Enhanced Floor Plan Algorithm for Ultra Complex SoCs
Enhanced Floor Plan Algorithm for Ultra Complex SoCs
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All content following this page was uploaded by Ashok Kumar Nagarajan on 20 September 2022.
Abstract
With the increase in the functionalities, complexity and instance count of the designs,
floor planning has become a most critical task which needs lot of manual effort, time and machine usage.
As the technology of shrinking, there are analog circuits which are dominating the chips; there are lot of
floor plan rules which is mandatory and need to be done manually and it takes time, energy and
manpower which is being costly. We are developing the algorithm of enhanced automatic floor plan by
honoring all the floor plan rules and allowing the power and area optimizations.
Keywords: Physical design (PD), Enhanced Floor plan algorithm, Macro placement.
1. Introduction
Physical design (PD) is the process of transforming the logic design into layout
representation. The physically represented design has to meet the functional and performance
requirements. Performance requirements are in terms of Area, Power and Frequency of operation [1].
Signal Integrity became the major cause of design failure due to continuous shrink in layout dimensions
and the complexity of the design. Sub threshold leakage contributes to large amount of power dissipation
of the chip, which is uncontrollable for these lower technologies.
Now major part of the chip’s power is coming from its leakage power, which is
becoming important with advanced technologies. In order the drawn or implementing designs to meet
geometric, timing and power constraints Physical Design (PD) automation has comes into existence to
carry out such designs using electronic aided automation tools.
2. Floor Plan
This is the first major and important step to implement a design physically. Quality
of the chip is decided by the efficiency of floor plan. Here, defining block or chip size, allocation of
routing resources for power, macro placing and reservation of space for standard cells will be done. The
quality of floor plan decides the efficient of next stage sin the implementation like placement, routing and
timing closure [3].
This includes providing different inputs required to complete the floor plan. They are
technology information; libraries, synthesized design netlist, and Design constraints [2]. Technology
information is provided in the form of tech file,which contains data such as Manufacturing Grid, Routing
grid, Standard cell placement tile, Routing layer definition, Placement and routing blockage layer
definition, via definition, Conducting layer density rule, Metal layer slotting rule, Routing layer physical
profile etc.
Technology Libraries: They are same as those used for synthesis but in a different
format i.e. NDM (New Data Model).
Design Net list: After successful synthesis process net list been obtained. The output of
synthesis is the starting material for Physical Design.
Design Constraints: This can also be obtained from synthesis outputs as constraints
been already defined during synthesis process. Some PD related constraints can also be
added to the same file.
Site Array and Site row definitions has to be provided to the tool. Site Array is a
specific area which contain site rows of same height. Site rows are places where standard cells will be
placed. Modular Grid and Track Patterns has to be defined in design area. Modular Grid is primary thing
to be considered because this will helps to integrate all the blocks of the design. Track Pattern is also
dependent on modular grid of the technology. This defines the number of tracks can supported in
specified area, and each track’s pitch, width will be defined. Both are technology dependent data. Routing
Metal Layer definition has to be done. Where each metal layer width and alignment (direction) to be
specified. Along with layer definition extraction related information about this layer has to be provided.
This also technology related information and provided in TLUPLUS files format.
Floor plan Process will begin by creating boundary of the design. For the block under
implementation design height and width are provided in DEF file. Any placement and/or routing
blockages that are specific to technology or design, has to be created [4]. One of such blockage is
boundary blockage to avoid cell placement to be done very near to boundary.IO placement should happen
from the data available in DEF file. Where all pin placement information is provided. Information
includes pin location, metal layer on which pin has to be built and IO pad dimensions. And then create IO
pad blockage region to avoid cell placement in IO region. Up on various trials of complete PnR process,
for the design considered DEF (Design Exchange Format) file been created. Which contain optimum IO
and area information.
Site array and site row creation: For the obtained Technology three type of standard
cells are available. Core, Core2h and bonus core. Core and Core2h are of same height but of different
widths, so one site array will be sufficient for both of them. Whereas bonus core cells of double height
cells so site array has to be defined separately for these cells.
3. Placement
During floor plan creation of core area, placement of macros and structure of
power network is done. After doing the mentioned task during floor plan, for tool to place standard cell it
is the right time. Determining the location of each standard cell (or component) on the die is major
objective of placement stage. While doing so various factors like timing specifications of the design,
length of interconnections and power dissipation will come into existence [6]. As geometries are
decreasing continuously Interconnect length determines the performance of the design, which is majorly
decided by placement solution. Also routability is also decided by placement quality only. Placement not
only places the standard cells from the net list but also optimizes the design, to avoid any timing
violations in the design.During placement, all standard cells of the design are located within the design
area. Placing and selecting these standard cells is determined from area, timing and power constraints [5].
Placement also determines the utilization of the block, where utilization factor is defined as the ratio of
gate and routing areas to the total area of the block.
3.1 Placement Setup
The wire load models will be used at pre-placement stage. These wire load
models should be removed before the placement starts. As these placement uses the RC values from the
extraction possibilities in the setup. Clock reconvergence pessimism removal (CRPR): the clock trees
need to share as many buffers as possible in order to reduce the OCV effects. The timing calculations will
be shared by the clock path that is the common clock paths will have same delays so that can be reduced.
The delays through common cells cannot be different as when they are calculated as launch path and the
capture path. The difference between the earliest arrival time and the latest arrival time is known as Clock
reconvergence pessimism (CRP). The CRP will be added to capture path for setup timing in pessimism
removal. For hold timing the CRP will be subtracted from capture path.
During data path optimization, Buffer area utilization should be defined. TIE cells are used to power the
standard cells these will be placed along with the standard cells. Maximum fan out should be given to TIE
cells. The tie-high and tie-low cells will be connected to power and ground. But in lower level
technologies there may be ground bounce or power bounce if the gate is connected to power or ground of
the transistor. These cells will be present in the standard cell library[7]. The leakage optimization options
will also be given at placement stage. The library contains four type of cells they are Vt cells, high Vt
cells, standard Vt, nominal Vt, Ultra low Vt. Ultralow Vt cells are not used to provide more flexible for
optimization at later stages. Maximum density of cells should be placed in design area if place coarse
maximum density is defined. Specify cell spacing: For some specific cells, there are settings based on
physical DRC’s. And also should be given with DFM spacing rules: larger vias will be placed to improve
the yield. So that the failure of vias will gradually reduce in the design.
4. Existing Design
5. Proposed Design
With the help of automatic floor plan algorithm,( which as shown above) we place
the Macros and I/O pads in correct manner which has shown above figure 5. so that we can use the core
area and usages of metal layers effectively . Due to this congestion reduced, we can go to the next stage
quickly. In the above figure 6 shows core utilization at each stage that means for routing pulpous use
more core area due to that from one stage to another stage going taken time very less[9]. After proper
floor plan completion results to be verified are check report and utilization report. Figure 7 shows check
report of the design and Table 1 shows the corresponding utilization results of implementing design [10].
7. References
1. Cadence. Innovus(Encounter) User Guide, Product Version 16.2, 2016.
2.Chang B, Jigang W, Srikanthan T, et al. “Fast evaluation-based algorithm for fixed-out line
floor planning ”, Computer Engineering and Technology (ICCET), 2010 2nd International Conference
on. IEEE, pp. V2-81-V2-85, 2010.
4.C.-W.Liu and Y.-W.Chang, "Floorplan and power/ground network co synthesis for fast design
convergence," in Proc. of ISPD, pp.86, 2006.
5. D. E. Khalil and Y. Ismail, "Optimum sizing of power grids for IR drop," 2006 IEEE
International Symposium on Circuits and Systems, Island of Kos, pp. 4pp.-484, 2006.
7. H. Kaul, D. Sylvester and D. Blaauw, "Performance optimization of critical nets through active
shielding," in IEEE Transactions on Circuits and Systems I: Regular Papers, vol. 51, no. 12, pp. 2417-
2435, Dec.2004.
8. S.N. Adya and I.L. Markov, “Fixed-outline Floor planning: Enabling Hierarchical Design”,
IEEE Trans. on VLSI 11(6), pp. 1120-1135, 2003.
10. M. Hashimoto, M. Takahashi, and H. Onodera. “Crosstalk noise optimization by post layout
transistor sizing.” Proc. Int. Symp. Physical Design, pp.126–130,2002.