TCE 6204minstrumentation & Process Control Dynamics
TCE 6204minstrumentation & Process Control Dynamics
Control Dynamics
Engineer Stanford Mudono
Office: SD2 , 2nd Floor Chemical Engineering Building
Email: [email protected]
Cell: +263 775137257/715444990
Module Content
1. Instrumentation & Process Control Dynamics
basic Concepts
2. Modeling Tools for Industrial Processes
3. Bode Diagrams and Plots Concepts for Control
of Industrial Processes
4. Routh Array and Nyquist Stability Criterion
Applications
5. SISO and MIMO Process Control Concepts
Learning Objectives:
• In this case:
• The complex frequency response can also be represented in the form:
• where,
RT is the resistance at temperature, T (K)
Ro is the resistance at temperature, To (K)
To is the reference temperature, normally 25°C
β is a constant, its value is decided by the characteristics of the
material, and the nominal value is taken as 4000.
• From equation 3, the resistance temperature coefficient
can be obtained as:
Thermocouple
• Is a senor made from two wires with dissimilar thermo-electric
properties (i.e. heat liberates electrons to different extents).
• The wires are joined at each end and a small voltage is generated
which is proportional to the differences between the temperatures at
the two ends of the device.
• The emf generated can be approximately expressed by the
relationship:
• where,
T1 and T2 are hot and cold junction temperatures in K
C1 and C2 are constants depending upon the materials
for Copper/Constantan couple; C1 = 61.1 and C2 = 0.045
1.1.4.2 Pressure measurement
• Pressure measurement is very important in chemical plants both
as a fundamental measurement and also as an implied
measurement of flowrate and level.
• Pressure measurements can be classified into 4 main categories:
1. Gauge pressure
2. Absolute pressure
3. Vacuum pressure
4. Differential pressure (DPC)
• where,
Cd is the discharge coefficient
A1 cross-sectional area of the pipe (m2),
A2 cross-sectional area of the orifice (m2),
H is change in depth of liquid (m)
Fig 1.5 Venturi meter
1.1.4.4 Level Measurement
• The measurement and control of liquid level with a
chemical plant is one of the most important functions of
the instrumentations.
• Liquid level controllers maintain the overall process
mass balance and also maintain liquid seals
Differential pressure measurements
Capacitance measurements
Ultrasonic and radar measurements
Dipsticks
Sight glasses
1.1.4.5 Composition measurement
• When safety and quality concerns are met, process control objectives
can be focused on profit.
• All processes experience variations and product quality demands that
we operate within constraints.
A batch system may require ± 0.5% tolerance on each ingredient
addition to maintain quality.
A cook system may require ± 0.5 degrees on the exit temperature to
maintain quality.
• Profits will be maximized the closer the process is operated to these
constraints.
The real challenge in process control is to do so safely without
compromising product quality.
Why Process Control is needed?
• Specific Objectives of Control
•Increased product throughput
•Increased yield of higher valued products
•Decreased energy consumption
•Decreased pollution
•Decreased off-spec product
•Increased Safety
•Extended life of equipment
•Improved Operability
•Decreased production labor
1.2.2 The foundation of process control