Exercise 3
Exercise 3
Questions
Exercise 1
On an n-type Si wafer with phosphor 1015 cm−3 one creates a p+ layer by
doping with boron 1018 cm−3 . In addition, the substrate has deep levels
with: Nt = 1012 cm−3 , Et ≈ Ei , c = Svth = 5 × 10−8 cm3 /s (equal value for
electrons and holes). (ni (300K) = 1.45×1010 cm−3 , ε0 = 8.854×10−14 F/cm,
ε = 11.9ε0 , µp = 450cm2 /Vs)
Determine the following properties of the p+ n diode (at 300K):
1. The diffusion potential Vb .
2. For a reverse bias of 2 volt: the depletion width W , the capacity per
cm2 , the reverse bias current (include generation in the depletion area).
Exercise 2
High-purity germanium is used to fabricate gamma-ray detectors. Assume
a planar detector made from a 2 cm thick p-Ge crystal, with a thin n+ layer
on top. The detector is thus an n+ p diode, with the depletion area as active
area. (ε = 16ε0 , ni (300K) = 2.4 × 1013 cm−3 )
2. Show that the detector needs to be cooled to satisfy this demand. (In
practice, the detector is attached to a liquid nitrogen cryostat.)
Exercise 3
A silicon pn junction is doped with 1017 cm−3 donors on the n-side and
1017 cm−3 acceptors on the p-side. (take Eg , Nc and Nv from the table of
physical constants)
1
2
1. Calculate the Fermi energies on the two sides at 300 K. Set the zero
of energy to be at the top of the valence band.
2. Calculate the built-in voltage for this diode. If you did not find the
Fermi energies in part (1), use EF n = 1 eV and EF p = 0.1 eV.
Exercise 4
Consider a silicon pn junction.
1. Draw the band diagram indicating the valence band, the conduction
band, the Fermi energy, and the built-in potential, Vb assuming that
no voltage is applied across the junction. Indicate on this diagram
approximately where the depletion region would be.
3. Explain what the diffusion current is and which way it is flowing for
forward bias and reverse bias.