be a related comparable ultrathin films in the context of research.
effect 共Zafar et al., 1999兲. The electromigration of oxy- This progress has led to a true relevance of calculational
gen vacancies under an applied field in a Fe-doped results to experimental observations, opening a mean-
SrTiO3 single crystal has been directly observed via elec- ingful experimental-theoretical dialog. However, this
trochromic effects 共Waser et al., 1990兲. Oxygen-vacancy progress in some ways only serves to highlight the full
redistribution under an applied field has also been in- complexity of the physics of real ferroelectric films: as
voked to explain a slow relaxation of the capacitance in questions get answered, more questions, especially
BST thin films 共Boikov et al., 2001兲. It would seem to about phenomena at longer length scales and about dy-
make sense that whereas fatigue relates to the cumula- namics, are put forth. These challenges will be discussed
tive motion of oxygen vacancies under an ac field, resis- in Sec. IV.B.6.
tance degradation is a result of their migration under an
applied dc field, and retention failure is a result of their
migration under the depolarization field or other built-in A. Density-functional-theory studies of bulk ferroelectrics
fields in the material.
In parallel with advances in laboratory synthesis, the
past decade has seen a revolution in the atomic-scale
IV. FIRST PRINCIPLES theoretical understanding of ferroelectricity, especially
in perovskite oxides, through first-principles density-
With continuing advances in algorithms and computer functional-theory investigations. The central result of a
hardware, first-principles studies of the electronic struc- density-functional-theory calculation is the ground-state
ture and structural energetics of complex oxides can energy computed within the Born-Oppenheimer ap-
now produce accurate, material-specific information rel- proximation; from this the predicted ground-state crystal
evant to the properties of thin-film ferroelectrics. In this structure, phonon dispersion relations, and elastic con-
section, we focus on first-principles studies that identify stants are directly accessible. The latter two quantities
and analyze the characteristic effects specific to thin can be obtained by finite-difference calculations, or,
films. First, we briefly review the relevant methodologi- more efficiently, through the direct calculation of deriva-
cal progress and the application of these methods to tives of the total energy through density-functional per-
bulk ferroelectric materials. Next, we survey the first- turbation theory 共Baroni et al., 2001兲.
principles investigations of ferroelectric thin films and For the physics of ferroelectrics, the electric polariza-
superlattices reported in the literature. It will be seen tion and its derivatives, such as the Born effective
that the scale of systems that can be studied directly by charges and the dielectric and piezoelectric tensors, are
first-principles methods is severely limited at present by as central as the structural energetics, yet proper formu-
practical considerations. This can be circumvented by lation in a first-principles context long proved to be
the construction of nonempirical models with param- quite elusive. Expressions for derivatives of the polariza-
eters determined by fitting to the results of selected first- tion corresponding to physically measurable quantities
principles calculations. These models can be param- were presented and applied in density-functional pertur-
etrized interatomic potentials, permitting molecular- bation theory calculations in the late 1980s 共de Gironcoli
dynamics studies of nonzero temperature effects, or et al., 1989兲. A key conceptual advance was establishing
first-principles effective Hamiltonians for appropriate the correct definition of the electric polarization as a
degrees of freedom 共usually local polarization and bulk property through the Berry-phase formalism of
King-Smith, Vanderbilt, and Resta 共King-Smith and Singh for PbZrO3 共Singh, 1995兲, in which the correct
Vanderbilt, 1993; Resta, 1994兲. With this and the related energy ordering between ferroelectric and antiferroelec-
Wannier function expression 共King-Smith and Vander- tric structures was obtained and, furthermore, compari-
bilt, 1994兲, the spontaneous polarization and its deriva- sons of the total energy resolved an ambiguity in the
tives can be computed in a post-processing phase of a reported space group and provided an accurate determi-
conventional total-energy calculation, greatly facilitating nation of the oxygen positions.
studies of polarization-related properties. It is important to note, however, that there seem to be
For perovskite oxides, the presence of oxygen and limitations on the accuracy to which structural param-
first-row transition metals significantly increases the eters, particularly lattice constants, can be obtained.
computational demands of density-functional total- Most obvious is the underestimation of the lattice con-
energy calculations compared to those for typical semi- stants within the local-density approximation, typically
conductors. Calculations for perovskite oxides have by about 1% 共generalized-gradient approximation tends
been reported using essentially all of the available first- to shift lattice constants upward, sometimes substantially
principles methods for accurate representation of the overcorrecting兲. Considering that the calculation in-
electronic wave functions: all-electron methods, mainly volves no empirical input whatsoever, an error as small
linearized augmented plane wave 共LAPW兲 and full- as 1% could be regarded not as a failure, but as a success
potential linearized augmented plane wave 共FLAPW兲, of the method. Moreover, the fact that the underesti-
linear muffin-tin orbitals, norm-conserving and ultrasoft mate varies little from compound to compound means
pseudopotentials, and projector-augmented wave- that the relative lattice constants and thus the type of
function potentials. The effects of different choices for lattice mismatch 共tensile/compressive兲 between two ma-
the approximate density functional have been examined; terials in a heterostructure is generally correctly repro-
while most calculations are carried out with the local- duced when using computed lattice parameters. How-
density approximation, for many systems the effects of ever, for certain questions, even a 1% underestimate can
the generalized-gradient approximation and weighted- be problematic. The ferroelectric instability in the per-
density approximation 共Wu et al., 2004兲 have been inves- ovskite oxides, in particular, is known to be very sensi-
tigated, as well as the alternative use of the Hartree- tive to pressure 共Samara, 1987兲 and thus to the lattice
Fock approach. Most calculations being currently constant, so that 1% can have a significant effect on the
reported are performed with an appropriate standard ferroelectric instability. In addition, full optimization of
package, mainly VASP 共Kresse and Hafner, 1993; Kresse all structural parameters in a low-symmetry space group
and Furthmuller, 1996兲, with ultrasoft pseudopotentials can in some cases, PbTiO3 being the most well-studied
and projector-augmented wave function potentials, example, lead to an apparently spurious prediction,
ABINIT 共Gonze et al., 2002兲, with norm-conserving though fixing the lattice constants to their experimental
pseudopotentials and projector-augmented wave func- values leads to good agreement for the other structural
tion potentials, PWscf 共Baroni et al.兲, with norm- parameters 共Saghi-Szabo et al., 1998兲. Thus it has be-
conserving and ultrasoft pseudopotentials, SIESTA 共Soler come acceptable, at least in certain first-principles con-
et al., 2002兲, with norm-conserving pseudopotentials, texts, to fix the lattice parameters or at least the volume
WIEN97 共FLAPW兲 共Blaha et al., 1990兲 and CRYSTAL of the unit cell, to the experimental value when this
共Hartree-Fock兲 共Dovesi et al., 2005兲. value is known.
To predict ground-state crystal structures, the usual In a first-principles structural prediction, the initial
method is to minimize the total energy with respect to choice of space group may appear to limit the chance
free structural parameters in a chosen space group, in a that a true ground-state structure will be found. In gen-
spirit similar to that of a Rietveld refinement in an ex- eral, once a minimum is found, it can be proved 共or not兲
perimental structural determination. The space group is to be a local minimum by computation of the full pho-
usually implicitly specified by a starting guess for the non dispersion and of the coupling, if allowed by sym-
structure. For efficient optimization, the calculation of metry, between zone-center phonons and homogeneous
forces on atoms and stresses on the unit cell is essential strain 共Garcia and Vanderbilt, 1996兲. Of course, this does
and is included now in every standard first-principles not rule out the possibility of a different local minimum
implementation following the formalism of Hellmann with lower energy with an unrelated structure.
and Feynman 共1939兲 for the forces and Nielsen and Mar- For ferroelectrics, the soft-mode theory of ferroelec-
tin 共1985兲 for stresses. tricity provides a natural conceptual framework for the
The accuracy of density-functional theory for predict- identification of low-symmetry ground-state structures
ing the ground-state structures of ferroelectrics was first and for estimating response functions. The starting point
investigated for the prototypical cases of BaTiO3 and is the identification of a high-symmetry reference struc-
PbTiO3 共Cohen and Krakauer, 1990, 1992; Cohen, 1992兲 ture. For perovskite compounds, this is clearly the cubic
and then extended to a larger class of ferroelectric per- perovskite structure, and for layered perovskites, it is
ovskites 共King-Smith and Vanderbilt, 1994兲. Extensive the nonpolar tetragonal structure. The lattice instabili-
studies of the structures of perovskite oxides and related ties of the reference structure can be readily identified
ferroelectric-oxide structures have since been carried from the first-principles calculation of phonon disper-
out 共Resta, 2003兲. The predictive power of first- sion relations 共Waghmare and Rabe, 1997a; Ghosez et
principles calculations is well illustrated by the results of al., 1999; Sai and Vanderbilt, 2000兲, this being especially
efficient within density-functional perturbation theory. tionals, such as the local-density approximation, the fun-
In simple ferroelectric perovskites, the ground-state damental band gaps of insulators and semiconductors,
structure is obtained to lowest order by freezing in the including perovskite ferroelectrics, are substantially un-
most unstable mode 共a zone-center polar mode兲. This derestimated. While for narrow gap materials the system
picture can still be useful for more complex ground-state may even be erroneously found to be metallic, for wider
structures that involve the freezing in two or more gap systems such as most of the simple ferroelectric per-
coupled modes 共e.g., PbZrO3兲 共Waghmare and Rabe, ovskite compounds considered here, the band gap is still
1997b; Cockayne and Rabe, 2000兲, as well as for identi- nonzero and thus the structural energetics in the vicinity
fying low-energy structures that might be stabilized by of the ground-state structure is unaffected. While this
temperature or pressure 共Stachiotti et al., 2000; Fennie error might be considered to be an insuperable stum-
and Rabe, 2005兲. The polarization induced by the soft bling block to first-principles investigation of electronic
polar mode can be obtained by computation of the Born structure and related properties, there is at present no
effective charges, yielding the mode effective charge. widely available, computationally tractable, alternative
The temperature-dependent frequency of the soft polar 关there are, though, some indications that the use of
mode and its coupling to strain are expected largely to exact-exchange functionals can eliminate much of this
determine the dielectric and piezoelectric response of error 共Piskunov et al., 2004兲; it has long been known that
ferroelectric and near-ferroelectric perovskite oxides; Hartree-Fock, i.e., exact exchange only, leads to overes-
this idea has been the basis of several calculations timates of the gaps兴. The truth is that, as will be dis-
共Cockayne and Rabe, 1998; Garcia and Vanderbilt, cussed further below, these results can, with care, aware-
1998兲. ness of the possible limitations, and judicious use of
Minimization of the total energy can similarly be used experimental input, be used to extract useful informa-
to predict atomic arrangements and formation energies tion about the electronic structure and related proper-
of point defects 共Park and Chadi, 1998; Poykko and ties in individual material systems.
Chadi, 2000; Betsuyaku et al., 2001; Man and Feng, 2002; At present, the computational limitations of full first-
Park, 2003; Robertson, 2003; Astala and Bristowe, 2004兲, principles calculations to 70–100 atoms per supercell
domain walls 共Poykko and Chadi, 2000; Meyer and have stimulated considerable interest in the develop-
Vanderbilt, 2002; He and Vanderbilt, 2003兲, and non- ment and use in simulations of effective models, from
stoichiometric planar defects such as antiphase domain which a subset of the degrees of freedom have been
boundaries 共Suzuki and Fujimoto, 2001; Li et al., 2002兲, integrated out. Interatomic shell-model potentials have
in bulk perovskite oxides. The supercell used must ac- been developed for a number of perovskite-oxide sys-
commodate the defect geometry and generally must tems, eliminating most of the electronic degrees of free-
contain many bulk primitive cells to minimize the inter- dom except for those represented by the shells 共Tinte et
action of a defect with its periodically repeated images. al., 1999; Heifets, Kotonin, and Maier, 2000; Sepliarsky
Thus these calculations are extremely computationally et al., 2004兲. A more dramatic reduction in the number
intensive, and many important questions remain to be of degrees of freedom is performed to obtain effective
addressed. Hamiltonians, in which typically one vector degree of
While much of the essential physics of ferroelectrics freedom decribes the local polar distortion in each unit
arises from the structural energetics, the polarization, cell. This approach has proved useful for describing
and the coupling between them, there has been increas- finite-temperature structural transitions in compounds
ing interest in ferroelectric oxides as electronic and op- and solid solutions 共Zhong et al., 1994; Rabe and Wagh-
tical materials, for which accurate calculations of the gap mare, 1995, 2002; Waghmare and Rabe, 1997a; Bellaiche
and dipole matrix elements are important. Furthermore, et al., 2000兲. To the extent that the parameters appearing
as we shall discuss in detail below, the band structures in these potentials are determined by fitting to selected
enter in an essential way in understanding the charge first-principles results 共e.g., structures, elastic constants,
transfer and dipole layer formation of heterostructures phonons兲, these approaches can be regarded as approxi-
involving ferroelectrics, other insulators, and metals. mate first-principles methods. They allow computation
While density-functional theory provides a rigorous of the polarization as well as of the structural energetics,
foundation only for the computation of Born- but not, however, of the electronic states. Most of the
Oppenheimer ground-state total energies and electronic effort has been focused on BaTiO3, though other per-
charge densities, it is also often used for investigation of ovskites, including PbTiO3 and KNbO3, SrTiO3 and
electronic structure. In the vast majority of density- 共Ba, Sr兲TiO3, and Pb共Zr, Ti兲O3, have been investigated
functional implementations, calculation of the ground- in this way and useful results obtained.
state total energy and charge density involves the com-
putation of a band structure for independent electron B. First-principles investigation of ferroelectric thin films
states in an effective potential, following the work of
Kohn and Sham 共1965兲. This band structure is generally The interest in ferroelectric thin films and superlat-
regarded as a useful guide to the electronic structure of tices lies in the fact that the properties of the system as a
materials, including perovskite and layered perovskite whole can be so different from the individual properties
oxides 共Cohen, 1992; Robertson et al., 1996; Tsai et al., of the constituent material共s兲. Empirically, it has been
2003兲. It should be noted that with approximate func- observed that certain desirable bulk properties, such as a
high dielectric response, can be degraded in thin films, produce a supercell; a few studies have been carried out
while in other investigations there are signs of novel in- with electronic wave-function basis sets that permit the
teresting behavior obtained only in thin-film form. study of an isolated slab. The variables to be specified
Theoretical analysis of the observed properties of thin include the orientation, the number of atomic layers in-
films presents a daunting challenge. It is well known that cluded, choice of termination of the surfaces, and width
the process of thin-film growth itself can lead to non- of vacuum layer separating adjacent slabs. As in the
trivial differences from the bulk material, as observed in first-principles prediction of the bulk crystal structure,
studies of homoepitaxial oxide films such as SrTiO3 choice of a space group for the supercell is usually es-
共Klenov et al., 2004兲. However, as synthetic methods tablished by the initial structure; relaxations following
have developed, the goal of growing nearly ideal, atomi- forces and stresses do not break space-group symme-
cally ordered, single-crystal films and superlattices is tries. The direction of the spontaneous polarization is
coming within reach, and the relevance of first-principles constrained by the choice of space group, allowing com-
results for perfect single-crystal films to experimental parison of unpolarized 共paraelectric兲 films with films po-
observations emerging. larized along the normal or in the plane of the film.
As will be clear from the discussion in the rest of this As we shall see below, in most cases the slabs are very
section, an understanding of characteristic thin-film be- thin 共ten atomic layers or fewer兲. It is possible to relate
havior can best be achieved by detailed quantitative ex- the results to the surface of a semi-infinite system or a
amination of individual systems combined with the con- coherent epitaxial film on a semi-infinite substrate by
struction of models incorporating various aspects of the imposing certain constraints on the structures consid-
physics, from which more general organizing principles ered. In the former case, the atomic positions for inte-
can be identified. In first-principles calculations, there is rior layers are fixed to correspond to the bulk crystal
a freedom to impose constraints on structural param- structure. In the latter, the in-plane lattice parameters of
eters and consider hypothetical structures that goes far the supercell are fixed to the corresponding bulk lattice
beyond anything possible in a real system being studied parameters of the substrate, which is not otherwise ex-
experimentally. This will allow us to isolate and examine plicitly included in the calculation. More sophisticated
various influences on the state of a thin film: epitaxial methods developed to deal with the coupling of vibra-
strain, macroscopic electric fields, surfaces and inter- tional modes at the surface with bulk modes of the sub-
faces, characteristic defects associated with thin-film strate 共Lewis and Rappe, 1996兲 could also be applied to
growth, and “true” finite-size effects, and how they ferroelectric thin films, though this has not yet been
change the atomic arrangements, electronic structure, done.
polarization, vibrational properties, and responses to ap- The local-density approximation underestimate of the
plied fields and stresses. While the main focus of this equilibrium atomic volume will in general also affect
review is on thin films, this approach also applies natu- slab calculations, and similar concerns arise on the cou-
rally to multilayers and superlattices. Extending our dis- pling of strain and the ferroelectric instability. As in the
cussion to include these latter systems will allow us to bulk crystal structure prediction, it may in some cases be
consider the effects of the influencing factors in different appropriate to fix certain structural parameters accord-
combinations, for example, the changing density of in- ing to experimental or bulk information. In the case of
terfaces, the degree of mismatch strain, and the polariza- superlattices and supercells of films on substrates, it may,
tion mismatch. These ideas are also relevant to investi- on the other hand, be a good choice to work consistently
gating the behavior of bulk-layered ferroelectrics, which at the 共compressed兲 theoretical lattice constant since the
can be regarded as natural short-period superlattices. generic underestimate of the atomic volume ensures that
Within this first-principles modeling framework, we the lattice mismatch and relative tensile/compressive
can more clearly identify specific issues and results for strain will be correctly reproduced. This applies, for ex-
investigation and analysis. The focus on modeling is also ample, to the technique mentioned in the previous para-
key to the connection of first-principles results to the graph, in which the effects of epitaxial strain are inves-
extensive literature on phenomenological analysis and tigated by performing slab calculations with an
to experimental observations. This makes the most ef- appropriate constraint on the in-plane lattice param-
fective use of first-principles calculations in developing a eters.
conceptual and quantitative understanding of character- As in first-principles predictions of the bulk crystal
istic thin-film properties, as manifested by thickness de- structure, the initial choice of space group constrains, to
pendence as well as by the dependence on choice of a large extent, the final “ground-state” structure. If the
materials for the film, substrate, and electrodes. supercell is constructed by choosing a bulk termination,
the energy minimization based on forces and stresses
will preserve the initial symmetry, yielding information
1. First-principles methodology for thin films
about surface relaxations of the unreconstructed surface.
The fundamental geometry for the study of thin films, A lower-energy structure might result from breaking ad-
surfaces, and interfaces is that of an infinite single- ditional point or translational symmetries to obtain a
crystalline planar slab. Since three-dimensional period- surface reconstruction. This type of surface reconstruc-
icity is required by most first-principles implementa- tion could be detected by computing the Hessian matrix
tions, in those cases the slab is periodically repeated to 共coupled phonon dispersion and homogeneous strain兲
cation 共Ba or Ti兲 moves inward relative to the oxygen comparison between isolated and periodic slabs is pos-
atoms, as in Fig. 22. While the relaxation energy was sible. It was found that the surface charge and surface
found to be much greater than the ferroelectric double- dipoles of isolated slabs converge rapidly as a function
well depth, the in-plane component of the unit-cell di- of slab thickness and can be used, combined with a value
pole moment was relatively insensitive to the surface of ⑀⬁ taken from the bulk, to extract a spontaneous po-
relaxation, with a modest enhancement at the larization of 0.245 C / m2 共corrected to zero field using
TiO2-terminated surface and a small reduction at the the electronic dielectric constant ⑀⬁ = 2.76兲, compared
BaO-terminated surface. The relative stability of BaO with 0.240 C / m2 from a Berry-phase calculation. This is
and TiO2 terminations was compared and both found to only slightly less than the bulk value of 0.263 C / m2
be stable depending on whether the growth was under taken from experiment. The average surface energy for
Ba-rich or Ti-rich conditions. the two terminations of symmetrically terminated slabs
This investigation was extended by Meyer and is 0.85 eV per surface unit cell. Surface longitudinal dy-
Vanderbilt 共2001兲 to seven-layer and nine-layer polar- namical charges differ considerably from bulk values,
ized slabs with polarization along the normal. The prob- satisfying a sum rule that the dynamical charges at the
lem of the artificial vacuum field in this periodically re- surface planes add up to half of the corresponding bulk
peated slab calculation was addressed by the techniques value 共Ruini et al., 1998兲. Convergence of all quantities
of introducing an external dipole layer in the vacuum with slab and vacuum thickness of periodically repeated
region of the supercell described in Sec. IV.B.1. This slabs was found, in comparision, to be slow, with signifi-
technique can also be used to generate an applied field cant corrections due to the fictitious field in the vacuum
that partially or fully compensates the depolarization 共for polarized slabs兲 and the interaction between slab
field for BaTiO3 slabs. As a function of applied field, the images.
change in structure can be understood as arising from The isolated slab was also the subject of a FLAPW
oppositely directed electrostatic forces on the positively study 共Krcmar and Fu, 2003兲. The symmetric
charged cations and negatively charged anions, leading TiO2-TiO2 共nine-layer兲 and asymmetric TiO2-BaO 共ten-
to corresponding changes in the rumplings of the atomic layer兲 slabs were considered in a paraelectric structure
layers and field-induced increases of the layer dipoles. with a fixed to 4.00 Å and a polar tetragonal structure
Analysis of the internal electric field as a function of the with a and c equal to 4.00 and 4.04 Å, respectively. For
applied field allows determination of whether the slab is
the cubic TiO2-terminated slab, displacements in units of
paraelectric or ferroelectric. The BaO-terminated slab is
c for the surface Ti, surface O, subsurface Ba, and sub-
clearly ferroelectric, with vanishing internal electric field
surface O are −0.021, +0.007, +0.022, and −0.009 c, to be
at an external field of 0.05 a.u. and a polarization of
compared with the results 共Padilla and Vanderbilt, 1997;
22.9 C cm−2, comparable to the bulk spontaneous po-
larization. The ferroelectric instability is suppressed in −0.0389,−0.0163,+0.0131,−0.0062兲 for a periodically re-
peated seven-layer slab with lattice constant 3.94 Å. The
the TiO2-terminated slab, which appears to be margin-
ally paraelectric. tetragonal phase was relaxed to a convergence criterion
The Hartree-Fock method was used by Cora and Cat- of 0.06 eV/ Å on the atomic forces; the rumplings of the
low 共1999兲 and by Fu et al. 共1999兲. Cora and Catlow layers follow overall the same pattern as that reported
共1999兲 performed a detailed analysis of the bonding us- by Meyer and Vanderbilt 共2001兲, with an inward-
ing tight-binding parametrization. For the 7-layer BaO- pointing surface dipole arising from surface relaxation,
terminated slab, the reported displacement of selected though the reduction of the rumpling in the interior is
Ti and O atoms is in good agreement with the results of not as pronounced as for the zero-applied field case by
Padilla and Vanderbilt 共1997兲, and these calculations Meyer and Vanderbilt. The energy difference between
were extended to slabs of up to 15 layers. Fu et al. 共1999兲 the paraelectric and ferroelectric slabs was not reported.
performed Hartree-Fock calculations for slabs of two to With interatomic potentials, it is possible to study ad-
eight atomic layers, with symmetric and asymmetric ter- ditional aspects of surface behavior in BaTiO3 thin films
minations. Using a localized basis set, they were able to and nanocrystals. The most important feature of inter-
perform calculations for isolated slabs as well as periodi- atomic studies of thin films relative to full first-principles
cally repeated slabs. Calculations of the macroscopically calculations is the relative ease of extending the super-
averaged planar charge density, surface energy, and sur- cell in the lateral direction, allowing the formation of
face dynamical charges were reported as a function of 180° domains and molecular dynamics studies of finite-
thickness and termination for a cubic lattice constant of temperature effects. Tinte and Stachiotti 共2001兲 studied
4.006 Å. The relative atomic positions were fixed to their a 15-layer TiO2-terminated slab periodically repeated
bulk tetragonal structure values 共note that this polarized with a vacuum region of 20 Å using interatomic poten-
structure in both isolated and periodic boundary condi- tials that had previously been benchmarked against first-
tions has a very high electrostatic energy and is not the principles surface relaxations and energies 共Tinte and
ground-state structure兲. This would significantly affect Stachiotti, 2000兲. The unconstrained 共stress-free兲 slab is
the comparison of the computed surface properties with found to undergo a series of phase transitions with de-
experiment. In particular, it is presumably responsible creasing temperature, from a paraelectric phase to ferro-
for the high value of the average surface energy re- electric phases, first with polarization in the plane along
ported 共1.69 eV per surface unit cell兲. However, a useful 共100兲, and then along 共110兲. Enhancement of the surface
require a review paper in its own right to cover it fully. treated implicitly by constraining the in-plane lattice
Since we expect the ferroelectric instability in related constant of the supercell to that of bulk SrTiO3. For
systems such as BaTiO3 and PbTiO3 to make the physics each BaTiO3 thickness, the system was relaxed assuming
more, not less, complicated, this suggests that we have a nonpolar state for BaTiO3, and the energy of the bulk-
only scratched the surface in developing a complete un- like tetragonal distortion was computed as a function of
derstanding of the surfaces of perovskite ferroelectrics overall amplitude of the distortion. Above a critical
and the resulting effects on thin-film properties. thickness of six unit cells, this distortion lowered the en-
ergy, demonstrating the development of a ferroelectric
instability. As discussed in Sec. IV.B.5, this finite-size ef-
4. Studies of individual heterostructures
fect can be largely understood by considering the imper-
Now we turn to the description of studies of systems fect screening in the metal layers.
with two or more material components. The main struc- Considerable first-principles effort has been devoted
tural issues are the rearrangements at the interface, the to investigating various aspects of epitaxial ferroelectric
change in electrical and mechanical boundary conditions thin films on Si. As perovskite oxides cannot be grown
felt by each constituent layer, and how these changes directly on Si, an approach developed by McKee and
modify the ferroelectric instability exhibited by the sys- Walker 共McKee et al., 1998, 2001兲 is to include an AO
tem as a whole. This geometry also allows the calcula- buffer layer, which apparently also results in the forma-
tion of band offsets and/or Schottky barriers, crucial in tion of a silicide interface phase. The constituent layers
principle to understanding the electronic behavior of this heterostructure should thus be considered to be
共though with the caveat that the measured Schottky bar- Si/ ASi2 / AO/ ABO3. The full system has not been simu-
rier in real systems is influenced by effects such as oxi- lated directly, but first-principles approaches have been
dation of the electrodes that are not included in the used to investigate individual interfaces. The importance
highly idealized geometries studied theoretically兲. The of relaxations, the additional role of the buffer layer in
current state of knowledge, derived from experimental changing the band offset, and the analysis of electronic
measurements, is described in Sec. III.B.3. structure within the local-density approximation are il-
The first combination we discuss is that of a ferroelec- lustrated by the following.
tric thin film with metallic electrodes. Transition-metal McKee et al. 共2003兲 presented first-principles results
interfaces with nonpolar BaO-terminated layers of for the atomic arrangements and electronic structure in
BaTiO3 were studied by Rao et al. 共1997兲, specifically the Si/ ASi2 / AO system, in conjunction with an experi-
systems of three and seven atomic layers of BaTiO3, mental study. A strong correlation is found between the
with the lattice constant set to the bulk value of 4.00Å, valence-band offset and the dipole associated with the
combined with top and bottom monolayers of Ta, W, Ir, A-O bond linking the A atom in the silicide to the O
and Pt representing the electrodes. The preferred ab- atom in the oxide, shown in Fig. 25. It is thus seen that
sorption site for the metal atoms was found to be above the structural rearrangements in the interface are a key
the O site, with calculated metal-oxygen distances rang- determining factor in the band offset.
ing from 2.05 Å for Ta to 2.11 Å for Pt. The BaTiO3 A detailed examination of the interface between the
slabs were assumed to retain their ideal cubic structure. perovskite oxide and the alkaline-oxide buffer layer,
Analysis of the partial density of states of the hetero- specifically BaO/ BaTiO3 and SrO/ SrTiO3, was carried
structure shows that the Pt and Ir Fermi energies lie in out by Junquera et al. 共2003兲. A periodic 1 ⫻ 1 ⫻ 16 su-
the gap of the BaTiO3 layer at 0.94 and 0.64 eV, respec- percell was chosen with stacking of 共001兲 atomic layers:
tively, above the top of the valence band 共this is, fortu- 共AO兲n − 共AO − TiO2兲m, with n = 6 and m = 5. Two mirror-
nately, smaller than the underestimated computed gap symmetry planes were fixed on the central AO and BO2
of 1.22 eV for the BaTiO3 slab兲. Using the experimental layers, and the in-plane lattice constant chosen for per-
gap of 3.13 eV, a Schottky barrier height of 2.19 eV for fect matching to the computed local-density approxima-
Pt and 2.49 eV for Ir is thus obtained. Experimentally, tion lattice constant of Si 共this epitaxial strain constraint
however, the Schottky barrier is known to be substan- is the only effect of the Si substrate included in the cal-
tially lower for Ir than for Pt, illustrating the limitations culation兲. Relaxations within the highest-symmetry te-
mentioned in the previous paragraph. tragonal space group consistent with this supercell were
Robertson and Chen 共1999兲 combined first-principles performed. Analysis of the partial density of states
calculations of the charge neutrality levels with experi- showed no interface-induced gap states. The main effect
mental values of the band gap, electronic dielectric con- observed for relaxations was to control the size of the
stant ⑀⬁, the electron affinity, and the empirical param- interface dipole, which in turn was found to control the
eter S, described in Sec. III.B.3. Values for SrTiO3 and band offsets, shown here in Fig. 26.
PZT were reported for Pt, Au, Ti, Al, and the conduc- As in the studies described above, the conduction-
tion and valence bands of Si. band offset is obtained from the computed valence-band
To explore how the electrodes affect the ferroelectric offset using the bulk experimental band gap. These re-
instability of the film, Junquera and Ghosez 共2003兲 con- sults were combined with offsets reported for other rel-
sidered a supercell of five unit cells of metallic SrRuO3 evant interfaces to estimate band alignments for
and 2–10 unit cells of BaTiO3, with a SrO/ TiO2 interface Si/ SrO/ SrTiO3 / Pt and Si/ BaO/ BaTiO3 / SrRuO3 het-
between SrRuO3 and BaTiO3. A SrTiO3 substrate was erostructures, confirming that the AO layer introduces
FIG. 26. Schematic representation of the valence-band offset 共VBO兲 and the conduction-band offset 共CBO兲 for 共a兲 BaO/ BaTiO3
expt
and 共b兲 SrO/ SrTiO3 interfaces. Ev, Ec, and Egap stand for the top of the valence band, the bottom of the conduction band, and the
experimental band gap, respectively. Values for Ev, measured with respect to the average of the electrostatic potential in each
material, are indicated. The solid curve represents the profile of the macroscopic average of the total electrostatic potential across
the interface. ⌬V stands for the resulting lineup. The in-plane lattice constant was set equal to the theoretical value of Si 共5.389兲.
The size of the supercell corresponds to n = 6 and m = 5. From Junquera et al., 2003.
approach could be useful, but in practice it has been parameters for use in calculations such as those by
found to be surprisingly successful. Speck and Pompe 共1994兲, Alpay and Roytburd 共1998兲,
One simple application of this approach has been Bratkovsky and Levanyk 共2001兲, and Li, Akhadov, et al.
used to predict and analyze the strain in nonpolar thin 共2003兲. The effects of inhomogeneous strain due to misfit
films and multilayers. In the construction of the refer- dislocations that provide elastic relaxation in thicker
ence structure for the AO / ABO3 interfaces by Junquera films have also been argued to be significant.
et al. 共2003兲, macroscopic modeling of the structure with Next we consider the application of these “con-
bulk elastic constants for the constituent layers yielded tinuum” models to analyzing structures in which the
accurate estimates for the lattice constants along the macroscopic field is allowed to be nonzero. Macroscopic
normal direction. In cases of large lattice mismatch, very electrostatics is applied to the systems of interest by a
high strains can be obtained in very thin films and non- coarse graining over a lattice-constant-scale window to
linear contributions to the elastic energy can become yield a value for the local macroscopic electric potential.
important. These can be computed with a slightly more Despite the fact that this is not strictly within the regime
sophisticated though still very easy-to-implement of validity of the classical theory of macroscopic electro-
method that has been developed to study the effects of statics, which requires slow variation over many lattice
epitaixial strain more generally on the structure and constants, this analysis turns out to be remarkably useful
properties of a particular material, described next. for first-principles results. In the simplest example, the
As is discussed in Sec. V, the effects of epitaxial strain polarization of a polar BaTiO3 slab 共periodically re-
in ultrathin films and heterostructures have been identi- peated in a supercell with vacuum兲 is accurately repro-
fied as a major factor in determining polarization-related duced using bulk values for the bulk spontaneous polar-
properties, and have been the subject of intense interest ization and electronic dielectric constant even for slabs
in both phenomenological and first-principles modeling. as thin as two lattice constants 共Junquera and Rabe,
In particular, for ferroelectric perovskite oxides it has 2005兲.
long been known that there is a strong coupling between We have already mentioned in the previous section
strain 共e.g., pressure-induced兲 and the ferroelectric insta- that perpendicular 共to the surface兲 polarization can lead
bility, as reflected by the frequency of the soft mode and to a nonzero macroscopic field that opposes the polar-
the transition temperature. In both phenomenological ization 共the depolarizing field兲. Unless compensated by
and first-principles studies, it has become common to fields from electrodes or applied fields, this strongly de-
study the effects of epitaxial strain induced by the sub- stabilizes the polarized state. In systems with two or
strate by studying the structural energetics of the more distinct constituent layers, this condition in the ab-
strained bulk. Specifically, two of the lattice vectors of a ជ = 0. For ex-
sence of free charge favors states with · P
bulk crystal are constrained to match the substrate and
ample, in the first-principles calculations of short-period
other structural degrees of freedom are allowed to relax,
as described in the previous paragraph. In most cases, BaTiO3 / SrTiO3 superlattices, the local polarization
these calculations are performed for zero macroscopic along 关001兴 is found to be quite uniform in the two layers
electric field, as would be the case for a film with perfect 共Neaton and Rabe, 2003; Johnston, Huang, et al., 2005兲,
short-circuited electrodes. Indeed, it is often the case though the in-plane component can be very different
共Pertsev et al., 1998; Junquera et al., 2003; Neaton and 共Johnston, Huang, et al., 2005兲. To the extent that lay-
Rabe, 2003兲 that the strain effect is considered to be the ered ferroelectrics such as SBT can be treated in this
dominant effect of the substrate, which is otherwise not macroscopic framework, one similarly expects that po-
included 共thus greatly simplifying the calculation兲. At larization along c will not tend to be energetically fa-
zero temperature, the sequence of phases and phase vored since the layers separating the polarized perovs-
boundaries can be readily identified as a function of in- kitelike layers typically have low polarizability 共Fennie
plane strain directly through total-energy calculations of and Rabe, 2005兲. This observation provides a theoretical
the relaxed structure subject to the appropriate con- framework for evaluating claims of large ferroelectric
straints. Atomic-scale information can be obtained for polarization along c in layered compounds 共Chon et al.,
the precise atomic positions, band structure, phonon fre- 2002兲; unless there is an unusually high polarizability for
quencies, and eigenvectors. The temperature axis in the the nonperovskite layers, or a strong competing contri-
phase diagram can be included by using effective Hamil- bution to the energy due, for example, to the interfaces
tonian 共or interatomic potential兲 simulations. Results for to help stabilize a high c polarization, other reasons for
selected perovskite oxides are discussed in Sec. V; a the observations need to be considered 共Garg et al.,
similar analysis was reported for TiO2 or by Montanari 2003兲.
and Harrison 共2004兲. These considerations become particularly important
This modeling is based on the assumption that the for ultrathin films with metal electrodes. The limiting
layer stays in a single-domain state. As discussed in Sec. case of complete screening of the depolarizing field by
V, the possibility of strain relaxation through formation perfect electrodes is never realized in real thin-film sys-
of multidomain structures must be allowed for. While tems. The screening charge in real metal electrodes is
this cannot be readily done directly in first-principles spread over a characteristic screening length and is asso-
calculations, first-principles data on structural energetics ciated with a voltage drop in the electrode. For thick
for large misfit strains could be used to refine Landau films, this can be neglected, but the relative size of the
voltage drop increases as the film thickness decreases. Electronic states associated with surfaces and inter-
This has been identified as a dominant contribution to faces will also contribute to determining the equilibrium
the relation between the applied field and the true field configuration of electric fields and polarizations. In the
in the film for the thinnest films 共Dawber, Chandra, et simple example of periodically repeated slabs separated
al., 2003兲. One way this shows up is in the thickness by vacuum, as the slab gets thicker, a breakdown is ex-
dependence of the apparent coercive field; it is found pected where the conduction-band minimum on one sur-
that the true coercive field scales uniformly down to the face of the slab falls below the valence-band maximum
thinnest films. Effects are also expected on the structure on the other. In this case, charge will be transferred
and polarization. While films with partial compensation across the slab with the equilibrium charge 共for fixed
of the depolarization field may still exhibit a ferroelec- atomic positions兲 being determined by a combination of
tric instability, the polarization and the energy gain rela- the macroscopic electrostatic energy and the single-
tive to the nonpolar state are expected to decrease. This particle density of states. This tends partially to screen
simple model was developed and successfully used by the depolarization field. The role of interface states in
Junquera and Ghosez 共2003兲 to describe the thickness screening the depolarization field in the film has been
dependence of the ferroelectric instability in a BaTiO3 discussed in a model for BaTiO3 on Ge 共Reiner et al.,
film between SrRuO3 electrodes. This analysis identified 2004兲. The presence of surface and interface states can
be established by examination of the band structure and
the thickness dependence of the residual depolarization
partial density of states, as discussed in the previous sec-
field as the principal source of thickness dependence in
tion.
this case. Lichtensteiger et al. 共2005兲 suggest that the re-
Finally, we turn our attention to an analysis of what
duction of the uniform polarization by the residual field
the discussion above tells us about finite-size effects in
and its coupling to tetragonal strain is the cause of the
ferroelectric thin films. We have seen that many factors
decrease in tetragonality with decreasing thickness of
contribute to the thickness dependence of the ferroelec-
PbTiO3 ultrathin films. tric instability: the thickness dependence of the depolar-
It is well known that 180° domain formation provides ization field, the gradual relaxation of the in-plane lat-
an effective mechanism for compensating the depolar- tice constant from full coherence with the substrate to its
ization field, and is expected to be favored when the bulk value, and the changing weight of the influence of
screening available from electrodes is poor or nonexist- surfaces and interfaces. The “true” finite-size effect, i.e.,
ent 关for example, on an insulating substrate 共Streiffer et the modification of the collective ferroelectric instability
al., 2002兲兴. Instability to domain formation is discussed due to the removal of material in the film relative to the
by Bratkovsky and Levanyuk 共2000兲 as the result of a infinite bulk, could possibly be disentangled from the
nonzero residual depolarization field due to the pres- other factors by a carefully designed first-principles cal-
ence of a passive layer. Similarly, a phase transition from culation, but this has not yet been done. We speculate
a uniform polarized state to a 180° domain state with that this effect does not universally act to suppress fer-
zero net polarization is expected to occur with decreas- roelectricity, but could, depending on the material, en-
ing thickness 共Junquera et al., 2003兲. hance ferroelectricity 共Ghosez and Rabe, 2000兲.
Despite the usefulness of macroscopic models, it
should not be forgotten that they are being applied far
outside the regime of their formal validity 共i.e., length 6. Challenges for first-principles modeling
scales of many lattice constants兲 and that atomistic ef- First-principles calculations have advanced tremen-
fects can be expected to play an important role, espe- dously in the last decade, to the point where systems of
cially at the surfaces and interfaces. The structural ener- substantial chemical and structural complexity can be
getics could be substantially altered by relaxations and addressed, and a meaningful dialog opened up between
reconstructions 共atomic rearrangements兲 at the surfaces experimentalists and theorists. With these successes the
and interfaces. These relaxations and reconstructions bar gets set ever higher, and the push is now to make the
are also expected to couple to the polarization 共Meyer theory of ferroelectrics truly realistic. The highest long-
and Vanderbilt, 2001; Bungaro and Rabe, 2005兲 with the term priorities include making finite-temperature calcu-
possibility of either enhancing or suppressing the switch- lations routine, proper treatment of the effects of defects
able polarization. The surfaces and the interfaces will and surfaces, and the description of structure and dy-
also be primarily responsible for the asymmetry in en- namics on longer length and time scales. In addition,
ergy between up and down directions for the polariza- there are specific issues that have been raised that may
tion. For ultrathin films, the surface and interface energy be addressable in the shorter term through the interac-
can be important enough to dominate over elastic en- tion of theory and experiment, and the rest of this sec-
ergy, leading to a possible tradeoff between lattice tion will highlight some of these.
matching and atomic-scale matching for favorable bond- Many applications depend on the stability of films
ing at the interface. These surface and interface energies with a uniform switchable polarization along the film
could even be large enough to stabilize nonbulk phases normal. This stability depends critically on compensa-
with potentially improved properties. This should be es- tion of the depolarization field. Understanding and con-
pecially significant for interfaces between unlike materi- trolling the compensation mechanism共s兲 are thus the
als. subjects of intense current research interest. There are
two main classes of mechanism: compensation by “free” as a whole rather than via a domain-wall mechanism has
charges 共in electrodes/substrate or applied fields兲 and been raised for ultrathin films of PVDF 共Bune et al.,
compensation by the formation of polarization domains. 1998兲, while a different interpretation has been offered
On insulating substrates, this latter alternative has been by Dawber, Chandra, et al. 共2003兲. Some progress has
observed and characterized in ultrathin films 共Streiffer et been made using interatomic potentials for idealized
al., 2002; Fong et al., 2004兲. It has been proposed that defect-free films, though real systems certainly are af-
domain formation occurs in films on conducting sub- fected by defects responsible for such phenomena as im-
strates at very low thicknesses as well as where the print and fatigue. Ongoing comparison of characteristics
finite-screening length in realistic electrodes inhibits that such as coercive fields, time scales, material sensitivity,
mechanism of compensation 共Junquera et al., 2003兲. The and thickness dependence of domain-wall nucleation,
critical thickness for this instability depends on the formation energy, and motion with experimental studies
domain-wall energy. This is expected to be different in promises that at least some of these issues will soon be
thin films than in bulk, one factor being that the bulk better understood.
atomic plane shifts across the domain walls. To conclude this section, we emphasize that it is not
Compensation of the depolarization field by free very realistic to expect first-principles calculations quan-
charges appears to be the dominant mechanism in films titatively to predict all aspects of the behavior of chemi-
on conducting substrates 共even relatively poor conduc- cally and structurally complex systems such as ferroelec-
tors兲 with or without a top electrode. In the latter case tric thin films, although successful predictions should
there must be free charge on the surface; the challenge is continue to become increasingly possible and frequent.
to understand how the charge is stabilized. There are Rather, the quantitative microscopic information and
also unresolved questions about how the charge is dis- the development of a useful conceptual framework con-
tributed at the substrate-film interface and how this tribute in a close interaction with experiment to build an
couples to local atomic rearrangements. Asymmetry of understanding of known phenomena and to propel the
the compensation mechanism may prove to be a signifi- field into exciting new directions.
cant contribution to the overall up-down asymmetry in
the film discussed in the previous section. A better un- V. STRAIN EFFECTS
derstanding could lead to the identification of system
configurations with more complete compensation and Macroscopic strain is an important factor in determin-
thus an enhancement of stability. ing the structure and behavior of very thin ferroelectric
The study of the behavior of ferroelectrics in applied films. The primary origin of homogeneous film strain is
electric fields also promises progress in the relatively lattice mismatch between the film and the substrate. In
near future. Recently, with the solution of long-standing addition, defects characteristic of thin films can produce
questions of principle, it has become possible to perform inhomogeneous strains that can affect the properties of
density-functional-theory calculations for crystalline sol- thicker relaxed films of technological relevance. Because
ids in finite electric fields 共Souza et al., 2002兲. In ferro- of the strong coupling of both homogeneous and inho-
electrics, this allows the investigation of nonlinearities in mogeneous strains to polarization, these strains have a
structure and polarization at fields relevant to experi- substantial impact on the structure, ferroelectric transi-
ments and the possibility of more accurate modeling of tion temperatures, and related properties such as the di-
constituent layers of thin-film and superlattice systems electric and piezoelectric responses, which has been the
subject to nonzero fields. It is also of interest to ask what subject of extensive experimental and theoretical inves-
the intrinsic breakdown field would be in the absence of tigation.
defects, though the question is rather academic with re- The largest effects are expected in coherent epitaxial
spect to real systems. films. These films are sufficiently thin that the areal elas-
The nonzero conductivity of real ferroelectrics be- tic energy density for straining the film to match the
comes particularly important for thinner films, since a substrate at the interface is less than the energy cost for
higher concentration of free carriers is expected to be introducing misfit dislocations to relax the lattice param-
associated with characteristic defects in the film, and eters back towards their unconstrained equilibrium val-
also because a given concentration of free carriers will ues. 关We note that for ultrathin films, the relaxed in-
have a more significant impact as thickness decreases. plane lattice constant will not in general be the same as
Free carriers can at least partially screen macroscopic the bulk lattice constant, and the former is more appro-
electric fields. At the macroscopic level, the concepts of priate for computing lattice mismatch 共Rabe, 2005兲兴.
band bending and space charge arising in semiconductor Very high homogeneous strains, of the order of 2%, are
physics can be applied to thin-film ferroelectrics, while a achievable. For example, barium titanate 共BTO兲 films on
correct atomic-scale treatment of these effects could be strontium titanate 共STO兲, with a bulk mismatch of 2.2%,
important to describing the behavior of ultrathin films. remain coherent in equilibrium up to a critical thickness
The physics of switching presents a significant chal- of 2–4 nm 共Sun et al., 2004兲. With low-temperature
lenge, requiring description of structure and dynamics growth techniques, the formation of misfit dislocations is
on long length and time scales. The questions of what kinetically inhibited and coherent films can be grown to
changes, if any, occur in switching as films become thin- thicknesses of two to three times the critical thickness
ner continue to be debated. The possibility of switching 共Choi et al., 2004兲. Even these films, however, are much
theory is required to describe the crystallization pro- out by Szafraniak et al. 共2003兲. Ruediger et al. 共2004兲
cesses which occur at quite high temperatures. An ex- have recently reviewed size effects in ferroelectric nano-
tension of the theory to finite temperatures has been crystals.
carried out by Williams and co-workers 共Williams et al., Although there is potential to produce self-patterned
2000; Rudd et al., 2003兲. The chief result of this theory is arrays with greater registration by better choice of ma-
the prediction of three different kinds of structures terials and processing conditions, our general conclusion
共pyramids, domes, and superdomes兲, a volume distribu- is that highly registered memory arrays will not occur
tion for a particular species of structure, and a shape spontaneously in the absence of a prepatterned field.
map to describe relative populations of structures as a
function of coverage and crystallization temperature. D. Nonplanar geometries: ferroelectric nanotubes
One interesting result from the experiments is that
similar-shaped structures are observed in both the Almost all recent work on ferroelectric-oxide films
Volmer-Weber and Stranski-Krastanow growth modes, has involved planar geometries. However, both from a
but on different size scales. In the work of Williams the device engineering point of view and from theoretical
thickness above which dome populations occur is of the considerations, it is now appropriate to analyze carefully
order of 4–5 monolayers, corresponding to the critical nonplanar geometries, especially nanotubes.
thickness for misfit dislocations for Ge on Si共100兲. On Nanotubes made of oxide insulators have a variety of
the other hand, Capellini et al. 共1997兲 studied via atomic applications for pyroelectric detectors, piezoelectric ink-
force microscopy the growth of Ge on Si共100兲 in the jet printers, and memory capacitors that cannot be filled
Stanski-Krastanow growth mode and found a much by other nanotubes 共Herzog and Kattner, 1985; Gnade et
larger critical structure height of 50 nm at which dislo- al., 2000; Averdung et al., 2001; Sakamaki et al., 2001;
cations were introduced and the structures changed Sajeev and Busch, 2002兲. In the drive for increased stor-
from being pyramidal in geometry to domelike. The age density in FRAM and DRAM devices, complicated
large increase in critical thickness is due to a substantial
part of the misfit strain being taken up by the substrate
in the Stranski-Krastanow growth mode, as described by
Eaglesham and Cerrulo 共1990兲. The description of self-
patterned ferroelectric nanocrystals by the models of
Schukin and Williams has recently been undertaken by
Dawber, Szafraniak, et al. 共2003兲.
Prior to this two groups have grown PbTiO3 nanocrys-
tals on Pt/ Si共111兲 substrates to measure size effects in
ferroelectricity 共Roelofs et al., 2003; Shimizu et al., 2004兲.
These works both show a lack of piezoresponse in struc-
tures below 20 nm in lateral size 共Fig. 36兲, though we
expect that this is connected to mechanical constraints
rather than any fundamental limiting size for ferroelec-
tric systems. Chu et al. 共2004兲 have highlighted the role
that misfit dislocations can play in hampering ferroelec-
tricity in small structures. Interestingly in the work of
Roelofs et al. 共2003兲 and Shimizu et al. 共2004兲 because of
the 共111兲 orientation of their substrates, instead of
square-based pyramids they obtain triangular-based
structures that display hexagonal rather than cubic reg- FIG. 36. 共a兲 Topographic image of grains from 100 to 20 nm in
istration 关an analogous result is observed when Ge is lateral size. 共b兲 Piezoresponse image of same grains showing
grown on Si共111兲; Capellini et al., 1999兴. The growth and the absence of piezoresponse for grains below 20 nm. From
analysis of PZT nanocrystals on SrTiO3 has been carried Roelofs et al., 2003.
Bungaro, C., and K. M. Rabe, 2005, Phys. Rev. B 71, 035420. Dawber, M., J. F. Scott, and A. J. Hartmann, 2001, J. Eur.
Canedy, C. L., H. Li, S. P. Alpay, L. Salamanca-Riba, A. L. Ceram. Soc. 21, 1633.
Roytburd, and R. Ramesh, 2000, Appl. Phys. Lett. 77, 1695. Dawber, M., I. Szafraniak, M. Alexe, and J. F. Scott, 2003, J.
Capellini, G., L. Di Gaspare, and F. Evangelisti, 1997, Appl. Phys.: Condens. Matter 15, L667.
Phys. Lett. 70, 493. de Araujo, C. A.-Paz, J. D. Cuchiaro, L. D. McMillan, M. C.
Capellini, G., N. Motta, A. Sgarlata, and R. Calarco, 1999, Scott, and J. F. Scott, 1995, Nature 共London兲 374, 627.
Solid State Commun. 112, 145. de Gironcoli, S., S. Baroni, and R. Resta, 1989, Phys. Rev. Lett.
Castell, M. R., 2002, Surf. Sci. 505, 1. 62, 2853.
Chalamala, B. R., Y. Wei, R. H. Reuss, S. Aggarwal, B. E. Dekker, A. J., 1954, Phys. Rev. 94, 1179.
Gnade, R. Ramesh, J. M. Bernhard, E. D. Sosa, and D. E. Democritov, S. O., and N. M. Kreines, 1988, JETP Lett. 48,
Golden 1999, Appl. Phys. Lett. 74, 1394. 294.
Chan, N.-H., R. K. Sharma, and D. M. Smyth, 1976, J. Elec- Dieguez, O., S. Tinte, A. Antons, C. Bungaro, J. B. Neaton, K.
trochem. Soc. 123, 1584. M. Rabe, and D. Vanderbilt, 2004, Phys. Rev. B 69, 212101.
Chan, N.-H., R. K. Sharma, and D. M. Smyth, 1981, J. Am. Dietz, G. W., M. Schumacher, R. Waser, S. K. Streiffer, C.
Ceram. Soc. 64, 556. Basceri, and A. I. Kingon, 1997, J. Appl. Phys. 82, 2359.
Chen, H.-M., S.-W. Tsaur, and Y.-M. Lee J., 1998, Jpn. J. Appl. Dietz, G. W., and R. Waser, 1995, Integr. Ferroelectr. 9, 317.
Phys., Part 1 137, 4056. Dietz, G. W., and R. Waser, 1997, Thin Solid Films 299, 53.
Chen, L., V. Nagarajan, R. Ramesh, and A. L. Roytburd, 2003, Dimos, D., W. L. Warren, M. B. Sinclair, B. A. Tuttle, and R.
J. Appl. Phys. 94, 5147. W. Schwartz, 1994, J. Appl. Phys. 76 4305.
Cheon, C. I., K. Y. Yun, J. S. Kim, and J. H. Kim, 2001, Integr. Do, D-H., P. G. Evans, E. D. Issacs, D. M. Kim, C. B. Eom,
Ferroelectr. 34, 1513. and E. M. Dufresne, 2004, Nat. Mater. 3, 365.
Choi, K. J., M. Biegalski, Y. L. Li, A. Sharan, J. Schubert, R. Dovesi, R., R. Orlando, B. Civalleri, C. Roetti, V. R. Saunders,
Uecker, P. Reiche, Y. B. Chen, X. Q. Pan, V. Gopalan, L.-Q. and C. M. Zichovich-Wilson, 2005, Z. Kristallogr. 220, 571.
Chen, D. G. Schlom, and C. B. Eom, 2004, Science 306, 1005. Du, X., and I. W. Chen, 1998a, J. Appl. Phys. 83, 7789.
Choi, K.-J., W.-C. Shin, and S.-G. Yoon, 2001, Integr. Ferro- Du, X., and I. W. Chen, 1998b, in Ferroelectric Thin Films VI,
electr. 34, 1541. edited by R. E. Treece et al., MRS Symposia Proceedings No.
Chon, U., H. M. Jang, M. G. Kim, and C. H. Chang, 2002, 493 共Materials Research Society, Pittsburgh兲, p. 311.
Phys. Rev. Lett. 89, 087601. Ducharme, S., V. M. Fridkin, A. V. Bune, S. P. Palto, L. M.
Christen, H.-M., L. A. Boatner, J. D. Budai, M. F. Chisholm, L. Blinov, N. N. Petukhova, and S. G. Yudin, 2000, Phys. Rev.
A. Ga, P. J. Marrero, and D. P. Norton, 1996, Appl. Phys. Lett. 84, 175.
Lett. 68, 1488. Duiker, H. M., 1990, Ph.D. thesis 共University of Colorado兲.
Chu, M.-W., I. Szafraniak, R. Scholz, C. Harnagea, D. Hesse, Duiker, H. M., and P. D. Beale, 1990, Phys. Rev. B 41, 490.
M. Alexe, and U. Gosele, 2004, Nat. Mater. 3, 87. Duiker, H. M., P. D. Beale, J. F. Scott, C. A. Paz de Araujo, B.
Cockayne, E., and K. M. Rabe, 1998, in First-Principles Calcu- M. Melnick, and J. D. Cuchario, 1990, J. Appl. Phys. 68, 5783.
lations for Ferroelectrics, edited by R. E. Cohen, AIP Conf. Eaglesham, D. J., and M. Cerullo, 1990, Phys. Rev. Lett. 64,
Proc. No. 436 共AIP, Woodbury, NY兲, p. 61. 1943.
Cockayne, E., and K. M. Rabe, 2000, J. Phys.: Condens. Matter Ebenezer, D. D., and P. Abraham, 2002, Curr. Sci. 83, 981.
61, 305. Ebenezer, D. D., and R. Ramesh, 2003, Curr. Sci. 85, 1173.
Cohen, R. E., 1992, Nature 共London兲 358, 136. Erdman, N., K. R. Poeppelmeier, M. Asta, O. Warschkow, D.
Cohen, R. E., 1996, J. Phys. Chem. Solids 57, 1393. E. Ellis, and L. D. Marks, 2002, Nature 共London兲 419, 55.
Cohen, R. E., 1997, Ferroelectrics 194, 323. Evans, J., 1990.
Cohen, R. E., and H. Krakauer, 1990, Phys. Rev. B 42, 6416. Fatuzzo, E., and W. J. Merz, 1967, Ferroelectricity 共North-
Cohen, R. E., and H. Krakauer, 1992, Ferroelectrics 136, 65. Holland, Amsterdam兲.
Colla, E. L., S. Hong, D. V. Taylor, A. K. Tagantsev, and N. Fennie, C. J., and K. M. Rabe, 2005, Phys. Rev. B 71, 100102.
Setter, 1998, Appl. Phys. Lett. 72, 2763. Feynman, R. P., 1939, Phys. Rev. 56, 340.
Conley, J. W., and G. D. Mahan, 1967, Phys. Rev. 161, 681. Fiebig, M., T. Lottermoser, D. Frohlich, A. V. Goltsev, and R.
Cora, F., and C.R. A. Catlow, 1999, Faraday Discuss. 114, 421. V. Pisarev, 2002, Nature 共London兲 419, 818.
Cowley, A. M., and S. M. Sze, 1965, J. Appl. Phys. 36, 3212. Floquet, N., and C. Valot, 1999, Ferroelectrics 234, 107.
Damjanovic, D., 1997, Phys. Rev. B 55, R649. Floquet, N., C. M. Valot, M. T. Mesnier, J. C. Niepce, L. Nor-
Dawber, M., P. Chandra, P. B. Littlewood, and J. F. Scott, 2003, mand, A. Thorel, and R. Kilaas, 1997, J. Phys. III 7, 1105.
J. Phys.: Condens. Matter 15, L393. Foeth, M., A. Sfera, P. Stadelmann, and P-A. Buffat, 1999, J.
Dawber, M., I. Farnan, and J. F. Scott, 2003, Am. J. Phys. 71, Electron Microsc. 48, 717.
819. Fong, D. D., G. B. Stephenson, S. K. Streiffer, J. A. Eastman,
Dawber, M., C. Lichtensteiger, M. Cantoni, M. Veithen, P. O. Auciello, P. H. Fuoss, and C. Thompson, 2004, Science
Ghosez, K. Johnston, K. M. Rabe, and J.-M. Triscone, 2005, 304, 1650.
Phys. Rev. Lett. 共to be published兲. Forlani, F., and N. Minnaja, 1964, Phys. Status Solidi 4, 311.
Dawber, M., and J. F. Scott, 2000, Appl. Phys. Lett. 76, 1060; Fouskova, A., 1965, J. Phys. Soc. Jpn. 20, 1625.
2000, Appl. Phys. Lett. 76, 3655. Fouskova, A., and V. Janousek, 1965, J. Phys. Soc. Jpn. 20,
Dawber, M., and J. F. Scott, 2001, Integr. Ferroelectr. 38, 161. 1619.
Dawber, M., and J. F. Scott, 2002, Jpn. J. Appl. Phys., Part 1 41, Fox, D. L., D. R. Tilley, J. F. Scott, and H. J. Guggenheim,
6848. 1980, Phys. Rev. B 21, 2926.
Dawber, M., and J. F. Scott, 2004, J. Phys.: Condens. Matter 16, Fox, G. R., 1995, J. Mater. Sci. Lett. 14, 1496.
L515. Fu, H., and L. Bellaiche, 2003, Phys. Rev. Lett. 91, 257601.
Fu, H. X., and R. E. Cohen, 2000, Nature 共London兲 403, 281. Herzog, K., and E. Kattner, 1985, U.S. Patent No. 4504845 共12
Fu, L., E. Yaschenko, L. Resca, and R. Resta, 1999, Phys. Rev. March兲.
B 60, 2697. Hill, N. A., 2000, J. Phys. Chem. B 104, 6694.
Ganpule, C. S., V. Nagarajan, H. Li, A. S. Ogale, D. E. Stein- Huffmann, M., 1995, Integr. Ferroelectr. 10, 39.
hauser, S. Aggarwal, E. Williams, R. Ramesh, and P. De Wolf, Hwang, C. S., 1998, Mater. Sci. Eng., B 56, 178.
2000, Appl. Phys. Lett. 77, 292. Hwang, C. S., B. T. Lee, H.-J. Cho, K. H. Lee, C. S. Kang, H.
Ganpule, C. S., V. Nagarajan, S. B. Ogale, A. L. Roytburd, E. Horii, S. I. Lee, and M. Y. Lee, 1997, Appl. Phys. Lett. 71,
D. Williams, and R. Ramesh, 2000, Appl. Phys. Lett. 77, 3275. 371.
Ganpule, C. S., A. L. Roytburd, V. Nagarajan, B. K. Hill, S. B. Hwang, C. S., B. T. Lee, C. S. Kang, J. W. Kim, K. H. Lee, H.-J.
Ogale, E. D. Williams, R. Ramesh, and J. F. Scott, 2001, Phys. Cho, H. Horii, W. D. Kim, S. I. Lee, Y. B. Roh, and M. Y.
Rev. B 65, 014101. Lee, 1998, J. Appl. Phys. 83, 3703.
Garcia, A., and D. Vanderbilt, 1996, Phys. Rev. B 54, 3817. Ishibashi, Y., N. Ohashi, and T. Tsurumi, 2000, Jpn. J. Appl.
Garcia, A., and D. Vanderbilt, 1998, Appl. Phys. Lett. 72, 2981. Phys., Part 1 39, 186.
Garg, A., Z. H. Barber, M. Dawber, J. F. Scott, A. Snedden, Ishiwara, H., 1993, Jpn. J. Appl. Phys., Part 1 32, 442.
and P. Lightfoot, 2003, Appl. Phys. Lett. 83, 2414. Ishiwara, H., 2001, Integr. Ferroelectr. 34, 1451.
Gerson, R., and T. C. Marshall, 1959, J. Appl. Phys. 30, 1650. Ishiwara, H., T. Shimamura, and E. Tokumitsu, 1997, Jpn. J.
Ghosez, P., E. Cockayne, U. V. Waghmare, and K. M. Rabe, Appl. Phys., Part 1 36, 1655.
1999, Phys. Rev. B 60, 836. Izumi, M., Y. Murakami, Y. Konishi, T. Manako, M. Kawasaki,
Ghosez, P., and K. M. Rabe, 2000, Appl. Phys. Lett. 76, 2767. and Y. Tokura, 1999, Phys. Rev. B 60, 1211.
Gnade, B., et. al, 2000, U.S. Patent No. US6033919 共7 March兲. Jaffe, B., W. R. Cook, and H. Jaffe, 1971, Piezoelectric Ceram-
Gonze, X., J.-M. Beuken, R. Caracas, F. Detraux, M. Fuchs, ics 共Academic, London兲.
G.-M. Rignanese, L. Sindic, M. Verstraete, G. Zerah, F. Jol- Janovec, V., 1958, Czech. J. Phys., Sect. A 8, 3.
let, M. Torrent, A. Roy, M. Mikami, Ph. Ghosez, J.-Y. Raty, Jiang, A. Q., J. F. Scott, H. Lu, and Z. Chen, 2003, J. Appl.
and D. C. Allan, 2002, Comput. Mater. Sci. 25, 478. http:// Phys. 93, 1180.
www.mapr.ucl.ac.be/ABINIT Jiang, J. C., X. Q. Pan, W. Tian, C. D. Theis, and D. G. Schlom,
Gorbenko, O. Y., S. V. Samoilenkov, I. E. Graboy, and A. R. 1999, Appl. Phys. Lett. 74, 2851.
Kaul, 2002, Chem. Mater. 14, 4026. Johnston, K., M. R. Castell, A. T. Paxton, and M. W. Finnis,
2004, Phys. Rev. B 70, 085415.
Gruverman, A., 1990, Ph.D. thesis 共Ural State University, Eka-
Johnston, K., X. Huang, J. B. Neaton, and K. M. Rabe, 2005,
terinburg, Russia兲.
Phys. Rev. B 71, 100103.
Gruverman, A., O. Auciello, and H. Tokumoto, 1996, Appl.
Johnston, K., and K. M. Rabe, 2005, unpublished.
Phys. Lett. 69, 3191.
Jun, S., and J. Lee, 2001, Integr. Ferroelectr. 34, 1579.
Gruverman, A., H. Tokumoto, A. S. Prakash, S. Aggarwal, B.
Jung, D. J., M. Dawber, J. F. Scott, L. J. Sinnamon, and J. M.
Yang, M. Wuttig, R. Ramesh, O. Auciello, and T. Venkatesan,
Gregg, 2002, Integr. Ferroelectr. 48, 59.
1997, Appl. Phys. Lett. 71, 3492.
Jung, D. J., H. H. Kim, Y. J. Song, N. W. Jang, B. J. Koo, S. Y.
Haeni, J. H., et al., 2004, Nature 共London兲 430, 758.
Lee, S. D. Park, Y. W. Park, and K. N. Kim, 2000, IEDM 2000
Han, J.-P., X. Guo, C. C. Broadbridge, T. P. Ma, M. Cantoni,
Technical Digest, 801.
J.-M. Sallese, and P. Fazan, 2001, Integr. Ferroelectr. 34, 1505.
Jung, D. J., F. D. Morrison, M. Dawber, H. H. Kim, K. Kim,
Haneder, T. P., W. Hoenlein, H. Bachhofer, H. Von Philips-
and J. F. Scott, 2004, J. Appl. Phys. 95, 4968.
born, and R. Waser, 2001, Integr. Ferroelectr. 34, 1487. Junquera, J., and P. Ghosez, 2003, Nature 共London兲 422, 506.
Hartmann, A. J., M. Neilson, R. N. Lamb, K. Watanabe, and J. Junquera, J., P. Ghosez, and K. M. Rabe, 2005, unpublished.
F. Scott, 2000, Appl. Phys. A 70, 239. Junquera, J., and K. M. Rabe, 2005, unpublished.
Hashimoto, S., H. Orihara, and Y. Ishibashi, 1994, J. Phys. Soc. Junquera, J., M. Zimmer, P. Ordejon, and P. Ghosez, 2003,
Jpn. 63, 1601. Phys. Rev. B 67, 155327.
He, L. X., and D. Vanderbilt, 2003, Phys. Rev. B 68, 134103. Kalkur, T. S., B. Jacob, and G. Argos, 1994, Integr. Ferroelectr.
Heifets, E., R. I. Eglitis, E. A. Kotonin, and G. Borstel, 2001a, 5, 177.
in Fundamental Physics of Ferroelectrics 2001, edited by H. Kalkur, T. S., and J. Lindsey, 2001, Integr. Ferroelectr. 34,
Krakauer, AIP Conf. Proc. No. 582 共AIP, Melville, NY兲, p. 1587.
201. Kato, K., 2001, Integr. Ferroelectr. 34, 1533.
Heifets, E., R. I. Eglitis, E. A. Kotonin, and G. Borstel, 2002b, Kay, H. F., and J. W. Dunn, 1962, Philos. Mag. 7, 1962.
in Fundamental Physics of Ferroelectrics 2002, edited by R. E. Kelman, M. B., L. F. Schloss, P. C. McIntyre, B. C. Hendrix, S.
Cohen, AIP Conf. Proc. No. 626 共AIP, Melville, NY兲, p. 285. M. Bilodeau, and J. F. Roeder, 2002, Appl. Phys. Lett. 80,
Heifets, E., R. I. Eglitis, E. A. Kotonin, J. Maier, and G. Bor- 1258.
stel, 2001b, Phys. Rev. B 64, 235417. Khodenkov, G. E., 1975, Fiz. Met. Metalloved. 39, 466.
Heifets, E., R. I. Eglitis, E. A. Kotonin, J. Maier, and G. Bor- Kim, J., C. J. Kim, and I. Chung, 2001, Integr. Ferroelectr. 33,
stel, 2002a, Surf. Sci. 513, 211. 133.
Heifets, E., E. Kotonin, and P. W. M. Jacobs, 2000, Thin Solid Kim, M., G. Duscher, N. D. Browning, K. Sohlberg, S. T. Pan-
Films 375, 64. telides, and S. J. Pennycock, 2001, Phys. Rev. Lett. 86, 4056.
Heifets, E., E. A. Kotonin, and J. Maier, 2000, Surf. Sci. 462, Kimoto, K., Y. Matsui, H. Yamada, M. Kawasaki, X. Yu, Y.
19. Kaneko, and Y. Tokura, 2004, Appl. Phys. Lett. 84, 5374.
Heine, V., 1965, Phys. Rev. 138, A1689. King-Smith, R. D., and D. Vanderbilt, 1993, Phys. Rev. B 47,
Hernandez, B. A., K.-S. Chang, E. R. Fisher, and P. K. Dor- 1651.
hout, 2002, Chem. Mater. 14, 481. King-Smith, R. D., and D. Vanderbilt, 1994, Phys. Rev. B 49,
Lett. 79, 530. Ross, I. M., 1957, U.S. Patent No. 2,791,760.
Patzke, G. R., F. Krumeich, and R. Nesper, 2002, Angew. Rossetti, G. A., L. E. Cross, and K. Kushida, 1991, Appl. Phys.
Chem., Int. Ed. 41, 2446. Lett. 59, 2524.
Peacock, P. W., and J. Robertson, 2002, J. Appl. Phys. 92, 4712. Roytburd, A. L., S. P. Alpay, L. A. Bendersky, V. Nagarajan,
Pertsev, N. A., V. G. Kukhar, H. Kohlstedt, and R. Waser, and R. Ramesh, 2001, J. Appl. Phys. 89, 553.
2003, Phys. Rev. B 67, 054107. Rudd, R. E., G. A. D. Briggs, A. P. Sutton, G. Medeiros-
Pertsev, N. A., J. Rodriguez Contreras, V. G. Kukhar, B. Her- Ribeiro, and R. Stanley Williams, 2003, Phys. Rev. Lett. 90,
manns, H. Kohlstedt, and R. Waser, 2003, Appl. Phys. Lett. 146101.
83, 3356. Ruediger, A., T. Schneller, A. Roelofs, S. Tiedke, T. Schmitz,
Pertsev, N. A., A. K. Tagantsev, and N. Setter, 2000a, Phys. and R. Waser, 2004, Appl. Phys. A 共to be published兲.
Rev. B 61, R825. Ruini, A., R. Resta, and S. Baroni, 1998, Phys. Rev. B 57, 5742.
Pertsev, N. A., A. K. Tagantsev, and N. Setter, 2000b, Phys. Saghi-Szabo, G., R. E. Cohen, and H. Krakauer, 1998, Phys.
Rev. Lett. 84, 3722. Rev. Lett. 80, 4321.
Pertsev, N. A., A. G. Zembilgotov, and A. K. Tagantsev, 1998, Sai, N., A. M. Kolpak, and A. M. Rappe, 2005 Phys. Rev. B 72,
Phys. Rev. Lett. 80, 1988. 020101.
Pertsev, N. A., A. G. Zembilgotov, and A. K. Tagantsev, 1999, Sai, N., B. Meyer, and D. Vanderbilt, 2000, Phys. Rev. Lett. 84,
Ferroelectrics 223, 79. 5636.
Petroff, P. M., A. Lorke, and A. Imamoglu, 2001, Phys. Today Sai, N., and D. Vanderbilt, 2000, Phys. Rev. B 62, 13942.
54 共5兲, 46. Sajeev, J., 2002, U.S. Patent No. US2002074537 共20 June兲.
Piskunov, S., E. Heifets, R. I. Eglitis, and G. Borstel, 2004, Sakamaki, S., et al., 2001, U.S. Patent No. 20010412.
Comput. Mater. Sci. 29, 165. Salje, E. K. H., and W. T. Lee, 2004, Nat. Mater. 3, 425.
Plumlee, R., 1967, Sandia Laboratories Report No. SC-RR-67- Samara, G. A., 1987, Ferroelectrics 73, 145.
730. Samara, G. A., 2003, J. Phys.: Condens. Matter 15, R367.
Pokropivny, V. V., 2001, Physica C 351, 71. Sarin Kumar, A. K., P. Paruch, J.-M. Triscone, W. Daniau, S.
Poykko, S., and D. J. Chadi, 2000, J. Phys. Chem. Solids 61, Ballandras, L. Pellegrino, D. Marr, and T. Tybell, 2004, Appl.
291. Phys. Lett. 85, 1757.
Rabe, K. M., 2005, unpublished. Sawyer, C. B., and C. H. Tower, 1930, Phys. Rev. 35, 269.
Rabe, K. M., and U. V. Waghmare, 1995, Phys. Rev. B 52, Sayer, M., A. Mansingh, A. K. Arora, and A. Lo, 1992, Integr.
13236. Ferroelectr. 1, 129.
Rabe, K. M., and U. V. Waghmare, 2002, Phys. Rev. B 65, Schilling, J., F. Muller, S. Matthias, R. B. Wehrspohn, U. Gos-
214111. ele, and K. Busch, 2001, Appl. Phys. Lett. 78, 1180.
Rabson, T. A., T. A. Rost, and H. Lin, 1995, Integr. Ferroelectr. Schloss, L. F., H. Kim, and P. C. McIntyre, 2004, J. Mater. Res.
6, 15. 19, 1265.
Ramesh, R., T. Sands, and V. G. Keramidas, 1993, Appl. Phys. Schloss, L. F., P. C. McIntyre, B. C. Hendrix, S. M. Bilodeau, J.
Lett. 63, 731. F. Roeder, and S. R. Gilbert, 2002, Appl. Phys. Lett. 81, 3218.
Randoshkin, V. V., 1995, Fiz. Tverd. Tela 共Leningrad兲 37, 3056. Schluter, M., 1978, Phys. Rev. B 17, 5044.
Rao, F., M. Kim, A. J. Freeman, S. Tang, and M. Anthony, Schnupp, P., 1967, Phys. Status Solidi 21, 567.
1997, Phys. Rev. B 55, 13953. Schottky, W., 1938, Naturwiss. 26, 843.
Reiner, J. W., F. J. Walker, R. A. McKee, C. A. Billman, J. Scott, J. F., 1977, Phys. Rev. B 16, 2329.
Junquera, K. M. Rabe, and C. H. Ahn, 2004, Phys. Status Scott, J. F., 1979, Rep. Prog. Phys. 42, 1055.
Solidi B 241, 2287. Scott, J. F., 1995, in Science and Technology of Electroceramic
Resta, R., 1994, Rev. Mod. Phys. 66, 899. Thin Films, edited by O. Auciello and R. Waser, NATO ASI
Resta, R., 2003, Modell. Simul. Mater. Sci. Eng. 11, R69. Series No. 284 共Kluwer, Dordrecht兲.
Rhoderick, E. H., and R. H. Williams, 1988, Metal- Scott, J. F., 1996, Integr. Ferroelectr. 12, 71.
Semiconductor Contacts, 2nd ed. 共Oxford, Clarendon兲. Scott, J. F., 1998, Ferroelectrics 1, 82.
Rios, S., A. Ruediger, J. Q. Jiang, J. F. Scott, H. Lu, and Z. Scott, J. F., 1999, Ferroelectrics 232, 905.
Chen, 2003, J. Phys.: Condens. Matter 15, 305. Scott, J. F., 2000a, Ferroelectric Memories 共Springer-Verlag,
Robblee, L. S., and S. F. Cogan, 1986, in Encyclopedia of Ma- Berlin兲
terials Science and Engineering Supplementary Vol. I, edited Scott, J. F., 2000b, J. Appl. Phys. 88, 6092.
by R. W. Cahn 共Pergamon, Oxford兲, p. 276. Scott, J. F., 2005, Microelectron. Eng. 共to be published兲.
Robels, U., and G. Arlt, 1993, J. Appl. Phys. 73, 3454. Scott, J. F., C. A. Araujo, B. M. Melnick, L. D. McMillan, and
Robertson, J., 2003, J. Appl. Phys. 93, 1054. R. Zuleeg, 1991, J. Appl. Phys. 70, 382.
Robertson, J., and C. W. Chen, 1999, Appl. Phys. Lett. 74, Scott, J. F., M. Azuma, E. Fujii, T. Otsuki, G. Kano, M. C.
1168. Scott, C. A. Paz de Araujo, L. D. McMillan, and T. Roberts,
Robertson, J., C. W. Chen, W. L. Warren, and C. D. Gutleben, 1992, Proceedings of ISAF 1992 共IEEE, New York兲, p. 356.
1996, Appl. Phys. Lett. 69, 1704. Scott, J. F., and M. Dawber, 2000, Appl. Phys. Lett. 76, 3801.
Rodriguez Contreras, J., H. Kohlstedt, U. Poppe, and R. Scott, J. F., A. Q. Jiang, S. A. T. Redfern, M. Zhang, and M.
Waser, 2003, Appl. Phys. Lett. 83, 4595. Dawber, 2003, J. Appl. Phys. 94, 3333.
Roelofs, A., N. A. Pertsev, R. Waser, F. Schlaphof, L. M. Eng, Scott, J. F., L. Kammerdiner, M. Parris, S. Traynor, V. Otten-
C. Ganpule, V. Nagarajan, and R. Ramesh, 2002, Appl. Phys. bacher, A. Shawabkeh, and W. F. Oliver, 1988, J. Appl. Phys.
Lett. 80, 1424. 64, 787.
Roelofs, A., T. Schneller, K. Szot, and R. Waser, 2003, Scott, J. F., B. M. Melnick, L. D. McMillan, and C. A. Paz de
Nanotechnology 14, 250. Araujo, 1993, Integr. Ferroelectr. 3, 225.
Scott, J. F., and B. Pouligny, 1988, J. Appl. Phys. 64, 1547. Stolichnov, I., and A. K. Tagantsev, 1998, J. Appl. Phys. 84,
Seifert, A., A. Vojta, J. S. Speck, and F. F. Lange, 1996, J. 3216.
Mater. Res. 11, 1470. Stolichnov, I., A. K. Tagantsev, E. L. Colla, and N. Setter,
Sepliarsky, M., S. R. Phillpot, M. G. Stachiotti, and R. L. 1998, Appl. Phys. Lett. 73, 1361.
Migoni, 2002, J. Appl. Phys. 91, 3165. Stolichnov, I., A. K. Tagantsev, E. L. Colla, and N. Setter,
Sepliarsky, M., S. R. Phillpot, D. Wolf, M. G. Stachiotti, and R. 1999, Ferroelectrics 225, 125.
L. Migoni, 2001, J. Appl. Phys. 90, 4509. Stolichnov, I., A. Tagantsev, N. Setter, S. Okhonin, P. Fazan, J.
Sepliarsky, M., M. G. Stachiotti, and R. L. Migoni, 2005, S. Cross, M. Tsukada, A. Bartic, and D. Wouters, 2001, Integr.
e-print cond-mat/0503524. Ferroelectr. 32, 737.
Sepliarsky, M., Z. Wu, A. Asthagiri, and R. E. Cohen, 2004, Streiffer, S. K., J. A. Eastman, D. D. Fong, C. Thompson, A.
Ferroelectrics 301, 55. Munkholm, M. V. R. Murty, O. Auciello, G. R. Bai, and G. B.
Seshadri R., and N. A. Hill, 2001, Chem. Mater. 13, 2892. Stephenson, 2002, Phys. Rev. Lett. 89, 067601.
Shchukin, V. A., and D. Bimberg, 1999, Rev. Mod. Phys. 71, Sugiyama, H., K. Kodama, T. Nakaiso, M. Noda, and M.
1125. Okuyama, 2001, Integr. Ferroelectr. 34, 1521.
Shilo, D., G. Ravichandran, and K. Bhattacharya, 2004, Nat. Sun, H. P., W. Tian, X. Q. Pan, J. H. Haeni, and D. G. Schlom,
Mater. 3, 453. 2004, Appl. Phys. Lett. 84, 3298.
Shimada, Y., K. Arita, Y. Kato, K. Uchiyama, V. Joshi, and M. Suzuki, T., and M. Fujimoto, 2001, J. Appl. Phys. 89, 5622.
Lim, 2001, Integr. Ferroelectr. 34, 1467. Suzuki, T., Y. Nishi, and M. Fujimoto, 1999, Philos. Mag. A 79,
Shimakawa, Y., Y. Kubo, Y. Nakagawa, T. Kamiyama, H. 2461.
Asano, and F. Izumi, 1999, Appl. Phys. Lett. 74, 1904. Switzer, J. A., M. G. Shumsky, and E. W. Bohannan, 1999,
Shimizu, M., H. Fujisawa, H. Nonomura, and H. Niu, 2004, Science 284, 293.
Integr. Ferroelectr. 62, 109. Szafraniak, I., C. Harnagea, R. Scholz, S. Bhattacharyya, D.
Shimuta, T., O. Nakagawara, T. Makino, S. Arai, H. Tabata, Hesse, and M. Alexe, 2003, Appl. Phys. Lett. 83, 2211.
and T. Kawai, 2002, Jpn. J. Appl. Phys., Part 1 91, 2290. Sze, S. M., D. J. Coleman, and A. Loya, 1971, Solid-State
Shin, C.-H., S. Y. Cha, H. C. Lee, W.-J. Lee, B.-G. Yu, and Electron. 14, 1209.
D.-H. Kwak, 2001, Integr. Ferroelectr. 34, 1553. Tabata, H., H. Tanaka, and T. Kawai, 1994, Appl. Phys. Lett.
Shur, V. Ya., 1996, in Ferroelectric Thin Films: Synthesis and 65, 1970.
Basic Properties, edited by C. Paz de Araujo, G. W. Taylor, Tagantsev, A. K., I. Stolichnov, E. L. Colla, and N. Setter,
and J. F. Scott 共Gordon and Breach, Amsterdam兲, pp. 153– 2001, J. Appl. Phys. 90, 1387.
192. Tagantsev, A. K., I. Stolichnov, N. Setter, J. S. Cross, and M.
Shur, V. Ya., A. Gruverman, V. P. Kuminov, and N. A. Tsukada, 2002, Phys. Rev. B 66, 214109.
Tonkachyova, 1990, Ferroelectrics 111, 197. Takahashi, K. S., M. Kawasaki, and Y. Tokura, 2001, Appl.
Shur, V. Ya, A. L. Gruverman, N. Yu. Ponomarev, E. L. Phys. Lett. 79, 1324.
Rumyantsev, and N. A. Tonkacheva, 1991, JETP Lett. 53, Taylor, D. V., and D. Damjanovic, 1997, J. Appl. Phys. 82,
615. 1973.
Shur, V. Ya., et al., 2000, Taylor, D. V., and D. Damjanovic, 1998, Appl. Phys. Lett. 73,
Sigman, J., D. P. Norton, H. M. Christen, P. H. Fleming, and L. 2045.
A. Boatner, 2002, Phys. Rev. Lett. 88, 079601. Tian, W., J. C. Jiang, X. Q. Pan, J. H. Haeni, D. G. Schlom, J.
Simmons, J. G., 1965, Phys. Rev. Lett. 15, 967. B. Neaton, and K. M. Rabe, 2005, unpublished.
Singh, D. J., 1995, Phys. Rev. B 52, 12559. Tinte, S., and M. G. Stachiotti, 2000, in Fundamental Physics of
Sinharoy, S., H. Buhay, M. H. Francombe, and D. R. Lampe, Ferroelectrics 2000, edited by B. N. Hale and M. Kulmala,
1993, Integr. Ferroelectr. 3, 217. AIP Conf. Proc. No. 535 共AIP, Melville, NY兲, p. 273.
Sinharoy, S., H. Buhay, M. H. Francombe, W. J. Takei, N. J. Tinte, S., and M. G. Stachiotti, 2001, Phys. Rev. B 64, 235403.
Doyle, J. H. Rieger, D. R. Lampe, and E. Stepke, 1991, J. Tinte, S., M. G. Stachiotti, M. Sepliarsky, R. L. Migoni, and C.
Vac. Sci. Technol. A 9, 409. O. Rodriguez, 1999, J. Phys.: Condens. Matter 11, 9679.
Sinharoy, S., D. R. Lampe, H. Buhay, and M. H. Francombe, Troeger, G., 1991, unpublished.
1992, Integr. Ferroelectr. 2, 377. Tsai, F., V. Khiznishenko, and J. M. Cowley, 1992, Ultramicros-
Smith, R. L., and S. D. Collins, 1992, J. Appl. Phys. 71, R1. copy 4, 5.
Smyth, D. M., 1984, Prog. Solid State Chem. 15, 145. Tsai, M. H., Y. H. Tang, and S. K. Dey, 2003, J. Phys.: Condens.
Soler, J. M., E. Artacho, J. D. Gale, A. Garcia, J. Junquera, P. Matter 15, 7901.
Ordejon, and D. Sanchez-Portal, 2002, J. Phys.: Condens. Tsurumi, T., S.-M. Num, Y.-B. Kil, and S. Wada, 2001, Ferro-
Matter 14, 2745. electrics 259, 43.
Souza, I., J. Iniguez, and D. Vanderbilt, 2002, Phys. Rev. Lett. Tybell, T., P. Paruch, T. Giamarchi, and J.-M. Triscone, 2002,
89, 117602. Phys. Rev. Lett. 89, 097601.
Speck, J. S., and W. Pompe, 1994, J. Appl. Phys. 76, 466. Ueda, K., H. Tabata, and T. Kawai, 1998, Science 280, 1064.
Stachiotti, M. G., 2004, Appl. Phys. Lett. 84, 251. Ueda, K., H. Tabata, and T. Kawai, 1999a, Jpn. J. Appl. Phys.,
Stachiotti, M. G., C. O. Rodriguez, C. Ambrosch-Draxl, and N. Part 1 38, 6690.
E. Christensen, 2000, Phys. Rev. B 61, 14434. Ueda, K., H. Tabata, and T. Kawai, 1999b, Phys. Rev. B 60,
Steinhart, M., Z. Jia, A. K. Schaper, R. B. Wehrspohn, U. R12561.
Gsele, and J. H. Wendorff, 2003, Adv. Mater. 共Weinheim, Ullmann, M., H. Goebel, H. Hoenigschmid, and T. Haneder,
Ger.兲 15, 706. 2001, Integr. Ferroelectr. 34, 1595.
Stemmer, S., S. K. Streiffer, F. Ernst, and M. Ruhle, 1995, Phi- Van Aken, B. B., T. T. M. Palstra, A. Filippetti, and N. A.
los. Mag. A 71, 713. Spaldin, 2004, Nat. Mater. 3, 164.
Vasco, E., R. Dittmann, S. Karthauser, and R. Waser, 2003, Williams, R. Stanley, G. Medeiros-Ribeiro, T. I. Kamins, and
Appl. Phys. Lett. 82, 2497. D. A. A. Ohlberg, 2000, Annu. Rev. Phys. Chem. 51, 527.
Vendik, O. G., and S. P. Zubko, 2000, J. Appl. Phys. 88, 5343. Woodward, D. I., I. M. Reaney, G. Y. Yang, E. C. Dickey, and
Von Hippel, A., 1935, Ergeb. Exakten Naturwiss. 14, 118. C. A. Randall, 2004, Appl. Phys. Lett. 84, 4650.
Waghmare, U. V., and K. M. Rabe, 1997a, Phys. Rev. B 55, Wu, S.-Y., 1974, IEEE Trans. Electron Devices 21, 8.
6161. Wu, Z., R. E. Cohen, and D. J. Singh, 2004, Phys. Rev. B 70,
Waghmare, U. V., and K. M. Rabe, 1997b, Ferroelectrics 194, 104112.
135. Wu, Z., and H. Krakauer 2003, Phys. Rev. B 68, 014112.
Walker, L. R., 1963, in Magnetism III, edited by G. T. Rado Xiaohua, L., J. Yin, Z. G. Liu, L. Wang, J. Li, X. H. Zhu, and
and H. Suhl 共Academic, New York兲, p. 450. K. J. Chen, 2001, Integr. Ferroelectr. 34, 1571.
Wang, J., et al., 2003, Science 299, 1719. Yamada, H., M. Kawasaki, Y. Ogawa, Y. Ogawa, and Y.
Warusawithana, M. P., E. V. Colla, J. N. Eckstein, and M. B. Ogawa, 2002, Appl. Phys. Lett. 81, 4793.
Weissman, 2003, Phys. Rev. Lett. 90, 036802. Yoo, I. K., and S. B. Desu, 1992, Phys. Status Solidi A 133, 565.
Waser, R., T. Baiatu, and K.-H. Hartdl, 1990, J. Am. Ceram. Yoon, S.-M., and H. Ishiwara, 2001, IEEE Trans. Electron
Soc. 73, 1654. Devices 48, 2002.
Waser, R., and D. M. Smyth, 1996, in Ferroelectric Thin Films: Yu, B., C. Zhu, and F. Gan, 1997, J. Appl. Phys. 82, 4532.
Synthesis and Basic Properties, edited by C. Paz de Araujo, Zafar, S., B. Hradsky, D. Gentile, P. Chu, R. E. Jones, and S.
G. W. Taylor, and J. F. Scott 共Gordon and Breach, Amster- Gillespie, 1999, J. Appl. Phys. 86, 3890.
dam兲, pp. 47–92. Zafar, S., R. E. Jones, B. Jiang, B. White, V. Kaushik, and S.
Watanabe, K., A. J. Hartmann, R. N. Lamb, and J. F. Scott, Gillespie, 1998, Appl. Phys. Lett. 73, 3533.
1998, J. Appl. Phys. 84, 2170. Zhong, W., D. Vanderbilt, and K. M. Rabe, 1994, Phys. Rev.
Wieder, H. H., 1956, J. Appl. Phys. 27, 413. Lett. 73, 1861.
Wieder, H. H., 1957, J. Appl. Phys. 28, 367. Zhou, W., 1992, J. Solid State Chem. 101, 1.