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Pulsed Laser Deposition (PLD)
A Colorful Journey into Thin Film
Technology What is PLD? • PLD is a technique where a laser beam hits a target material, • forming a plasma that deposits as a thin film on a surface. • It is used to make smooth, thin layers for high- tech applications. How PLD Works • 1. A pulsed laser hits a solid target. • 2. The material is vaporized into plasma. • 3. The plasma moves toward a substrate. • 4. A thin film grows layer by layer. Advantages of PLD • ✓ Copies material stoichiometry exactly. • ✓ Needs lower temperatures. • ✓ Multi-target switching allows layered films. • ✓ Simple setup for lab use. Disadvantages of PLD • ✗ Not ideal for large areas. • ✗ Particulates may form on film. • ✗ Limited use in mass production. Materials Used in PLD • - Zinc Oxide (ZnO): semiconductors • - YBCO: superconductors • - TiO₂: photocatalysts • - Nickel, Copper, Iron oxides, etc. Applications of PLD • - High-temperature superconductors • - Optical and electronic coatings • - Thin-film batteries and solar cells • - Nanotubes and quantum dots Graph: Deposition Rate vs. Laser Energy
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