Cec370 Unit 1
Cec370 Unit 1
Downloadable at
Ms.G VIJAYAKUMARI,AP/ ECE
tiny.cc/npsb-elearning
NEW PRINCE DEPARTMENT OF ELECTRONICS AND COMMUNICATION ENGINEERING
E-LEARNING CEC370 LOW POWER IC DESIGN
OUTLINE
If the system or chip includes circuits other than conventional CMOS gates that have
continuous current paths between the power supply and the ground, a fourth (static)
power component should also be considered
Output capacitance:
The output capacitance of the gate consists mainly of the junction parasitic capacitances,
which are due to the drain diffusion regions of the MOS transistors in the circuit. So, the
size of the total drain diffusion area determines the amount of parasitic capacitance.
The average power dissipation of the CMOS logic gate, driven by a periodic input
voltage waveform with ideally zero rise- and fall-times, can be calculated from the
energy required to charge up the output node to VDD and charge down the total output
load capacitance to ground level.
Simplifying this integral gives the well-known expression for the average dynamic
(switching) power consumption in CMOS logic circuits.
• The average dynamic power dissipation is proportional to the square of the power
supply voltage; hence, any reduction of VDD will significantly reduce the power
consumption.
• Another way to limit the dynamic power dissipation of a CMOS logic gate is to
reduce the amount of switched capacitance at the output.
Effect of reducing the power supply voltage VDD on switching power dissipation
Assuming that the power supply voltage is being scaled down while all other variables
are kept constant, it can be seen that the propagation delay time will increase.
The dependence of circuit speed on the power supply voltage may also influence the
relationship between the dynamic power dissipation and the supply voltage.
Effect of reducing the power supply voltage VDD on switching power dissipation
To better represent this behavior, we will introduce T (node transition factor), which
is the effective number of power-consuming voltage transitions experienced per clock
cycle. Then, the average switching power dissipation becomes
There is a parasitic node capacitance associated with each internal node, these
internal transitions contribute to the overall power dissipation of the circuit. In fact,
an internal node may face several transitions while the output node voltage of the
circuit remains unchanged,
Effect of reducing the power supply voltage VDD on switching power dissipation
Where Ci represents the parasitic capacitance associated with each node and αTi
represents the corresponding node transition factor associated with that node.
• The switching power dissipation discussed above is purely due to the energy
required to charge up the parasitic capacitances in the circuit, and the
switching power is independent of the rise and fall times of the input signals.
• Now, if a CMOS inverter (or a logic gate) is driven with input voltage
waveforms with finite rise and fall times, both the nMOS and the pMOS
transistors in the circuit may conduct simultaneously for a short amount of
time during switching, forming a direct current path between the power
supply and the ground
• The nMOS transistor in the circuit starts conducting when the rising input voltage
exceeds the threshold voltage VT,n.
• The pMOS transistor remains on until the input reaches the voltage level (VDD -
|VT,p|). Thus, there is a time window during which both transistors are turned on. As the
output capacitance is discharged through the nMOS transistor, the output voltage starts
to fall.
• The drain-to-source voltage drop of the pMOS transistor becomes nonzero, which
allows the pMOS transistor to conduct as well. The short circuit current is terminated
when the input voltage transition is completed and the pMOS transistor is turned off.
Short-circuit power dissipation is linearly proportional to the input signal rise and
fall times, and also to the transconductance of the transistors. Hence, reducing the input
transition times will obviously decrease the short circuit current component.
• Short-circuit power dissipation is linearly proportional to the input signal rise and
fall times, and also to the transconductance of the transistors. Hence, reducing the input
transition times will obviously decrease the short circuit current component.
• The short-circuit power dissipation can be reduced by making the output voltage
transition times larger and/or by making the input voltage transition times smaller.
The nMOS and pMOS transistors used in a CMOS logic gate generally have nonzero
reverse leakage and sub threshold currents. In a CMOS VLSI chip containing a very
large number of transistors, these currents can contribute to the overall power
dissipation even when the transistors are not undergoing any switching event. The
magnitude of the leakage currents is determined mainly by the processing parameters.
when the input voltage is equal to zero, and the output voltage is charged up to VDD through
the pMOS transistor. Then, the reverse potential difference between the nMOS drain region
and the p-type substrate causes a reverse leakage current which is also drawn from the
power supply (through the pMOS transistor).
The magnitude of the reverse leakage current of a pn-junction is given by the following
expression
Vbias is the magnitude of the reverse bias voltage across the junction
JS is the reverse saturation current density and the A is the junction area.
Leakage currents which occur in CMOS circuits is the subthreshold current, which is
due to carrier diffusion between the source and the drain region of the transistor in weak
inversion.
An MOS transistor in the subthreshold operating region behaves similar to a bipolar
device and the subthreshold current exhibits an exponential dependence on the gate
voltage.
The amount of the subthreshold current may become significant when the gate- to
source voltage is smaller than, but very close to the threshold voltage of the device. In
this case, the power dissipation due to subthreshold leakage can become comparable in
magnitude to the switching power dissipation of the circuit.
UNIT 1:FUNDAMENTALS OF LOW POWER CIRCUITS Ms. G VIJAYAKUMARI, AP/ ECE 24
NEW PRINCE DEPARTMENT OF ELECTRONICS AND COMMUNICATION ENGINEERING
E-LEARNING CEC370 LOW POWER IC DESIGN
The sub threshold leakage current also occurs when there is no switching activity in
the circuit, and this component must be carefully considered for estimating the total
power dissipation in the stand-by operation mode. The sub threshold current
expression is
Short-Channel Effects:
Short-Channel Devices:
A MOSFET device is considered to be short when the channel length is the same order of
magnitude as the depletion-layer widths (xdD, xdS) of the source and drain junction. As
the channel length L is reduced to increase both the operation speed and the number of
components per chip, the so-called short-channel effects arise.
Short-Channel Effects
The short-channel effects are attributed to two physical phenomena:
1.The limitation imposed on electron drift characteristics in the channel,
2.The modification of the threshold voltage due to the shortening channel length.
Short-Channel Effects:
• When the source junction barrier is reduced, electrons are easily injected into the
channel and the gate voltage has no longer any control over the drain current.
• In long channel devices, the source and drain are separated far enough that their
depletion regions have no effect on the potential or field pattern in most part of the
device.
• Hence, for such devices, the threshold voltage is virtually independent of the
channel length and drain bias. DIBL is enhanced at high drain voltages and shorter
channel lengths.
UNIT 1:FUNDAMENTALS OF LOW POWER CIRCUITS Ms. G VIJAYAKUMARI, AP/ ECE 32
NEW PRINCE DEPARTMENT OF ELECTRONICS AND COMMUNICATION ENGINEERING
E-LEARNING CEC370 LOW POWER IC DESIGN
Punch through:
• When the drain is at high enough voltage with respect to the source, the depletion
region around the drain may extend to the source, causing current to flow irrespective
of gate voltage (i.e. even if gate voltage is zero). This is known as Subsurface
Punchthrough as it takes place away from the gate oxide and substrate interface.
• So when channel length L decreases (i.e. short channel length case), punch through
voltage rapidly decreases.
• In short-channel devices, due to the proximity of the drain and the source, the
depletion regions at the drain-substrate and source- substrate junctions extend into the
channel.
• As the channel length is reduced, if the doping is kept constant, the separation
Punch through:
• An increase in the reverse bias across the junctions also pushes the junctions nearer to
each other. When the combination of channel length and reverse bias leads to the
merging of the depletion regions, punchthrough is said to have occurred.
Surface scattering:
As the channel length becomes smaller due to the lateral extension of the depletion layer
into the channel region, the longitudinal electric field component εy increases, and the
surface mobility becomes field-dependent. Since the carrier transport in a MOSFET is
confined within the narrow inversion layer, and the surface scattering that is the
collisions suffered by the electrons that are accelerated toward the interface by εx) causes
reduction of the mobility, the electrons move with great difficulty parallel to the
interface, so that the average surface mobility, even for small values of εy, is about half
as much as that of the bulk mobility.
Velocity saturation:
•The performance short-channel devices are also affected by velocity saturation, which
reduces the transconductance in the saturation mode.
• At low εy, the electron drift velocity vde in the channel varies linearly with the electric
field intensity.
• However, as εy increases above 104 V/cm, the drift velocity tends to increase more
slowly, and approaches a saturation value of vde(sat)=107 cm/s around εy =105 V/cm at
300 K.
•Note that the drain current is limited by velocity saturation instead of pinchoff.
•This occurs in short channel devices when the dimensions are scaled without lowering
the bias voltages. Using vde(sat), the maximum gain possible for a MOSFET can be
defined as
Impact ionization
•Another undesirable short-channel effect, especially in NMOS, occurs due to the high
velocity of electrons in presence of high longitudinal fields that can generate electron-
hole (e-h) pairs by impact ionization.
•It happens as follow: normally, most of the electrons are attracted by the drain, while the
holes enter the substrate to form part of the parasitic substrate current.
•If the aforementioned holes are collected by the source, and the corresponding hole
current creates a voltage drop in the substrate material of the order of 0.6V, the normally
reversed-biased substrate-source pn junction will conduct appreciably.
•Then electrons can be injected from the source to the substrate, similar to the injection
of electrons from the emitter to the base. They can gain enough energy as they travel
toward the drain to create new electron hole pairs.
•The situation can worsen if some electrons generated due to high fields escape the drain
field to travel into the substrate, thereby affecting other devices on a chip.
UNIT 1:FUNDAMENTALS OF LOW POWER CIRCUITS Ms. G VIJAYAKUMARI, AP/ ECE 37
NEW PRINCE DEPARTMENT OF ELECTRONICS AND COMMUNICATION ENGINEERING
E-LEARNING CEC370 LOW POWER IC DESIGN
•Another problem, related to high electric fields, is caused by so-called hot electrons.
• These high energy electrons can enter the oxide, where they can be trapped, giving rise
to oxide charging that can accumulate with time and degrade the device performance by
increasing VT and affect adversely the gate’s control on the drain current.