Ch5 Quality Control
Ch5 Quality Control
Learning Objectives
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Photolithography Example
• Important quality
characteristic in hard
bake is resist flow width
• Process is monitored by
average flow width
– Sample of 5 wafers
– Process mean is 1.5
microns
– Process standard
deviation is 0.15
microns
• Note that all plotted
points fall inside the
control limits
– Process is considered to
be in statistical control
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Rational Subgroups
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Check Sheet
Pareto Chart
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Cause-and-Effect Diagram
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Scatter Diagram
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