[EE362(B)] HW 3_solution
[EE362(B)] HW 3_solution
Sol)
(a)
1 𝐷𝐷𝑛𝑛 1 𝐷𝐷𝑝𝑝
𝐼𝐼𝑠𝑠 = Ae𝑛𝑛𝑖𝑖2 � � + � �
𝑁𝑁𝑎𝑎 𝜏𝜏𝑛𝑛0 𝑁𝑁𝑑𝑑 𝜏𝜏𝑝𝑝0
1 25 1 10
= (10−4 )(1.6 × 10−19 )(1.5 × 1010 )2 × � 16
� −7 + 16
� −7 �
4 × 10 10 4 × 10 10
(b)
Aeni 𝑊𝑊
𝐼𝐼𝑔𝑔𝑔𝑔𝑔𝑔 =
2𝜏𝜏0
We find,
and
1
2ϵs (Vbi + VR ) Na + 𝑁𝑁𝑑𝑑 2
W=� � ��
e 𝑁𝑁𝑎𝑎 𝑁𝑁𝑑𝑑
1
2(11.7)(8.85 × 10−14 )(0.7665 + 5) 4 × 1016 + 4 × 1016 2
=� × � ��
1.6 × 10−19 (4 × 1016 )(4 × 1016 )
= 6.109 × 10−5 cm
Then,
(10−4 )(1.6 × 10−19 )(1.5 × 1010 )(6.109 × 10−5 )
𝐼𝐼𝑔𝑔𝑔𝑔𝑔𝑔 = = 7.331 × 10−11 𝐴𝐴
2(10−7 )
(c)
2. A one-sided p+n silicon diode has doping concentrations of 𝑁𝑁𝑎𝑎 = 4 × 1017 cm−3 and
𝑁𝑁𝑑𝑑 = 8 × 1015 cm−3 . The diode cross-sectional area is A = 5 × 10−4 cm2. 𝐷𝐷𝑛𝑛 = 25 cm2 /𝑠𝑠
and 𝐷𝐷𝑝𝑝 = 10 cm2 /𝑠𝑠. The maximum diffusion capacitance is to be limited to 1 nF.
Determine (i) the maximum current through the diode, (ii) the maximum forward-bias
voltage, and (iii) the diffusion resistance. (Assume that T=300K, 𝜏𝜏𝑝𝑝0 = 10−7 𝑠𝑠)
Sol)
(i)
𝐼𝐼𝑝𝑝0 𝜏𝜏𝑝𝑝0
𝐶𝐶𝑑𝑑 =
2𝑉𝑉𝑡𝑡
or
(ii)
𝐷𝐷𝑝𝑝 n2i Va
𝐼𝐼𝑝𝑝0 = 𝐴𝐴𝐴𝐴� ∙ exp � �
𝜏𝜏𝑝𝑝0 Nd Vt
10 (1.5 × 1010 )2 Va
0.518 × 10−3 = (5 × 10−4 )(1.6 × 10−19 )� −7 ∙ 15
exp � �
10 8 × 10 Vt
0.518 × 10−3
𝑉𝑉𝑎𝑎 = (0.0259) ln � �
2.25 × 10−14
= 0.618 V
(iii)
Vt 0.0259
𝑟𝑟𝑑𝑑 = = = 50 Ω
𝐼𝐼𝐷𝐷 0.518 × 10−3