2011 IEEE-ACM International Symposium On Nanoscale Architectures-2011
2011 IEEE-ACM International Symposium On Nanoscale Architectures-2011
Abstract—This work discusses the modeling of memristive suggested [23],[24],[25] and shown experimentally [11] that
devices, for architectures where they are used as synapses. It is memristive devices can implement a learning rule observed in
shown that the most common models used in this context do not biological synapses (Spike Timing Dependent Plasticity [26]).
always accurately reflect the actual behavior of popular devices In different contexts, this rule has been shown to have
in pulse regime. We introduce a new behavioral model, intended important potential for machine learning [27],[28].
towards the nanoarchitecture community. It fits the conductance
evolution of Univ. Michigan’s synaptic memristive devices. A Such research could lead to particularly innovative
variation of the model fits HP labs’s memristors’ behavior in the electronic architectures and develop intelligent and low power
same conditions. Finally, we discuss using a simple example the electronic systems able to learn and to adapt themselves to their
importance of this type of modeling for learning architectures environment. Many explorations are now performed in this
and how it can impact the behavior of the learning. direction, both on devices and architectures. A serious
difficulty for the “nanoarchitects” working in that field,
Keywords-component; formatting; style; styling; insert (key however, is that the many memristive technologies that exist
words) rely on different physics. Therefore, they can have extremely
I. INTRODUCTION different behaviors, which can lead to different results if used
for learning. To invent the applications of memristive
In recent years, memristive devices have emerged as a technology, we have to rely on simplified models of devices.
fantastic opportunity for renewal in electronic systems. Are they sufficient? How do they compare with the actual
Memristive devices are a family of two-terminal devices whose technology developed in device labs, especially in “learning-
resistance evolves according to the bias and currents they type” situations?
experience [1]. Different applications fields have been targeted
for such technology. Memory and reprogrammable logic are In this paper, we review the most popular device models
probably the most direct application of memristive devices and used to develop nano-architectures capable of learning with
other nanoscale switches [2]-[9]. A reinvention of logic using memristive devices and introduce a new one. We then compare
schemes appropriate to their device physics has also been these models with measurements from two popular
proposed [10]. Most current proposals, however, do not exploit technologies for use as synapses that rely on different physics:
the multivalued resistance capability (analog memory) which is Univ. Michigan’s nanoscale synapses [11] and HP Labs’s TiO2
a fantastic property of some memristive technology. HP lab’s memristors [1]. We explore strengths and weaknesses of the
original memristors [1] have this feature. It is present in Univ. models and conclude how we believe memristive devices
Michigan’s synaptic devices [11], and others [12],[13]. It has should be considered for studies involving learning.
also been reported in memristive three-terminal devices
II. MEMRISTOR MODELS FOR LEARNING
(optically gated carbon nanotube FETs [14],[15], nanoparticle
organic memory FETs [16], Palermo organic devices [17] and A. The original linear memristor model (model A)
UCLA ionic transistors [18]). Different models have been used by nanoarchitects for
A currently highly researched approach is to use such exploratory studies that aim at taking advantage of multivalued
memristive devices as synapses for learning [19], since this resistance capability of memristive devices. Actually,
may be a way to exploit the intermediate resistance states of the memristors were introduced by HP Labs using a simple model
devices, with relaxed requirements on the controllability of [1] taking inspiration from Chua’s pioneering views on the
such states. Various proposals go into that direction. Some use “fourth passive element”, the memristor [29]. In HP’s model, a
conventional artificial neural networks [20],[21], a concept that memristor of thickness D has two layers: one of low linear
has been experimentally demonstrated in [15]. Some use novel resistance RON, and the second (of thickness w) of high
approaches inspired directly by Biology (like amoeba learning resistance ROFF. The device resistance is therefore:
[22]). Finally, a popular idea is to associate memristive devices
with spiking neural networks (neural networks that compute R RON D w ROFF w
with asynchronous spikes, like the brain). It has indeed been
This work was supported by the European Union through the FP7 Project
NABAB (Contract FP7-216777).
The front between the two regions evolves according to
(where µ is the front mobility)
dw R
ON i
dt D
dR V
i
dt R
dR dG
R2
dt dt
f V
dG
dt Figure 4. Schematization of the two kind of devices considered . a) Univ
Michigan nanoscale synapses. The position of the front between Ag-rich and
which leads to Ag-poor regions determines conductance, b) HP Labs’ TiO2
memristors.Conductance is determined by the thickness of a barrier at the
end of an electroformed conductive channel.
R 2 f V
dR
dt
A. Univ. Michigan’s nanoscale synapses 400 400
Resistance (M)
Resistance (M)
specifically targeted toward synaptic operation with continuous
variation of the resistance (whereas the original devices had
binary resistance, i.e. distinct low and high resistance states). 200 200
The physics of these devices actually seems close to the
original memristor model. Silver is cosputtered with the device
thin film material (silicon), on top of a silver-free layer of thin
film. An electric field moves the silver atoms giving rise to Ag-
rich and Ag-poor regions, the width of which defining the 0 0
device conductance (Fig. 4, a). Thus, unlike many resistive 0 20 40 60 80 100 0 20 40 60 80 100
memory technologies and the group’s previous samples, these Pulse number Pulse number
devices do not switch by rupturing or reforming filaments (in Figure 6. Same as Fig. 5 with resistance.
which case a more binary switching behavior is obtained).
Fig. 5 plots (red diamonds) measurements on these devices B. HP TiO2 memristors
reproduced from [11]. On the left plot, devices were subjected 1.8
1.8
4V
to brief -3.2 V potentiating pulses, and the conductance after -1.4 V 3.5 V
3V
w (nm)
Fig. 6 plots the corresponding resistance data. As seen on Fig 5 1.6
conductance can indeed be tuned finely by the short voltage 1.4
1.6
pulses. However, neither the conductance nor the resistance is 0 0.05
t (s)
linear in respect to pulse number. This invalidates both models 1.2 1.2
B and C for this technology. We also notice an extremely
w (nm)
1.4
asymmetric behavior between potentiation and depression. 0 0.05
t (s)
They both start rapidly and then slow down. This invalidates 1
0 0.5 1 1.5 2 2.5 3
model A. By contrast model D can fit the measurements (blue 0 0.2 0.4 0.6 0.8 1
Time (s)
line in Fig. 1 and Fig. 2) and thus seems appropriate for Time (s)
architectural studies. More experimental data will be needed Figure 7. Tunneling gap width w as a function of time in a serie of
however to fit f+(V) and f-(V) for other voltages than those potentitation (left) or depressing (right) pulses on HP memristors (symbols:
reported in [11]. experimental data from [33], full line: Model D), for different pulse voltages
(left: -1.4 and -1.25 V; right: 4, 3.5 and 3 V). Insets show details of the figure
for short times. Model D parameters are listed in Table I.
60
Low field conductance G (µS)
3 V 600
Low field conductance G (µS)
50 3.5 V
40 40
Conductance (nS)
Conductance (nS)
4 V 400
40
100 200
30 G (µS)
50
0
20 20 20
0 0.05
G (µS)
t (s)
10
-1.25 V 0 10
-1.4 V 0 0.05
t (s)
0
0 0 0 0.2 0.4 0.6 0.8 1 0 1 2 3
0 20 40 60 80 100 0 20 40 60 80 100 Time (s) Time (s)
Pulse number Pulse number
Figure 8. Low field conductance computed from tunneling gap width w from
Figure 5. Evolution of the conductance for the devices from Michigan, fitted Fig 7 in the same conditions. For depressing pulse, conductance is shown in a
with the model D. Left: device conductance (measured at 1 V) after each pulse log scale because of its abrupt change. The insets (details for short time) are
in a serie of potentiating (V=-3.2V) pulses. Right: same with depressing both in linear scale.
(V=2.8V) pulses. Diamond: experimental data, reproduced from [11]. Full
line: Model D (parameters listed in Table I). HP Labs’ TiO2 memristors were first introduced with a
simple physical interpretation [1]. The physical view has
largely progressed with subsequent experiments and analysis
[34],[35],[36]. Comprehensive characteristics of their
dynamical behavior at room temperature were introduced in
[33] and are used as a reference in this paper. The devices
appear to operate via modulation of tunnel barrier width at the
end of a conductive channel that was obtained by
electroformation (Fig. 4, b) [33]. The tunnel width w is the We have seen in part II that the different models used for
essential state parameter that can be connected to current by the designing learning architectures with memristive devices lead
model presented in [37] and in the supplementary information to qualitatively different conductance evolution dynamics when
of [33]. voltage pulses are used to change the conductance (these pulses
constituting a baseline at evaluating memristive device
In [33], the authors extracted the parameter w as a function modeling for learning architectures). In that regard, a
of time t after potentiating and depressing voltage pulses. This significant difference between the common models (A, B, C)
is plotted on Fig. 7 (left: potentiating, right: depressing). This and the new model D is that models A, B, C use symmetric
data was obtained by repeating voltage pulses whose duration equations for potentiating (V<0) and depressing (V>0) pulses,
was not constant. That is why the graphs are plotted as a whereas model D uses asymmetric equations. In particular, for
function of time and not pulse number, and can still be read models A and B, this implies that if a device is in low
similarly to the previous plots of this paper. On Fig. 8, we conductance state, potentiating pulses (pulses that increase the
converted w into a low field conductance using the well- conductance) have a small effect and a number of them is
established model given in [33]. Potentiation (left) starts with required before potentiation becomes efficient. Whereas with
an extremely abrupt increase of conductance and then becomes model D, for a device with a low conductance, the first
a lot slower. Similarly depression (right) starts with an
potentiating pulses cause the most conductance change, and
extremely abrupt decrease of conductance, and then becomes a then potentiation slows down (assuming identical pulses). In
lot slower. Among our models, only model D has this behavior. part III, we have seen how two popular devices actually behave
The initial increase or decrease of conductance is however so more like the new model D. Michigan’s devices can be fitted
abrupt that Fig. 8 cannot be fitted by model D. Without any by model D. In HP’s devices, the state’s variable w may be
change, none of our device model is thus appropriate. roughly modeled by model D, and the conductance switches
Interestingly, however, the evolution of w can be fitted abruptly when the device is in a low or high conductance state.
roughly by the equations of model D, with w taking the place Now, how important is it to catch this behavior correctly
of conductance G (full lines of Fig. 7). The fit is not perfect, when developing nanoarchitectures capable of learning? It
but can give an acceptable model of device behavior for seems to be significantly, in that the considered memristive
architectural studies. Alternatively the full model given in [33] device behavior can have significant repercussions on the
may be used, but is a lot more complex than model D. learning strategy that needs to be put in place. To illustrate this
The reason for which these devices (unlike Michigan’s) point, we performed a simple computational experiment. We
cannot be fitted by model D directly seems to be due to the simulated the behavior of the four models for a series of 2000
tunneling aspect of transport. If the conductance had a linear pulses of either potentiating type (with a probability of Ppot) or
dependence on w, model D would work, but the conductance is depressing type (with a probability of 1 - Ppot). In Fig. 9, we
rather an exponential function of w. This extremely abrupt start show the evolution of the conductance for each model for
of the potentiation and depression would have significant different values of the probability Ppot (0.8, 0.2, 0.6, and 0.4
impact if the device is used for learning. successively). It is noteworthy that the mean conductance
approximates the probability Ppot for the asymmetric model
IV. DISCUSSION (model D). For the models A and B, the initial increase in
conductivity being very slow compared to its initial decrease,
the mean conductance stay close to zero for low values of the
probability Ppot. The model C has a different behavior: since
the conductivity change is independent of the current state of
the device, the conductivity always tends to increase when Ppot
> 0.5 and decrease when Ppot < 0.5 .The conductance of the
device therefore does not stabilize to intermediate values with
this simple scheme.
This illustrates that the type of learning will be different
depending on the model used. In model A and B, low
conductance states are extremely stable. In model C, the
memristive device is naturally led to low or high conductance
states that are more stable. In model D, depending on the model
parameters, any intermediate resistance can be stable. Of
course, the simple computational experiment presented above
does not preclude the learning of stable arbitrary conductance
Figure 9. Conductance as a function of the potentiating / depressing pulses states with devices best modeled by models A, B or C. It
ratio for the four models described above. From top-left to bottom-right: linear suggests, however, that the commonly used models that may
memristor (model A, top, left), threshold models (models B, top, right, and look similar will give very different results regarding the final
C,bottom, left) and asymmetric model (model D, bottom, right). The dashed
red curve is the probability Ppot of the pulse to be a potentiating pulse and the state of learning.
blue curve is a moving average of the conductance of the device.
V. CONCLUSION [7] J. Borghetti, Z. Li, J. Straznicky, X. Li, D.A.A. Ohlberg, W. Wu,
D.R. Stewart, and R.S. Williams, “A hybrid nanomemristor/transistor logic
In this work, we first saw that the equations (linear circuit capable of self-programming,” PNAS, vol. 106, Feb. 2009, pp. 1699 -
memristor A, and threshold models B and C) commonly used 1703.
to model the conductance change of memristive device in [8] E. Linn, R. Rosezin, C. Kugeler, and R. Waser, “Complementary
nanoarchitectures lead to significantly different behaviors when resistive switches for passive nanocrossbar memories,” Nat. Mater., vol. 9,
May. 2010, pp. 403-406.
used with short voltage pulses. Such pulses are fundamental for [9] Q. Xia, W. Robinett, M.W. Cumbie, N. Banerjee, T.J. Cardinali,
nanoarchitectures involving learning. We then presented two J.J. Yang, W. Wu, X. Li, W.M. Tong, D.B. Strukov, G.S. Snider, G.
memristive technologies targeted towards learning, and saw Medeiros-Ribeiro, and R.S. Williams, “Memristor−CMOS Hybrid Integrated
that their behavior matched none of these common models. For Circuits for Reconfigurable Logic,” Nano Lett., vol. 9, Oct. 2009, pp. 3640-
both devices, potentiation (the process that increases the 3645.
[10] J. Borghetti, G.S. Snider, P.J. Kuekes, J.J. Yang, D.R. Stewart,
conductance of the memristors) and depression (the processes and R.S. Williams, “`Memristive’ switches enable `stateful’ logic operations
that decreases it) are extremely asymmetric, which none of the via material implication,” Nature, vol. 464, Apr. 2010, pp. 873-876.
three models captures. The new model that we introduced [11] S.H. Jo, T. Chang, I. Ebong, B.B. Bhadviya, P. Mazumder, and W.
(asymmetric model D) corrects this issue and fits Lu, “Nanoscale Memristor Device as Synapse in Neuromorphic Systems,”
measurements on Univ. Michigan’s synaptic devices directly, Nano Lett., vol. 10, Apr. 2010, pp. 1297-1301.
[12] H. Choi, H. Jung, J. Lee, J. Yoon, J. Park, D.-jun Seong, W. Lee,
and after an adaptation measurements on HP Labs’ original M. Hasan, G.-Y. Jung, and H. Hwang, “An electrically modifiable synapse
memristors. Finally, we pointed with a simple simulation that array of resistive switching memory,” Nanotechnol., vol. 20, 2009, p. 345201.
using one or the other of the models will change the stability of [13] S. Yu, Y. Wu, and H.-S.P. Wong, “Investigating the switching
the memristors’ states in a learning situation. All this suggests dynamics and multilevel capability of bipolar metal oxide resistive switching
that existing memristors’ models should be used with caution memory,” Appl. Phys. Lett., vol. 98, 2011, p. 103514.
when developing this kind of architectures. [14] W.S. Zhao, G. Agnus, V. Derycke, A. Filoramo, J.-P. Bourgoin,
and C. Gamrat, “Nanotube devices based crossbar architecture: toward
neuromorphic computing,” Nanotechnol., vol. 21, 2010, p. 175202.
TABLE I. MODEL PARAMETERS USED IN THIS PAPER [15] S.-Y. Liao, J.-M. Retrouvey, G. Agnus, W. Zhao, C. Maneux, S.
Fregonese, T. Zimmer, D. Chabi, A. Filoramo, V. Derycke, C. Gamrat, and J.-
Figure Model parameters
O. Klein, “Design and Modeling of a Neuro-Inspired Learning Circuit Using
Fig. 1, 2 Nanotube-Based Memory Devices,” IEEE Trans. Circuits Syst. Regul. Pap.,
1.25.10 ²/V/ms
12
model A in press.
Fig. 1, 2 [16] F. Alibart, S. Pleutin, D. Guérin, C. Novembre, S. Lenfant, K.
f(1V)=-f(-1V)=0.85 M/ms
model B Lmimouni, C. Gamrat, and D. Vuillaume, “An Organic Nanoparticle
Fig. 1, 2 Transistor Behaving as a Biological Spiking Synapse,” Adv. Funct. Mater.,
f(1V)=-f(-1V)=12.5 nS/ms
model C vol. 20, 2010, pp. 330-337.
Fig. 1, 2 = 2.0, = 3.5, f+(1V)= 40 nS/ms, f-(- [17] V. Erokhin, T. Berzina, and M.P. Fontana, “Hybrid electronic
model D 1V)=150 nS/ms device based on polyaniline-polyethyleneoxide junction,” J. Appl. Phys., vol.
Fig. 1,2 97, 2005, p. 064501.
Gmin = 10 nS, Gmax = 1 µS
all models [18] Q. Lai, L. Zhang, Z. Li, W.F. Stickle, R.S. Williams, and Y. Chen,
= 3.0, = 2.8, f+(1V)= 600 nS/ms, f-(- “Ionic/Electronic Hybrid Materials Integrated in a Synaptic Transistor with
Fig. 5,6
1V)=900 nS/ms, Gmin = 3.3 nS, Gmax = 40 nS Signal Processing and Learning Functions,” Adv. Mater., vol. 22, 2010, pp.
Potentation: = 20.0, f+ (-1.4V)= 0.1 mm/s, f+ (- 2448-2453.
1.25V)= 0.9 mm/s, wmin=1.3nm, wmax=1.8 nm [19] M. Versace and B. Chandler, “The brain of a new machine,” IEEE
Fig. 7 Depression: (4 V, 3.5 V, 3 V) = 14.2, 13.0, 14.8, Spectrum, vol. 47, 2010, pp. 30-37.
f(4 V, 3.5 V, 3 V) = 0.0026, 0.0028, 0.23 mm/s, [20] J.H. Lee and K.K. Likharev, “Defect-tolerant nanoelectronic
wmin=1.1nm, wmax=1.65nm pattern classifiers,” Int. J. Circuit Theory Appl., vol. 35, 2007, pp. 239-264.
[21] D. Chabi and J.-O. Klein, “Hight fault tolerance in neural
ACKNOWLEDGMENTS crossbar,” Int. Conf. on Design and Technology of Integrated Systems in
Nanoscale Era (DTIS), 2010, pp. 1-6.
We would like to thank D. Chabi, J.-O. Klein, W. Zhao, [22] Y.V. Pershin, S. La Fontaine, and M. Di Ventra, “Memristive
J. Saint-Martin and V. Derycke. model of amoeba learning,” Physical Review E, vol. 80, 2009, p. 021926.
[23] G.S. Snider, “Spike-timing-dependent learning in memristive
REFERENCES nanodevices,” Prof. of IEEE International Symposium on Nanoscale
[1] D.B. Strukov, G.S. Snider, D.R. Stewart, and R.S. Williams, “The Architectures 2008 (NANOARCH), 2008, pp. 85-92.
[24] J.A. P rez-Carrasco, C. Zamarreño-Ramos, T. Serrano-
missing memristor found,” Nature, vol. 453, May. 2008, pp. 80-83.
[2] D.B. Strukov and K.K. Likharev, “CMOL FPGA: a reconfigurable Gotarredona, and B. Linares-Barranco, “On neuromorphic spiking
architecture for hybrid digital circuits with two-terminal nanodevices,” architectures for asynchronous STDP memristive systems,” Proc. of 2010
IEEE Int. Symp. on Circuits and Systems (ISCAS), 2010, pp. 1659-1662.
Nanotechnology, vol. 16, 2005, pp. 888-900.
[3] J.R. Heath, P.J. Kuekes, G.S. Snider, and R.S. Williams, “A [25] D. Querlioz, O. Bichler, and C. Gamrat, “A memristor-based
defect-tolerant computer architecture: Opportunities for nanotechnology,” spiking neural network immune to device variations,” Proc. of IJCNN 2011,
in press.
Science, vol. 280, 1998, p. 1716--1721.
[4] A. DeHon, “Array-based architecture for FET-based, nanoscale [26] H. Markram, J. Lubke, M. Frotscher, and B. Sakmann,
electronics,” IEEE Trans. Nanotechnol., vol. 2, 2003, pp. 23-32. “Regulation of Synaptic Efficacy by Coincidence of Postsynaptic APs and
EPSPs,” Science, vol. 275, Jan. 1997, pp. 213-215.
[5] A. DeHon and K.K. Likharev, “Hybrid CMOS/nanoelectronic
digital circuits: devices, architectures, and design automation,” Proceedings of [27] T. Masquelier and S.J. Thorpe, “Unsupervised Learning of Visual
the 2005 IEEE/ACM Int. conf. on Computer-aided design, Washington, DC, Features through Spike Timing Dependent Plasticity,” PLoS Comput Biol, vol.
3, Feb. 2007, p. e31.
USA: IEEE Computer Society, 2005, p. 375–382.
[6] D.B. Strukov and R.S. Williams, “Four-dimensional address [28] B. Nessler, M. Pfeiffer, and W. Maass, “STDP enables spiking
topology for circuits with stacked multilayer crossbar arrays,” PNAS, vol. 106, neurons to detect hidden causes of their inputs,” Advances in Neural
Dec. 2009, pp. 20155 -20158. Information Processing Systems (NIPS’09), p. 1357–1365.
[29] L. Chua, “Memristor-The missing circuit element,” IEEE
Transactions on Circuit Theory, vol. 18, 1971, pp. 507-519. Behavior,” Small, vol. 5, 2009, pp. 1058-1063.
[30] G.S. Snider, “Self-organized computation with unreliable, [35] D.B. Strukov and R.S. Williams, “Exponential ionic drift: fast
memristive nanodevices,” Nanotechnol., vol. 18, 2007, p. 365202. switching and low volatility of thin-film memristors,” Appl. Phys. A, vol. 94,
[31] S.H. Jo, K.-H. Kim, and W. Lu, “Programmable Resistance 2008, pp. 515-519.
Switching in Nanoscale Two-Terminal Devices,” Nano Lett., vol. 9, Jan. [36] J. Borghetti, D.B. Strukov, M.D. Pickett, J.J. Yang, D.R. Stewart,
2009, pp. 496-500. and R.S. Williams, “Electrical transport and thermometry of electroformed
[32] S.H. Jo and W. Lu, “CMOS Compatible Nanoscale Nonvolatile titanium dioxide memristive switches,” J. Appl. Phys., vol. 106, 2009,p.
Resistance Switching Memory,” Nano Lett., vol. 8, Feb. 2008, pp. 392-397. 124504.
[33] M.D. Pickett, D.B. Strukov, J.L. Borghetti, J.J. Yang, G.S. Snider, [37] J.G. Simmons, “Generalized Formula for the Electric Tunnel Effect
D.R. Stewart, and R.S. Williams, “Switching dynamics in titanium dioxide between Similar Electrodes Separated by a Thin Insulating Film,” J.
memristive devices,” J. Appl. Phys., vol. 106, 2009, p. 074508. Appl. Phys., vol. 34, 1963, p. 1793.
[34] D.B. Strukov, J.L. Borghetti, and R.S. Williams, “Coupled Ionic
and Electronic Transport Model of Thin-Film Semiconductor Memristive