U.P.B. Sci. Bull., Series …, Vol. …, Iss.

…, 201 ISSN 1223-7027

DESIGN AND ANALYSIS OF A MICRO STRUCTURED

OPTICAL POLARIZER

Ionela GHIŢĂ1, Adrian RIZEA2, Claudiu CHIRICĂ3

The purpose of this paper is to present results regarding the design and realization of micro
structured optical polarizer with metallic grid geometry, which can be used in a polarization
imaging system for video cameras operating on the spectral domain from 8 to 12 μm. The structure
was designed using the OptiFDTD software from Optiwave and it is realized within the S.C PRO
OPTICA S.A. For design, we chose four types of structures with different materials and geometries.
Geometric parameters, such as grid period and height, can greatly influence the optical
performance of a polarizer.

Keywords: infrared polarizer, metal wire grid, Finite-Difference Time-Domain

(FDTD) method

1. Introduction

Polarizers are major optical devices used in optical systems with

applications in medicine, photography, optics, and microscopy, covering a very
wide spectral range (visible, infrared, microwave, etc.). Polarization imaging is
used to enhance image contrast in IR and to identify objects that are hard to
distinguish. In the infrared spectral region, there is a growing demand to improve
signal contrast, and one of the efficient methods for it requires polarized light [1].
The traditional types of polarizers, based on the birefringence effect of natural
crystals, can only be achieved over a narrow wavelength range, with a low
transmission factor and high manufacturing costs. The current development of
micro and nanostructured thin layer technology makes it possible to achieve more
efficient polarizers with metal grid geometry, which have the advantages of being
compact and flat structures and are easy to achieve. Thus, in 2005, Wang [2] and
Zhou [3] fabricated nanowire-grid polarizers using ultraviolet nanoimprint
lithography and electron beam lithography independently. The grid period was
approximately 200 nm, convenient for working in NIR. In 2006, Ekinci [4] and
Wang [5] successfully obtained nanowire-grid polarizers with about 100 nm
periods using extreme ultraviolet (EUV) interference lithography. In 2007, Z.Y.
Yang and Y.F.Lu [6] realized nanostructured polarizers with metallic grid

1
Eng.-corresponding author, Pro Optica, Romania, e-mail: [email protected]
2
PhD., Physicist, Pro Optica, Romania, e-mail: [email protected]
3
Eng., Pro Optica, Romania, e-mail: [email protected]
 Ionela GHIŢĂ, Adrian RIZEA, Claudiu CHIRICĂ

geometry, having a period of 80 nm and a high efficiency over a wide range

(0.3-5 μm). For the infrared spectral region from 3 to 19 μm, in 2014, Wenrui Guo
[1] designed and produced nanowire-grid polarizers, with a 500 nm period, using
electron beam lithography.

2. Design model

The photonic device was designed in OptiFDTD, its structure being

represented in Figure 1. The polarizer metallic grid was designed on a dielectric
substrate. The materials used in simulations for the dielectric substrate were: barium
fluoride (BaF2) and zinc selenide (ZnSe), and for the metallic grid, we used
aluminum (Al) and chromium (Cr) whose dielectric functions were described by
Lorentz-Drude model. The grid period (P) was 2 μm and its height (h) ranged from
0.05 μm to 0.2 μm.

Fig. 1. The structure of the metal wire grid polarizer used in simulation with the
period P and the height h
It is assumed that the metal wire-grids are sufficiently long along the Y
direction so we can use the 2D FDTD method to simplify the simulation. The source
chosen for simulations was flat-wave with pulsed emission. The source center was
chosen at the origin of the X axis, and the pulse generated by it was rectangular. In
simulations, the flat wave source illuminated the micro structured polarizer along
the positive direction of Z for TM (the magnetic field intensity vector is
perpendicular to the incidence plane) and TE (the electric field intensity vector is
perpendicular to the incidence plane) modes.
In the calculation, the flat wave is a Gaussian modulated light source that
can be described by the expression:
1 𝑡−𝑡𝑜𝑓𝑓
T(t) = exp[− (
2 𝑡𝑤
)] sin(𝜔𝑡) (1)

Where toff is the offset time, tw is the half width of the pulse, and ω is central
frequency of the source. Using a broadband source, information about all the
frequencies or wavelengths can be found with a single calculation.
 Design and analysis of a micro structured optical polarizer

For the study regarding region 8 to 12 μm, the following parameters were
used: ω = 30 THz, toff = 6.6237x10-14 s and tw = 1.8752x10 -14s. Figures 2(a) and
2(b) show the source in 8-12 μm region in both time and frequency domains.

Fig. 2. The function curves in time (a) and frequency (b) domains of the broadband simulation
excitation source, which has the expression of Eq. (1)

3. Simulation results and analysis

To characterize the optical performance of microstructure polarizers, two

parameters are used: extinction ratio (E) and degree of polarization (P).
TTM
E = 10 log , dB (2)
TTE
TTM − TTE
P= ∙ 100, % (3)
TTM + TTE

Where TTM is the transmission coefficient for TM polarized light and TTE
is the transmission coefficient for the polarized light TE.
In Figures 3.1, 3.2, 3.3 and 3.4 the parameters described above, obtained
from the simulations are graphically represented.
As shown in Figure 3.1, the polarizer with BaF2 and Al in its structure, with
a grid height of 0.2 μm, has the best optical performance for the proposed
application. For a wavelength of 10 μm and a grid height of 0.2 μm, the degree of
polarization was 98.5%. In contrast, for the polarizer with the same substrate, but
with the grid from Cr (fig.3.2), the degree of polarization was 92.4% for a
wavelength of 10 μm.
In Figures 3.3 and 3.4 we can see that the ZnSe substrate polarizers have
good optical performance only for certain wavelengths, so we get a narrow band
polarizer.
 Ionela GHIŢĂ, Adrian RIZEA, Claudiu CHIRICĂ

In conclusion, the polarizer with BaF2 substrate and Al in its structure, with
a height of 0.2 μm, presents the best optical performances for the proposed
application.

Fig. 3.1: The simulation results (transmission for TM and TE modes, extinction ratio and
polarization degree) of a polarizer with BaF2 substrate and Al for the metalic grid with different
grid heights
 Design and analysis of a micro structured optical polarizer

Fig. 3.2: The simulation results (transmission for TM and TE modes, extinction ratio and
polarization degree) of a polarizer with BaF2 substrate and Cr for the metalic grid with different
grid heights
 Ionela GHIŢĂ, Adrian RIZEA, Claudiu CHIRICĂ

Fig. 3.3: The simulation results (transmission for TM and TE modes, extinction ratio and
polarization degree) of a polarizer with ZnSe substrate and Al for the metalic grid with different
grid heights
 Design and analysis of a micro structured optical polarizer

Fig. 3.4: The simulation results (transmission for TM and TE modes, extinction ratio and
polarization degree) of a polarizer with ZnSe substrate and Cr for the metalic grid with
different grid heights
 Ionela GHIŢĂ, Adrian RIZEA, Claudiu CHIRICĂ

4. Making the broadband polarization prototype

Following the simulations performed with the OptiFDTD software and

taking into account the technological possibilities existing at ProOptica SA, it was
decided to make a prototype with the following structural features: substrate of
BaF2 with a diameter of 50 mm, a network of Al with a step of 2 μm and a height
of 0.1 μm by photolithography technology.
Photolithography is a photographic process whereby the photoresist is
exposed to ultraviolet radiation and then developed to form embossed (three-
dimensional) images on the substrate. The photolithography process is performed
on flat surfaces (surface accuracy must be: N = 1 and ΔN = 0.5).[7] The stages of a
typical photolithography process are shown in Figure 4.
The coating technology of the metal layer on the substrate was Physical
Vapor Deposition (PVD), this is achieved by heating, evaporating and condensing
the material on the optical active surface.

Fig. 4: a) Choosing the substrate; b) Deposition of the metal layer on the piece;
c) Coating the substrate with photoresist; d) Alignment and exposure to ultraviolet
radiation; e) The development; f) Metal layer attack; g) Removal of photoresist and final synthesis.

Figure 5 shows the microstructured broadband polarizer.

Fig.5: Microstructured optical polarizer

 Design and analysis of a micro structured optical polarizer

5. Structural and functional characterizations

After the realization of the polarizer, several types of experimental

determinations were made, in order to characterize its optical performance, namely:
structural analysis by microscopy; structural analysis by investigating the
diffraction phenomenon at 546 nm; polariscopic photometry measurements.

5.1 Structural analysis by microscopy

Figures 6 (a) and 6 (b) show images with different magnifications (approx.
1000X, figure 6 (b)). By sweeping the structured surface, observations and visual
inspection of the obtained networks were made. Some areas with micro-defects
have been identified, but which cannot have significant influence on the
functionality of polarizers.

Fig 6.a: The microstructure of the polarizer Fig 6.b: The microstructure of the polarizer
viewed under the microscope viewed under microscope with 1000X
magnification

5.2 Structural analysis by investigating the diffraction phenomenon at

546 nm

In the case of 2 μm step grids, the diffraction phenomenon is obtained at

wavelengths in the visible spectrum, which facilitates their investigation. The
experimental setup is composed of a laser diode with a wavelength of 546 nm, the
microstructured polarizer with network geometry and a graduated screen for
visualizing the diffraction phenomenon and facilitating measurements.

We consider that the sample is described by the parameters below (Eq.4 and
Eq.5) because the model applied is that of a grid.
𝑁
n= , the number of features per unit length; (4)
L
𝐿 1
l = n= , grid constant (5)
n
 Ionela GHIŢĂ, Adrian RIZEA, Claudiu CHIRICĂ

The optical path difference calculated in this case is:

d = l(sini – sinα) (6)

In order to determine the position of the maximum, and minimum,

respectively, the folowing conditions are imposed:

maximum: d = l(sini – sinα) = kλ (7)

𝜆
minimum: d = l(sini – sinα) = kλ + 2 (8)

Determination of the grid constant using the diffraction phenomenon:

In the case of this experiment, considering i = 0 (normal incidence) and k =

1, knowing the wavelength of the radiation, λ = 546 nm, from equation (7) results:
546
l =sinα (9)

Figure 7 shows the diffraction graph obtained from simulations with

OptiFDTD software, considering a grid with a pitch of 2 µm and incident radiation
of 546 nm.

Fig.7: Diffraction graph obtained by simulation with OptiFDTD software

The screen being at a distance of 20.5 cm, and the maximum of order 1, at
6 cm from the central maximum, results:
6
tgα = 20,5 => α = 16.3138524 ° => sinα = 0.281 (10)

By entering the value obtained in the formula above, results:

546
l = 0.281 = 1.94 µm (11)
 Design and analysis of a micro structured optical polarizer

Taking into account the possible assembly errors, the relation (11) confirms
the designed value, of 2 µm, of the investigated grids.

5.3 Polariscopic photometry measurements

These measurements were performed using an absorption spectrometer.

Absorption spectrometry measures the ratio between the intensity of the radiation
transmitted by the sample and the incident radiation per sample.
Figure 8 shows graphically the values of the transmissions (for TM and TE
mode), but also the extinction ratio and the degree of polarization obtained from the
measurements for the polarizer made practically.

Fig.8: Measurement results (transmission for TM and TE modes, extinction ratio and polarization
degree) for the microstructured polarizer made practically by photolithography technology

6. Conclusions

In this paper we designed and made practically a microstructured optical

polarizer with metal wire grid geometry, which can be used in a polarization
imaging system for video cameras operating on the spectral range of 8 - 12 µm.
 Ionela GHIŢĂ, Adrian RIZEA, Claudiu CHIRICĂ

The structure was designed and simulated using OptiFDTD software. For
the design, we chose four types of structures with different materials and
geometries. Geometric parameters, such as the period of the grid and its height, can
greatly influence the optical performance of a polarizer.
From the resulting spectral transmission, we concluded that the polarizer
with the best optical performance is the one that has the following structural
characteristics: BaF2 substrate, Al layer with a perioud of 2 μm and grid height of
0.2 μm. The optical performances of this polarizer, for 10 μm wavelength are the
following: the transmission coefficient for the TM mode reaches the value of 85%,
the transmission coefficient for the TE mode is 0.75% and the degree of polarization
is 98.5%.
Following the simulations performed with OptiFDTD software and taking
into account the existing technological possibilities at SC Pro Optica SA, it was
decided to make a prototype using photolithography technology, with the following
morphological characteristics: BaF2 substrate with a diameter of 50 mm, Al grid
with a perioud of 2 μm and the grid height of 0.1 μm. The optical performances of
the polarizer made practically for 10 μm wavelength are the following: the
transmission coefficient for the TM mode is 84%, the transmission coefficient for
the TE mode is 0.2% and the degree of polarization reaches the value of 99%.ş

Thus, we successfully simulated and realized through photolithography

technology, a polarizer of metal grid type on dielectric substrate with applications
in the field of imaging.

REFERENCES

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