p0897c
p0897c
Pd mass plated, mg
ing Pd source, temperature, reducing
agent concentration, stabilizer concen- T=64 °C
tration and buffer pH, require proper
choice of these variables to ensure plat-
ing solution stability and to maximize
the conversion of Pd salt to Pd metal. A
preliminary investigation of these vari-
ables readily enabled conversions ex-
ceeding 80 percent to be obtained after
three hr of plating. Near optimal values
(>95%) were also achieved within a
three-hr reaction period for a very spe- Time, hr
cific choice of variables. Surface uniformity and purity of b
the deposited film were excellent. The operating concen-
tration of the stabilizer (Na EDTA) appears to be the most
significant consideration in the plating process. Varying
Na EDTA concentration results in an optimal region of
Pd conversion. Conversions quickly decreased when the
system became unstable or if the system had too great a
Pd conversion, %
stability.
Choice of Chemicals
A limited choice of reductants is available for electroless
Pd conversion, %
a
Examples include Vycor13 glass, Corning, Inc., Corning, NY, porous stainless steel,14
Fig. 3—Effect of EDTA concentration on Pd conversion. and Membralox, 15 U.S. Filter Corp, Warrendale, PA.
August 1997 35
Table 4
Pd Conversions for pH 9 & 11 Buffers
(EDTA:Pd molar ratio = 6)
EDTA:Pd (mol
Hydrazine
Buffer pH Temp (°C) (molar ratio) Conversion %
9 59 0.4 19.5
ar ratio)
11 59 0.4 19.0
9 59 0.72 38.7
Hy
11 59 0.72 35.7 dr
az
ine )
9 71 0.4 43.0 :P (°C
d( ture
11 71 0.4 45.5
mo p era
lar em
rat iont
io) lut
So
Table 5 Fig. 4—EDTA:Pd molar ratio required for plating solution stability.
EPd /Pd for various EDTA:Pd
+2
Molar Ratios at 25 °C Five different variables were investigated for their effect
on palladium conversion: Tetra-ammine palladium chloride
EDTA:Pd Molar Ratio 0 6 20 40 or tetra-ammine palladium nitrate, solution temperature, buffer
EPd /Pd (V)
+2 0.83 0.2601 0.2446 0.2357 pH and the concentrations of hydrazine and Na2 EDTA.
Plating temperature was controlled to ±0.5 °C from the
difference between the oxidation and reduction reactions that predetermined temperature of the water bath. The volume of
acts as the driving force. Hypophosphite is commonly used, the plating solution (22 mL per experiment) and the surface
but deposits usually contain in excess of 1.5 percent phospho- area to be plated, were kept constant. Plating was performed
rus,6 thereby reducing film quality. Problems with surface in glass vials precleaned with 6-percent HNO3. The palla-
adhesion of Pd, using hypophosphite, can be encountered in dium solution was allowed to stabilize for at least 8 hr prior
films exceeding 5 mm.23 Hydrazine was judged the most to plating. Both hydrazine and palladium solutions were
suitable and was chosen as our reducing agent. preheated to the predetermined temperature amd mixed, then
Disodium EDTA was used as a stabilizer because it forms the membrane (ends sealed with Teflon™) was added to the
a highly stabile palladium complex. Ammonium chloride can solution.
also act as a stabilizer when using PdCl for the metal salt.
Surface Cleaning
Experimental Procedure A simple cleaning procedure for the membranes, similar to
Ceramic membranes used in this study were supplied by that used by Collins,15 was performed. Membranes were
Potchefstroom University. The membranes consisted of √- sectioned into 5-cm lengths, using a diamond saw. Cleaning
Al2 O3 (70%) and ZrO2 (29%) stabilized with Y2 O3 (1%), comprised
leading to excellent mechanical properties and chemical
stability. The tubular membranes had a 12-mm outer diam- • treatment for 1 min in a 0.1 wt% NaOH ultrasonic bath
eter, wall thickness of about 0.8 mm and nominally the (room temperature)
following properties: 210-nm pore size, 48.5 percent poros- • ultrasonic treatment for 2 min in deionized water
ity and 4.0 m2/g surface area. • rinsing in isopropanol for 10 min
• rinsing in deionized water for a further 10 min
• drying at 110 °C for 8 hr.
Surface Activation
The two-step procedure (although now not much in
use) was chosen for reasons mentioned in the back-
ground section.
The solutions used for surface activation are listed
in Table 1. They are similar to those used by Shu.14 A
Pd conversion, %
August 1997 37
at high hydrazine concentrations. This phenomenon
can be clearly seen in Fig. 2. Experiments done
outside the pH buffer range of 9 to 11 caused a
sudden decrease in Pd conversion. Pd is then no
longer deposited on the membrane alone, but also on
Pd conversion, %
System Stability
A response surface, using a smooth spline to plot it,
was compiled indicating system stability (Fig. 4).
The molar ratio of EDTA to Pd, on the z-axis,
represents the value at which stability can be guaran-
teed for a specific temperature and hydrazine con-
centration. Values on and above the curve indicate
stability, while those below the curve show probable
instability. Increases in temperature and hydrazine
concentration require a sharp increase in EDTA
concentration to guarantee stability. An unstable
Fig. 9—Effect of EDTA on Pd conversion at various hydrazine concentrations. system is highly unfavorable and will always lead to
low conversions.
a reduction in conversion.
6. Pd conversions in excess of 95
percent were obtained, within
three hr, using tetra-ammine pal-
ladium nitrate as Pd salt under
the following conditions: T=77
°C, hydrazine to Pd molar ratio
= 0.72:1, EDTA to Pd molar
ratio = 30 to 40:1 and buffer pH
= 11.
August 1997 39
Acknowledgments About the Authors
The authors wish to thank SASOL and the Foundation for Johan Keuler is a graduate student at
Research and Development for their financial support. the University of Stellenbosch. He ob-
tained a B.Eng. with distinction at
References Stellenbosch in 1995. Some of the un-
1. J. Shu, B.P.A. Grandjean, et al., Can. J. Chem. Eng., 69, dergraduate awards he received include:
1036 (1991). The SA Institute for Chemical Engi-
2. J.N. Armor and T.S. Farris, Proc. 10th Int’l Cong. on neers’ prize for the best final-year chemi-
Catalysts, July 1992, Budapest, Hungary. cal engineering student at Stellenbosch
3. J.N. Armor, Catal. Today, 25, 199 (1995). and the AECI prize for the best first-
4. W.J. Dressick, C.S. Dulcey, et al., J. Electrochem. Soc., year student.
141, 210 (1994)
5. H. Cachet, M. Froment, et al., J. Electrochem. Soc., 139, Professor Leon Lorenzen is professor
2920 (1992). and chair of the Department of Chemi-
6. S.N. Athavale and M.K. Totlani, Metal Fin., 87, 23 cal Engineering at the University of
(1989). Stellenbosch, Banhoek Road,
7. F. Pearlstein and R.F. Weightman, Plating, 56, 1158 Stellenbosch 7600, South Africa. He
(1969). joined the department in 1990 after sev-
8. Y.T. Sasaki, J. Vacuum Sci. and Technol., A, 9, 2025 eral years’ industrial experience in the
(1991). gold and uranium industries, as well as
9. D.W. Baudrand, Plat. and Surf. Fin., 71, 72 (1984). two years’ experience in the aerospace
10. A.K. Graham, Electroplating Engineering Handbook, industry. He holds a B.Eng. in chemical
3rd Ed., Van Nostrand Reinhold, New York, NY, 1971. engineering, an M.Eng., and PhD (Eng.) in metallurgical
11. Kirk-Othmer, Encyclopedia of Chemical Technology, 8, engineering from the University of Stellenbosch and a post-
738, 3rd Ed., John Wiley and Sons, New York, NY, graduate diploma in systems engineering. He has published
1980. as author or co-author 21 papers in international symposia.
12. K. Lin and C. Jong, Mater. Chem. and Phys., 35, 53 Prof. Lorenzen teaches high-temperature thermodynamics,
(1993). electrochemical engineering, mineral processing, project
13. K.L. Yeung, J.M. Sebastian, et al., Catal. Today, 25, 231 and technology management. His research interests include
(1995). all aspects of hydrometallurgy, especially leaching, waste
14. J. Shu, B.P.A. Grandjean, et al., J. Membrane Sci., 77, processing and reactive processes using membranes, resins
181 (1993). and activated carbon.
15. J.P. Collins and J.D. Way, Ind. Eng. Chem. Res., 32,
3006 (1993). Dr. Ronald D. Sanderson is the direc-
16. N. Feldstein, J. Electrochem. Soc.: Electrochem. Sci. tor of the Institute for Polymer Science at
and Technol., 121, 738 (1974). the University of Stellenbosch. He ob-
17. A.M.T. Van Der Putten, J. De Bakker, et al., J. tained a B.Sc. and B.Sc. Hon. at the
Electrochem. Soc., 139, 3475 (1992). University of Cape Town (South Africa)
18. T. Osaka and H. Takematsu, J. Electrochem. Soc.: Elec- and a PhD at the University of Akron. He
trochemical Sci. and Technol., 127, 1021 (1980). has published as author or co-author 90
19. J. Horkans, J. Electrochem. Soc.: Electrochem. Sci. and publications in international journals and
Technol., 130, 311 (1983). holds 18 patents. His main interests are
20. W.V. Hough, J.L. Little, et al., U.S. patent 4,255,194 membranes, separation, reactors and polymers.
(1981).
21. R.N. Rhoda and A.M. Madison, U.S. patent 2,915,406 Dr. Vladimir Linkov completed his
(1959). undergraduate studies in Russia and his
22. I. Ohno, O. Wakabayashi, et al., J. Electrochem. Soc.: PhD in 1995 at the Institute for Polymer
Electrochem, Sci. and Technol.,132, 2323 (1985). Science, University of Stellenbosch. He
23. J.P. Collins, PhD: Catalytic Decomposition of Ammonia has published several papers and is cur-
in a Membrane Reactor, Oregon State University (1993). rently part of a research team at the
24. E.W. Schmidt, Hydrazine and its Derivatives: Prepara- SASOL Centre for Chemistry at the Uni-
tion, Properties, Application, John Wiley and Sons, New versity of Potchefstroom (South Africa).
York, NY, 1984.
25. Ullmann, Ulmann’s Encyclopedia of Industrial Chemis-
try, A10, 96, 5th rev. ed.; VHC Publishers, Germany, Note: Correspondence regarding this paper should be addressed to Professor
1987. Lorenzen.
26. Kirk-Othmer, Encyclopedia of Chemical Technology, 5,
353, 3rd Ed., John Wiley and Sons, New York, NY,
1980.
27. R.N. Rhoda, Trans. Inst. Met. Fin., 36, 82 (1959).
28. L.G. Sillen and A.E. Martell, Stability Constants of
Metal-Ion Complexes, Special Publication No. 17, p.
639; The Chemical Society, London (1964)
29. L.F. Audrieth; The Chemistry of Hydrazine, John Wiley
and Sons, New York, NY, 1951.
40 PLATING & SURFACE FINISHING