Lecture (Semiconductor Physics)
Lecture (Semiconductor Physics)
Material
xN
Pauli exclusion→
localized energy states
split to accommodate
all electrons, e.g., not
allowed to have 4
electrons in 1s state.
New states are
extended throughout
material.
Fig. 41-3
Figure 41-2 (a) Two copper atoms separated by a large distance; their electron distributions are represented by dot plots. (b) Each copper atom
has 29 electrons distributed among a set of subshells. In the neutral atom in its ground state, all subshells up through the 3d level are filled, the
4s subshell contains one electron (it can hold two), and higher subshells are empty. For simplicity, the subshells are shown as being evenly
spaced in energy.
Insulators and Metals
To create a current that moves charge in a given direction, one must be able to
excite electrons to higher energy states. If there are no unoccupied higher energy
states close to the topmost electrons, no current can flow.
In metals, electrons in the highest occupied band can readily jump to higher
unoccupied levels. These conduction electrons can move freely throughout the
sample, like molecules of gas in a closed container (see free electron model-
Section 26-6).
Unoccupied States
Fermi Energy
Occupied States
8 2 m
1
2
Figure 41-6 The density of states N(E)—that is, the number of electron energy levels per unit energy interval per unit
volume— plotted as a function of electron energy. The density of states function simply counts the available states; it
says nothing about whether these states are occupied by electrons.
Occupancy Probability P(E)
Ability to conduct depends on the probability P(E) that available vacant levels will be
occupied. At T = 0, the P(E < EF) = 1 and P(E > EF) = 0. At T > 0 the electrons
distribute themselves according to Fermi-Dirac statistics:
P E 1
(occupancy probability)
E EF kT
e 1
At T 0 : For E E F , e E E F kT
e P E 1
For E EF , e
E EF kT
e P E 0
8 2 m 8 2 m 2 2E F2
3 3 3
2 EF
n E dE
1
2
h3 0 h3 3
3 h 2 3 0.121h2 2 3
3 2
EF mn n
16 2 m
Semiconductors
Semiconductors are qualitatively similar to insulators but
with a much smaller (~1.1 eV for silicon compared to 5.5
for diamond) energy gap Eg between top of the valence band
and bottom of the conduction band
Number density of carriers n: thermal agitation excites
some electron at the top of the valence band across to the
conduction band, leaving behind unoccupied energy state
(holes). Holes behave as positive charges when electric
fields are applied.
nCu / nSi~1013.
Resistivity ρ: since ρ=m/e2nτ, the large difference in
charge carrier density mostly account for the large increase
(~1011) in ρ in semiconductors compared to metals.
Fig. 41-8
Temperature coefficient of Resistivity α: When increasing temperature, resistivity in
metals increases (more scattering off lattice vibrations) while it decrease in
semiconductors (more charge carriers excited across energy gap)
Semiconductor
materials
Intrinsic and extrinsic semiconductor
Intrinsic: Pure semiconductor
Extrinsic: Impure or doped semiconductors
Possible Semiconductor Materials
1. Very Expensive
Carbon C 6 2. Band Gap Large: 6eV
3. Difficult to produce without high contamination
1. Cheap
Silicon Si 14 2. Ultra High Purity
3. Oxide is amazingly perfect for IC applications
1. High Mobility
Germanium Ge 32 2. High Purity Material
3. Oxide is porous to water/hydrogen (problematic)
B(5e): 1s22s22p1
N- type semiconductor
To increase the number of conduction-band electrons in intrinsic silicon,
pentavalent impurity atoms are added.
These are atoms with five valence electrons such as arsenic (As), phosphorus (P),
bismuth (Bi), and antimony (Sb).
Each pentavalent atom (antimony, in this case) forms covalent bonds with four
adjacent silicon atoms. Four of the antimony atom’s valence electrons are used to
form the covalent bonds with silicon atoms, leaving one extra electron. This extra
electron becomes a conduction electron because it is not attached to any atom.
Because the pentavalent atom gives up an electron, it is often called a donor atom.
The number of conduction electrons can be carefully controlled by the number of
impurity atoms added to the silicon.
N- type semiconductor
Majority and Minority Carriers: Since most of the current carriers are
electrons, silicon (or germanium) doped with pentavalent atoms is an n-type
semiconductor material (the n stands for the negative charge on an electron).
There are also a few holes that are created when electron-hole pairs are
thermally generated. These holes are not produced by the addition of the
pentavalent impurity atoms.
Table 41-2
Properties of Two Doped Semiconductors
Type of Semiconductor
Property n p
Matrix material Silicon Silicon
Matrix nuclear charge +14e +14e
Matrix energy gap 1.2 eV 1.2 eV
Dopant Phosphorous Aluminum
Type of dopant Donor Acceptor
Majority carriers Electrons Holes
Minority carriers Holes Electrons
Dopant energy gap Ed=0.045 eV Ea=0.067 eV
Dopant valence 5 3
Dopant nuclear charge +15e +13e
Dopant net ion charge +e -e
Fig. 41-10
Junction plane
The p-n Junction
If you take a block of silicon and
dope half of it with a trivalent
impurity and the other half with a
pentavalent impurity, a boundary
called the pn junction is formed
Space charge between the resulting p-type and n-
type portions .
Depletion zone
The pn junction is the feature that
allows diodes, transistors, and other
devices to work.
Contact potential difference
If a piece of intrinsic silicon is
doped so that half is n-type and the
other half is p-type, a pn junction
forms between the two regions as
indicated.
Fig. 41-11
Formation of the Depletion Region
When the pn junction is formed, the n region loses free electrons as they diffuse
across the junction.
This creates a layer of positive charges (pentavalent ions) near the junction, as
the electrons move across the junction, the p region loses holes as the electrons
and holes combine.
This creates a layer of negative charges (trivalent jons) near the junction.
These two layers of positive and negative charges form the depletion region.
After the initial surge of free electrons across the pn junction, the depletion
region has expanded to a point where equilibrium is established and there is no
further diffusion of electrons across the junction.
Barrier Potential
The forces between the opposite charges form a “field of forces” called an
electric field.
This electric field is a barrier to the free electrons in the n region, and energy
most be expended to move an electron through the electric field. That is, external
energy must be applied to get the electrons to move across the barrier of the
electric field in the depletion region.
Fig. 41-12
Fig. 41-13
The Junction Rectifier, cont’d
Forward-bias Back-bias
Fig. 41-14
Light Emitting Diode
At junction, electrons recombine with holes across Eg, emitting light in the process
c c hc
f Eg h Eg
Fig. 41-15
Fig. 41-16
The Photo-Diode
Use a p-n junction to detect light. Light is absorbed at p-n
junction, producing electrons and holes, allowing a detectible
current to flow.
Junction Laser
p-n already has a population inversion. If the
junction is placed in an optical cavity (between
two mirrors), photons that reflect back to the
junction will cause stimulated emission, producing
more identical photons, which in term will cause
more stimulated emision.
The Transistor
Transistor is a three terminal device where a small gate (G) voltage/current controls
the resistance between the source (S) and drain (D), allowing large currents to
flow→power amplification!
Field Effect Transistor: gate voltage depletes (dopes)
charge carriers in semiconductor, turning it into an
insulator (metal)
Fig. 41-18
metal-oxide-semiconductor-field-
effect-transistor (MOSFET)
Fig. 41-19
Integrated Circuits
Thousands, even millions of transistors and other electronic components
(capacitors, resistors, etc) manufactured on a single chip to make complex devices
such as computer processors.
Fast, reliable, small, well-suited for mass-production.