ClassMarker - NE S3
ClassMarker - NE S3
A. Azobenzene
B. Graphene Oxide
C. Silicon Carbide
D. Benzene
D. Orbital overlap
B. Ferrocene
C. Azobenzene
D. Phophorene
A. C60 (Fullerene)
B. Graphene
C. Carbon Nanotubes
Etching to create micro structure on Silicon substrate post thin film deposition is known as
A. Micromachining
B. Epitaxy
C. Anodizing
D. Sputtering
A. Doubles
B. is halved
C. Increases exponentially
D. decreases exponentially
A. 193 nm
B. 19.3 nm
C. 1.93 nm
D. 1930 nm
A. n type
B. p type
C. compound semiconductor