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The document discusses using an ionic triode in a plasma study facility for thermic and mass transfer analysis. It describes the design and operation of a laboratory facility to analyze the nitriding process using an ionic triode system. The facility allows measurement of electric discharge operation conditions and effects on diffused layers.

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0% found this document useful (0 votes)
20 views

Engleza

The document discusses using an ionic triode in a plasma study facility for thermic and mass transfer analysis. It describes the design and operation of a laboratory facility to analyze the nitriding process using an ionic triode system. The facility allows measurement of electric discharge operation conditions and effects on diffused layers.

Uploaded by

Mihai
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© © All Rights Reserved
We take content rights seriously. If you suspect this is your content, claim it here.
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USING IONIC TRIODE IN A PLASMA STUDY FACILITY IN TERMS OF

TERMIC AND MASS TRANSFER

Mihai AXINTE - “Gh. Asachi” Technical University of Iaşi


Carmen NEJNERU - “Gh. Asachi” Technical University of Iaşi
Manuela PERJU - “Gh. Asachi” Technical University of Iaşi
Ion HOPULELE - “Gh. Asachi” Technical University of Iaşi

Abstract:
Discharging process can produce an undesirable phenomena such as arc discharge or the double cathode
effect. Active screen plasma nitriding (ASPN) is an emerging surface engineering technology. By placing the ionic
triode is amended both polarized electric field distribution between electrodes and the characteristic volt-
amperes curve configuration of electrical discharge. We can change a classical plasma nitriding facility very easy
into ionic triode terms by placing a screen between anode and cathode with a power source to the active screen. A
simplified scheme for a fizico-mathematical model for stability study of electrical discharge inside the thermo-
chemical treatment is presented. Analysis of the test facility has resulted in a better stability in terms of discharge
for polarization of the screen and possibly an increase in heating efficiency.

1. Introduction.

Heating installations currently operating in the heat treatments sectors have a low thermal efficiency,
both due to constructive solutions, and inefficient methods of chemical energy or electrical energy
transformation required in heating premises by thermo-chemical treatment. Using modern heating fluidized
layer in the flow of electrons in vacuum, plasma and laser are effective methods to increase yield and quality
of plants and treated parts.
A classical plasma nitridings should create necessary conditions for achieving an electrical
luminescence in an atmosphere of nitrogen and hydrogen at a pressure as low as (2-12) MBA. where the
nitriding parts should be the discharging cathode, voltage electrical 400 - 1000V.
Physically, the ionic nitriding facility form ionic diode cathode where the cathode is the nitrided part
subject and the discharge atmosphere is formed from a mixture of nitrogen and hydrogen at low pressure.
Physical discharging process produce an undesirable phenomena such as arc discharge or the double
cathode effect, also part of the accumulated heat in the piece is lost in the environment by radiation.
To avoid these 2 phenomena several measures are taken to prevent, so to prevent arc discharge there
are used specialized electronic circuits and to avoid double cathode is amended in convenient way pressure
and supply voltage. Reduced heat loss is achieved through the use of thermal screens.
In case of ionic triode the screen between anode and cathode is electrically polarized, so it changes
the configuration of electric field between anode and cathode.
Changing the electrical field between anode and cathode changes both degeneration conditions of the
discharge in electric arc and the double cathode forming by adjusting electric potential of the screen.
Due to changing electric field that surround the part in the thermo-chemical treatment process the
forming difused layer parameters will change
For the analysis of nitriding process in ionic triode conditions was manufactured a laboratory facility
that allows to track the nitriding technology and physical parameters of discharge in the tenuous gas
environment.
2. Facility for analysis the nitriding process in conditions of using an ionic triode.system type

The physical principle of a triode ion consists in introducing a polarized screen in the electric field
between anode and cathode.
This screen is intended to change the configuration of electric field between anode and cathode, so
that the discharge to change in a convenient way. Polarized screen conditions are good for both of discharge
starting and the discharge stability.
A classical plasma nitridings facility is very easy to adjust in the ionic triode conditions by an
electrical power source to the active screen.
In order to establish the electric discharge operation conditions in the heating process and the
diffused layer effects we designed a laboratory facility that allows the ionic triode presence parameters
measurement.
Operational scheme plant is shown in Figure 1.

Fig.1. Block scheme of the discharge in the tenuous gas in terms of ionic triode.
1 - Transformer - rectifier, 2 - Anodic current regulator, 3 - Device for measuring the anodic
current, 4 - Current regulator for polarization display, 5 - Device for measuring the current
screen, 6 – The installation support, 7 -Vacuum chamber, 8 - Metal anode, 9 - Polarized
screen, 10 - Under heating tubes, 11 - Insulated sheath metal, 12 –Tthermocouple, 13 -
Temperature measuring and controlling installation, 14 - Regulating gas flow system , 15 - Gas
tank , 16 - Vacuum pump, 17 - Vacuum regulating system.
After chamber washing and a vacuum of 10-1 Torr connects anodic current and regulates the
discharging current. After a while the power is connected to the screen and adjust the desired value. It shall
then reduce the degree of vacuum by introducing the gas then adjust anodic current to the desired value. Due
to changing discharge conditions the screen current is changing, which requires appropriate correction.
When the temperature reaches near the prescribed temperature the anodic current discharge is
automatically reduced.
A photo of the plant is shown in Figure 2 where is observed both power supply, adjustment and
measurement desk and the precinct work.
2 1

5 4

Fig.2 Photo- installation in terms of ionic triode:


1 - desk power adjustment and control, 2 - Vacuum bell, 3 - Anode, 4 - Polarized screen, 5-Under heating
tubes

Analysis of the test facility has resulted in a better stability in terms of discharge for polarization of
the screen and possibly an increase in heating efficiency.

3. Electric discharge stability analysis in tenuous gas

In the technological aspects (for the thermo-chemical treatment), the discharge in the tenuous gas
must be stable and efficient in terms of heat and mass transfer in the superficial layer. In electrical discharge
between two electrodes in a tenuous gas there are a range of physical phenomena that lead to a distribution of
electric field (Fig.3).

Fig. 3 - Distribution of electric field in the discharge 1 - Tenuous gas space, 2 -


Anode, 3 - Cathode, 4 - Distribution of electric field, U-voltage power between anode
and cathode, d-distance between anode and cathode
From electric field distribution analysis, it follows that the voltage drop occurs near the cathode,
leading to a process of heating it. This phenomenon is even more intense as the current is higher and the
vacuum is lower (1-10 Torr).
To have a picture of the phenomenon must be analyzed the characteristic curve volt-amps of
discharge into the environment of tenuous gas, an example is provided in Figure 4.

Subnormal luninous
Potential

Transition region
dark discharage
Unselfsustained

discharage

Arc discharge
discharage
Corona
dark discharage
Selfsustained
(Townsend)

discharage
Abnormal
luninous
discharage
luninous
Normal

Current

Fig. 4 characteristic volt-amperes curve for neon at a pressure of 1


Torr in a tube length of 50 cm and eletrodes section of 10 cm2

To achieve thermo-chemical treatment is used the discharge conditions of FG part, which gives both
a good stability of discharge and a power strong enough to ensure that the process of heating the cathode.
An objective analysis of the technological process of thermo-chemical treatment by discharge into
the environment of tenuous gas can be achieved by using a physico-mathematical model so as to reveal the
stability of the process taking into account characteristic diagram volt-amperes.
To ensure stability of the process must take into account both the source of electric power and
consumer characteristics (the discharge gas in tenuous gas.
A simplified scheme for a fizico-mathematical model for stability study of electrical discharge inside
the thermo-chemical treatment is presented in Figure 5.

Fig. 5 - The source-consumer circuit for discharge into the environment of


tenuous gas
. Us-voltage power source,
U-voltage discharge between electrodes,
R-resistance on the circuit power,
I-current intensity.
Under the scheme of figure 5 can be written following equation (physico-mathematical model):

Us = U + IxR (1)

Product I x R represents the drop of resistance voltage circuit.Electrical voltage U (of the discharge
process) is in accordance with characteristic curve volt-amperes (presented in Figure 4) the portion is F-G:

U=Φ(I) (2)

If in the download process appears a disturbance, meaning a variation of current (an instability), then
the voltage will change according to changes in current.

(3)

Power supply will respond with a power of selfinduction, knowing that the power network is
currently via a high voltage transformer. Changing supply voltage Us will value:

(4)

L inductance value depends on the electrical transformer and network features. As a result of these
disruptions, relationship 1 acquires the following form:

Us+ΔUs=U+ΔU+R(I+ΔI) (5)

Introducing the 3,4 values in the relationship 5 resulting:

(6)

Using 1 and simplifying the relationship bearing in mind that the Us-U-IR=0 resulting:
(7)

This relationship can be written as:

(8)

By integrating resulting:

(9)

Conditions for the constant (C) are subject to the disturbance triggering:

For t = 0 corresponds
(10)

Thus the relationship (9) can be written as:


(11)

For the perturbation ( ) to be reduced as quickly as possible it needs to have an electrical


resistance (R) on electrical supply circuit of the discharge as high and a slope of the curve characteristic volt-
amperes more pronounced (F-G portion ).
Increasing resistance from the electrical supply leads to lower efficiency plant which requires the
minimum possible limiting value of this resistance.
Regarding discharge characteristic curve inclination may be altered by adjusting gas pressure in the
chamber and by changing the work current.
By placing the thermal screen is amended both polarized electric field distribution between
electrodes and the characteristic volt-amperes curve configuration of electrical discharge in the environment
of tenuous gas.
For this purpose facility can be used to analyze the thermo-chemical technological treatment.process
stability.

4. Conclusions:

1.-Ionic trioda has positive efect to the nitrided item surface quality, ionic sputtering do not affect
the item roughness.
2.-From the aproached matematical model we observe that facility energetic efficiency grows.
3.-Ionic triode gets all the unwanted discharges avoiding the arc and the double cathode.

Bibligrafie:
[1]- Găluşcă D.G. - Plasma nitriding, Sedcom publishing house, Iaşi, 1997
[2]- Popa, Gh.- Technological applications of plasma, Al. I. Cuza University publishing house, Iaşi, 1998
[3]- Ştefan. M. - Considerations About the Thermal and thermochemical Treatment. Equipments Utilisation
using Vacuum Atmosphere. 15th Heat Treatment National Conference Dunaujvaros, Hungaria, 19-21 oct.
1993
[4]- Vermesan G. - Plasma nitriding technological bases, Sibiu University publishing house, Sibiu, 1992,
[4]- Axinte M., Carmen Nejneru, Hopulele I., Stefan M., Facility for study heating and diffusion
processes in terms of ionic triode plasma, Suceava, The 15-th International conference Tehnomus 2009 pag.
223.

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