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Inx9 NG

This document discusses the process of creating a photoresist layer on a wafer substrate in order to generate a final product. The key steps involve cleaning the wafer, applying a photoresist coating, exposing the photoresist to light through a photomask, and developing the photoresist to produce the desired pattern. Ion implantation is also mentioned as a method for introducing atoms into a solid material by bombarding it with ions.
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0% found this document useful (0 votes)
17 views

Inx9 NG

This document discusses the process of creating a photoresist layer on a wafer substrate in order to generate a final product. The key steps involve cleaning the wafer, applying a photoresist coating, exposing the photoresist to light through a photomask, and developing the photoresist to produce the desired pattern. Ion implantation is also mentioned as a method for introducing atoms into a solid material by bombarding it with ions.
Copyright
© © All Rights Reserved
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as PDF, TXT or read online on Scribd
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