Development and discharge characteristics of negative hydrogen ion
Development and discharge characteristics of negative hydrogen ion
art ic l e i nf o a b s t r a c t
Article history: A negative hydrogen ion source was designed and manufactured for the SKKUCY-9 cyclotron at
Received 25 April 2014 Sungkyunkwan University. This ion source is a penning ionization gauge type source. We analyzed
Received in revised form the electromagnetic field distribution for simulation of electron temperature, electron trajectory, and
26 May 2014
average electric field in the anode using CST Particle Studio. We applied the ion bombardment position
Accepted 12 June 2014
Available online 1 July 2014
by electric field simulation data and confirmed the thermal distribution of the cathode. The anode
structure was developed using these simulation results. The penning discharge of plasma in the ion
Keywords: source occurred at 0.4 T. This ion source operates with a hydrogen flow of 1–5 cm3/min. The ignition
Negative hydrogen ion source voltage is approximately 1.7 kV and the arc current varies from 0.1 A to 2 A. The structure of the ion
Electromagnetic field simulation
source was constructed and the experimental results are in good agreement and can be useful
Discharge characteristics
information for the operation of a negative ion source.
& 2014 Elsevier B.V. All rights reserved.
1. Introduction The combined electric and magnetic fields make the electrons
oscillate, and these electrons are trapped in the plasma with a high
Sungkyunkwan University has developed the compact infor- probability of ionization effects. The electron emission takes place
mation-technology based SKKUCY-9 cyclotron for producing 18F. at the two cold cathodes, and the energy of the electron emission
It has a fully automated system and chemistry modules. The must be enough to excite hydrogen in the anode.
SKKUCY-9 cyclotron accelerates H ions to obtain a 9 MeV proton The hydrogen is ionized with electrons, and this ionized
beam with a carbon stripper. In this cyclotron, an internal penning hydrogen produces an ion bombardment, which increases the
ionization gauge type ion source is used for producing the H ions. temperature of the cathodes. As the temperature of the cathodes
The schematic of the penning ionization gauge type ion source is increases because of the ion bombardment, the increasing emis-
shown in Fig. 1. sion rate of electrons also results in hydrogen plasma discharge.
After L. R. Maxwell investigated penning discharge in 1931, The voltage drop of the plasma switches from a few thousand volts
penning ionization gauge-type ion sources were used as internal to a few hundred volts when the cold type cathode turns into a
sources in cyclotrons in the 1940s, because they have a simple thermo-cathode at a specific temperature. The temperature dis-
design and do not need an inflector for introducing beams [1–4]. It tribution of the cathodes is important for electron emission and
was used not only in cyclotrons but also in linear accelerators self-discharge of the plasma. The design of the anode is optimized
forproducing multiply charged ions [5,6]. by calculating this temperature distribution. The arc defining
In such an ion source, the H ions are produced in an arc radius was confirmed by the temperature distribution of cathode.
discharge with a magnetic field. Applying a high voltage, two cold- The diameter of the anode was confirmed with the arc defining
type cathodes generate electrons for producing hydrogen plasma. radius.
The electric field between the two cathodes and the one hollow The combined electric and magnetic fields were optimized for
anode plays an important role in extracting H ions from the slit designing the structure and positioning the cathodes and anode.
of the ion source. The distribution of the electric and magnetic fields was considered
for the H ion production processes in hydrogen plasma, because
electron collision processes such as dissociative electron attach-
n
Corresponding author at: Sungkyunkwan University, College of Information &
ment and polar dissociation with neutral molecules in the ground
Communication Engineering, 2066, Seobu-ro, Jangan-gu, Suwon-si, Korea. state are the main processes. The behavior of the electron-volume
E-mail address: [email protected] (J.S. Chai). process is very important for producing H ions.
http://dx.doi.org/10.1016/j.nima.2014.06.048
0168-9002/& 2014 Elsevier B.V. All rights reserved.
Y.H. Yeon et al. / Nuclear Instruments and Methods in Physics Research A 763 (2014) 510–516 511
the electric field in the transition region. reflected electrons [12]. Two types of anodes, a tapered anode and
a cylindrical anode were simulated for calculation of the secondary
Te
E ¼ 1:6 electron number. We simulated the number of secondary electrons
ex
after deciding the cathode material and the location of the
We applied average electric field and average temperature of cathodes and the anode.
electrons between the cathodes and the anode to find the transi- The emission electron temperature and applied voltage were
tion region length. used for the thermal distribution of the cathodes. The thermal
The transition region length was calculated. The appropriate distribution of the cathodes is important for their life time. The
cathode material was chosen for the optimization of conditions simulation of the thermal distribution was done by ANSYS to
such as lifetime, the center gap of the cyclotron, and price. confirm the choice of the cathode material also. The thermal
A particle tracking solver is used for the static field distribution distribution of the cathodes is needed because the ion bombard-
simulation in the cathodes and the anode. The magnetic field is ment temperature is the main reason for switching a cold-type
simulated by coil construction in CST Particle Studio. The magnetic cathode to a thermo-cathode. We used steady-state thermal-
field direction is perpendicular to the extraction direction of the H electric conduction analysis for the solution of the thermal and
ions. When the emitted electrons or the plasma ions are moving, electric fields. These coupled-fields simulate joule heating for
they feel a Lorentz force, which is perpendicular to both the particle resistive materials. We determined the ion bombardment area
velocity and the field. This force has no effect on the velocity with the results of the CST Particle Studio electron trajectory and
component parallel to the magnetic field, but in the perpendicular confirmed the anode diameter with the thermal distribution area.
plane, it forces the particles to rotate in a cyclotron orbit. We used a permanent magnet for the electrons oscillation and
The frequency of the particle's motion is known as the confinement in a test chamber. The magnetic field distribution was
cyclotron frequency. This value is given by simulated in Opera Tosca [13]. The potential was calculated using a
! finite element method. The position of the permanent magnet was
eB decided by the structure of the test chamber. The permanent
ωce;i ;
me;i magnets were located in upper cover of the test chamber and the
bottom of it. The distance between the permanent magnet and the
where e, B, and me;i are the electron charge, the magnetic field, and
ion source center point was 45 mm. We applied a ‘vacodym 863 tp
the electron/ion mass respectively. The Larmor radius is defined as
[14]’ permanent magnet B–H curve. The positions of the perma-
υ? nent magnets are shown in Fig. 3.
r ce;i ;
ωce;i
!
where υ ? is the velocity perpendicular to Β . The Larmor radius
decides the central region of the plasma. We calculate this Larmor 3. Experimental setup
radius using CST Particle Studio. The electron emission was
calculated using a thermionic emission model. The velocity, The penning ionization gauge type ion source consists of two
energy, and electric field are simulated for designing the ion tantalum cathodes, one copper-tungsten alloy anode, austenitic
source. stainless steel support pipes, oxygen-free highly conductive
The secondary electron emission was also calculated by CST copper pipes, and quartz. The copper pipes are connected with
Particle Studio to select the type of anode. There are three basic an arc power supply for applying high voltage to the tantalum
types of secondary electrons: backscattered, rediffused, and elastic cathodes. The quartz tube is installed in between stainless steel
support pipes and copper pipes for insulation, because the stain- the ion source slit. We applied a voltage of 5 kV to the copper
less steel support pipes are in contact with the anode and the electrode. The position of the copper electrode was 1 cm from the
copper pipes sustain the cathodes. A Teflon tube was chosen at ion source slit.
first for the insulator because of its high insulation, but it has a low The copper electrode was also inserted in the SKKUCY-9
melting point of 600 K. It is burned when hydrogen plasma is cyclotron for measuring the H current. We applied a voltage of
formed in the ion source. When it burns, the high voltage between 5 kV to the copper electrode to extract the H ions, just like a
the stainless steel support pipes and the copper pipes creates a puller in the test chamber. However the puller extraction voltage
short circuit. The short circuit damages to the arc power supply, was 40 kV, the same as a dee voltage. We applied only 5 kV to the
because the high current flows to the arc power supply. A resistor electrode because of the discharge between the electrode and the
protects the arc power supply against the high current. The ion source. The puller structure is complicated than the electrode
resistor consumes power coming from the short circuit and and its position is far from the ion source. We used a simple
damages the high power supply. copper electrode to check the H current because we wanted to
The ion source was installed to the test vacuum chamber to measure the H current without RF electric field effects.
check the self-maintained discharge plasma. The vacuum chamber
is the same as the vacuum chamber used for a cyclotron system,
and it was made of aluminum due to its non-magnetic properties. 4. Results and discussion
The permanent magnets were installed in the upper and lower
side of the vacuum chamber. A vacuum window, and vacuum 4.1. Electric field and thermal distribution simulations
sensor gauge were connected to the vacuum chamber, and a feed
through was connected to an ampere meter for checking the H The trajectory of electrons was simulated by CST Particle Studio
ion current. A power supply was included for extraction. We with electric and magnetic field distributions. These simulations
checked the gas flow rate using a gas flow meter before the ion were done to decide the length of the transition region. The length
source gas inlet. between the anode and the cathode was decided using this length,
A self-maintained discharge was confirmed in the test chamber. which was determined by the emission electron temperature.
We measured the H current using a copper electrode in front of The electric field strength between the cathode and the anode
is shown in Fig. 4 for a tantalum cathode. We started by assuming
that the length of the anode was 12 mm. The distance between the
cathode and the anode is optimized by calculation of the transition
region length.
The equipotential lines of the cathode and anode are shown in
Fig. 5. The electrons accelerate to the anode because of the voltage
difference between the cathode and the anode. The electrons
accelerate perpendicular to the direction of the equipotential lines.
The electron trajectory is shown in Fig. 6. We began with a
cathode diameter of 10 mm, but the space of this diameter allows
accelerating electrons to have enough energy for creation of self-
discharge plasma. Thus, we decreased the cathode diameter to
8.5 mm in order to reduce the size of the ion source.
The appropriate temperature of electrons emitted from tanta-
lum cathodes is 140 eV, and the electric field is 395 V/cm in the
cathode sheath (from the simulation). The length of the transition
region is 5.8 mm, and the total length of the transition region
should be approximately 12 mm (two cathode sheaths). The total
Fig. 4. The electric field strength between the tantalum cathode and the anode. plasma height should be 36 mm from the calculation result,
Fig. 13. The H current with increasing magnet power supply current.
Fig. 14. The magnetic field (at center) versus power supply current.
Fig. 16. The H current and vacuum condition with increasing gas flow rate.