Production of Polysilicon using a Modified Siemens

Process

ENES489P: Hands-On Systems Engineering Project Report

Steven Geng
Alex Yu

May 11, 2011

1
Project Abstract

Systems engineering is a unique approach to modeling many different processes. A high

level approach is used to analyze the design of an alternative version of a polysilicon production
facility. The system functions by structuring the pathways of the chemical process. The Siemens
process is currently the de facto standard in the production of polysilicon. This system strives to
improve upon this design as well as to create additional profit through an additional process
reaction that utilizes the waste products of the Siemens product. The primary flow of the entire
process is to first convert metallurgical grade silicon to a chlorosilane intermediate which then
deposits to form the desired polysilicon product but also forms a tetrachlorosilane as a waste
byproduct. The additional process converts the tetrachlorosilane to silicon dioxide which can be
further processed by the silicone industry.

The structure of the process include the primary manufacturing equipment and
specifically the deposition reactor. Different operating parameters for the deposition reactors are
considered in order to optimize the performance, cost, and safety of the reactor. These factors are
subjected to a trade-off analysis to determine the optimal combinations of components and
further used in the system entirety to meet the goal of a minimum 10% return on investment.

2
Contents
Project Description ....................................................................................................................................... 4
Problem Statement.................................................................................................................................... 4
Customer Requirements ........................................................................................................................... 4
Objectives................................................................................................................................................. 4
Terminology ............................................................................................................................................. 4
System Structure........................................................................................................................................... 5
ChemCAD Process Flow Diagram........................................................................................................... 5
Use Case Diagram .................................................................................................................................... 6
Activity Diagrams ........................................................................................................................................ 7
Textual Scenarios ......................................................................................................................................... 9
Use Case 1: Reaction from Input to form Product .................................................................................. 9
Use Case 2: Alarm................................................................................................................................. 16
Use Case 3: Maintenance .................................................................................................................. 19
Requirements and Traceability................................................................................................................... 22
High level requirements & specifications .............................................................................................. 23
Derived requirements & traceabiulity .................................................................................................... 23
Trade Off Analysis ..................................................................................................................................... 26
Graph Analysis ....................................................................................................................................... 28
Financials.................................................................................................................................................... 29
References .................................................................................................................................................. 31
Appendix I: ChemCAD Data ..................................................................................................................... 32

3
Project Description
Problem Statement
The majority of companies utilize the Siemens process for the production of solar grade
polysilicon. For every one mole of Si converted to polysilicon, three to four moles are converted
to tetrachlorosilane (TET), a toxic byproduct that is produced during the production of
polysilicon. This is a significant quantity of waste. Unfortunately, A popular solution has been to
dump TET in waste disposal sites. To avoid this chemical dumping, an alternative hydrolysis
reaction is being added on to the polysilicon production system to produce silicon dioxide, a
neutral compound that is further used in the production of silicone and evaluated as system.

Customer Requirements
The investors require a 10% return on investment and a nearly complete elimination of
TET exiting the process.

Objectives
The purpose of this report is to demonstrate the implementation and functionality to
which high level systems concepts can be used to think about current chemical process design.
This study lays out a new framework to approach the design of polysilicon production as well as
tackle a pressing environmental waste issue. To provide a detailed analysis of the system
designed, the following issues will be addressed:

1. How will the system go about producing products?

2. What are the system requirements?
3. What should the system produce?
4. What should objects be classified as?
5. How will objects and actors interact?
6. How will the investment be justified?

Terminology
 Distillation Column: A tall metal cylinder internally fitted with perforated horizontal
plates used to promote separation of miscible liquids.
 Fluidized Bed Reactor: a type of reactor device that can be used to carry out a variety of
multiphase chemical reactions.
 Chemical Vapor Deposition: a chemical process used to produce high-purity, high-
performance solid materials.
 Polysilicon: 99.9999% pure silicon

4
System Structure
ChemCAD Process Flow Diagram

5
Use Case Diagram

6
Activity Diagrams
Use Case 1

7
Use Case 2

8
Use Case 3

Textual Scenarios
Use Case 1: Reaction from Input to form Product
The first use case addresses the primary function of the system, which is to produce
polysilicon product from an input of metallurgical grade silicon (MG-Si) and hydrogen chloride
(HCl). This use case also addresses the goal of dealing with the toxic tetrachlorosilane by
forming it into another product, namely silicon dioxide (SiO)2. Although the specific conditions

9
of the process may be variable, the generalized behavior of the system is as follows: MG-Si is
fed in with HCl to form trichlorosilane (TCS) and impurities. The TCS is then isolated and
reactor to form polysilicon rods. The TET byproducts are then reacted with water in a separate
reactor to for SiO2. The individual scenarios detail the individual reactions and subsystems that
together comprise the overall process:

Scenario (1.1): Formation of chlorosilanes

Description: MG-Si is reacted with dry HCl to form TCS, TET, and other impurities

Primary Object: Fluidized Bed Reactor

Primary Actors: Solid Si and HCl

Pre-condition: FBR is at specified operating conditions

Flow of Events:

1. Solid Si is fed into the reactor

2. HCl is inputted through bottom of system
3. HCl reacts with Si to form silicon chlorides
4. Vapor collected from top of reactor
5. Unreacted mass removed through bottom of reactor
Post-condition: Trichlorosilane is produced, along with tetracholorsilane,
hydrogen(H2), boron trichloride (BCl3), and Phosphate Pentachloride (PCl5).

Scenario (1.2): Separation of FBR products

Description: Products from the FBR are separated into desirables and undesirables via a
series of distillation columns

Primary Object: Distillation Column

Primary Actors: H2, TCS,TET, BCl3, PCl5

Pre-condition: FBR products are fed in at proper conditions and distillation column is
maintained at proper conditions

Flow of Events:

1. FBR products are fed into column

2. FBR products undergo reflux
3. Low boiling impurities exit at the top of the column

10
 4. High boiling impurities exit at the bottom of the column
Post-condition: The desired compound is isolated at a certain purity level and passed
onto the next step in the reaction

Scenario (1.2.1): Separation of H2

Description: H2 is removed from the FBR products

Primary Object: Flash Distillation Drum

Primary Actors: H2, TCS,TET, BCl3, P2Cl5

Pre-condition: Inputs are fed in at proper conditions and the distillation drum is
maintained at proper conditions

Flow of Events:

1. FBR products are fed into drum

2. Products cooled until only H2 remains as gas
3. H2 exits and other compounds are isolated
Post-condition: All H2 is removed from the FBR product stream. The H2-free
stream continues through the rest of the process. The removed H2 is
recycled for use later in the process.

Scenario (1.2.2): Separation of BCl3

Description: BCl3 is removed from the H2 separation products

Primary Object: Distillation Column

Primary Actors: TCS,TET, BCl3, P2Cl5

Pre-condition: Inputs are fed in at proper conditions and the

distillation column is maintained at proper conditions

Flow of Events:

4. H2 separation products are fed into column

5. H2 separation column products undergo reflux
6. BCl3 boils most easily and exits at the top of the column, with a small
amount of other compounds
7. Other compounds exit at the bottom of the column

11
 Post-condition: All BCl3 is removed from the H2 separations product stream and
exits the process as waste. The BCl3-free stream continues through
the rest of the process.

Scenario (1.2.3): Separation of PCl5

Description: PCl5 is removed from the BCl3 separation products

Primary Object: Distillation Column

Primary Actors: TCS,TET, P2Cl5

Pre-condition: Inputs are fed in at proper conditions and distillation column is

maintained at proper conditions

Flow of Events:

1. BCl3 separation products are fed into column

2. BCl3 separation products undergo reflux
3. PCl5 boils least readily and is separated from the other compounds and
exits at the bottom of the column
4. All other compounds exit at the top of the column
Post-condition: All PCl5 is removed from the BCl3 separations product stream
and exits the process as waste. The PCl5-free stream continues through
the rest of the process.

Scenario (1.2.4): Separation of TET

Description: TET is removed from the PCl5 products

Primary Object: Distillation Column

Primary Actors: TCS,TET

Pre-condition: Inputs are fed in at proper conditions and distillation column is

maintained at proper conditions

Flow of Events:

1. PCl5 separation products are fed into column

2. PCl5 separation products undergo reflux
3. TET boils less readily and is separated from TCS and exits at the
bottom of the column
4. TCS exits at the top of the column

12
 Post-condition: Most TET is removed from the TCS product stream at the top of
the column. Both streams go on to be processed further

Scenario (1.3): Formation of polysilicon

Description: TCS is reacted with H2 to form polysilicon rods

Primary Object: Siemens CVD reactor

Primary Actors: TCS, H2

Pre-condition: CVD is at specified operating conditions, silicon will only deposit on the
seed rods

Flow of Events:

1. TCS is mixed with H2 and fed into the CVD reactor

2. TCS reacts with H2to form TET, HCl, and the desired polysilicon
3. Polysilicon deposits onto the silicon seed rods of the CVD reactor
4. Other compounds pass through the CVD for further processing
5. Polysilicon rods collected at the end of the process
Post-condition: Polysilicon rods of 99.9999% purity are formed.

Scenario (1.4): Separation of CVD products

Description: Products from the CVD are separated into desirables and undesirables via a
series of distillation columns

Primary Object: Distillation Column

Primary Actors: TCS,TET, HCl, DCS

Pre-condition: CVD products are fed in at proper conditions and distillation column is
maintained at proper conditions

Flow of Events:

1. CVD products are fed into column

2. CVD products undergo reflux
3. Low boiling impurities exit at the top of the column
4. High boiling impurities exit at the bottom of the column
Post-condition: The desired compound is isolated at a certain purity level and passed
onto the next step in the reaction

13
 Scenario (1.4.1): Separation of TET

Description: TET is removed from the CVD products

Primary Object: Distillation Column

Primary Actors: TCS,TET, HCl, DCS

Pre-condition: Inputs are fed in at proper conditions and distillation column is

maintained at proper conditions

Flow of Events:

1. CVD products are fed into column

2. CVD products undergo reflux
3. TET boils least readily and is separated from TCS and exits at the
bottom of the column
4. TCS, HCl, and DCS exits at the top of the column
Post-condition: Most TET is removed from stream at the top of the
column. Both streams go on to be processed further

Scenario (1.4.2): Separation of HCl

Description: HCl is removed from the CVD products for recycle

Primary Object: Distillation Column

Primary Actors: TCS, HCl, DCS

Pre-condition: Inputs are fed in at proper conditions and distillation column is

maintained at proper conditions

Flow of Events:

1. TET Separation products are fed into column

2. TET Separation products undergo reflux
3. HCl boils most easily and exits at the top of the column
4. TCS, DCS exit at bottom
Post-condition: Most HCl is removed from stream at the bottom of the
column. Both streams are recycled back into the process

Scenario (1.5): Formation of SiO2

14
 Description: TET is reacted with H2O to form SiO2

Primary Object: Hydrolysis Reactor

Primary Actors: TET, H2O

Pre-condition: TET from other parts in the process is mixed with water and fed in at the
proper conditions

Flow of Events:

1. TET and H2O are mixed and enter the reactor

2. TET reacts with H2O to form SiO2 and HCl
3. Products exit the reactor
Post-condition: SiO2 is formed and most of the TET formed from the earlier stages in
the process is consumed

Scenario (1.5.1): Separation of SiO2

Description: Solid SiO2 products are separated from the other compounds

Primary Object: Cyclone

Primary Actors: SiO2, HCl

Pre-condition: Inputs are fed in at proper conditions and cyclone is

maintained at proper conditions. SiO2 is a solid.

Flow of Events:

1. SiO2, HCl product and small amounts of TCS, TET, and water are fed
into the cyclone
2. Solid SiO2 falls to the bottom and exits the cyclone
3. Gaseous compounds exit through the top of the cyclone
Post-condition: All SiO2 is separated from the hydrolysis reactor product stream.

15
Sequence Diagram for Use Case 1

Use Case 2: Alarm

The second use case addresses the necessity of preventing accidents and dangerous
operating conditions within the plant. Sensors must be used throughout the system to monitor the
temperature, pressure, and flow rates. Should any of these conditions fall outside of normal or
allowable operating conditions, the system must trigger an alarm to notify the operators of the
issue.

Scenario (2.1): Temperature sensors

16
 Description: Temperature sensors detect the difference between the desired operating
temperature and the actual operating temperature and alerts if there is a
certain difference between the two.

Primary Object: Temperature sensor

Primary Actors: Streams of reactants and products throughout the system

Pre-condition: Desired operating temperature and maximum allowable difference are

specified

Flow of Events:

1. Temperature sensor takes reading of the operating temperature

2. Sensor compares operating temperature to desired temperature
3. Sensor compares the difference in the actual and desired temperature to the
specified allowable difference
4. If the difference is smaller, then alarm does nothing. If it is larger, the alarm
goes off.
Post-condition: The appropriate action is taken based on the operating temperature. If
there is a dangerous condition, the alarm goes off, if not, then process goes on
as normal.

Scenario (2.2): Pressure

Description: Pressure sensors detect the difference between the desired operating
pressure and the actual operating pressure and alerts if there is a certain
difference between the two.

Primary Object: Pressure sensor

Primary Actors: Streams of reactants and products throughout the system

Pre-condition: Desired operating pressure and maximum allowable difference are

specified

Flow of Events:

1. Pressure sensor takes reading of the operating temperature

2. Sensor compares operating temperature to desired pressure
3. Sensor compares the difference in the actual and desired pressure to the
specified allowable difference
4. If the difference is smaller, then alarm does nothing. If it is larger, the alarm
goes off.

17
 Post-condition: The appropriate action is taken based on the operating pressure. If
there is a dangerous condition, the alarm goes off, if not, then process goes on
as normal.

Scenario (2.3): Flow rate

Description: Flow rate sensors detect the difference between the desired operating
pressure and the actual operating pressure and alerts if there is a certain
difference between the two.

Primary Object: Flow rate sensor

Primary Actors: Streams of reactants and products throughout the system

Pre-condition: Desired operating flow rate and maximum allowable difference are
specified

Flow of Events:

1. Flow rate sensor takes reading of the operating temperature

2. Sensor compares operating temperature to desired pressure
3. Sensor compares the difference in the actual and desired pressure to the
specified allowable difference
4. If the difference is smaller, then alarm does nothing. If it is larger, the alarm
goes off.
Post-condition: The appropriate action is taken based on the operating pressure. If
there is a dangerous condition, the alarm goes off, if not, then process goes on
as normal.

18
Sequence Diagram for Use Case 2

Use Case 3: Maintenance

The third use case addresses the need to perform regular maintenance and inspections on
the plant and ensure the process is operating properly. The maintenance operator should be able
to inspect each reactor and the sensors and piping attached to them. The operator will proceed
with each reactor in sequence and the equipment attached to them. If there is a problem
appropriate actions should be taken to rectify the problem. In the end the time and date of
maintenance should be documented to verify that everything is working as it should. The number
of different possibilities for maintenance issues is too large to comprehensively cover, but the
following scenarios address common/simplified possibilities:

19
Scenario (3.1): Reactor Maintenance

Description: Reactors will be inspected for performance

Primary Object: Reactors

Primary Actors: Maintenance Operator

Pre-condition: Process is not running

Flow of Events:

1. Operator inspects the reactor for any signs of problems

2. If there is a problem, the operator will take appropriate action, whether it is
replacing or fixing the reactor/problem
3. The operator documents the actions taken and the date the inspection took
place
Post-condition: Reactor is ready for optimal performance.

Scenario (3.1.1): Weakened Structural Integrity

Description: Structural weakening in reactors must be detected and replaced

Primary Object: Reactor

Primary Actors: Maintenance Operator

Pre-condition: Process not running

Flow of Events:

1. Maintenance operator inspects reactor

2. Operator discovers structural weakness, such as corrosion from HCl
3. Reactor is removed and replaced with new reactor
4. Maintenance is documented
Post-condition: New reactor installed and process is able to continue without
increased operation hazard levels

Scenario (3.1.2): Leak in Reactor

Description: Reactor develops a leak and must be patched up or replaced

Primary Object: Reactor

Primary Actors: Maintenance Operator

20
 Pre-condition: Process not running

Flow of Events:

1. Maintenance operator inspects reactor

2. Detects leak, most likely through a pressure test
3. Operator determines if leak can be fix through patching or replacement
is immediately necessary
4. Reactor is either fixed or replaced according to the need
5. Maintenance is documented
Post-condition: Leak is fixed, and process is able to continue without
increased operation hazard levels

Scenario (3.2): Sensor and Piping Maintenance

Description: Sensors and pipes will be inspected for performance

Primary Object: Sensors

Primary Actors: Maintenance Operator

Pre-condition: Process is not running

Flow of Events:

1. Operator inspects the sensor for any signs of problems as well as proper
settings
2. Operator inspects the pipes for build-up or clogs or weaknesses
3. If there is a problem, the operator will take appropriate action, whether it is
replacing the sensor/pipes or fixing the settings
4. The operator documents the actions taken and the date the inspection took
place
Post-condition: Sensor and pipes are ready for optimal performance.

Scenario (3.1.2): Temperature Sensor Maintenance

Description: Temperature Sensor tested for accuracy and performance

Primary Object: Temperature Sensor

Primary Actors: Maintenance Operator

Pre-condition: Process not running

21
 Flow of Events:

1. Maintenance operator inspects temperature sensor, testing its

capability to detect known temperatures within the acceptable
accuracy and its ability to determine the correct course of action based
on what it senses
2. Temperature sensor is recalibrated or replaced if not detecting the
correct temperature or taking the right action after detecting
temperature
3. Maintenance is documented
Post-condition: Temperature sensor is able to detect the correct temperature
within the specified accuracy and able to take the correct course of
action based on its readings and process is able to continue without
increased operation hazard levels

Scenario (3.1.2): Piping Leak Maintenance

Description: Pipe tested for leaks

Primary Object: Reactor Piping

Primary Actors: Maintenance Operator

Pre-condition: Process not running

Flow of Events:

1. Maintenance operator inspects pipes for leaks, most likely by running

pressure or flow tests
2. Any presence of leaks is detected and their severity determined
3. If problem is sever, pipe may have to be replaced immediately, if it is
minor, patching of pipe may be acceptable
4. Maintenance is documented
Post-condition: Pipe leak is eliminated and process is able to continue without
increased operation hazard levels

Requirements and Traceability

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High level requirements & specifications
# Requirements Specifications

1 Produce Polysilicon >1000MTA

2 Minimize TET waste <1MTA

3 Produce SiO2 >3000MTA

4 Produce a profit 10% return on investment over 10 years

5 Produce high quality Poly-Si >99.9999% purity

6 Produce high quality SiO2 >97% purity

Derived requirements & traceabiulity

Req.
Use Case Scenario Description
#

1.1 1.1.1 MG-Si must react with HCl to for TCS

1.1 1.1.2 Vapor must pass through top of FBR

Solid wastes must exit through bottom

1.1 1.1.3
of FBR

Reaction of input to
Vapor from FBR must be separated
form output 1.2 1.2.1
into desirables and undesirables

1.2.1 1.2.2 All H2 is removed from stream

1.2.2 1.2.3 All BCl3 is removed from stream

1.2.3 1.2.4 All PCl5 is removed from stream

23
 1.2.4 1.2.5 Most TET is separated from TCS

1.3 1.3.1 TCS reacts with H2 to form Poly-Si

1.3 1.3.2 Poly-si is deposited onto seed rods

1.3 1.3.3 Poly-si is >99.9999% purity

1.3 1.3.4 Other compounds exit CVD safetly

Products from CVD are separated into

1.4 1.4.1
desirables and undesirables

Most TET is removed from CVD

1.4.1 1.4.2
product stream

1.4.2 1.4.3 Most HCl is removed from stream

TET must react with H2O to form

1.5 1.5.1
SiO2

1.5 1.5.2 SiO2 must be >97% purity

Most TET from process must be

1.5 1.5.3
consumed

SiO2 must exit through bottom of

1.5.1 1.5.4
cyclone

Other compounds exit through top of

1.5.1 1.5.5
cyclone

Req.
Use Case Scenario Description
#

24
 Temperature sensors detect operating temperature
2.1 2.1.1
within 1 K (Kelvin, not 1000) accuracy

Temperature sensors determine difference between

2.1 2.1.2
operating and desired conditions

2.1 2.1.3 Temperature sensors take correct action

Pressure sensors detect operating pressure within

2.2 2.2.1
0.1 bar accuracy
Alarm
Pressure sensors determine difference between
2.2 2.2.2
operating and desired conditions

2.2 2.2.3 Pressure sensors take correct action

2.3 2.3.1 Flow rate sensors detect operating flow rate within

Flow rate sensors determine difference between

2.3 2.3.2
operating and desired conditions

2.3 2.3.3 Flow Rate sensors take correct action

Maintenance operator must be able to inspect all

3.1 3.1.1
aspects of the reactors

Reactors should be able to be replaced without

3.1 3.1.2
dismantling the entire plant
Maintenance
Sensors must be able to be operated apart from the
3.2 3.2.1
rest of the process

Spare sensor and piping parts/equipment should be

3.2 3.2.2
available

25
Trade Off Analysis
The trade-off analysis focuses on the primary deposition reactor for three system level
aspects: energy used,polysilicon production, and safety. The focus on the deposition reactor is
due to its possession of the greatest variability in results and is the entire purpose of the entire
system. For the design in the trade-off analysis, operating condition variables of temperature and
pressure were chosen and their effect on the energy used, production, and safety was assessed.
The energy used is the required energy necessary to supplement the reactions that occur. The
production is the total amount of solid polysilicon that is produced in the deposition reactor. The
relative safety risk is classified from 1 to 4 where pressure is the primary consideration of risk
with operating temperature as a secondary risk. The table below displays the quantitative values
of specified operating variables and conditions.

Operating
Operating Energy Used Production Relative
System Temperature
Pressure (bar) (kWh) (kmol/hr) Safety Risk
Number (K)
1 1373 1.1 424 3.54 4
2 1373 1 428 3.58 2
3 1373 0.9 433 3.63 3
4 1273 1.1 409 3.11 3
5 1273 1 413 3.15 2
6 1273 0.9 417 3.19 2
7 1173 1.1 395 2.80 3
8 1173 1 398 2.82 1
9 1173 0.9 402 2.85 2
Possible combinations of systems arrangements were based on variations in temperature and
pressure. There are many possible combinations of operating temperatures and pressure. For the
purposes of this report, only 3 different temperatures and 3 different pressures are considered. In
order to carry out the tradeoff analysis, the graphs of the 3 system level aspects are plotted.

26
 Production vs Energy Used
4
System 1
3.5
Polysilicon (kmol/hr)

3 System 2

2.5 System 3
2 System 4
1.5 System 5
1 System 6
0.5
System 7
0
System 8
390 400 410 420 430
Energy Used (kWh) System 9

Safety Risk vs Production

4.5
System 1
4
3.5 System 2
3 System 3
Safety Risk

2.5
System 4
2
1.5 System 5
1 System 6
0.5 System 7
0
System 8
0 1 2 3 4
Production (kmol/hr) System 9

27
 Safety Risk vs Energy Used
4.5
System 1
4
3.5 System 2
3 System 3
Safety Risk

2.5
System 4
2
1.5 System 5
1 System 6
0.5 System 7
0
System 8
390 400 410 420 430 440
Energy Used (kWh) System 9

Graph Analysis
The graphs show each system as a point of interest that can be considered more
thoroughly to determine an optimal setting. For the safety risk factor and the amount of energy
used, it is desirable to be closer to the origin for optimal placement of points. For the production
of polysilicon, it is ideal to be further away from the origin for optimal placement of points.

From the Production vs. Energy Used graph, there is a very distinct and clear trend. As
the amount of energy used increases, so does the amount of polysilicon produced. While the
graph appears to show a very distance and large difference in the amount of energy used in order
to produce more polysilicon, it can be seen that the difference in energy used between system 4
and system 2 is only 8% higher whereas the difference in production is a significant 27%
increase in production. With this, it is clear that from a very distinct trend associated between
energy consumed by the reactor and the production amount that a higher energy consumption
rate is ideal as the production quantity of polysilicon is increased at a much larger quantity.

Next, the safety risk vs production graph is considered. There is no clear trend between
the safety risk of the deposition reactor and the production quantity. In addition, a higher
production rate naturally increases the operating conditions of the deposition reactor resulting in
higher safety risk. In effort to minimize the safety risks of the process while maintaining as large
production as possible, systems 8 and system 2 are reasonable candidates for consideration.

Lastly, the safety risk vs energy graph is considered. Again, there is no clear trend
between the safety risk and the consumption of energy. There is also no direct connection
between an increase in energy consumption and safety risk. Due to many systems having
relatively low safety risks, the ones with the lowest energy use are system 8 and system 9.

28
 In order to find the best combination of design variables, a consideration of all 3 graphs
is necessary. However, at the present time, energy costs are valued at a very low $0.06/kWh.
Because of this allowance, focus will not be placed on the safety risk vs energy graph. From the
remaining graph analysis, an overlap of optimal systems is obtained for system 8 and system 2.
While system 8 has the lowest safety risk, the large increase in polysilicon production can be
justified and the risk assessed to prevent accidents.

Financials
The fixed costs of all process equipment are calculated via chemcad or obtained by industry
standards.

Fixed Installed
Cost
Distillation Column
3 $ 1,300,000.00
Distillation Column
6 $ 1,300,000.00
Distillation Column
17 $ 1,000,000.00
Distillation Column
18 $ 1,400,000.00
Distillation Column
19 $ 1,400,000.00

Cyclone 9 $ 1,500.00

Cylone 10 $ 1,500.00

FBR $ 39,000.00

FBR Separator $ 3,200.00

FBR Separator 2 $ 5,000.00

CVD $ 40,000,000.00

Hydrolysis Reactor $ 115,000.00

SUMMATION $ 46,565,200.00

29
Variable costs are calculated via the input and output of the system as well as tacking on
additional overhead such as tax on revenue and 325 day operation.

Energy Cost $ 20,738,473.57

Silicon 46526789.84
SiO2 19850899.66

Current Consumption
H2 -329664
HCl -45496.37474
H2O -3299.649408
Mg Si -8883302.4
Operating Running
Total 36,377,453.50

This leads to an overall economic forecast indicated by the graph below: The first year is forecasted to
be complete installation of the facility. The second year is taken to be half capacity and only by third
year is full capacity in effect. This returns a return on investment of 66% allowing for additional
consideration in safety of system performance as well as other miscellaneous costs not taken into
account by an elementary financial analysis.

Profit Projections
$100.00
Millions

$80.00
$60.00
$40.00
$20.00
$-
1 2 3 4 5 6 7 8 9 10
$(20.00)
$(40.00)
$(60.00)
Year

30
References

Dow Corning. (2010, November 16). Dow Corning(R) Q1-2333 Chemical Grade
Trichlorosilane. Retrieved Febuary 15, 2011, from Dow Corning:
http://www3.dowcorning.com/DataFiles/090007b2815f0cc8.pdf

Fisher Scientific. (2005, October 3). Hydrochloric Acid, 1N Standard Solution MSDS.
Retrieved Febuary 15, 2011, from Fisher Scientific:
https://fscimage.fishersci.com/msds/95551.htm

Forbes. (2011, Febuary 9). Polysilicon price pop casts shadow on sunpowers profits.
Retrieved Febuary 15, 2011, from Forbes:
http://blogs.forbes.com/greatspeculations/2011/02/09/polysilicon-price-pop-casts-shadow-
on-sunpowers-profits/

Gunther, E. A. (2010, January 15). AE Polysilicon scores $4.85 US Manufacturing Tax

Credit. Retrieved Febuary 15, 2011, from Edgar A. Gunther:
http://guntherportfolio.com/2010/01/ae-polysilicon-scores-44-85-million-us-manufacturing-
tax-credit/

Gunther, E. A. (2009, August 3). Solar Polysilicon Oversupply until 2013? Retrieved
Febuary 15, 2011, from Gunther Porfolio: http://guntherportfolio.com/2009/08/solar-
polysilicon-oversupply-until-2013/

Hazeltine, B., Fero, C., Wenjun, Q., & Inc., G. S. (2010, June 30).
Advancements in the Commercial Production of Polysilicon, Retrieved Febuary 22, 2011,
from Renewable Energy World:
http://www.renewableenergyworld.com/rea/news/article/2010/06/advancements-in-the-
commercial-production-of-polysilicon

Hummel Croton Inc. (2007, April 24). Silicon Powder MSDS. Retrieved Febuary 15, 2011,
from Hydrazin: http://www.hydrazin.com/msds/msdsp/si_p.html

Myers, S., & Yuan, L. (2011), China's Solar Energy Inudstry. Retrieved Febuary 15, 2011,
from altenergymag.com:
http://www.altenergymag.com/emagazine.php?issue_number=07.06.01&article=china

National Renewable Energy Laboratory. (n.d.). Energy Technology Cost and Performance
Data.

PVinsights. (2011, Febuary 9). PVinsights. Retrieved Febuary 15, 2911, from
http://pvinsights.com/

Rao, H. (2008, September 8). Polysilicon prices go through the roof, Retrieved Febuary 15,
2011, from Project Monitor: http://www.projectsmonitor.com/detailnews.asp?newsid=16898

31
 Salama, T. A., Elmorsy, S. S., & Ismail, M. A. (2008, November), Tetrachlorosilane - A
Versatile Reagent in Organic Synthesis, Retrieved Febuary 22, 2011, from
http://www.usc.es/congresos/ecsoc/12/hall_a_GOS/a0002/a0002.pdf

Scotte Catalog. (2001, March 9). Silicon Tetrachloride, Retrieved Febuary 15, 2011, from
Scotte Catalog:
http://www.scottecatalog.com/msds.nsf/0/7a864c42804268b585256a0a004e1acb?OpenDocu
ment

Specialty Gases of America. (2010, January 13). Dichlorosilane MSDS, Retrieved Febuary
15, 2011, from Specialty Gases of America:
http://specialtygasesofamerica.com/msds/dichlorosilane-msds.pdf

Suguru, N., Katsuaki, T. Z., Takashi, Y., & Toshio, O. (2004, January 2),
Reaction of Si with HCl to Form Chlorosilanes. Retrieved Febuary 22, 2011,
from AIP:
http://scitation.aip.org/getpdf/servlet/GetPDFServlet?filetype=pdf&id=JESOAN0001510000
0600C399000001&idtype=cvips&prog=normal

The Linde Group. (2010, September 2),

Hydrogen MSDS. Retrieved Febuary 15, 2011, from Linde US:
http://msds.lindeus.com/files/msds/WPS_LIND_047_HYDROGEN_NA_MSDS_FINAL_R
EV_9_2_10.pdf

TNC Solar. (2011, January 24),

PV Industry, polysilicon prices are still afraid of excess production.
Retrieved Febuary 15, 2011, from TNC Solar:
http://en.tncsolar.com/news_detail/newsId=4857e209-adfd-466c-abc3-
4159e4fa2c9a&comp_stats=comp-FrontNews_list01-1293623399865.html

Walch, S. P., & Dateo, C. E. (2001, July 11).

Reactions of SiCl2 and SiHCl with H and Cl Atoms.
Retrieved Febuary 22, 2011, from J. Phys. Chem.
http://chem.skku.ac.kr/~wkpark/trash/jp0126154.pdf

Wang, U. (2008, November 13), Polysilicon Prices Head for a Steep Fall.
Retrieved Febuary 15, 2011, from greentechsolar:
http://www.greentechmedia.com/articles/read/polysilicon-prices-head-for-a-steep-fall-5174/

Appendix I: ChemCAD Data

32
CHEMCAD 6.0.1 Page 1

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15

FLOWSHEET SUMMARY

Equipment Label Stream Numbers

1 REAC 3 -4
2 CSEP 4 -5 -6
3 SCDS 35 -7 -8
4 GIBS 33 -2
5 CSEP 2 -21 -22
6 SCDS 22 -32 -24
7 MIXE 8 24 11 -12
8 REAC 12 -10
9 CYCL 10 -13 -14
10 CYCL 13 -18 -19
12 MIXE 7 5 9 -1
13 CYCL 15 -16 -17
14 MIXE 14 19 -20
16 SCDS 6 -30 -31
17 SCDS 32 -29 -23
18 MIXE 1 23 -33
19 SCDS 31 -35 -34

Stream Connections

Stream Equipment Stream Equipment Stream Equipment

From To From To From To
1 12 18 12 7 8 23 17 18
2 4 5 13 9 10 24 6 7
3 1 14 9 14 29 17
4 1 2 15 13 30 16
5 2 12 16 13 31 16 19
6 2 16 17 13 32 6 17
7 3 12 18 10 33 18 4
8 3 7 19 10 14 34 19
9 12 20 14 35 19 3
10 8 9 21 5
11 7 22 5 6

Calculation mode : Sequential

Flash algorithm : Normal

Equipment Calculation Sequence

1 2 13 16 19 3 12 18 4 5 6 17 7 8 9 10 14

Equipment Recycle Sequence

18 4 5 6 17

Recycle Cut Streams

33
 23

CHEMCAD 6.0.1 Page 2

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15

Recycle Convergence Method: Direct Substitution

Max. loop iterations 40

Recycle Convergence Tolerance

Flow rate 1.000E-003

Temperature 1.000E-003
Pressure 1.000E-003
Enthalpy 1.000E-003
Vapor frac. 1.000E-003

Recycle calculation has converged.

Run Time Error and Warning Messages:

*** Equip. 19 ***

Can't converge with original specs. Alternative optimal solution is found.

* Uop 12, Check mass balance.

CHEMCAD 6.0.1 Page 3

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15

Overall Mass Balance kmol/h kg/h

Input Output Input Output
Hydrogen 10.000 26.571 20.158 53.561
Dichlorosilane 0.000 0.015 0.000 1.505
Trichlorosilane 0.000 0.160 0.000 21.729
Silicon TetraCl 0.000 0.126 0.000 21.344
Hydrogen Chlorid 39.690 37.694 1447.137 1374.361
Silicon 12.600 4.055 353.871 113.884
Water 18.840 3.008 339.403 54.182
Silicon Dioxide 2.575 10.491 154.716 630.354
Boron Trichlorid 0.008 0.008 0.903 0.899
Phosphoric Chlor 0.008 0.008 1.606 1.606

Total 83.720 82.135 2317.795 2273.425

Warning: Overall mass balance not good enough. Need lower flow tolerance.

34
CHEMCAD 6.0.1 Page 4

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15

COMPONENTS
ID # Name Formula
1 1 Hydrogen H2
2 935 Dichlorosilane H2Cl2Si
3 938 Trichlorosilane HCl3Si
4 944 Silicon TetraCl Cl4Si
5 104 Hydrogen Chlorid HCl
6 993 Silicon Si * solid *
7 62 Water H2O
8 987 Silicon Dioxide O2Si * solid *
9 629 Boron Trichlorid BCl3
10 946 Phosphoric Chlor Cl5P

THERMODYNAMICS

K-value model : Henry's law

Enthalpy model : Latent Heat
Liquid density : Library

Std vapor rate reference temperature is 0 C.

Atmospheric pressure is 1.0132 bar.

35
CHEMCAD 6.0.1 Page 5

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15
EQUIPMENT SUMMARIES

Reactor Summary

Equip. No. 1 8
Name
Thermal mode 2 2
Temperature K 623.0000 573.0000
Heat duty kW -802.9692 1391.8734
Key Component 6 4
Frac. Conversion 1.0000 0.9990
Reactor Pressure bar 1.0000
Calc H of Reac. -230448.5938 471754.5000
(kJ/kmol)

Stoichiometrics:
Hydrogen 1.150 0.000E+000
Trichlorosilane 0.850 0.000E+000
Silicon TetraCl 0.150 -1.000
Hydrogen Chlori -3.150 4.000
Silicon -1.000 0.000E+000
Water 0.000E+000 -2.000
Silicon Dioxide 0.000E+000 1.000

Component Separator Summary

Equip. No. 2 5
Name
Top Temp Spec 623.0000 1373.0000
Bottom Temp Spec 623.0000 1373.0000
Heat duty kW 0.0001 -69.1435
Component No. 1 1.0000 1.0000
Component No. 6 1.0000 1.0000
Component No. 9 1.0000
Component No. 10 1.0000

Scds Rigorous Distillation Summary

Equip. No. 3 6 16 17
Name
No. of stages 20 20 20 10
1st feed stage 4 10 11 5
Condenser mode 7 1 7 1
Condenser spec 0.9900 20.0000 0.9950 5.0000
Cond comp i pos. 3 3 9 0
Reboiler mode 7 7 7 7
Reboiler spec. 0.9900 0.9000 0.9950 0.9000
Reboiler comp i 4 4 3 2
Est. dist. rate 10.6667 2.9630
(kmol/h)

36
Est. reflux rate 24.6230 14.8150
(kmol/h)

CHEMCAD 6.0.1 Page 6

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15
EQUIPMENT SUMMARIES

Est. T top K 304.6428 321.1796 304.3802 188.9737

Est. T bottom K 329.6360 332.2907 315.4913 301.7689
Est. T 2 K 304.6835 189.4986
Calc Cond duty kW -1087.2502 -1391.5433 -542.2547 -165.2581
Calc Reblr duty kW 1087.7965 936.9020 354.4969 176.9636
Initial flag 6 1 6 1
Calc Reflux mole 143.7663 188.2681 77.1328 30.2214
(kmol/h)
Calc Reflux ratio 13.6045 20.0000 1260.2826 5.0000
Calc Reflux mass kg/h 19481.4766 13934.0947 10270.8555 1106.7990
Column diameter m 2.5000 2.5000 2.5000 2.5000
Tray space m 2.4000 2.4000 2.4000 2.4000
Column length m 17.0000 17.0000 21.0000 12.0000
Thickness (top) m 0.0600 0.0600 0.0600 0.0600
Thickness (bot) m 0.0600 0.0600 0.0600 0.0600
Material density 7850.0000 7850.0000 7850.0000 7850.0000
(kg/m3)
Actual no of trays 24.0000 24.0000 24.0000 12.0000
Install factor 3.0000 3.0000 3.0000 3.0000
Column purchase $ 395090 395090 449095 309574
Column installed $ 1185270 1185270 1347286 928722
Cost estimation flag 1 1 1 1
Shell weight kg 70393 70393 85189 51896
Cost of shell $ 253702 253702 292580 202779
Cost of trays $ 37551 37551 37551 25964
Platform & ladder $ 19507 19507 23107 14755
No of sections 1 1 1 1
Condenser area m2 100.0000 100.0000 100.0000 100.0000
Cond P design bar 1.0000
Reboiler area m2 100.0000 100.0000 100.0000 100.0000
Rebl P design bar 1.0000
Cond purchase $ 15640 15640 15640 15640
Cond installed $ 31281 31281 31281 31281
Rebl purchase $ 15640 15640 15640 15640
Rebl installed $ 31281 31281 31281 31281
Total purchase $ 426371 426371 480376 340855
Total installed $ 1247831 1247831 1409848 991283
Optimization flag 1 1 1 1
Calc. tolerance 7.9771e-006 0.0005 7.2281e-006 8.4822e-006

*** Equip. 19 ***

Can't converge with original specs. Alternative optimal solution is found.

Equip. No. 19
Name
No. of stages 20
1st feed stage 10
Condenser mode 7

37
Condenser spec 0.9999
Cond comp i pos. 3
Reboiler mode 7
Reboiler spec. 0.9999
Reboiler comp i 10
Est. dist. rate 12.4287

CHEMCAD 6.0.1 Page 7

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15
EQUIPMENT SUMMARIES

(kmol/h)
Est. reflux rate 0.1526
(kmol/h)
Est. T top K 307.3199
Est. T bottom K 556.5712
Est. T 2 K 310.9799
Calc Cond duty kW -98.6244
Calc Reblr duty kW 98.6618
Initial flag 6
Calc Reflux mole 1.2429
(kmol/h)
Calc Reflux ratio 0.1000
Calc Reflux mass kg/h 174.4520
Column diameter m 2.5000
Tray space m 2.4000
Column length m 21.0000
Thickness (top) m 0.0600
Thickness (bot) m 0.0600
Material density 7850.0000
(kg/m3)
Actual no of trays 24.0000
Install factor 3.0000
Column purchase $ 449095
Column installed $ 1347286
Cost estimation flag 1
Shell weight kg 85189
Cost of shell $ 292580
Cost of trays $ 37551
Platform & ladder $ 23107
No of sections 1
Condenser area m2 100.0000
Cond P design bar 1.0000
Reboiler area m2 100.0000
Rebl P design bar 1.0000
Cond purchase $ 15640
Cond installed $ 31281
Rebl purchase $ 15640
Rebl installed $ 31281
Total purchase $ 480376
Total installed $ 1409848
Optimization flag 1
Calc. tolerance 5.5649e-007

38
 Gibbs Reactor Summary

Equip. No. 4
Name
Thermal mode 2
Reaction Phase 1
Temperature K 1373.0000
Heat duty kW 815.0995
Pressure bar 1.0000
Overall Heat of Rxn 89.3146

CHEMCAD 6.0.1 Page 8

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15
EQUIPMENT SUMMARIES

(kW)
Solid Component 6

Mixer Summary

Equip. No. 7 12 14 18
Name
Output Pressure bar 1.1000

Cyclone Summary

Equip. No. 9 10 13
Name
Vane constant 16.0000 16.0000 16.0000
Cyclone diameter m 0.1000 0.1000 0.1000
No. of cyclones 5.0000 1.0000 1.0000
Inlet height m 0.0500 0.0500 0.0500
Inlet width m 0.0200 0.0200 0.0200
Outlet length m 0.0500 0.0500 0.0500
Outlet diameter m 0.0500 0.0500 0.0500
Cylinder height m 0.1500 0.1500 0.1500
Overall length m 0.4000 0.4000 0.4000
Dust outlet dia. m 0.0375 0.0375 0.0375
No. of gas turns 5.0000 5.0000 5.0000
Overall efficiency 0.9992 1.0000 9.9793e-031
Pressure drop bar 0.1598 4.6717 0.0190
Std gas flow m3/h 712.6849 712.6849 67.0168
Cost estimation flag 1 1 1
Purchase cost $ 754 754 74
Installed cost $ 1056 1056 104

39
CHEMCAD 6.0.1 Page 9

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15
STREAM PROPERTIES

Stream No. 1 2 3 4
Name
- - Overall - -
Molar flow kmol/h 34.7295 45.3726 52.3054 27.1054
Mass flow kg/h 1436.9562 1912.3660 1803.5179 1803.4990
Temp K 268.5774 1373.0000 623.0000 623.0000
Pres bar 1.0000 1.0000 1.0000 1.0000
Vapor mole fraction 0.9237 1.000 1.000 1.000
Enth kW -1448.7 -1146.9 -887.53 -1690.5
Tc K 315.4425 329.0780 325.4156 388.5290
Pc bar 126.1360 151.3810 84.1843 114.7742
Std. sp gr. wtr = 1 0.831 0.904 0.969 1.057
Std. sp gr. air = 1 1.429 1.455 1.191 2.297
Degree API 38.7980 25.0419 14.5571 2.3324
Average mol wt 41.3757 42.1480 34.4805 66.5365
Actual dens kg/m3 2.0102 0.4013 0.8771 1.2851
Actual vol m3/h 714.8267 4765.2368 2056.1179 1403.4258
Std liq m3/h 1.7294 2.1157 1.8616 1.7058
Std vap 0 C m3/h 778.4144 1016.9653 1172.3553 607.5314
- - Vapor only - -
Molar flow kmol/h 32.0786 41.7357 39.7054 27.1054
Mass flow kg/h 1077.7009 1810.2236 1449.6469 1803.4990
Average mol wt 33.5956 43.3735 36.5100 66.5365
Actual dens kg/m3 1.5082 0.3799 0.7051 1.2851
Actual vol m3/h 714.5700 4765.1926 2055.9654 1403.4258
Std liq m3/h 1.4643 2.0718 1.7097 1.7058
Std vap 0 C m3/h 718.9994 935.4489 889.9433 607.5314
Cp kJ/kg-K 1.1613 1.1445 0.8128 0.8963
Z factor 0.9977 1.0003 0.9998 0.9997
Visc N-s/m2 1.171e-005 4.713e-005 2.929e-005 2.368e-005
Th cond W/m-K 0.0692 0.1696 0.0291 0.0742
- - Liquid only - -
Molar flow kmol/h 2.6508
Mass flow kg/h 359.2552
Average mol wt 135.5249
Actual dens kg/m3 1399.5706
Actual vol m3/h 0.2567
Std liq m3/h 0.2651
Std vap 0 C m3/h 59.4151
Cp kJ/kg-K 0.8817
Z factor 0.0045
Visc N-s/m2 0.0004351
Th cond W/m-K 0.1351
Surf tens N/m 0.0213

40
CHEMCAD 6.0.1 Page 10

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STREAM PROPERTIES

Stream No. 5 6 7 8
Name
- - Overall - -
Molar flow kmol/h 14.4900 12.6154 10.5676 1.8611
Mass flow kg/h 29.2090 1774.2902 1431.9910 312.5285
Temp K 623.0000 623.0000 304.6457 327.7168
Pres bar 1.0000 1.0000 1.0000 1.0000
Vapor mole fraction 1.000 1.000 0.0000 0.0000
Enth kW 35.555 -1726.1 -1530.4 -350.78
Tc K 33.2700 484.2731 479.0571 505.6690
Pc bar 12.9595 41.3810 41.6966 36.3671
Std. sp gr. wtr = 1 0.070 1.377 1.355 1.486
Std. sp gr. air = 1 0.070 4.856 4.679 5.798
Degree API 1889.9269 -28.7418 -27.0585 -36.2954
Average mol wt 2.0158 140.6445 135.5077 167.9283
Actual dens kg/m3 0.0389 2.7248 1311.9866 1400.1318
Actual vol m3/h 750.7029 651.1588 1.0915 0.2232
Std liq m3/h 0.4173 1.2885 1.0570 0.2103
Std vap 0 C m3/h 324.7737 282.7577 236.8584 41.7137
- - Vapor only - -
Molar flow kmol/h 14.4900 12.6154
Mass flow kg/h 29.2089 1774.2902
Average mol wt 2.0158 140.6445
Actual dens kg/m3 0.0389 2.7248
Actual vol m3/h 750.7029 651.1588
Std liq m3/h 0.4173 1.2885
Std vap 0 C m3/h 324.7737 282.7577
Cp kJ/kg-K 14.5508 0.6716
Z factor 1.0003 0.9966
Visc N-s/m2 1.479e-005 2.234e-005
Th cond W/m-K 0.3021 0.0210
- - Liquid only - -
Molar flow kmol/h 10.5676 1.8611
Mass flow kg/h 1431.9910 312.5285
Average mol wt 135.5077 167.9283
Actual dens kg/m3 1311.9866 1400.1318
Actual vol m3/h 1.0915 0.2232
Std liq m3/h 1.0570 0.2103
Std vap 0 C m3/h 236.8584 41.7137
Cp kJ/kg-K 0.9387 0.8393
Z factor 0.0042 0.0047
Visc N-s/m2 0.0003086 0.0003489
Th cond W/m-K 0.1232 0.0966
Surf tens N/m 0.0166 0.0157

41
CHEMCAD 6.0.1 Page 11

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15
STREAM PROPERTIES

Stream No. 9 10 11 12
Name
- - Overall - -
Molar flow kmol/h 10.0000 39.7131 15.8500 23.8807
Mass flow kg/h 20.1580 1646.2687 285.5377 1646.2845
Temp K 305.0000 573.0000 298.0000 313.2391
Pres bar 1.0000 1.1000 1.0000 1.1000
Vapor mole fraction 1.000 1.000 0.0000 0.0000
Enth kW -1.2754 -1395.9 -1257.9 -2787.7
Tc K 33.2700 326.6678 647.3500 545.8163
Pc bar 12.9595 85.1165 221.1823 53.6634
Std. sp gr. wtr = 1 0.070 1.060 1.000 1.374
Std. sp gr. air = 1 0.070 1.431 0.622 2.380
Degree API 1889.9286 2.0210 10.0000 -28.5509
Average mol wt 2.0158 41.4540 18.0150 68.9378
Actual dens kg/m3 0.0795 1.1960 996.7463 1333.3728
Actual vol m3/h 253.6836 1376.5118 0.2865 1.2347
Std liq m3/h 0.2880 1.5534 0.2855 1.1978
Std vap 0 C m3/h 224.1365 890.1160 355.2563 535.2539
- - Vapor only - -
Molar flow kmol/h 10.0000 31.7969
Mass flow kg/h 20.1580 1170.6313
Average mol wt 2.0158 36.8159
Actual dens kg/m3 0.0795 0.8505
Actual vol m3/h 253.6836 1376.3304
Std liq m3/h 0.2880 1.3739
Std vap 0 C m3/h 224.1365 712.6849
Cp kJ/kg-K 14.2970 0.8069
Z factor 1.0005 0.9996
Visc N-s/m2 9.005e-006 2.721e-005
Th cond W/m-K 0.1749 0.0269
- - Liquid only - -
Molar flow kmol/h 15.8500 23.8807
Mass flow kg/h 285.5377 1646.2845
Average mol wt 18.0150 68.9378
Actual dens kg/m3 996.7463 1333.3727
Actual vol m3/h 0.2865 1.2347
Std liq m3/h 0.2855 1.1978
Std vap 0 C m3/h 355.2563 535.2539
Cp kJ/kg-K 4.1851 1.4097
Z factor 0.0010 0.0025
Visc N-s/m2 0.0009258 0.0005661
Th cond W/m-K 0.6060 0.1520
Surf tens N/m 0.0721 0.0250

42
CHEMCAD 6.0.1 Page 12

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15
STREAM PROPERTIES

Stream No. 13 14 15 16
Name
- - Overall - -
Molar flow kmol/h 31.8036 7.9096 5.5650 5.5650
Mass flow kg/h 1171.0302 475.2384 208.5811 208.5811
Temp K 572.6719 572.6719 573.0000 572.9728
Pres bar 0.9402 0.9402 1.0000 0.9810
Vapor mole fraction 1.000 0.0000 1.000 1.000
Enth kW -758.27 -637.60 -400.45 -400.45
Tc K 326.6678 0.0000 647.3500 647.3500
Pc bar 85.1165 0.0000 221.1823 221.1823
Std. sp gr. wtr = 1 0.852 2.649 1.858 1.858
Std. sp gr. air = 1 1.271 2.075 1.294 1.294
Degree API 34.5318 -78.0883 -55.3400 -55.3400
Average mol wt 36.8207 60.0840 37.4809 37.4809
Actual dens kg/m3 0.7276 2621.5273 1.4673 1.4394
Actual vol m3/h 1609.4430 0.1813 142.1554 144.9038
Std liq m3/h 1.3741 0.1794 0.1123 0.1123
Std vap 0 C m3/h 712.8336 177.2822 124.7319 124.7319
- - Vapor only - -
Molar flow kmol/h 31.7969 2.9900 2.9900
Mass flow kg/h 1170.6313 53.8648 53.8648
Average mol wt 36.8159 18.0150 18.0150
Actual dens kg/m3 0.7274 0.3791 0.3719
Actual vol m3/h 1609.4428 142.0963 144.8448
Std liq m3/h 1.3739 0.0539 0.0539
Std vap 0 C m3/h 712.6849 67.0168 67.0168
Cp kJ/kg-K 0.8069 2.0002 2.0001
Z factor 0.9996 0.9977 0.9977
Visc N-s/m2 2.719e-005 2.034e-005 2.034e-005
Th cond W/m-K 0.0268 0.0436 0.0436
- - Liquid only - -
Molar flow kmol/h
Mass flow kg/h
Average mol wt
Actual dens kg/m3
Actual vol m3/h
Std liq m3/h
Std vap 0 C m3/h
Cp kJ/kg-K
Z factor
Visc N-s/m2
Th cond W/m-K
Surf tens N/m

43
CHEMCAD 6.0.1 Page 13

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15
STREAM PROPERTIES

Stream No. 17 18 19 20
Name
- - Overall - -
Molar flow kmol/h 0.0000 31.7969 0.0066 7.9162
Mass flow kg/h 0.0000 1170.6312 0.3989 475.6373
Temp K 0.0000 509.4411 509.4411 572.6204
Pres bar 0.0000 0.0000 0.0000 0.9402
Vapor mole fraction 0.0000 1.000 0.0000 0.0000
Enth kW 0.00000 -755.82 -0.54234 -638.15
Tc K 0.0000 326.6678 0.0000 0.0000
Pc bar 0.0000 85.1165 0.0000 0.0000
Std. sp gr. wtr = 1 0.000 0.852 2.649 2.649
Std. sp gr. air = 1 0.000 1.271 2.075 2.075
Degree API 0.0000 34.5702 -78.0883 -78.0883
Average mol wt 0.0000 36.8159 60.0840 60.0840
Actual dens kg/m3 0.0000 0.0000 2627.6962 2621.5322
Actual vol m3/h 0.0000 1953126643012.5496 0.0002
0.1814
Std liq m3/h 0.0000 1.3739 0.0002 0.1795
Std vap 0 C m3/h 0.0000 712.6849 0.1488 177.4310
- - Vapor only - -
Molar flow kmol/h 31.7969
Mass flow kg/h 1170.6312
Average mol wt 36.8159
Actual dens kg/m3 0.0000
Actual vol m3/h 1953126643012.5496
Std liq m3/h 1.3739
Std vap 0 C m3/h 712.6849
Cp kJ/kg-K 0.8023
Z factor 1.0000
Visc N-s/m2 2.449e-005
Th cond W/m-K 0.0240
- - Liquid only - -
Molar flow kmol/h
Mass flow kg/h
Average mol wt
Actual dens kg/m3
Actual vol m3/h
Std liq m3/h
Std vap 0 C m3/h
Cp kJ/kg-K
Z factor
Visc N-s/m2
Th cond W/m-K
Surf tens N/m

44
CHEMCAD 6.0.1 Page 14

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15
STREAM PROPERTIES

Stream No. 21 22 23 24
Name
- - Overall - -
Molar flow kmol/h 30.6257 15.5830 3.3691 6.1696
Mass flow kg/h 167.4450 1744.9207 475.3427 1048.2182
Temp K 1373.0000 1373.0000 306.8699 329.7928
Pres bar 1.0000 1.0000 1.0000 1.0000
Vapor mole fraction 1.000 1.000 0.0000 0.0000
Enth kW 327.46 -1437.9 -513.23 -1179.1
Tc K 33.2700 474.9816 484.6973 507.0000
Pc bar 12.9595 92.8192 41.3092 35.9001
Std. sp gr. wtr = 1 0.206 1.335 1.381 1.493
Std. sp gr. air = 1 0.189 3.866 4.871 5.866
Degree API 556.4040 -25.5211 -29.0032 -36.7433
Average mol wt 5.4675 111.9758 141.0886 169.8996
Actual dens kg/m3 0.0552 0.9806 1333.7551 1403.6521
Actual vol m3/h 3033.3404 1779.4601 0.3564 0.7468
Std liq m3/h 0.8140 1.3069 0.3443 0.7019
Std vap 0 C m3/h 686.4335 349.2722 75.5140 138.2840
- - Vapor only - -
Molar flow kmol/h 26.5707 15.5830
Mass flow kg/h 53.5614 1744.9207
Average mol wt 2.0158 111.9758
Actual dens kg/m3 0.0177 0.9806
Actual vol m3/h 3033.2909 1779.4601
Std liq m3/h 0.7652 1.3069
Std vap 0 C m3/h 595.5469 349.2722
Cp kJ/kg-K 15.7528 0.6952
Z factor 1.0002 1.0005
Visc N-s/m2 2.571e-005 4.613e-005
Th cond W/m-K 0.5482 0.0093
- - Liquid only - -
Molar flow kmol/h 3.3691 6.1696
Mass flow kg/h 475.3427 1048.2182
Average mol wt 141.0886 169.8996
Actual dens kg/m3 1333.7551 1403.6521
Actual vol m3/h 0.3564 0.7468
Std liq m3/h 0.3443 0.7019
Std vap 0 C m3/h 75.5140 138.2840
Cp kJ/kg-K 0.9255 0.8332
Z factor 0.0043 0.0048
Visc N-s/m2 0.0003193 0.0003495
Th cond W/m-K 0.1175 0.0954
Surf tens N/m 0.0166 0.0156

45
CHEMCAD 6.0.1 Page 15

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15
STREAM PROPERTIES

Stream No. 29 30 31 32
Name
- - Overall - -
Molar flow kmol/h 6.0443 0.0612 12.5542 9.4134
Mass flow kg/h 221.3598 8.1497 1766.1406 696.7025
Temp K 189.0152 301.2649 307.3381 196.5361
Pres bar 1.0000 1.0000 1.0000 1.0000
Vapor mole fraction 0.0000 0.0000 0.0000 0.0000
Enth kW -188.52 -8.6615 -1905.1 -713.46
Tc K 325.5240 477.0123 484.3055 429.9205
Pc bar 83.9184 42.1520 41.3755 124.3196
Std. sp gr. wtr = 1 0.849 1.353 1.377 1.152
Std. sp gr. air = 1 1.264 4.598 4.857 2.555
Degree API 35.0974 -26.9336 -28.7501 -8.6368
Average mol wt 36.6231 133.1581 140.6810 74.0119
Actual dens kg/m3 1191.9519 1319.1171 1328.6638 1421.0085
Actual vol m3/h 0.1857 0.0062 1.3293 0.4903
Std liq m3/h 0.2606 0.0060 1.2825 0.6049
Std vap 0 C m3/h 135.4742 1.3718 281.3859 210.9882
- - Liquid only - -
Molar flow kmol/h 6.0443 0.0612 12.5542 9.4134
Mass flow kg/h 221.3598 8.1497 1766.1406 696.7025
Average mol wt 36.6231 133.1581 140.6810 74.0119
Actual dens kg/m3 1191.9518 1319.1171 1328.6638 1421.0084
Actual vol m3/h 0.1857 0.0062 1.3293 0.4903
Std liq m3/h 0.2606 0.0060 1.2825 0.6049
Std vap 0 C m3/h 135.4742 1.3718 281.3859 210.9882
Cp kJ/kg-K 1.7587 0.9535 0.9220 1.1149
Z factor 0.0022 0.0042 0.0043 0.0036
Visc N-s/m2 0.0001855 0.0003136 0.0003171 0.0003657
Th cond W/m-K 0.4057 0.1217 0.1180 0.2159
Surf tens N/m 0.0275 0.0169 0.0165 0.0287

46
CHEMCAD 6.0.1 Page 16

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15
STREAM PROPERTIES

Stream No. 33 34 35
Name
- - Overall - -
Molar flow kmol/h 38.0988 0.1255 12.4287
Mass flow kg/h 1912.3270 21.6210 1744.5196
Temp K 270.4577 330.7219 307.1727
Pres bar 1.0000 1.0000 1.0000
Vapor mole fraction 0.8535 0.0000 0.0000
Enth kW -1962.0 -23.338 -1881.8
Tc K 345.5220 529.0084 483.7114
Pc bar 123.2367 40.6720 41.2886
Std. sp gr. wtr = 1 0.922 1.418 1.377
Std. sp gr. air = 1 1.733 5.946 4.846
Degree API 21.9438 -31.7208 -28.7133
Average mol wt 50.1939 172.2211 140.3624
Actual dens kg/m3 2.6203 1334.5066 1328.4592
Actual vol m3/h 729.7993 0.0162 1.3132
Std liq m3/h 2.0737 0.0152 1.2672
Std vap 0 C m3/h 853.9326 2.8139 278.5720
- - Vapor only - -
Molar flow kmol/h 32.5162
Mass flow kg/h 1141.6558
Average mol wt 35.1104
Actual dens kg/m3 1.5655
Actual vol m3/h 729.2512
Std liq m3/h 1.5098
Std vap 0 C m3/h 728.8071
Cp kJ/kg-K 1.1278
Z factor 0.9975
Visc N-s/m2 1.173e-005
Th cond W/m-K 0.0674
- - Liquid only - -
Molar flow kmol/h 5.5826 0.1255 12.4287
Mass flow kg/h 770.6712 21.6210 1744.5196
Average mol wt 138.0497 172.2211 140.3624
Actual dens kg/m3 1405.9118 1334.5066 1328.4592
Actual vol m3/h 0.5482 0.0162 1.3132
Std liq m3/h 0.5640 0.0152 1.2672
Std vap 0 C m3/h 125.1256 2.8139 278.5720
Cp kJ/kg-K 0.8789 0.8202 0.9233
Z factor 0.0045 0.0063 0.0043
Visc N-s/m2 0.0004355 0.0003515 0.0003166
Th cond W/m-K 0.1314 0.0966 0.1183
Surf tens N/m 0.0210 0.0135 0.0165

47
CHEMCAD 6.0.1 Page 17

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15
FLOW SUMMARIES

Stream No. 1 2 3 4
Stream Name
Temp K 268.5774 1373.0000 623.0000 623.0000
Pres bar 1.0000 1.0000 1.0000 1.0000
Enth kW -1448.7 -1146.9 -887.53 -1690.5
Vapor mole fraction 0.92367 1.0000 1.0000 1.0000
Total kmol/h 34.7295 45.3726 52.3054 27.1054
Flowrates in kmol/h
Hydrogen 24.4900 27.2689 0.0000 14.4900
Dichlorosilane 0.0000 0.1513 0.0000 0.0000
Trichlorosilane 10.2206 2.6830 0.0000 10.7100
Silicon TetraCl 0.0189 7.1375 0.0000 1.8900
Hydrogen Chlorid 0.0000 4.4949 39.6900 0.0000
Silicon 0.0000 3.6369 12.6000 0.0000
Water 0.0000 0.0000 0.0000 0.0000
Silicon Dioxide 0.0000 0.0000 0.0000 0.0000
Boron Trichlorid 0.0000 0.0000 0.0077 0.0077
Phosphoric Chlor 0.0000 0.0000 0.0077 0.0077

Stream No. 5 6 7 8
Stream Name
Temp K 623.0000 623.0000 304.6457 327.7168
Pres bar 1.0000 1.0000 1.0000 1.0000
Enth kW 35.555 -1726.1 -1530.4 -350.78
Vapor mole fraction 1.0000 1.0000 0.00000 0.00000
Total kmol/h 14.4900 12.6154 10.5675 1.8611
Flowrates in kmol/h
Hydrogen 14.4900 0.0000 0.0000 0.0000
Dichlorosilane 0.0000 0.0000 0.0000 0.0000
Trichlorosilane 0.0000 10.7100 10.5498 0.1065
Silicon TetraCl 0.0000 1.8900 0.0177 1.7546
Hydrogen Chlorid 0.0000 0.0000 0.0000 0.0000
Silicon 0.0000 0.0000 0.0000 0.0000
Water 0.0000 0.0000 0.0000 0.0000
Silicon Dioxide 0.0000 0.0000 0.0000 0.0000
Boron Trichlorid 0.0000 0.0077 0.0000 0.0000
Phosphoric Chlor 0.0000 0.0077 0.0000 0.0000

48
CHEMCAD 6.0.1 Page 18

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15
FLOW SUMMARIES

Stream No. 9 10 11 12
Stream Name
Temp K 305.0000 573.0000 298.0000 313.2391
Pres bar 1.0000 1.1000 1.0000 1.1000
Enth kW -1.2754 -1395.9 -1257.9 -2787.7
Vapor mole fraction 1.0000 1.0000 0.00000 0.00000
Total kmol/h 10.0000 39.7131 15.8500 23.8807
Flowrates in kmol/h
Hydrogen 10.0000 0.0000 0.0000 0.0000
Dichlorosilane 0.0000 0.0000 0.0000 0.0000
Trichlorosilane 0.0000 0.1066 0.0000 0.1066
Silicon TetraCl 0.0000 0.0079 0.0000 7.9241
Hydrogen Chlorid 0.0000 31.6648 0.0000 0.0000
Silicon 0.0000 0.0000 0.0000 0.0000
Water 0.0000 0.0176 15.8500 15.8500
Silicon Dioxide 0.0000 7.9162 0.0000 0.0000
Boron Trichlorid 0.0000 0.0000 0.0000 0.0000
Phosphoric Chlor 0.0000 0.0000 0.0000 0.0000

Stream No. 13 14 15 16
Stream Name
Temp K 572.6719 572.6719 573.0000 572.9728
Pres bar 0.9402 0.9402 1.0000 0.9810
Enth kW -758.27 -637.60 -400.45 -400.45
Vapor mole fraction 1.0000 0.00000 1.0000 1.0000
Total kmol/h 31.8036 7.9096 5.5650 5.5650
Flowrates in kmol/h
Hydrogen 0.0000 0.0000 0.0000 0.0000
Dichlorosilane 0.0000 0.0000 0.0000 0.0000
Trichlorosilane 0.1066 0.0000 0.0000 0.0000
Silicon TetraCl 0.0079 0.0000 0.0000 0.0000
Hydrogen Chlorid 31.6648 0.0000 0.0000 0.0000
Silicon 0.0000 0.0000 0.0000 0.0000
Water 0.0176 0.0000 2.9900 2.9900
Silicon Dioxide 0.0066 7.9096 2.5750 2.5750
Boron Trichlorid 0.0000 0.0000 0.0000 0.0000
Phosphoric Chlor 0.0000 0.0000 0.0000 0.0000

49
CHEMCAD 6.0.1 Page 19

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15
FLOW SUMMARIES

Stream No. 17 18 19 20
Stream Name
Temp K 572.9728 509.4411 509.4411 572.6204
Pres bar 0.9810 0.0000 0.0000 0.9402
Enth kW -2.0713E-028 -755.82 -0.54234 -638.15
Vapor mole fraction 0.00000 1.0000 0.00000 0.00000
Total kmol/h 0.0000 31.7969 0.0066 7.9162
Flowrates in kmol/h
Hydrogen 0.0000 0.0000 0.0000 0.0000
Dichlorosilane 0.0000 0.0000 0.0000 0.0000
Trichlorosilane 0.0000 0.1066 0.0000 0.0000
Silicon TetraCl 0.0000 0.0079 0.0000 0.0000
Hydrogen Chlorid 0.0000 31.6648 0.0000 0.0000
Silicon 0.0000 0.0000 0.0000 0.0000
Water 0.0000 0.0176 0.0000 0.0000
Silicon Dioxide 0.0000 0.0000 0.0066 7.9162
Boron Trichlorid 0.0000 0.0000 0.0000 0.0000
Phosphoric Chlor 0.0000 0.0000 0.0000 0.0000

Stream No. 21 22 23 24
Stream Name
Temp K 1373.0000 1373.0000 306.8699 329.7928
Pres bar 1.0000 1.0000 1.0000 1.0000
Enth kW 327.46 -1437.9 -513.23 -1179.1
Vapor mole fraction 1.0000 1.0000 0.00000 0.00000
Total kmol/h 30.6257 15.5830 3.3691 6.1696
Flowrates in kmol/h
Hydrogen 26.5707 0.0000 0.0000 0.0000
Dichlorosilane 0.0000 0.1490 0.1341 0.0000
Trichlorosilane 0.0000 2.5498 2.5495 0.0001
Silicon TetraCl 0.0000 6.8551 0.6855 6.1696
Hydrogen Chlorid 0.0000 6.0292 0.0000 0.0000
Silicon 4.0550 0.0000 0.0000 0.0000
Water 0.0000 0.0000 0.0000 0.0000
Silicon Dioxide 0.0000 0.0000 0.0000 0.0000
Boron Trichlorid 0.0000 0.0000 0.0000 0.0000
Phosphoric Chlor 0.0000 0.0000 0.0000 0.0000

50
CHEMCAD 6.0.1 Page 20

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15
FLOW SUMMARIES

Stream No. 29 30 31 32
Stream Name
Temp K 189.0152 301.2649 307.3381 196.5361
Pres bar 1.0000 1.0000 1.0000 1.0000
Enth kW -188.52 -8.6615 -1905.1 -713.46
Vapor mole fraction 0.00000 0.00000 0.00000 0.00000
Total kmol/h 6.0443 0.0612 12.5542 9.4134
Flowrates in kmol/h
Hydrogen 0.0000 0.0000 0.0000 0.0000
Dichlorosilane 0.0149 0.0000 0.0000 0.1490
Trichlorosilane 0.0002 0.0535 10.6565 2.5497
Silicon TetraCl 0.0000 0.0000 1.8900 0.6855
Hydrogen Chlorid 6.0292 0.0000 0.0000 6.0292
Silicon 0.0000 0.0000 0.0000 0.0000
Water 0.0000 0.0000 0.0000 0.0000
Silicon Dioxide 0.0000 0.0000 0.0000 0.0000
Boron Trichlorid 0.0000 0.0077 0.0000 0.0000
Phosphoric Chlor 0.0000 0.0000 0.0077 0.0000

Stream No. 33 34 35
Stream Name
Temp K 270.4577 330.7219 307.1727
Pres bar 1.0000 1.0000 1.0000
Enth kW -1962.0 -23.338 -1881.8
Vapor mole fraction 0.85347 0.00000 0.00000
Total kmol/h 38.0988 0.1255 12.4287
Flowrates in kmol/h
Hydrogen 24.4900 0.0000 0.0000
Dichlorosilane 0.1341 0.0000 0.0000
Trichlorosilane 12.7702 0.0001 10.6563
Silicon TetraCl 0.7045 0.1177 1.7723
Hydrogen Chlorid 0.0000 0.0000 0.0000
Silicon 0.0000 0.0000 0.0000
Water 0.0000 0.0000 0.0000
Silicon Dioxide 0.0000 0.0000 0.0000
Boron Trichlorid 0.0000 0.0000 0.0000
Phosphoric Chlor 0.0000 0.0077 0.0000

51
CHEMCAD 6.0.1 Page 21

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15
DISTILLATION PROFILE

Unit type : SCDS Unit name: Eqp # 3

* Net Flows *
Temp Pres Liquid Vapor Feeds Product Duties
Stg K bar kmol/h kmol/h kmol/h kmol/h kW
1 304.6 1.00 143.77 10.57 -1087
2 304.7 1.00 143.69 154.33
3 304.8 1.00 143.55 154.26
4 305.0 1.00 155.98 154.12 12.43
5 305.0 1.00 155.97 154.11
6 305.0 1.00 155.96 154.11
7 305.0 1.00 155.95 154.10
8 305.0 1.00 155.96 154.09
9 305.0 1.00 155.92 154.10
10 305.0 1.00 155.84 154.06
11 305.1 1.00 155.65 153.98
12 305.4 1.00 155.28 153.79
13 305.9 1.00 154.49 153.42
14 307.1 1.00 152.89 152.63
15 309.4 1.00 150.35 151.03
16 313.1 1.00 147.22 148.48
17 317.8 1.00 144.64 145.36
18 322.4 1.00 143.16 142.78
19 325.7 1.00 142.58 141.30
20 327.7 1.00 140.72 1.86 1088

Mole Reflux ratio 13.605

Total liquid entering stage 4 at 304.953 K, 155.974 kmol/h.

52
CHEMCAD 6.0.1 Page 22

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15
DISTILLATION PROFILE

Unit type : SCDS Unit name: Eqp # 6

* Net Flows *
Temp Pres Liquid Vapor Feeds Product Duties
Stg K bar kmol/h kmol/h kmol/h kmol/h kW
1 196.5 1.00 188.27 9.41 -1392
2 284.6 1.00 158.86 197.68
3 315.3 1.00 172.65 168.27
4 320.9 1.00 171.44 182.06
5 324.2 1.00 170.70 180.85
6 326.2 1.00 170.43 180.11
7 327.2 1.00 170.34 179.85
8 327.7 1.00 170.30 179.75
9 328.0 1.00 170.29 179.72
10 328.1 1.00 126.47 179.70 15.58
11 329.5 1.00 127.10 120.30
12 329.7 1.00 127.11 120.93
13 329.7 1.00 127.11 120.94
14 329.8 1.00 127.10 120.94
15 329.8 1.00 127.10 120.93
16 329.8 1.00 127.10 120.93
17 329.8 1.00 127.10 120.93
18 329.8 1.00 127.10 120.93
19 329.8 1.00 127.10 120.93
20 329.8 1.00 120.93 6.17 936.9

Mole Reflux ratio 20.000

Total liquid entering stage 10 at 327.978 K, 170.289 kmol/h.

53
CHEMCAD 6.0.1 Page 23

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15
DISTILLATION PROFILE

Unit type : SCDS Unit name: Eqp # 16

* Net Flows *
Temp Pres Liquid Vapor Feeds Product Duties
Stg K bar kmol/h kmol/h kmol/h kmol/h kW
1 301.3 1.00 77.13 0.06 -542.3
2 302.7 1.00 77.03 77.19
3 303.6 1.00 76.98 77.09
4 304.1 1.00 76.95 77.04
5 304.3 1.00 76.94 77.01
6 304.5 1.00 76.93 77.00
7 304.6 1.00 76.91 76.99
8 304.6 1.00 76.88 76.97
9 304.7 1.00 76.81 76.94
10 305.0 1.00 76.65 76.87
11 305.4 1.00 62.70 76.71 12.62
12 305.4 1.00 62.70 50.14
13 305.4 1.00 62.70 50.14
14 305.4 1.00 62.70 50.14
15 305.4 1.00 62.69 50.14
16 305.5 1.00 62.68 50.14
17 305.5 1.00 62.64 50.12
18 305.7 1.00 62.53 50.08
19 306.1 1.00 62.26 49.98
20 307.3 1.00 49.71 12.55 354.5

Mole Reflux ratio 1260.283

Total liquid entering stage 11 at 304.952 K, 76.649 kmol/h.

54
CHEMCAD 6.0.1 Page 24

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15
DISTILLATION PROFILE

Unit type : SCDS Unit name: Eqp # 17

* Net Flows *
Temp Pres Liquid Vapor Feeds Product Duties
Stg K bar kmol/h kmol/h kmol/h kmol/h kW
1 189.0 1.00 30.22 6.04 -165.3
2 195.3 1.00 21.43 36.27
3 251.5 1.00 17.25 27.48
4 276.7 1.00 18.44 23.30
5 282.5 1.00 27.25 24.48 9.41
6 293.3 1.00 28.08 23.88
7 297.2 1.00 28.11 24.71
8 300.6 1.00 28.10 24.74
9 303.6 1.00 27.96 24.73
10 306.9 1.00 24.59 3.37 177

Mole Reflux ratio 5.000

Total liquid entering stage 5 at 235.929 K, 24.075 kmol/h.

55
CHEMCAD 6.0.1 Page 25

Job Name: Systems Final Project Impurities Date: 05/12/2011 Time: 02:29:15
DISTILLATION PROFILE

Unit type : SCDS Unit name: Eqp # 19

* Net Flows *
Temp Pres Liquid Vapor Feeds Product Duties
Stg K bar kmol/h kmol/h kmol/h kmol/h kW
1 307.2 1.00 1.24 12.43 -98.62
2 309.8 1.00 1.22 13.67
3 310.2 1.00 1.22 13.65
4 310.3 1.00 1.21 13.64
5 310.3 1.00 1.21 13.64
6 310.3 1.00 1.21 13.64
7 310.3 1.00 1.21 13.64
8 310.3 1.00 1.21 13.64
9 310.3 1.00 1.21 13.64
10 310.3 1.00 13.51 13.64 12.55
11 314.5 1.00 13.23 13.38
12 319.3 1.00 13.02 13.10
13 323.6 1.00 12.92 12.90
14 326.5 1.00 12.88 12.79
15 328.1 1.00 12.87 12.76
16 329.0 1.00 12.86 12.74
17 329.4 1.00 12.86 12.74
18 329.6 1.00 12.86 12.74
19 329.7 1.00 12.82 12.74
20 330.7 1.00 12.69 0.13 98.66

Mole Reflux ratio 0.100

Total liquid entering stage 10 at 307.586 K, 13.767 kmol/h.

56