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IPC-7094A-TOC

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IPC-7094A-TOC

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IPC-7094A

Design and Assembly


Process Implementation
for Flip Chip and Die-
Size Components

Developed by the Flip Chip Mounting Task Group (5-21g) of the


Assembly & Joining Processes Committee (5-20) of IPC

Supersedes: Users of this publication are encouraged to participate in the


IPC-7094 - February 2009 development of future revisions.

Contact:

IPC
January 2018 IPC-7094A

Table of Contents
1 SCOPE ...................................................................... 1 4.5.3 Solder Paste Deposition ..................................... 17
1.1 Target Audience and Intent ................................. 1 4.5.4 Solder Electroplating ......................................... 18
1.2 Definition of Requirements ................................. 1 4.5.5 Other Bumping Techniques and Materials ....... 18
1.3 Classification of Product ..................................... 1 4.6 Ball and Bump Terminal Process for
Flip Chip ............................................................ 18
2 APPLICABLE DOCUMENTS .................................... 1
4.6.1 Dimensional Control .......................................... 18
2.1 IPC ....................................................................... 1
4.6.2 Metallurgical Integrity ....................................... 19
2.2 Joint Industry Standards ...................................... 2
4.6.3 Cleanliness of Bumping Site ............................. 19
2.3 JEDEC .................................................................. 3
4.7 Surface Redistribution ....................................... 19
3 REQUIREMENTS AND TECHNOLOGY 4.8 Cu Post or Pillar Termination ........................... 20
OVERVIEW ................................................................ 4
3.1 Terms and Definitions ......................................... 4 5 FLIP CHIP POST-FABRICATION
PROCESSING ......................................................... 20
3.1.1 Acronyms and Abbreviations .............................. 4
5.1 Test and Reliability Screening .......................... 20
3.2 History of Flip Chip Mounting ........................... 4
5.1.1 Known Good Die (KGD) .................................. 20
3.2.1 Advantages of Flip Chip Mounting .................... 5
5.1.2 Known Quality Die (KQD) ............................... 20
3.3 History of Die Size and Chip Scale Array
5.1.3 Wafer Testing and Equipment Challenges/
Packaging ............................................................. 5
Concerns ............................................................. 20
3.3.1 Film-Based Package Substrate ............................ 6
5.1.4 Reliability Screening at the Wafer or
3.3.2 Commercial Package Variations .......................... 7 Die Level ........................................................... 21
3.3.3 Redistribution ....................................................... 7 5.2 Wafer Thinning (Grinding and Polishing) ........ 22
3.3.4 Advantages of Die-Size Package and Chip 5.2.1 Thinning and Polishing Process ........................ 22
Scale Package (CSP) Technology ....................... 7
5.2.2 Processing Effect on the Quality of the Die ..... 22
4 FLIP CHIP TECHNOLOGY ....................................... 8 5.3 Singulation ......................................................... 22
4.1 Electrical Design Considerations ........................ 8 5.3.1 Sawing ................................................................ 22
4.1.1 Equivalent Circuitry ............................................. 8 5.3.2 Scribe and Break ............................................... 23
4.1.2 Final Metal Traces ............................................... 9 5.4 Laser Sawing ..................................................... 24
4.1.3 Inductance and Capacitance .............................. 10 5.4.1 Wafer Dicing With Deep Reactive-Ion
4.1.4 High-Frequency Performance ............................ 10 Etching (DRIE) Process .................................... 24
4.2 Thermal Design ................................................. 10 5.5 Shipping and Handling ...................................... 24
4.2.1 Bump Interconnect Thermal Model .................. 11 6 FLIP CHIP INTERCONNECTING
4.3 Flip Chip Preparation for Mounting ................. 12 SUBSTRATES ......................................................... 25
4.3.1 Design Guide Checklist ..................................... 12 6.1 Substrate Base Material ..................................... 25
4.3.2 Final Metal ......................................................... 14 6.1.1 Flexible Base Substrates .................................... 25
4.3.3 Surface Passivation ............................................ 14 6.1.2 Reinforced-Resin Substrates .............................. 26
4.3.4 Footprint Population .......................................... 15 6.1.3 Cu Conductor Base Metals for Flexible and
4.4 Design Output Requirements ............................ 16 Reinforced Laminates ........................................ 26
4.4.1 Final Metal Reticle Mask .................................. 16 6.1.4 Ceramic Substrates ............................................ 26
4.4.2 Passivation (Terminal Via) Reticle 6.1.5 Si-Based Substrates ........................................... 27
Mask and Plan ................................................... 16 6.2 Surface Finish Properties ................................... 28
4.4.3 Unit Cell Design ................................................ 16 6.2.1 Chemical Plating Finishes (Electrolytic and
4.5 Land Pattern Design .......................................... 17 Electroless) ......................................................... 28
4.5.1 Land Pattern for Ceramic Substrate Design ..... 17 6.2.2 Thick-Film Metallic Finishes ............................ 28
4.5.2 Solder Bumping ................................................. 17 6.2.3 Thick-Film Deposition Processes ...................... 28

v
IPC-7094A January 2018

6.2.4 Sputtered (Thin-Film) Conductive Finishes ..... 28 7.6 Contact Array Redistribution ............................. 40
6.2.5 Sputtered Metal Deposition Process ................. 28 7.6.1 Staggered-Array Planning ................................. 40
6.3 Alternative Circuit Forming Processes ............. 28 7.6.2 Die Shrink Considerations ................................. 41
6.3.1 Laser Direct Image (LDI) ................................. 28 7.7 Flip Chip and Chip Scale Package (CSP)
6.3.2 Inkjet Imaging .................................................... 29 Assembly ............................................................ 41
6.3.3 Silkscreen and Stencil Printing ......................... 29 7.7.1 Passivation Material Requirements ................... 41
6.3.4 Direct Image Conductive Inks Process ............. 29 7.7.2 Requirements for Bump and Ball
Terminal Alloy ................................................... 41
7 PACKAGE-LEVEL STANDARDIZATION ............... 30 7.7.3 Flux for Flip Chip and Chip-Size
7.1 Controlling Physical Features ........................... 30 Package Mounting ............................................. 42
7.2 Mechanical Outline Standards for Die-Size 7.7.4 Solder Paste for Flip Chip and Chip-
Ball Grid Array (DSBGA) Packaging .............. 30 Size Package Mounting ..................................... 42
7.2.1 JEDEC Standard for Die-Size BGA 7.7.5 Electrically Conductive Adhesives for
(DSBGA) ........................................................... 31 Flip Chip Attachment ........................................ 42
7.2.2 Ball Terminal Measurement .............................. 32 7.7.6 Underfill Material Requirements ....................... 42
7.2.3 Die-Size Ball Grid Array (DSBGA) Outline 7.7.7 Encapsulation Material Requirements ............... 43
Consideration ..................................................... 32 7.8 Flip Chip and Chip Scale Assembly
7.3 Electrical Performance Planning ....................... 32 Performance Requirements ................................ 43
7.3.1 Modeling and Simulation .................................. 33 7.8.1 Thermal Cycle Stress Testing of Soldered
Assemblies ......................................................... 43
7.3.2 Electromagnetic Radiation ................................. 33
7.9 Trays for Flip Chip and Chip-Size Packages
7.3.3 Electrical Bias Created by Nonelectrical
(Shipping and Delivery) .................................... 43
Phenomena ......................................................... 33
7.4 Standards for Package-Level Substrate 8 SYSTEM-LEVEL ISSUES ....................................... 44
Design and Performance ................................... 33 8.1 Design for Assembly ......................................... 44
7.4.1 Qualification and Performance of Organic 8.1.1 Flip Chip, Die-Size Ball Grid Array
Structures for Flip Chip Mounting ................... 33 (DSBGA) Land Pattern Design ......................... 44
7.4.2 Qualification and Performance for Organic 8.1.2 Component Clearance ........................................ 45
Single and Multichip Mounting and
Interconnecting Structures ................................. 33 8.1.3 Rigid Organic Substrate Design ........................ 45
7.4.3 Qualification and Performance Standard for 8.1.4 Restriction of Hazardous Substances
Inorganic Mounting Structures .......................... 34 (RoHS)-Compliant Surface Finish
Selection ............................................................. 47
7.4.4 Test Methods for Qualification and
Evaluation of Flip Chip Mounting 8.2 Flexible Circuit Substrate Design ..................... 48
Structures ........................................................... 34 8.2.1 Material for Harsh Environments ..................... 48
7.4.5 Mechanical Performance Test Requirements .... 34 8.2.2 Rigid-Flex Substrates ......................................... 48
7.5 Flip Chip Development and Performance 8.3 Ceramic Substrate Design ................................. 49
Standards ............................................................ 34 8.3.1 Thick-Film on Ceramic Substrates ................... 49
7.5.1 Flip Chip Integrated Circuit (IC) Component 8.3.2 Thin Film on Ceramic Substrates ..................... 50
Design ................................................................ 34
8.3.3 Multiple-Layer Ceramic Substrates ................... 50
7.5.2 Wafer Fabrication and Bond Site Planning ...... 35
8.4 Substrate Design Guide Checklist ..................... 51
7.5.3 Wafer-Level Terminal Forming
Methodologies .................................................... 35 9 FLIP CHIP AND DIE-SIZE DEVICE ASSEMBLY ... 51
7.5.4 Molded Fan-Out Wafer-Level Process 9.1 Substrate Preparation ......................................... 51
(FOWLP) ........................................................... 36
9.2 Flip Chip and Die-Size Device Placement ....... 51
7.5.5 Design Standards for Wafer-Level Ball
9.3 Attachment Processes ........................................ 52
Grid Array (WLBGA) ....................................... 36
9.3.1 Solder Attachment Process for Flip Chip ......... 52
7.5.6 Bond Pad and Array Planning ........................... 37
9.3.2 Reflow Soldering ............................................... 52
7.5.7 Critical Factor: Bump Attachment and
Bonding .............................................................. 39 9.3.3 Solder Alloys and Process Parameters .............. 52
7.5.8 Metallurgical Integrity ....................................... 39 9.3.4 Solder Stencil Development .............................. 53

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January 2018 IPC-7094A

9.4 Solder Process Profile Planning ........................ 54 10.8.2 Solder Interface Grain Structure Effects ........... 67
9.4.1 Reflow Process Implementation ........................ 55 10.8.3 Global Expansion Mismatch ............................. 68
9.4.2 Solder Process Evaluation ................................. 55 10.8.4 Local Expansion Mismatch ............................... 68
9.5 Thermocompression and Ultrasonic Bonding ... 56 10.8.5 Internal Expansion Mismatch ............................ 68
9.6 Adhesive Interconnection .................................. 56 10.8.6 Solder Attachment Failure ................................. 68
9.6.1 Anisotropic Conductive Adhesives ................... 56
11 RELIABILITY PREDICTION MODELING ............. 68
9.6.2 Isotropic Conductive Adhesives ........................ 57 11.1 Large Temperature Excursions .......................... 69
9.6.3 Nonconductive Adhesive Process ..................... 57 11.2 Creep-Fatigue Modeling Creep ......................... 69
9.7 Cleaning ............................................................. 57 11.3 Statistical Failure Distribution and Failure
9.7.1 No-Clean Flip Chip Processes .......................... 57 Probability .......................................................... 69
9.7.2 Aqueous Flip Chip Cleaning Technology ......... 57 11.4 Damage Modeling ............................................. 69
9.8 Attachment Assessment ..................................... 58
12 VALIDATION AND QUALIFICATION TESTING ... 70
9.8.1 Optical Inspection .............................................. 58
12.1 Screening Procedures ......................................... 70
9.8.2 X-Ray Inspection ............................................... 58
12.2 Evaluating Solder Joints .................................... 70
9.9 Underfill (Flip Chip Encapsulation) .................. 58
12.3 Testing Scenarios ............................................... 70
9.9.1 Capillary Flow Underfill Process Overview ..... 59
12.3.1 Critical Environmental Testing .......................... 70
9.9.2 Fluxing (No Flow) Underfill ............................. 59
12.3.2 Die Testing for Known Good Die (KGD) ........ 70
9.9.3 Removable/Reworkable Underfill ..................... 60
12.4 Inspection and Process Control Assurance ....... 71
9.9.4 Substrate Surface Compatibility ........................ 60
12.5 Total Quality Management and
9.10 Electrical Test .................................................... 60 Manufacturing (TQMM) ................................... 71
9.11 Rework and Repair ............................................ 60
13 SUPPLY CHAIN ISSUES ...................................... 71
9.11.1 Hot-Air Process for Device Removal ............... 60
13.1 Supply Chain Traceability ................................. 71
9.11.2 Laser Process for Device Removal ................... 61
13.2 Configuration Management ............................... 71
10 REQUIREMENTS FOR BOARD- AND
MODULE-LEVEL RELIABILITY ........................... 61 APPENDIX A Glossary ........................................... 72
10.1 Robustness of Products to Use ......................... 61 APPENDIX B Acronyms ........................................... 78
10.2 Chip Scale Package Robustness and
Reliability ........................................................... 61
10.3 Reliability Factors .............................................. 63 Figures
10.3.1 Wear-Out Failures .............................................. 63 Figure 3-1 Solid Copper Core Ball Contact ....................... 4
10.3.2 Creep .................................................................. 63 Figure 3-2 Flip Chip With a Ag-Coated Cu Core
Terminal to Maintain Uniform Stand-Off
10.3.3 Electromigration ................................................. 63 Height ............................................................... 4
10.3.4 Corrosion ............................................................ 63 Figure 3-3 Solder-Bumped Wafer-Level Ball Grid
10.3.5 Thermomigration ............................................... 64 Array (WLBGA) ................................................. 5
10.4 Solder Bump Mechanical Reliability ................ 64 Figure 3-4 Array-Configured Die-Size Ball Grid
Array (BGA) ...................................................... 5
10.4.1 Strain .................................................................. 64
Figure 3-5 Face-Down Mounted Die (Flip Chip) on
10.4.2 Effect of Thermal Expansion Mismatch ........... 64 Organic Substrate ............................................. 6
10.4.3 Temperature Cycling Frequency ....................... 65 Figure 3-6 Face-Up Wire-Bond Chip Scale
10.5 Wear-Out Mechanisms ...................................... 65 Package (CSP) ................................................. 6

10.5.1 Reliability Factors .............................................. 65 Figure 3-7 Narrow Opening in a Substrate Provides
Access for Through-Window Wire-Bond
10.5.2 Benefits of Reinforcement ................................. 66 Process ............................................................. 6
10.6 Event-Related Failures ....................................... 66 Figure 3-8 Commercial Flip-Chip and Wafer-Level
10.7 Design for Reliability (DfR) ............................. 66 Semiconductor Package Innovations ............... 7

10.8 Damage Mechanisms and Failure of Solder Figure 3-9 Wire-Bond Pad to Array Redistribution
Provides Wider Spacing and Larger
Attachments ....................................................... 66
Terminal Features ............................................. 7
10.8.1 Solder Joints and Attachment Types ................. 67

vii
IPC-7094A January 2018

Figure 4−1 Bump Equivalent Circuit (Redistributed Chip) .. 8 Figure 5-8 Horizontal and Vertical Carriers for
Figure 4-2 Solder Bump Electrical Path (Redistributed Transporting Wafers ....................................... 25
Chip) ................................................................. 9 Figure 6-1 Low Input/Output (I/O) Flip Chip Device
Figure 4-3 Final Metal Trace and Underlying Traces With Solder Bump Terminals .......................... 26
(Cross-Section) ............................................... 10 Figure 6-2 High Input/Output (I/O) Flip Chip on
Figure 4-4 Thermal/Electrical Analogy ............................. 11 Multilayer Ball Grid Array (BGA) .................... 27

Figure 4-5 Bump Interconnect Equivalent Model ............. 11 Figure 6-3 Laser Direct Imaging (LDI) ............................. 28

Figure 4-6 Alignment to Visual/Sensitive Chip Figure 6-4 Offset-Printed Conductive Ink Pattern ............ 29
Structure ......................................................... 13 Figure 7-1 Die-Size Ball Grid Array (BGA) Package
Figure 4-7 Minimum Pitch From Solder Bump to Examples ........................................................ 30
Passivation Seal ............................................. 13 Figure 7-2 Die-Size Ball Grid Array (DSBGA) Package
Figure 4-8 Comparing Perimeter and Redistributed Outline Showing a Fully Populated Terminal
Terminal Sites ................................................. 14 Array (Bottom View) ....................................... 31

Figure 4-9 Redistribution of a Single Metal Figure 7-3 Ball Coplanarity .............................................. 32
Layer Device ................................................... 14 Figure 7-4 Terminal Depopulation From the Full Array ... 32
Figure 4-10 Passivation Cross-Section .............................. 14 Figure 7-5 Flip Chip Fan-Out on Substrate ..................... 34
Figure 4-11 Suggested Distribution of Redundant Figure 7-6 Comparing Perimeter Wire Bond Pad
Bump Terminals .............................................. 15 Layout Variations ............................................ 35
Figure 4-12 Array Design Anticipating the Potential for Figure 7-7 Comparing Wafer-Level Terminal Formation
Die Shrink ....................................................... 15 Methodologies ................................................ 35
Figure 4-13 Signal and Power Distribution Positions ........ 15 Figure 7-8 Molded Fan-Out Wafer-Level Process
(FOWLP) Sequence ....................................... 36
Figure 4-14 Nested I/O Terminals ...................................... 16
Figure 7-9 Uniform Terminal Array Is a Result of
Figure 4-15 Typical Bump Passivation Reticle Mask
Surface Redistribution .................................... 36
Format for Peripheral and Array Terminal
Variations ........................................................ 16 Figure 7-10 Fully Populated Array Matrix With Corner
‘A1’ Mark on the Outer Surface of the Die
Figure 4-16 Product Unit Cell Plan .................................... 16
(Top View Left, Bottom View Right) ............... 37
Figure 4-17 Comparing Solder Ball Collapse Figure 7-11 Comparing Passivation Patterns .................... 39
After Reflow .................................................... 17
Figure 7-12 Redistribution of Perimeter Bond Pads
Figure 4-18 Land Pattern Planning for Flip Chip Into a Raised-Array Terminal Pattern ............. 40
Attachment on a Ceramic-Based
Substrate ........................................................ 17 Figure 7-13 Wafer-Level Ball Grid Array (WLBGA)
Design Layout Guideline for a Staggered-
Figure 4-19 Mass Reflow Solder Bumping of the Die Array Pattern .................................................. 40
While in a Wafer Format ................................ 17
Figure 7-14 Terminal Array Accommodating Die Shrink .... 41
Figure 4-20 Au Stud-Bump Terminal Comparing a
Wire Break-Off to a More Uniform Cut- Figure 7-15 Underfill Material Applied to Mechanically
Stabilize the Flip-Chip-Mounted Die ............... 42
Wire Profile ..................................................... 18
Figure 7-16 Encapsulation Material Dispensing ................ 43
Figure 4-21 Surface Redistribution Layer of the Bond
Sites to a Uniform Electroplated-Au Bump Figure 7-17 JEDEC Standard Carrier Tray Designed
Terminal Array ................................................. 19 for Array-Packaged Devices ........................... 43
Figure 4-22 Solder-Capped Cu Post or Pillar Terminal ..... 20 Figure 7-18 Tray Carrier With Smaller Partitions ............... 44
Figure 5-1 Wafer-Level Testing Identifies Die Elements Figure 8-1 Sequential Build-Up Substrate Structure ....... 45
That Do Not Meet Established Functional Figure 8-2 Flip-Chip and SMT Mounted Onto a
Criteria ............................................................ 21 Rigid-Flex Substrate ....................................... 48
Figure 5-2 Groove-Cutting and Wafer-Thinning Process Figure 8-3 Ceramic-Based Substrates ............................. 49
Flow for Low-Stress Die Singulation .............. 23 Figure 8-4 Flip Chip and SMT on a Ceramic-Based
Figure 5-3 Scribe and Break Singulation ......................... 23 Substrate ........................................................ 49
Figure 5-4 Scribe and Break Singulation Aspect Ratio Figure 8-5 Three-Layer, Low-Temperature Cofired
Consideration .................................................. 23 Ceramic Substrate .......................................... 50
Figure 5-5 Thin Wafer ...................................................... 24 Figure 9-1 Automated Placement System ....................... 51
Figure 5-6 Example Street Formed in Wafer Using the Figure 9-2 Flip Chip Attachment Process Using Flux
Deep Reactive-Ion Etching (DRIE) Process .. 24 Dipping of Terminals ....................................... 52

Figure 5-7 Basic Die Singulation Process Using Figure 9-3 Laser-Cut Stencil Aperture ............................. 54
Deep Reactive-Ion Etching (DRIE) Figure 9-4 Pb-Free Solder Process Profile ...................... 54
Ablation Process ............................................. 24

viii
January 2018 IPC-7094A

Figure 9-5 Reflow Solder of Flip Chip Die With Table 4-4 Terminal Via and Final Metal Via Pitch ............. 13
Discrete SMT Devices .................................... 55 Table 4-5 Contact Pitch, Ball Size to Land Pattern
Figure 9-6 Comparison of SnPb and SAC Ball-to- Approximation (µm) ........................................... 17
Package Interface ........................................... 55 Table 5-1 Bare Die Testing Levels .................................... 20
Figure 9-7 Direct Die Attachment Using Solid-Au Table 7-1 JEDEC Standard Terminal Pitch (e) and
Bump .............................................................. 56 Terminal Diameter (b) Variations for Die-
Figure 9-8 Comparison of Flip Chip Reflow Solder Size Ball Grid Array (DSBGA) (mm) ................. 31
Attachment and Anisotropic Adhesive
Table 7-2 Maximum Permitted Matrix Sizes (mm)
Joining Process .............................................. 57
for Recommended Body Sizes for WLBGA
Figure 9-9 System for Evaluating Perimeter Terminal Packages ........................................................... 38
Site Interface .................................................. 58
Table 7-3 Comparing Wafer-Level Ball Grid Array
Figure 9-10 Edge-Dispensed Underfill ............................... 59 (WLBGA) Terminal Pitch to Ball or Bump
Figure 9-11 Component Spacing for Tool Access ............. 60 Terminal Diameter Range ................................. 38

Figure 9-12 Hot-Air Process for Device Removal ............. 60 Table 7-4 Nominal Ball or Bump Diameter and Minimum
Land Diameter for Wafer-Level Ball Grid
Figure 10-1 Cross-Section of Crack Formation Due To Array (WLBGA) ................................................. 39
Coefficient of Thermal Expansion (CTE)
Mismatch ........................................................ 64 Table 8-1 Ball and Land Pattern Size Comparison .......... 44
Figure 10-2 Effects of Accumulating Fatigue Damage in Table 8-2 Substrate Design Feature Characteristics ........ 45
Solder Joint Structures ................................... 67 Table 8-3 IPC-4101 RoHS-Compliant Substrate
Materials ............................................................ 47

Tables Table 8-4 Physical Attributes of Nonreinforced


Polyimide Films ................................................. 48
Table 3-1 Comparative Table of Various Technologies Table 8-5 Thin-Film Circuit on Ceramic-Based
for a 100 Lead 10x10 mm Die ............................ 5 Substrates ......................................................... 50
Table 4-1 Final Metal Signal Trace (30 µm)
Table 9-1 Solder Alloy Examples ...................................... 53
Resistances (Example) ....................................... 9
Table 10-1 Product Categories and Use Environments ..... 62
Table 4-2 Final Metal Power Trace (60 µm)
Resistances (Example) ....................................... 9 Table 10-2 Coefficient of Thermal Expansion (CTE) for
Typical Materials ............................................... 64
Table 4-3 Typical Thermal Resistance for Variable
Bump Options (Triple Layer Chip) .................... 11 Table 10-3 Typical Heights (Joined) .................................... 64

ix
January 2018 IPC-7094A

Design and Assembly Process Implementation


for Flip Chip and Die Size Components

1 SCOPE
This document describes the design and assembly challenges for implementing flip chip technology in a direct chip attach
(DCA) assembly. The effect of bare-die or die-size components in a flip chip format has an impact on component charac-
teristics and dictates the appropriate assembly methodology. This standard focuses on design, assembly methodology, criti-
cal inspection, repair and reliability issues associated with flip chip and die-size package technologies, including wafer-level
ball grid array (WLBGA).

1.1 Target Audience and Intent The target audiences for this document are managers, design and process engineers as
well as operators and technicians who deal with electronic assembly, inspection and repair processes. The intent is to pro-
vide useful and practical information to those who mount bare-die or die-size components in a DCA assembly or those who
are considering flip chip process implementation.

1.2 Definition of Requirements The imperative form of action verbs is used throughout this document to identify accep-
tance requirements that may require compliance, depending on the Performance Classification of the hardware (see 1.3). To
assist the User, these action verbs are in bold text.
a) The words ‘‘shall/shall not’’ are used whenever a requirement is intended to express a provision that is mandatory.
Deviation from a shall or shall not requirement for a Performance Class may be considered if sufficient technical
rationale/objective evidence is supplied to the User to justify the exception.
b) The word ‘‘should’’ is used whenever a requirement is intended to express a provision that is nonmandatory and which
reflects general industry practice and/or procedure.

1.3 Classification of Product The following is a general explanation of the three classes of hardware, (see J-STD-001 for
details concerning the specific requirements for each of these classes).
IPC CLASS 1, General Electronic Products – Includes products suitable for applications in which the major requirement is
function of the completed assembly.
IPC CLASS 2, Dedicated Service Electronic Products – Includes products for which continued performance and extended
life is required and for which uninterrupted service is desired, but not critical. Typically, the end-use environment would not
cause failures.
IPC CLASS 3, High-Performance Electronic Products – Includes products for which continued high performance or
performance-on-demand is critical, equipment downtime cannot be tolerated, end-use environment may be uncommonly
harsh, and the equipment must function when required, such as life support or other critical systems.
Each of these three classes most likely will have different reliability requirements as dictated by the end user and the
intended use environment.

2 APPLICABLE DOCUMENTS

2.1 IPC1

IPC-T-50 Terms and Definitions for Interconnecting and Packaging Electronic Circuits

IPC-D-279 Design Guidelines for Reliable Surface Mount Technology Printed Board Assemblies

IPC-A-610 Acceptability of Electronic Assemblies

1. www.ipc.org

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