Angular Dependence of The Sputtering Yield From A Cilindrical Track
Angular Dependence of The Sputtering Yield From A Cilindrical Track
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Abstract
The dependence of the sputtering yield on the incident angle, H, is determined using molecular dynamics (MD)
simulations for a cylindrical track produced by a fast ion. For a `small' spike radius and for the mean energy in the
track, Eexc , smaller than the binding energy, U, a
cos H 1:7 dependence is found, close to the linear collision cascade
(LCC) result and to some thermal spike models. On the other hand, when Eexc > U , the incident angle dependence is
cos H 1 . For a larger spike radius we obtain a
cos H 1:6 dependence for both high and low energy densities.
Analytic spike models based on diusive transport are shown not to give satisfactory results. In addition, at low energy
densities we see correlated atom ejection ignored in analytic models. Applying the MD results to the experimental data
for electronic sputtering of solid O2 at large excitation densities suggests that the eective spike radius is larger than the
initial Bohr adiabatic radius indicating that energy is rapidly transported from the initially narrow track. Ó 2001
Elsevier Science B.V. All rights reserved.
1. Introduction ejected per ion incident), but they also are used to
predict the dependence of the yield on the angle
Ejection of atoms and molecules from a solid of incidence and the angular and energy distri-
by ion bombardment (sputtering) is a process bution of the ejecta. In this paper, we present
which can test our ability to describe non-equi- results from molecular dynamics (MD) simula-
librium, molecular scale processes in solids. Be- tions of the ejection of atoms from an energized
cause of their simplicity, equilibrium models like track in an atomic solid. These are used to test
the thermal spike model, are often used to the predictions from spike models for angular
describe the sputtering of metals and insulators distribution of the ejecta and the incident angle
[1±7,20]. Such models are used to calculate the dependence of the sputtering yield from a track
average yield (the number of atoms or molecules produced by a fast ion.
Earlier we compared spike results to MD sim-
*
Corresponding author. Tel.: 1-804-924-4344; fax: 1-804-
ulations of the dependence of the yield on the en-
924-3104. ergy deposited per unit path length,
dE=dx, and
E-mail address: [email protected] (E.M. Bringa). the ejected atom energy distribution for normal
0168-583X/01/$ - see front matter Ó 2001 Elsevier Science B.V. All rights reserved.
PII: S 0 1 6 8 - 5 8 3 X ( 0 1 ) 0 0 4 0 2 - 5
100 E.M. Bringa, R.E. Johnson / Nucl. Instr. and Meth. in Phys. Res. B 180 (2001) 99±104
Fig. 2. Y
H=Y
0 for rcyl 2r, Eexc 0:8U (open circles) and
Eexc 4U (solid squares). The lines are a guide to the eye:
cos H 1:1 (solid),
cos H 5=3 (dashed). Experimental points
for 2 MeV Heq (charge equilibrated He ) bombardment of
solid O2 from [11] are also included (solid triangles), as well as
the analytical ®t from the spike superposition model [23] (dot-
ted line).
angle like that in the analytic spike model above [23]. ated by a fast ion in a solid. We calculated the
This is due to the variation of the distance from the dependence of the sputtering yield on the angle of
incident particle track to the surface and the trans- incidence of the ions. The sputtering yield as a
port of energy to the surface in both cases. For small function of the eective energy deposition,
incident angles (and Mtarget =Mprojectile 6 3 for LCC)
dE=dxeff , was shown to have roughly the same
5=3
this dependence is approximated as
cos H in behavior with
dE=dxeff for both normal inci-
both models which is also shown in Fig. 3. This dence (H 0) and for H 60.
dependence is seen to agree, fortuitously, with our At ®xed energy deposition, the variation of the
MD results for the threshold regime even though the yield with incident angle H is 1= cosn H with
sputtering process is non-linear and the dependence n 1:6 for large spike radius (rcyl 5r). When
at small angles is extrapolated to large angles. In the spike radius is smaller (rcyl 2r), n 1 for
fact, in both models, as seen for the analytic spike large
dE=dxeff and n 1:7 for small
dE=dxeff .
result in Fig. 3, the dependence on incident angle is When describing electronic sputtering the as-
less steep at large angles. Therefore, care should be sumption of a spike radius equal to the Bohr
taken in using the small angle result, cos 5=3 H. radius does not appear to be consistent with the
Claussen [18] obtained an approximate result for a experimental data. However, if the energy ex-
spike having an initial width. He found that, as the pands rapidly as we suggested [14], the spike ra-
energy density decreases, the dependence of the dius increases giving an angular dependence that
yield on incident angle rapidly becomes steeper than is consistent with the experimental results for
5=3
cos H . For the parameters used in the MD electronic sputtering of a number of condensed
simulations of the threshold regime Claussen pre- gas solids.
n
dicts
cos H with n 3:75 for rcyl 2r, a de- Even though one would like to use simple
pendence not found here. analytic models to describe the sputtering yield
Recently, we suggested [14] that the high energy from cylindrical tracks those available appear to
density deposited within the Bohr radius rapidly fail. At low
dE=dxeff , small variations in the
expands until the mean energy per particle is close surface temperature distribution caused by the
to the binding energy of solid O2 . If correct, a change in beam angle and correlated emission
radius of about rcyl 5r should be used to com- aect the yield. The discrepancies between our
pare with the experimental data in Fig. 2. This is results and spike models are principally due to
shown in Fig. 3, for several excitation energies. the dierences in the surface temperature pro®les
The excitation energy in the atomic solid giving the given by the radial diusion equation from those
same
dE=dxeff would be Eexc 2U [14] for obtained in the MD simulation [11]. Therefore,
rcyl 5r. We see that the angular dependence in although we showed that spike models can de-
both the linear and threshold regime can be scribe aspects of the sputtering in at low
roughly approximated by a cos 1:6 H dependence,
dE=dxeff , they, apparently, cannot describe the
in reasonable agreement with experiments on O2 dependence of the yield on incident angle in ei-
and CO [9,10]. The steeper dependence occurs ther the high
dE=dxeff or low
dE=dxeff re-
because at large track radii the spike is sustained gimes. As a consequence, the rough agreement of
longer so emission from deeper layers contributes the analytic spike model with the data for elec-
signi®cantly to the yield, as discussed in [21]. In tronic sputtering of solid O2 [9] is probably for-
addition, considerable ejection of low energy par- tuitous.
ticles occurs at all
dE=dxeff for wide tracks.
In this paper we studied the ejection of atoms The work was supported by the NSF Divisions
from a cylindrical energized region, like that cre- of Astronomy and Chemistry.
104 E.M. Bringa, R.E. Johnson / Nucl. Instr. and Meth. in Phys. Res. B 180 (2001) 99±104