Lecture - Electron Diffraction
Lecture - Electron Diffraction
1. Diffraction
Diffraction refers to various phenomena associated with the bending of waves when they interact with obstacles in their path. It occurs with any type of wave, including sound waves, water waves, and electromagnetic waves such as visible light, x-rays and radio waves. As physical objects have wave-like properties, diffraction also occurs with matter and can be studied according to the principles of quantum mechanics. While diffraction always occurs when propagating waves encounter obstacles in their paths, its effects are generally most pronounced for waves where the wavelength is on the order of the size of the diffracting objects. The complex patterns resulting from the intensity of a diffracted wave are a result of interference between different parts of a wave that traveled to the observer by different paths.
The final results on the observed image are : The deviation of the intensity distribution that is predicted from the linear propagation The increasing or decreasing of the intensity at unexpected points that give rise to bright or dark fringes.
The amplitude of the optical field at a point beyond P is the superposition of all af these waves (considering their amplitudes and relative phaces). The calculation requires the integration of the elementary wavelets ds over all the diffracting space.
( + C) =
where,
k = k0 = k k0
The superposition of the secondary wavelets triple integral over all the diffraction space ( ) gives the Fourier Transform of the function that describes the potential of the material that induces the electrons diffraction. A() =
2m 0e h2
V(r)exp[i2K r]d
The intensity of every diffracted beam in Fraunhofer diffraction condition is proportional to the Fourier Transform and is observed on the back focal plane of the imaging lens. The calculations of the diffraction integral in the volume of a unit cell gives as a result the Structural Factor of the diffracted material for a specific diffraction angle .
Z f x ( ) 2h 2 sin 2
f
j
( )exp[i2pKrj ]
2m 0e h2
V(r)exp[i2(k - k
crystal
) r]d
or
exp[i 2 pKr ]
n n
8.Bragg's law
A crystalline specimen will diffract the electron beam strongly through welldefined directions (given in angles, q) dependent on electron wavelength and crystal lattice spacing according to Bragg's law, nhkl = 2dhklsin where: n is an integer is the electron wavelength d is the crystal lattice spacing between atomic planes is the angle of incidence and also of reflection
This relation gives the conditions for constructive interference of the scattered electron waves (Fig. 3). There is reinforcement of reflections from successive parallel planes when the angles of incidence and reflection satisfy Bragg's law. The dimensions and spacing of spots are reciprocally related to the lattice dimensions in the specimen. For example, with 100 kV electrons, (= 0.0037 nm) and a d-spacing for a typical biological crystal = 10 nm, sinq = 0.000185 and the Bragg angle q = 0.0106. (A typical d-spacing for a metallic crystal such as nickel is 0.203 nm, so sin q = 0.00911 and q = 0.522).
Depending on the nature of the specimen, a diffraction pattern usually consists of a series of rings (for specimens consisting of many randomly oriented microcrystals) or a discrete lattice of sharp spots (for specimens with a single, crystalline domain). Each sharp spot in the diffraction pattern is an image of the electron source since the imaging system is set to bring the image of the electron source to the viewing screen.
9.Ewalds Sphere
The Ewald sphere is a geometric construct used in electron, neutron, and X-ray crystallography which neatly demonstrates the relationship between: the wavelength of the incident and diffracted x-ray beams, the diffraction angle for a given reflection, the reciprocal lattice of the crystal
It was conceived by Paul Peter Ewald, a German physicist and crystallographer. Ewald's sphere can be used to find the maximum resolution available for a given x-ray wavelength and the unit cell dimensions. It is often simplified to the twodimensional "Ewald's circle" model or may be referred to as the Ewald sphere.
A crystal can be described as a lattice of points of equal symmetry. The requirement for constructive interference in a diffraction experiment means that in momentum or reciprocal space the values of momentum transfer where constructive interference occurs also form a lattice (the reciprocal lattice). For example, the reciprocal lattice of a simple cubic real-space lattice is also a simple cubic structure. The aim of the Ewald sphere is to determine which lattice planes (represented by the grid points on the reciprocal lattice) will result in a diffracted signal for a given wavelength, , of incident radiation. The incident plane wave falling on the crystal has a wave vector Ki whose length is 2 / . The diffracted plane wave has a wave vector Kf. If no energy is gained or lost in the diffraction process (it is elastic) then Kf has the same length as Ki. The amount the beam is diffracted by is defined by the scattering vector K = Kf Ki. Since Ki and Kf have the same length the scattering vector must lie on the surface of a sphere of radius 2 / . This sphere is called the Ewald sphere. The reciprocal lattice points are the values of momentum transfer where the Bragg diffraction condition is satisfied and for diffraction to occur the scattering vector must be equal to a reciprocal lattice vector. Geometrically this means that if the origin of reciprocal space is placed at the tip of Ki then diffraction will occur only for reciprocal lattice points that lie on the surface of the Ewald sphere.
Figure 5. Diffraction pattern taken from single crystal of gallium nitride along 0001 wurtzite zone axis.
Diffraction pattern of bi-crystal (Figure 6) is observed when the diffraction pattern is taken from the area of two discrete structures with specific orientation correlation. Diffraction spots are not in periodic arrangement and correspond to the two independent overlapping diffraction images of single crystals. Such a diffraction pattern brings the information about the relationship between these two crystalline parts of the sample.
Figure 6.
Diffraction pattern taken from bi-crystal of gallium nitride epitaxial film on sapphire substrate. Pattern taken along [1101] sapphire and [0001] gallium nitride zone axes.
Diffraction pattern of polycrystalline materials (Figure 7) is observed when the diffraction pattern is taken from the area of a big number of discrete segments with the same structure in random orientations. Diffraction spots are then arranged in concentric rings. The number of spots in every ring depends on the number and size of crystallites .When the spots in the rings are resolvable; the diffraction pattern is taken from a small number of rather large crystallites. In case when the spots in rings are cot resolvable it means that the diffraction patterns was taken from a big number of rather small crystallites.
Figure 7. Diffraction pattern taken from polycrystalline gold (inversed contrast). Courtesy of J.A. Kozubowski
Diffraction pattern of amorphous material is observed when the diffraction pattern is taken from area of randomly arranged very small structural units with short range ordering. We can not resolve any discrete spots, and diffraction pattern consists of diffused concentrating rings. Diffraction pattern of modulated structures is observed when the diffraction pattern is taken from area of structure with periodic modification of basic perfect structure but without any disturbance. In this case we observe a discrete spots coming from single crystal and additional discrete spots with reciprocal lattice vectors perpendicular to the direction of modification.
Distances between additional are inversely proportional to the distances of modification in a real structure.
Since in diffraction of fast electrons Bragg angles are very small, about 1o so we can write the proportion: L/Rr =(1/)(1/d)=d/ And then it is possible to calculate the interplanar spacing for investigated material: d= L/R where: L is a camera constant characteristic feature of microscope and depends also on magnification of a diffraction pattern R is a measured on the diffraction pattern the distance between spot coming from direct beam and spot coming from lattice plane (hkl) diffracting the beam. It is a distance OG on figure 8.
efficiencies, DSSCs show true promise for being an inexpensive, renewable, and environmentally benign alternative to fossil fuels. DSSCs are made by covalently bonding a sensitizer dye to the surface of a thin film of nanocrystalline TiO2, which does not absorb visible light because it is a wide-gap semiconductor. Sensitization with a dye, such as Ruthenium-535 [Ru(4,4'-dicarboxy-2,2'bipyridine)2(NCS)2], greatly enhances the ability of these cells to absorb sunlight. Electrons are injected from the dye molecule's excited state to the conduction band of the TiO2 on a sub-picosecond time scale, where they are conducted through the electrical circuit (shown on Fig. 9).
a)
b)
In this case study, the polycrystalline complex of TiO2Ru was investigated. The diffraction pattern shown on Fig 10a) was taken from matrix material and it consists of concentric rings. The diffraction rings are composed of discrete spots what indicates that the matrix material consists of small number of rather large crystallites. To find the material of the matrix the ring diffraction pattern for rutile form and antanase form of titanium dioxide and for ruthenium crystals were prepared and then compared with the real diffraction pattern. It is visible that the simulated rings of rutile match very well with the rings visible on the diffraction pattern and this is also the main phase of matrix material. Some discrete spots between rutile rings (yellow arrows) cover with simulated diffraction rings of antanase phase, this indicate for the rare appearance of the antanase crystallites
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in matrix material. The simulated spots for Ru are situated very close to that of TiO2, but Ru is not observed in matrix material. The diffraction pattern shown on Fig 10b) was taken from area with bigger crystals and its analysis indicates that bigger crystals are TiO2 rutile crystals (discrete spots are observed).It is also visible that weak spots are coming from ruthenium small crystallites.
13.2
Gallium nitride and its alloys with aluminium and indium are the group of semiconductors which are widely used in many optoelectronic applications. AlGaN is used to manufacture light-emitting diodes operating in blue to ultraviolet region, where wavelengths down to 250 nm (far UV) were achieved. It is also used in blue semiconductor lasers, detectors of ultraviolet radiation, and in AlGaN/GaN HEMT transistors. Nitrides are very hard, mechanically stable materials with large heat capacity. GaN in its pure form it resists cracking and can be deposited in thin film on sapphire or silicon carbide, despite the mismatch in their lattice constants. GaN can be doped with silicon (Si) or with oxygen to Ntype and with magnesium (Mg) to P-type, however the Si and Mg atoms change the way the GaN crystals grow, introducing tensile stresses and making them brittle. Gallium nitride compounds also tend to have a high spatial defect frequency, on the order of a hundred million to ten billion defects per square centimeter.
In this case studies it was shown that the percentage composition of Al in AlGaN alloy can be determined with diffraction pattern analysis. AlGaN may crystallize in wurtzite structure with crystallographic symmetry group P63mc(186). The lattice constants of pure wurtzite GaN are c=0.519 nm and a= 0.359 and these values are diminished since aluminium atom is much smaller than the gallium atoms and their values depend on aluminium composition in AlGaN. According to the rule for structure factor, some reflections should not appear in case of pure GaN, and forbidden reflection for: [11.0] zone axis are: g00.1, g00.3, g30.1 and g 30.3 [01.0] zone axis are: g00.1, g00.3, g11.1 and g11.3 However for AlGaN this rule is not true and these reflections would be visible when some order in AlGaN occurs.
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In Table 1 the different possible composition of alternative 00.1 planes in AlGaN are listed. Positions 1 and 2 respond to two possible positions in a crystallographic cell of wurtzite structure.
Table 1. Interplay between occupation of Ga-Al sites in alternative (00.1) planes
Intensity of forbidden reflection may be calculated for each possible configuration of (00.1) planes in AlGaN structure (values listed in Table 2) and the calculated values could be compared with intensities of the forbidden reflections measured on the diffraction patterns. In this way the modulation in occupancy of Al-Ga atoms in (00.1) planes could be determined.
Table2. Calculated intensities for different modulations:zone axis [010]
H 0 3 0 3
K 0 0 0 0
L 1 1 3 3
The intensities of the forbidden reflections measured on the diffraction patterns could be different than the calculated values since the dynamical scattering of electrons always occurs and changes the intensity of reflections.
14. References
[1] [2] http://en.wikipedia.org/wiki/Diffraction D.B. Williams, C.B. Carter, Transmission Electron Microscopy- A textbook for materials science second part Diffraction. Plenum Press, New York 1996
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