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Experimental Procedure 101114

The document outlines the importance of cleanroom conditions for the fabrication of perovskite solar cells, detailing ISO classifications for cleanroom environments. It describes the Piranha solution used for cleaning FTO substrates, emphasizing safety precautions and the step-by-step cleaning procedure. Additionally, it provides an alternative cleaning method using isopropyl alcohol (IPA) and outlines a comprehensive cleaning process for optimal substrate preparation.

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9 views

Experimental Procedure 101114

The document outlines the importance of cleanroom conditions for the fabrication of perovskite solar cells, detailing ISO classifications for cleanroom environments. It describes the Piranha solution used for cleaning FTO substrates, emphasizing safety precautions and the step-by-step cleaning procedure. Additionally, it provides an alternative cleaning method using isopropyl alcohol (IPA) and outlines a comprehensive cleaning process for optimal substrate preparation.

Uploaded by

ferdousriduan
Copyright
© © All Rights Reserved
We take content rights seriously. If you suspect this is your content, claim it here.
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EXPERIMENTAL PROCEDURE

Since perovskite materials are highly sensitive to moisture, oxygen, dust, and other contaminants, clean
room conditions play a crucial role in achieving high-efficiency and stable solar cells.

ISO - International Organization for Standardization

ISO Cleanroom Classification Chart

ISO Max. Particles (≥0.1 µm) Max. Particles (≥0.5


Clean Room Application
Class per m³ µm) per m³
ISO 1 10 0 Ultra-clean semiconductor labs
ISO 2 100 2 Advanced microelectronics
ISO 3 1,000 35 Pharmaceutical manufacturing
ISO 4 10,000 352 High-end semiconductor fabs
ISO 5 100,000 3,520 Critical optics and aerospace
ISO 6 1,000,000 35,200 Perovskite solar cell fabrication
General microelectronics, LED
ISO 7 10,000,000 352,000
production
ISO 8 100,000,000 3,520,000 Basic clean environments
Regular room air (not a clean
ISO 9 No specific limit 35,200,000
room)
PIRANHA PROCESS
Piranha Solution for FTO Substrate Cleaning

Piranha solution is an extremely strong oxidizing agent used to remove organic contaminants
from substrates. It is a mixture of sulfuric acid (H₂SO₄) and hydrogen peroxide (H₂O₂) and is
commonly used in semiconductor and solar cell fabrication.

WARNING: Piranha solution is highly dangerous! It reacts violently with organics and can
cause explosions if mishandled. Proper safety precautions are mandatory.

Composition of Piranha Solution

1. Standard Acidic Piranha (Most Common)

 H₂SO₄ : H₂O₂ = 3:1 (or 4:1 by volume)

 Powerful oxidizer for removing organic residues.

2. Basic Piranha (Less Common)

 NH₄OH : H₂O₂ : H₂O = 1:1:5

 Used for removing metal contaminants.

For FTO substrate cleaning, the acidic Piranha solution (H₂SO₄/H₂O₂) is preferred.

Step-by-Step Piranha Cleaning Procedure

1. Safety First! �

 Work inside a fume hood with proper ventilation.

 Wear gloves, face shield, and acid-resistant lab coat.

 Keep a large beaker of DI water nearby for emergency dilution.

 Never store Piranha solution—it decomposes and releases oxygen gas, which can cause
pressure buildup and explosions.

2. Preparation of Piranha Solution

 Slowly add H₂O₂ to H₂SO₄ (NEVER the reverse!)

 The reaction is exothermic (releases heat), so let it stabilize before use.

3. Cleaning Process
 Submerge FTO glass in freshly prepared Piranha solution for 5–10 minutes.

 Remove carefully using acid-resistant tweezers.

 Rinse thoroughly with DI water (at least 3 times).

 Dry using N₂ gas or on a hotplate (~100°C for 10 min).

4. Optional: UV-Ozone or Plasma Treatment

 To further enhance wettability, perform 15-20 min UV-ozone or 5 min plasma treatment.

IPA
Why Use IPA for Cleaning?

[1] Removes residual acetone after solvent cleaning.


[2] Dissolves organic contaminants (fingerprints, dust, oils).
[3] Dries quickly without leaving water stains.
[4] Less aggressive than Piranha solution (safer alternative).

Required Materials:

 99.9% Isopropyl Alcohol (IPA)

 Acetone (pre-cleaning)

 Deionized (DI) Water (final rinse)

 Ultrasonic Bath (optional, but improves effectiveness)

 N₂ Gas or Compressed Air (for drying)

 Glass Beakers & Tweezers

Step-by-Step Cleaning Process:

1. Initial Rinsing:

Rinse the FTO substrates with DI water to remove dust and loose particles.

2. Detergent Cleaning (Optional but Recommended for Heavy Contamination):

Prepare a solution of detergent in DI water.

Mix 2–5% Hellmanex III (a liquid alkaline concentrate) in DI water.


Stir the solution to ensure uniformity.

Ultrasonicate the substrates in the detergent solution for 10–15 minutes.

Rinse thoroughly with DI water.

3. Acetone Cleaning:

Immerse the substrates in acetone.

Ultrasonicate for 10–15 minutes to dissolve organic residues.

Rinse with DI water.

4. IPA Cleaning:

Transfer the substrates to a fresh IPA bath.

Ultrasonicate for another 10–15 minutes to remove remaining impurities.

IPA helps in removing grease and fine organic residues.

5. Final Rinsing and Drying:

Rinse thoroughly with DI water.

Blow dry using nitrogen (N₂) or dry in an oven at ~80°C for 15–30 minutes.

Additional Surface Activation (If Needed):

UV-Ozone Treatment: Expose the cleaned FTO to UV-ozone for 15–30 minutes to enhance
wettability and remove any remaining organic residues.

Plasma Cleaning: Use oxygen plasma for a few minutes to improve surface energy and
adhesion.

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