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並 不 得 書 寫 、畫 記 、作 答 。

國 立 清 華 大 學 1 1 1 學年度硕壬班考試入學試題

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科 目 代 碼 ：1102
考 試 科 目 ：科技英文

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1 . 請 核 對 答 案 卷 （卡 ）上之准考證號、科目違稱是否正確。

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 國 立 清 華 大 學 111學年度項壬班考試入學試題

系 所 班 組 別 ：動 为 機 械 工 程 學 系 項 击 班 甲 組 ( 熱 流 與 能 源 組 ）

考 試 科 目 （代 碼 ）：科 技 英 文 (1102)

共 _ 8 _ 頁 ，第_ 1 _ _ 頁 *請 在 【答 索 卷 、卡 】 作 答

Time: 10:30 〜12:10 (100 minutes)

Question I， problem 1-30,2 points for each question.

Questio 打II， problem 31-35, 2 points for each question.

Questio 打III， Problem 36-45, 3 points for each question.

N o points will be deducted for incorrect answers.

Questions I (2 points each)

Choose 也e best answer 化 replace 化e section in 化e question 化at has an underline.

1. A microscope makes a small thing appear much larger than______ •

(A) really are，巧 ） are really，（
C ) 化ey really are，（
D) are 化巧 really, (E ) 化at 化 巧 really

2. Fruits and vegetables are a good source______ vitami打s and mi打erds,

(A) in, 〇B) of, (C) have，（

D ) 也at, (E) what

3. A research institu化 offers s 化f fs ______ which include a pension plan.

(A) benefUs, (B) benefitting, (C) benefitted，（
D) bene扫dal, (E) beneficially

4. She could not sit in an aisle seat during her bus trip because 出ere w ere______ available.

(A) som e, 巧 ）an乂 （

C) mainly, (D) none, (E) 111〇化

5. Transport 0 街 cials wew unsu巧 o f ______ caused 也e airplane era油 in 化 is night,

(A) why, (B) what, (C) where, (D ) 化ose ，（

E) each

6. The guide 化Id visitors 也at 化 e machine______ by the 垃mous engineers.

(A) design, (B) designs, (C) designing, (D) designed, (E) was designed

I fill in the forms 拓r agreements.

(A) remind, (B) have reminded, (C) reminding, (D) i ;remhiding，（

E) are reminded

Re化 archers looking for good papers will find a _ ^ _ selection in 化e special issues.

(A) greater, (B) greatest, (C) greatly, (D) more greatly, (E) greaten
9. ______ students had 化 attend the class for 化e training wi化out exception.

(A) A 化 促 ) Every, (C) A lot, (D) One, (E) No

10. He had 化 work______ 化 get 化e report finished by 化e deadline.

(A) intense, 巧 ）intensity，（
C) intenskies，（
D) intensive, (E) intenisely

11 • The open o f a 化巧aurant was successful______ ^buUhe owner wished 化e event had attrac化d more

attentio口from media.

(A) only, (B) enough, (C) yet, (D) soon, (E) rather

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 國 立 清 華 大 學 111學年度項去班考試入學試題

系 所 班 組 別 ：動 为 機 械 工 程 學 系 頌 去 班 甲 組 ( 熱 流 與 能 源 組 ）

考 試 科 目 （代 碼 ）：科 技 英 文 (110巧
共 _ 8 _ _ 頁 ，第 _ 2 _ _ 頁 *請 在 【答 索 卷 、卡】作答

Time: 10:30〜12:10 (100 minutes)

Questio 打I， problem 1-30, 2 poi 打ts for each question.

Question II, problem 31-35, 2 points for each qu 巧tion.

Question III, Problem 36-45, 3 points for each question.

N o points w ill be deducted for incorrect answers.

12. He paused. _during his presentation 化 change 化e slide projec把d on 化e scree打.

(A) a moment, (B) moments, (C) momentous, (D) momentarily, (E) momentary
13. Arran呂ement of an appointment 化 化 e Prof. Lin two weeks in advance i s ____ due 化 his busy
schedule.
(A) precise:( 良) strange: (G) grateflil，(D) nee的sary: (E) conclusive
14. The department celebrated the______of its 50&anniversarybyhostingaparty.
(A) gratkude，(B) birth, (C) integration, (D) {111口巧531〇11, (E) occasion
15. Under 化e president leadership, corporations recovered from losses and began maki打g substantial

(A) regulations，(B) estimations, (C) eami打gs，(D) losses, (E) Kgulatio打s

16. Government grants for college tuition will make education_____ 化 more people from around the
world.
(A) plent瓶 1,巧 ）painful, (C) confidential, (D) exclusive ，（
E) access 化le

7. Job failure means being fired from a job, being asked U) resign， or leaving 化 pro化ct yourself.

(A) abruptl乂（
B) voluntaril乂（
C) knowingly, (D) understandably, (E) increasingly
18. The 化eory 化at as people become more ind巧 endent o f one ano化er，化ey begin 化 feel so isolated
and londy that freedom becom巧 a ______ conditionwasaccepted.
(A) common, (B) perma打ent，（
C) political，（
D) pos化ve, (E ) 打egative
19. The cuckoo would be one of nature's more______ (：
化3化化3, blkhely laying the eggs in 化e nests of

0 化er birds and leavin呂the incubatin呂a打d nurturing !;〇them.

(A) feckless, (B) lackluster, (C) industrious, (D) domestic, (E) mettlesome

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 國 立 清 華 大 學 111學年度項去班考試入學試題

系 所 班 組 別 ：動 为 機 械 工 程 學 系 項 壬 班 甲 組 (熱 流 與 能 源 組 ）

考 試 科 目 （代 碼 ）：科 技 英 文 (1102)

共_ 8 _ 頁 ，第_ 3 _ 頁 * 請 在 【答 案 卷 、卡】作答

Time: 10:30 〜12:10 (100 minutes)

Question I， problem 1-30, 2 points for each question.

Qu 站 tion II， problem 31-35, 2 points for each question.

Questio 打III， Problem 3 6 -4 5 ,3 poinl:s fbr each question.

N o points w ill be deducted for incorrect answers.

20. Now that 化6 company has hired additio打al workers, it can __ with the ccmstructio打o f the new

buildings.

(A) concern, (B) proceed, (C) step, (D) replace, (E) enhance

21. The Professor’s ______ o f the discussion is considered unique and daring.

(A) calculation, (B) subtraction, (C) interpretation, (D) reason, (E) obligation

22. The chief executive officer made an official apology______ 化e company for mistakes.

(A) on behalf of, (B) called as, (C) as soon as, (D) according to, (E) in spite o f

23. Members can______ papers in open access journals even their institution does not subscribe.
(A) access, (B) come, (C) proof, (D) intend, (E) work

24. One microampere i s ______ ampere.

(A) 10-3, 〇B) 10-6, (C) 10-9, (D) 10-12,(巨) 1 0 -口

25. One cubic micrometer i s ______ liter.

(A) 10-3, (B) 10-6, (C) 10-9, (D) 10-12, (E) 10-"

26. Multiplying the area by the height gives th e______ •

(A) length, (B) area, (C) volume, (D) power, (E) force
27. The unit o f rpm is widely u化d 化 show the rotations per______ •

(A) mind, (B) matrix, (C) minute, (D) matching, (E) mass

28. Wind turbin巧 convert 化e ______ energy in 化e wind into medianical pow 化

(A) kinetic, 巧 ）electric, (C ) 也ermal，（

D ) 邸 tical, (E ) 沈 emical

29. Megapascal (MPa) is unit for______ .

(A) foi*ce, (B) Ksistance, (C) voltage, (D) power, (E) pre化ure

30. Linear flow velocity in the tube which cross巧ectional area is 100 ] ' and volume flow rate is

(A)0.01mm/s，（B)0.1 s，（C) 1mm/s, (D) 10mm/s，脚 100 mm/s

 國 立 清 華 大 學 1 1 1 學年度項去班考試入學試題

系 所 班 組 別 ：動 力 機 械 工 程 學 系 頭 击 班 甲 組 (熱 流 與 能 源 組 ）

考 試 科 目 （代 碼 ）：科 技 英 文 (110巧
*_8_ 頁 ，第 頁 * 猜 在 【答 案 卷 、卡 】作答

Time: 10:30 〜12:10 (100 minutes)

Q u e stio n l ，p r o b le m l-3 0 ,2 p o in ts fo r e a c h q u e s tio n .

Q uestion II， problem 3 1 -3 5 ,2 points for each question.

Que 巧io n III ，P r o b le m 3 6 -4 5 ,3 p o in tsfo rea ch q u estio n .

N o points w ill be deducted for incorrect answers.

Questions II (2 points each)

Try 化 help complete 化e d巧灯iption o f micro扫山dies by 打lling 化e answers in.

幸幸本本# 幸♦ 幸本幸幸本幸♦ 幸幸伞车幸幸幸幸幸# 争幸车东来幸本本本李本本幸幸本本东本本# 东#本本本本# 本幸去♦ 本幸去本#

Miniaturized analytical sys 化ms _ _as microfluidics, micro-total analysis systems (^-TAS), i

lab-0打-a-chip have attrac化过 attention over 化e last 30 years. 虹 化 is CO打cept, microfluidic channels

___ 32___ on a subsfrate and various types o f chemical and biochemical proces化s are integrated into

化e channels. When compared with bulk proces化s, there are many advantages with such miniaturized

analytical systems, such as ease o f analysis, high-speed reaction, low reagent consumption, and small

sample volumes. F ir st_____ 33___ all, considering 化eir typical diffusion time, molecules d 近 Use over

microm別er regions within 化e order o f seconds. Therefore， molecular transport in liquids, even at

liquid/liquid interfaces，gas/liquid interfaces, a打d solid/liquid interfaces, can be completed within a

very short time.___34___addition，co打sideri打g the small heat capacity of liquids i打side a microfluidic
channel,化 e 化mperature can be in巧antaneously changed. Such characteristics a化 es 化打tial for 化e
control o f chemical reactions, and___ 35___ ob 化rved in bulk-scale chemical rea巧ions; 化 erefore，

microfluidic devices have received much atte打tion as chemical reaction U)〇ls.

31. (A) know , 巧 ）knew, (C) are known, (D) known，（

E) knowing

32. (A) fabricate, (B) fabricated, (C) are fabricated,(巧 fabricating, (E) fabrication

33. (A) of, (B) from，（

C) to, (D) at, (巧 in
34. (A) Of, (B) From, (C) To, (D) At, (E) In

35. (A) did not, (B) does not, (C) doing not, (D) are not, (巧 being not

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 國 立 清 華 大 學 1 1 1 學年度項壬班考試入學試題

系 所 班 組 別 ：動 力 機 械 工 程 學 系 項 壬 班 甲 組 (熱 流 與 能 源 組 ）

考 試 科 目 （代 碼 ）：科 技 英 文 (1102)

共__8_ 頁 ，第_ 5 _ _ 頁 * 請 在 【答 秦 卷 、卡 】作答

Time: 10:30 〜12:10 (100 minutes)

Question I， problem 1-30, 2 points for each question.

Question II, problem 3 1 -3 5 ,2 points for each question.

Questio nIII ，Probleni36-45,3 pointsforeachquestion.

No points w ill be deducted for incorrect answers.

Questions III (3 points each)

Below is the information from published Journal papers, please try to an • 化e 扣llowing questions.

Article

Metal-Free Fabrication of Fused Silica Extended Nano幻uidic

Channel to Remove Artifacts in Chemical Analysis
Kyojiro Morikawa 】声 ， Ryoichi Ohta 1, Kazuma Mawatari I* and TakeMko Kitamoid
1 Collaborative 民esearch Organiza垃on for Micro and Nano Multifunctional Devices (NIvItlD), The UhiveirsSty
of Tokyo, 7-3-1 Hongo, Bimkyo, Tokyo 百氏Japan;
2 Department of Applied Oieinistry, Sdiool 〇£ Engineering, Hie University of Tok^ro^ 7-3-1 Hongo, Bvinkyo,
Tokyo ； ll3-8656, Japan
3 Institute of Nanoengineering and Microsystems (iNEMS), Department of Power Mechanical Engineerings
National Tsin島Hua University, No. lOi, Section 2, fCuang-Fti Road, Hsmch。30013, Taiwan
* Correspondence: morxkawti@icl,t.u-tokyo.acjp (K.M.);lonawatari©g.eccu-tokyo.ac.jp (K.M.)

Received: 29 June 2021, Accepted: 30 July 2021, Published: date: 31 July 2021

A b str a c t: In m ic r o fh U d ic s , e s p e c ia lly in n a n o flu id ic s , n a n o c h a r m e ls w it h fu n c tic m a liz e d s u r fa c e s

h a v e r e c e n tly a ttr a c te d a t te 打tio n f o r u s e a s a n e w to o l fo r th e in v e s t i色a巧o n o f c h e m ic a l r e a c 巧o n fie ld s .
M o le c u le s h a n d le d in th e r e a c tio n f ie ld c a n r e a c li th e s in g le - m o le c u le l e v e l d u e to t h e s m a ll s iz e o f
扫l e n a n o c h a r m e L I n s u c h 巧ir r o u n d ln g s , c o n ta iiU n a tio n o f t h e c h a n n e l s u r fa c e s h o u ld b e r e m o v e d a t
t h e s i n g le - m o le c u le ! e v e l. In th is s t u d y , 巧 w a s a s s u m e 过社la t m e t a l m a te r ia ls c o u ld c o n ta m in a te th e
ru m o c h a r m e ls d iir in 呂 抹 le fa b r ic a t化打 p r o c e s s e s ; th e r e fo r e , sv e a im e 过 t o d e v e lo p m e ta l-fr e e
fa b a ic a tio 打 p r o c e sse s* f u s e d s ilic a c h a n n e ls 1 口0 。n m - d e e p w e r e c o n v e 打tio 打a lly fa b r ic a te d u s in g a
沈 r o m iu 打1 m a s k . I n s 化孔d o f d ir o m iu m , e le c tr o n b e a m r e s is ts m o r e th 。。 1 0 0 。ru n th ic k w e r e u s e d
a n d th e lith o g r a p h y c o n d itio n s w e r e o p tim iz e d . F r o m th e r e s u lts o f o p tim iz a tio n , c lia n n e ls w it h
1 0 0 0 n m s c 別e w i d t h a n d d e p 化 w e r e fa b r ica 括d o n f u s e d 纽 ic a s u b s tr a te s w it h o u t 化 e u s e o f a
c h r o m iu m m ask * I n n a n o f lu id ic e x p e ir k n e n ts, a n o x ic ia tio n r e a c tio n w a s o b s e r v e d i 打 。 过e v ic e
fa b r ic a te d b y c o r w e n 巧o n a l fa b r ica U o 打 p r o c e s s e s u s in g a ck ro x n iu m m a s k . It w a s £ou打d th a t C l如
r e m a n e d o 打灶le d h a rm el s u r fa c e s a n d r e a c te d w i t h c h e m ic a ls in t h e li q 山 d p h a s e i n 化 e e x te r id e d
n a n o c h a n n e ls ; t h is e f fe c t o c c u r r e d at le a s t to tlie m ic r o m o la r le v e l. In c o n tr a st, d e v ic e fa b r ic a te d
w it h m etal_-£ree p r o c e s s e s 、 、，a s fr e e o f a r tifa c ts in d u c e d b y th e p r e s e n c e o f c h r o m iu m . T h e 过e v e lo p e d
虹b r ic a tio n p r o 说 s s e s a n d r e s u lt s o f th is s t u d y w i l l b e a s ig n if ic a n t c c m tiitm tio n 化 t h e fu 打dam erx村1
t e c h n o lo g ie s e m p lo y e d i n 化巧 6 e l d s o f m ic r o 公u id ic s a n d n a n o flu id ic s .

K e y w o r 泣s: m i c r o f l u i d k s ; 打a n o 幻u id ic s ; e x te n d e d n a n o c h a r m e l^ ia n o fa b r ic a tio n ; f u s e 幻 sU ica; m e ta l-

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 國 立 清 華 大 學 1 1 1 學年度領壬班考試入學試題

系 所 班 組 別 ：動 力 機 械 工 程 學 系 項 壬 班 甲 組 (熱 流 與 能 源 組 ）

考 試 科 目 （代 碼 ）：科 技 英 文 (110巧
共_ 8_ _ 頁 ，第 頁 * 請 在 【答 案 卷 、卡 】作答

Time: 10:30 〜12:10 (100 minutes)

Question I， problem 1-30, 2 points 抗r each question.

Questio 打II， problem 3 1 -3 5 ,2 points for each question.

Questio 打III， Problem 36-45, 3 poi打ts for each question.

N o points w ill be deducted for incorrect answers.

36. How many correspondmg author(s) is/are shown in 化is article?

(A )0 ，(B )1 ，(C )2 ，(D )3 , 脚 4
37. When the authon submitted 化e mamiscripUo the journal?
(A ) 巧 June 2021 ，巧 ） 30 化心 2021 ，（
C) 31 July 2021, (D) Approximately 1 month，（
E) not shown

38. What does not allow us to use nanochannels 仿r chemical reaction fields?
(A) single-molec 山e, (B) contaminatio打o f 化e channel surface, (C) 1000 nm-deep 打anochannel，（
D)

1000 nm-thick resist，脚 fUsed silica substrate

39. What is "me化1-free fabricatio打proc巧s" mentioned in 化is article?
(A ) 化 fabrics化 1000 nm-deep nanochannel, (B ) 化 fabricate nanochannel with chromium mask, (C)
化 拉 bricate nanochan打別 wi 化out chromium mask, (D ) 化 observe oxidatio 。化actio打，（
E) 化 keep

chromium on 出e channel surface

40. To what extent did remained chromium on the nanochannel surface induce artifact?
(A) single molecule level，（
B) 1000 nm-deq) level, (C) 1000 nm-thidc level, (D) micromolar level,

(E) not ob 化rved

41. What was achieved by me^kfree fabricatio打proce巧？
(A) contaminatio打o f the 打anochannel surface, (B) fabrication o f 1000 nm-deep nanochannel，(C)

Optimizatio打for channels wi化 1000 打m scale width and dq)化， （

D ) 化 induce oxidatio 打reaction,

(E) observation without art瓶 ct

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 國 立 清 華 大 學 1 1 1 學年度硕壬班考試入學試題

系 所 班 組 別 ：動 力 機 械 工 程 學 系 硕 壬 班 甲 組 (熱 流 與 能 源 組 ）

考 試 科 目 （代 碼 ）：科 技 英 文 (110巧
共_ 8_ 頁 ，第_ 7_頁- * 請 在 【答 案 卷 、卡 】作答

Time: 10:30 〜12:10 (100 minutes)

Question I, problem 1-30, 2 points for each question.

Question II, problem 31-35, 2 points for each question.

Qu 巧 tion III，Problem 3 6 -4 5 ,3 points for each question.

N o points will be deducted 拓 r incorrect answers.

Time [s]

Figure 1: Signals fbrTMB (3,3 ，

，5,5 ，
-tetrame化y 化enzidine) solutions wUh various mcubation times.

Signals were obtained, that indicated the oxidation o f TMB, and the progress o f the reaction is
indicated by the incKase in the signal intensity with increasin呂incubation time.

42. What is the value o f maximum signal int卽 sity in 化e conditio打o f "1 mi打incubation" ?

(A) 6 s ，(B) 12 s ，(C) 1 ^iV，(D) 3 [iV: 似 8 fiV

43. What is mainly discussed by 化e au化ors using 化is F igure

(A) background signal, (B) signal starting 化 increase at 10 s, (C) appeared si呂打al peak around 13

(D) progre化 o f Kaction wUh incKasing incubation time ，(E) fast reaction within 20 s
 國立清華大學m 學年度項去班考試入學試題

系 所 班 組 別 ：動 力 機 械 工 程 學 系 頌 去 班 甲 組 (熟 流 與 能 源 組 ）

考 試 科 目 （代 碼 ）：科 技 英 文 (110巧
共_ 8 一 頁 ■ 第 頁 * 請 在 【答 案 卷 、卡 】作答

Time: 10:30 〜12:10 (100 minutes)

Questio 打t problem 1-30, 2 points for each question.

Questio 打II， problem 31-35, 2 points for each question.

Questio 打III， Problem 3 6 -4 5 ,3 poi打ts for each question.

N o poi 打ts wUi be deducted for incorrect answers.

支鄕始i

〜 严 ， r 違 广 ，术
mm "S•矿 W ， 叩r

100 nm

Figure 2: SEM images o f nanochannels fabricated using exposure times o f (A) 0.4, (B) 0.5, (C) 0.6, (D)

0.7 and (E) 0.8 fis/dot. I打化is process, the electron beam resist was spin-coated onto a flised silica

substrate at 5000 rpm. Electron beam li出ography was subsequently performed while varying the

exposure time. After electro打beam exposure,化e Ksist was developed wi化 o-xyle 打e fbr a time spa打o f

1.5 min, following which 化e 打anochannels were dry etched with gaseous o f SFga打d CHF3 . The

nanochannels in (A) had a triangular shape becau化 也 e exposure time was not optimized: and some

reskt was retained in 化e nanocliannel regio打after development. I打contrast, the 打anochannels in (B )-

(E) exWbit approximately rectan呂ular shapes. With increas巧 in 化e exposure tim e, 化e nanochannels

also became wider, and the optimal exposure time was determined 化 be 0,5 ^s/dot. Using this

exposure, na打ochan打els w 侃 dimensio打s o f 48 主3 nm (width) and 49 ± 1 nm (dep化）wi化

approximately square shap巧 wcK obtained.

44. Ghoose incorrect answer about the fabrication process in Figure 2.

(A) Electron beam reskt was spin-coated, (B) Lkhography was performed by electro打beam, (C)

The 扣化 d silica was etched by o-xylene, (D) Gaseous o f SFs and CHF3 were used for dry etching,

(E) None

45. Choose correct a打swer abo山 discussio 打in 化is Figure 2.

( A ) 民ectangular nanochannels were fabricated in all CO打dition, (B) Exposure time was not critical

param別er， (C) With deci*eases in the exposure time, nanochannel became narrower, (D)

Nanochannels with dimensions less 也an 50 nm were di班 cult 化 fabricate, (E) None